JP2013535074A5 - - Google Patents

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JP2013535074A5
JP2013535074A5 JP2013514413A JP2013514413A JP2013535074A5 JP 2013535074 A5 JP2013535074 A5 JP 2013535074A5 JP 2013514413 A JP2013514413 A JP 2013514413A JP 2013514413 A JP2013514413 A JP 2013514413A JP 2013535074 A5 JP2013535074 A5 JP 2013535074A5
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period
species
substrate
power level
bias
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JP5896572B2 (ja
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JP2013514413A 2010-06-11 2011-06-13 基板プラズマ処理方法 Active JP5896572B2 (ja)

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Application Number Priority Date Filing Date Title
US35395310P 2010-06-11 2010-06-11
US61/353,953 2010-06-11
US13/157,005 US9123509B2 (en) 2007-06-29 2011-06-09 Techniques for plasma processing a substrate
US13/157,005 2011-06-09
PCT/US2011/040206 WO2011156813A1 (en) 2010-06-11 2011-06-13 Techniques for plasma processing a substrate

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JP2013535074A JP2013535074A (ja) 2013-09-09
JP2013535074A5 true JP2013535074A5 (enExample) 2014-04-10
JP5896572B2 JP5896572B2 (ja) 2016-03-30

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US (1) US9123509B2 (enExample)
JP (1) JP5896572B2 (enExample)
KR (1) KR101811364B1 (enExample)
CN (1) CN103109342B (enExample)
TW (1) TWI562226B (enExample)
WO (1) WO2011156813A1 (enExample)

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