JP2013541844A5 - - Google Patents

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Publication number
JP2013541844A5
JP2013541844A5 JP2013531609A JP2013531609A JP2013541844A5 JP 2013541844 A5 JP2013541844 A5 JP 2013541844A5 JP 2013531609 A JP2013531609 A JP 2013531609A JP 2013531609 A JP2013531609 A JP 2013531609A JP 2013541844 A5 JP2013541844 A5 JP 2013541844A5
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JP
Japan
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during
droplet
period
generating
laser
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JP2013531609A
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Japanese (ja)
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JP2013541844A (ja
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Priority claimed from US13/157,233 external-priority patent/US8653437B2/en
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Publication of JP2013541844A publication Critical patent/JP2013541844A/ja
Publication of JP2013541844A5 publication Critical patent/JP2013541844A5/ja
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JP2013531609A 2010-10-04 2011-09-06 Ｅｕｖ非出力期間中のｌｐｐ駆動レーザー出力のための方法 Pending JP2013541844A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US40456410P 2010-10-04 2010-10-04
US61/404,564 2010-10-04
US13/157,233 2011-06-09
US13/157,233 US8653437B2 (en) 2010-10-04 2011-06-09 EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
PCT/US2011/050565 WO2012050685A1 (en) 2010-10-04 2011-09-06 Method for lpp drive laser output during euv non-output periods

Related Child Applications (1)

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JP2016125237A Division JP6182645B2 (ja) 2010-10-04 2016-06-24 Ｅｕｖ非出力期間中のｌｐｐ駆動レーザー出力のためのデバイス

Publications (2)

Publication Number Publication Date
JP2013541844A JP2013541844A (ja) 2013-11-14
JP2013541844A5 true JP2013541844A5 (enExample) 2014-10-16

Family

ID=45888994

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JP2013531609A Pending JP2013541844A (ja) 2010-10-04 2011-09-06 Ｅｕｖ非出力期間中のｌｐｐ駆動レーザー出力のための方法
JP2016125237A Active JP6182645B2 (ja) 2010-10-04 2016-06-24 Ｅｕｖ非出力期間中のｌｐｐ駆動レーザー出力のためのデバイス

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JP2016125237A Active JP6182645B2 (ja) 2010-10-04 2016-06-24 Ｅｕｖ非出力期間中のｌｐｐ駆動レーザー出力のためのデバイス

Country Status (6)

Country Link
US (2) US8653437B2 (enExample)
EP (1) EP2624913B1 (enExample)
JP (2) JP2013541844A (enExample)
KR (1) KR101884706B1 (enExample)
TW (1) TWI530231B (enExample)
WO (1) WO2012050685A1 (enExample)

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JP6649958B2 (ja) * 2015-10-02 2020-02-19 ギガフォトン株式会社 極端紫外光生成システム
US10048199B1 (en) * 2017-03-20 2018-08-14 Asml Netherlands B.V. Metrology system for an extreme ultraviolet light source
KR102675689B1 (ko) * 2018-05-14 2024-06-14 트럼프 레이저시스템즈 포 세미컨덕터 매뉴팩처링 게엠베하 초점 조정 장치 및 이를 구비한 euv 방사선 발생 장치
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