JP2013535562A5 - - Google Patents

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Publication number
JP2013535562A5
JP2013535562A5 JP2013524128A JP2013524128A JP2013535562A5 JP 2013535562 A5 JP2013535562 A5 JP 2013535562A5 JP 2013524128 A JP2013524128 A JP 2013524128A JP 2013524128 A JP2013524128 A JP 2013524128A JP 2013535562 A5 JP2013535562 A5 JP 2013535562A5
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Japan
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polymer composition
phenyl
tris
formula
exo
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JP2013524128A
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Japanese (ja)
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JP5837069B2 (ja
JP2013535562A (ja
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Priority claimed from PCT/US2011/046729 external-priority patent/WO2012019091A1/en
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Publication of JP2013535562A5 publication Critical patent/JP2013535562A5/ja
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Publication of JP5837069B2 publication Critical patent/JP5837069B2/ja
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JP2013524128A 2010-08-06 2011-08-05 立体特異性多環式2,3−ジオールモノマーから誘導される繰り返し単位を有するポリカーボネートを含む犠牲ポリマー組成物 Expired - Fee Related JP5837069B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US37121110P 2010-08-06 2010-08-06
US37148910P 2010-08-06 2010-08-06
US61/371,211 2010-08-06
US61/371,489 2010-08-06
PCT/US2011/046729 WO2012019091A1 (en) 2010-08-06 2011-08-05 Sacrificial polymer compositions including polycarbonates having repeat units derived from stereospecific polycyclic 2,3-diol monomers

Publications (3)

Publication Number Publication Date
JP2013535562A JP2013535562A (ja) 2013-09-12
JP2013535562A5 true JP2013535562A5 (enExample) 2014-04-24
JP5837069B2 JP5837069B2 (ja) 2015-12-24

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Family Applications (2)

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JP2013524128A Expired - Fee Related JP5837069B2 (ja) 2010-08-06 2011-08-05 立体特異性多環式2,3−ジオールモノマーから誘導される繰り返し単位を有するポリカーボネートを含む犠牲ポリマー組成物
JP2013524129A Expired - Fee Related JP5704495B2 (ja) 2010-08-06 2011-08-05 マイクロエレクトロニクス組立用のポリマー組成物

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JP2013524129A Expired - Fee Related JP5704495B2 (ja) 2010-08-06 2011-08-05 マイクロエレクトロニクス組立用のポリマー組成物

Country Status (6)

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US (4) US8575248B2 (enExample)
EP (2) EP2601239A1 (enExample)
JP (2) JP5837069B2 (enExample)
KR (2) KR101650893B1 (enExample)
CN (2) CN103119082A (enExample)
WO (2) WO2012019091A1 (enExample)

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JP5837069B2 (ja) 2010-08-06 2015-12-24 プロメラス, エルエルシー 立体特異性多環式2,3−ジオールモノマーから誘導される繰り返し単位を有するポリカーボネートを含む犠牲ポリマー組成物
US8535454B2 (en) * 2010-11-23 2013-09-17 Promerus, Llc Polymer composition for microelectronic assembly
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US9505948B2 (en) * 2012-12-17 2016-11-29 Promerus, Llc Thermally decomposable polymer compositions for forming microelectronic assemblies
TW201446876A (zh) * 2013-02-28 2014-12-16 Promerus Llc 具有聚環官能側基之高玻璃轉換溫度之光可成像聚碳酸酯類聚合物
JP6612533B2 (ja) * 2015-06-12 2019-11-27 三菱瓦斯化学株式会社 反応現像画像形成法、反応現像画像形成法に用いられる感光性樹脂組成物、および反応現像画像形成方法により製造された基板ならびに構造物
JP6807226B2 (ja) * 2016-12-09 2021-01-06 東京応化工業株式会社 基材上に平坦化膜又はマイクロレンズを形成するために用いられるエネルギー感受性組成物、硬化体の製造方法、硬化体、マイクロレンズの製造方法、及びcmosイメージセンサ
KR101880151B1 (ko) * 2017-07-12 2018-07-20 주식회사 삼양사 폴리노보넨-폴리카보네이트 공중합체 및 그 제조방법
CN111848933B (zh) * 2020-06-28 2022-08-23 吴君宇 一种可降解共聚酯的制备方法
CN114161031A (zh) * 2021-12-30 2022-03-11 广东芯聚能半导体有限公司 助焊剂、助焊膜、预制焊片及其应用
JP2023135288A (ja) * 2022-03-15 2023-09-28 旭化成株式会社 メチレン鎖を含む脂環式ポリカーボネート樹脂
JPWO2024042951A1 (enExample) * 2022-08-23 2024-02-29
JP2023052255A (ja) * 2022-08-23 2023-04-11 サンアプロ株式会社 酸発生剤、前記酸発生剤を含む硬化性組成物、及びその硬化物
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JP7745814B1 (ja) * 2024-03-26 2025-09-29 リンテック株式会社 分解性フィルムの使用方法およびレジストパターンの作製方法

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