JP2013510931A5 - - Google Patents
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- JP2013510931A5 JP2013510931A5 JP2012538938A JP2012538938A JP2013510931A5 JP 2013510931 A5 JP2013510931 A5 JP 2013510931A5 JP 2012538938 A JP2012538938 A JP 2012538938A JP 2012538938 A JP2012538938 A JP 2012538938A JP 2013510931 A5 JP2013510931 A5 JP 2013510931A5
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- Japan
- Prior art keywords
- ocf
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- treatment composition
- general formula
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- Prior art date
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- 239000000203 mixture Substances 0.000 claims description 125
- 238000004381 surface treatment Methods 0.000 claims description 88
- 150000001875 compounds Chemical class 0.000 claims description 87
- -1 cyclic amine Chemical class 0.000 claims description 56
- 239000011541 reaction mixture Substances 0.000 claims description 46
- 239000000758 substrate Substances 0.000 claims description 45
- 229910052731 fluorine Inorganic materials 0.000 claims description 41
- 239000011737 fluorine Substances 0.000 claims description 41
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 39
- 238000000034 method Methods 0.000 claims description 34
- 230000003287 optical effect Effects 0.000 claims description 34
- 238000004519 manufacturing process Methods 0.000 claims description 29
- 150000003961 organosilicon compounds Chemical class 0.000 claims description 29
- 239000003638 chemical reducing agent Substances 0.000 claims description 26
- 101100167062 Caenorhabditis elegans chch-3 gene Proteins 0.000 claims description 17
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 16
- 239000003054 catalyst Substances 0.000 claims description 15
- 150000001735 carboxylic acids Chemical class 0.000 claims description 13
- 239000013014 purified material Substances 0.000 claims description 13
- 125000003545 alkoxy group Chemical group 0.000 claims description 12
- 239000000126 substance Substances 0.000 claims description 12
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 claims description 12
- 239000005052 trichlorosilane Substances 0.000 claims description 12
- 229910052723 transition metal Inorganic materials 0.000 claims description 11
- 150000003624 transition metals Chemical class 0.000 claims description 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 8
- 239000001301 oxygen Substances 0.000 claims description 8
- 229910052760 oxygen Inorganic materials 0.000 claims description 8
- 239000002994 raw material Substances 0.000 claims description 8
- 239000002585 base Substances 0.000 claims description 7
- 150000003973 alkyl amines Chemical class 0.000 claims description 6
- 125000003282 alkyl amino group Chemical group 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 claims description 6
- 238000004440 column chromatography Methods 0.000 claims description 6
- 229910052697 platinum Inorganic materials 0.000 claims description 6
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- 125000000962 organic group Chemical group 0.000 claims description 5
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- 125000005843 halogen group Chemical group 0.000 claims description 4
- 239000010948 rhodium Substances 0.000 claims description 4
- 229910052783 alkali metal Inorganic materials 0.000 claims description 3
- 229910052703 rhodium Inorganic materials 0.000 claims description 3
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 3
- 229910010082 LiAlH Inorganic materials 0.000 claims description 2
- 125000002947 alkylene group Chemical group 0.000 claims description 2
- 125000001153 fluoro group Chemical group F* 0.000 claims description 2
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- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 239000010702 perfluoropolyether Substances 0.000 description 12
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 11
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- GVNVAWHJIKLAGL-UHFFFAOYSA-N 2-(cyclohexen-1-yl)cyclohexan-1-one Chemical compound O=C1CCCCC1C1=CCCCC1 GVNVAWHJIKLAGL-UHFFFAOYSA-N 0.000 description 7
- 101150065749 Churc1 gene Proteins 0.000 description 7
- 102100038239 Protein Churchill Human genes 0.000 description 7
- 238000004458 analytical method Methods 0.000 description 7
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- SJBBXFLOLUTGCW-UHFFFAOYSA-N 1,3-bis(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC(C(F)(F)F)=C1 SJBBXFLOLUTGCW-UHFFFAOYSA-N 0.000 description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
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- 229920001577 copolymer Polymers 0.000 description 6
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 6
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- 239000002184 metal Substances 0.000 description 5
- 229960004624 perflexane Drugs 0.000 description 5
- ZJIJAJXFLBMLCK-UHFFFAOYSA-N perfluorohexane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F ZJIJAJXFLBMLCK-UHFFFAOYSA-N 0.000 description 5
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- 238000007033 dehydrochlorination reaction Methods 0.000 description 4
- 125000000524 functional group Chemical group 0.000 description 4
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- 125000004356 hydroxy functional group Chemical group O* 0.000 description 4
- 229910010272 inorganic material Inorganic materials 0.000 description 4
- 239000007791 liquid phase Substances 0.000 description 4
- TZIHFWKZFHZASV-UHFFFAOYSA-N methyl formate Chemical compound COC=O TZIHFWKZFHZASV-UHFFFAOYSA-N 0.000 description 4
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- 238000005160 1H NMR spectroscopy Methods 0.000 description 3
- JHQVCQDWGSXTFE-UHFFFAOYSA-N 2-(2-prop-2-enoxycarbonyloxyethoxy)ethyl prop-2-enyl carbonate Chemical compound C=CCOC(=O)OCCOCCOC(=O)OCC=C JHQVCQDWGSXTFE-UHFFFAOYSA-N 0.000 description 3
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
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- 125000003277 amino group Chemical group 0.000 description 3
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- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
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- 125000001309 chloro group Chemical group Cl* 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 3
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 3
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- 238000004821 distillation Methods 0.000 description 3
- BITPLIXHRASDQB-UHFFFAOYSA-N ethenyl-[ethenyl(dimethyl)silyl]oxy-dimethylsilane Chemical compound C=C[Si](C)(C)O[Si](C)(C)C=C BITPLIXHRASDQB-UHFFFAOYSA-N 0.000 description 3
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- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical compound C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 description 2
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- PXAJQJMDEXJWFB-UHFFFAOYSA-N acetone oxime Chemical group CC(C)=NO PXAJQJMDEXJWFB-UHFFFAOYSA-N 0.000 description 2
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- 125000001931 aliphatic group Chemical group 0.000 description 2
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- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
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- XRHGYUZYPHTUJZ-UHFFFAOYSA-N 4-chlorobenzoic acid Chemical compound OC(=O)C1=CC=C(Cl)C=C1 XRHGYUZYPHTUJZ-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
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- 239000004215 Carbon black (E152) Substances 0.000 description 1
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
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| USPCT/US2009/064016 | 2009-11-11 | ||
| PCT/US2010/056194 WO2011060047A1 (en) | 2009-11-11 | 2010-11-10 | Surface treatment composition, process for producing the same, and surface-treated article |
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| KR (2) | KR101419153B1 (https=) |
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| BR (1) | BR112012011306B1 (https=) |
| CA (1) | CA2779655C (https=) |
| EA (1) | EA026635B1 (https=) |
| WO (2) | WO2011059430A1 (https=) |
Families Citing this family (48)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2638050B1 (en) | 2010-11-10 | 2017-07-26 | Dow Corning Corporation | Surface treatment composition, method of producing the surface treatment composition, and surface-treated article |
| KR101969187B1 (ko) | 2011-09-21 | 2019-04-15 | 에이지씨 가부시키가이샤 | 함불소 에테르 조성물, 그 제조 방법, 코팅액, 및 표면 처리층을 갖는 기재의 제조 방법 |
| US9035082B2 (en) * | 2011-10-10 | 2015-05-19 | Cytonix, Llc | Low surface energy touch screens, coatings, and methods |
| US10077207B2 (en) | 2011-11-30 | 2018-09-18 | Corning Incorporated | Optical coating method, apparatus and product |
| US9957609B2 (en) | 2011-11-30 | 2018-05-01 | Corning Incorporated | Process for making of glass articles with optical and easy-to-clean coatings |
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| TWI579347B (zh) | 2012-02-17 | 2017-04-21 | Asahi Glass Co Ltd | A fluorine-containing ether compound, a fluorine-containing ether composition and a coating liquid, and a substrate having a surface treatment layer and a method for producing the same (3) |
| KR102016195B1 (ko) | 2012-02-17 | 2019-08-29 | 에이지씨 가부시키가이샤 | 함불소 에테르 화합물, 함불소 에테르 조성물 및 코팅액, 그리고 표면 처리층을 갖는 기재 및 그 제조 방법 |
| EP2816045B1 (en) | 2012-02-17 | 2019-04-03 | AGC Inc. | Fluorinated ether compound, fluorinated ether composition and coating fluid, and substrate having surface-treated layer and method for its production |
| JP6163796B2 (ja) * | 2012-04-27 | 2017-07-19 | ダイキン工業株式会社 | パーフルオロポリエーテル基含有シラザン化合物 |
| JP2014077115A (ja) * | 2012-09-21 | 2014-05-01 | Dow Corning Toray Co Ltd | 光学材料用表面処理剤および光学材料 |
| CN104968750B (zh) * | 2013-02-11 | 2017-04-19 | 道康宁公司 | 簇合官能化聚有机硅氧烷、形成所述簇合官能化聚有机硅氧烷的工艺及其使用方法 |
| JP6264371B2 (ja) * | 2013-04-04 | 2018-01-24 | 旭硝子株式会社 | 含フッ素エーテル化合物、含フッ素エーテル組成物およびコーティング液、ならびに表面層を有する基材およびその製造方法 |
| DE102013103676A1 (de) | 2013-04-11 | 2014-10-30 | Schott Ag | Behälter mit geringer Partikelemission und reibkontrollierter Trockengleitoberfläche, sowie Verfahren zu dessen Herstellung |
| CN103319996B (zh) * | 2013-05-27 | 2015-10-28 | 赛吉材料科技（上海）有限公司 | 表面处理组合物及其制备方法和表面经处理的物品 |
| US20140363682A1 (en) * | 2013-06-06 | 2014-12-11 | Shin-Etsu Chemical Co., Ltd. | Surface modifier and article |
| WO2015038454A1 (en) | 2013-09-16 | 2015-03-19 | Honeywell International Inc. | Poly fluorine-containing siloxane coatings |
| JP6378203B2 (ja) | 2013-12-13 | 2018-08-22 | Ａｇｃ株式会社 | 含フッ素エーテル組成物、その製造方法、コーティング液、表面処理層を有する基材およびその製造方法 |
| TW201546115A (zh) * | 2013-12-26 | 2015-12-16 | Daikin Ind Ltd | 含有含全氟（聚）醚基之矽烷化合物的表面處理劑 |
| FR3024673B1 (fr) | 2014-08-05 | 2016-09-09 | Essilor Int | Procede pour diminuer ou eviter la degradation d'une couche antisalissure d'un article d'optique |
| CN104312397A (zh) * | 2014-10-29 | 2015-01-28 | 苏州东杏表面技术有限公司 | 一种表面处理剂及其制备方法和用途 |
| WO2016158221A1 (ja) * | 2015-04-02 | 2016-10-06 | 株式会社東レリサーチセンター | マイクロ分光分析用試料台の作製方法 |
| KR101992582B1 (ko) | 2015-07-31 | 2019-06-24 | 다이킨 고교 가부시키가이샤 | 퍼플루오로(폴리)에테르기 함유 실란 화합물 |
| CN107922445B (zh) * | 2015-09-01 | 2020-07-28 | Ａｇｃ株式会社 | 含氟醚化合物、含氟醚组合物、涂布液和物品 |
| CN106810684A (zh) * | 2015-12-02 | 2017-06-09 | 中昊晨光化工研究院有限公司 | 一种氟硅防水拒油剂及其合成方法和应用 |
| WO2017155787A1 (en) | 2016-03-08 | 2017-09-14 | The Chemours Company Fc, Llc | Polysilane compound containing perfluoro(poly)ether group |
| CN107915835B (zh) * | 2016-10-09 | 2019-08-27 | 中昊晨光化工研究院有限公司 | 一种氟硅防水拒油剂及其利用一锅法进行合成的方法 |
| CN106939064B (zh) * | 2016-12-28 | 2019-05-14 | 衢州氟硅技术研究院 | 一种包含全氟聚醚活性成分的组合物 |
| CN110392711B (zh) * | 2017-03-27 | 2022-04-12 | Ａｇｃ株式会社 | 含氟醚组合物及其制造方法 |
| CN108977769A (zh) * | 2017-06-05 | 2018-12-11 | 深圳富泰宏精密工业有限公司 | 壳体及该壳体的制作方法 |
| CN111548026B (zh) | 2017-06-21 | 2022-04-12 | Ａｇｃ株式会社 | 带拒水拒油层的物品及其制造方法 |
| CN107459641B (zh) * | 2017-08-30 | 2019-08-09 | 龙岩思康新材料有限公司 | 一种全氟聚醚改性烯丙氧基体的制备方法 |
| JP7196927B2 (ja) * | 2018-10-05 | 2022-12-27 | Ａｇｃ株式会社 | 含フッ素エーテル組成物、コーティング液、物品およびその製造方法 |
| KR102799381B1 (ko) | 2018-11-13 | 2025-04-22 | 에이지씨 가부시키가이샤 | 발수발유층 형성 기재, 증착 재료 및 발수발유층 형성 기재의 제조 방법 |
| WO2020137998A1 (ja) | 2018-12-26 | 2020-07-02 | Ａｇｃ株式会社 | 撥水撥油層付き基材、およびその製造方法 |
| EP3922626B1 (en) | 2019-02-08 | 2024-09-04 | Agc Inc. | Fluorine-containing ether compound, fluorine-containing ether composition, coating liquid, article, method for producing article, and method for producing fluorine-containing compound |
| US11254838B2 (en) | 2019-03-29 | 2022-02-22 | Ppg Industries Ohio, Inc. | Single component hydrophobic coating |
| WO2020203676A1 (ja) * | 2019-03-29 | 2020-10-08 | ダイキン工業株式会社 | フルオロポリエーテル基含有化合物 |
| JP7480780B2 (ja) * | 2019-05-31 | 2024-05-10 | Ａｇｃ株式会社 | 防汚層付き透明基板 |
| JP7385894B2 (ja) * | 2019-06-11 | 2023-11-24 | 東海光学株式会社 | プラスチック基材ｎｄフィルタ及び眼鏡用プラスチック基材ｎｄフィルタ |
| EP4032933A4 (en) | 2019-09-20 | 2024-03-20 | Agc Inc. | FLUORINE ETHER COMPOUND, SURFACE TREATMENT AGENT, FLUORINE ETHER COMPOSITION, COATING LIQUID, ARTICLE AND COMPOUND |
| JP7760915B2 (ja) | 2019-12-26 | 2025-10-28 | Ａｇｃ株式会社 | 表面処理剤、表面処理剤組成物、コーティング液、物品、及び物品の製造方法 |
| JP7616207B2 (ja) | 2020-03-09 | 2025-01-17 | Ａｇｃ株式会社 | 含フッ素エーテル化合物及びその製造方法、化合物及びその製造方法、含フッ素エーテル組成物、コーティング液、並びに物品及びその製造方法 |
| CN115697249A (zh) | 2020-06-01 | 2023-02-03 | 应用奈米医材科技股份有限公司 | 双面非球面衍射多焦点透镜及其制造和用途 |
| MX2024000951A (es) * | 2021-07-19 | 2024-02-08 | Essilor Int | Molde para fabricar un articulo optico termoestable, metodo para fabricar el molde y metodo para fabricar el articulo optico termoestable. |
| EP4424745A4 (en) | 2021-10-29 | 2025-10-29 | Agc Inc | COMPOUND, COMPOSITION, SURFACE TREATMENT AGENT, COATING LIQUID, ARTICLE AND METHOD OF MANUFACTURING AN ARTICLE |
| KR20240134335A (ko) | 2022-01-11 | 2024-09-09 | 에이지씨 가부시키가이샤 | 표면 처리제, 물품, 물품의 제조 방법 |
| CN116004120A (zh) * | 2023-03-24 | 2023-04-25 | 山东奥虹新材料有限公司 | 一种防污漆及其制备方法 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0629332B2 (ja) | 1985-04-26 | 1994-04-20 | 旭硝子株式会社 | 防汚性・低反射性プラスチツク |
| JPS6468657A (en) * | 1987-09-09 | 1989-03-14 | Dow Chemical Japan | Method and device for dispensing column chromatography eluate |
| JPH0778066B2 (ja) * | 1991-10-17 | 1995-08-23 | 信越化学工業株式会社 | 含フッ素有機ケイ素化合物およびその製造方法 |
| FR2702486B1 (fr) | 1993-03-08 | 1995-04-21 | Essilor Int | Compositions de revêtement antiabrasion à base d'hydrolysats de silanes et de composés de l'aluminium, et articles revêtus correspondants résistants à l'abrasion et aux chocs. |
| JP4174867B2 (ja) | 1998-09-17 | 2008-11-05 | 凸版印刷株式会社 | 防汚層の形成方法 |
| JP2000119634A (ja) | 1998-10-13 | 2000-04-25 | Toray Ind Inc | 防汚性組成物および防汚性を有する光学物品 |
| JP2000282009A (ja) * | 1999-04-01 | 2000-10-10 | Toray Ind Inc | 防汚性組成物および防汚性を有する光学物品 |
| JP4857528B2 (ja) * | 2004-06-11 | 2012-01-18 | 旭硝子株式会社 | シランカップリング基含有含フッ素エーテル化合物、溶液組成物、コーティング膜および物品 |
| CN103551075B (zh) * | 2005-04-01 | 2016-07-06 | 大金工业株式会社 | 表面改性剂 |
| CN101151269A (zh) * | 2005-04-01 | 2008-03-26 | 大金工业株式会社 | 表面改性剂 |
| JP2006291266A (ja) * | 2005-04-08 | 2006-10-26 | Daikin Ind Ltd | フッ素化合物の気相表面処理法 |
| JP4995467B2 (ja) * | 2006-01-27 | 2012-08-08 | 日本曹達株式会社 | フッ素系薄膜基材の製造方法 |
| JP5487418B2 (ja) * | 2006-07-05 | 2014-05-07 | 国立大学法人 香川大学 | 撥水撥油防汚性光反射板とその製造方法及びそれを用いたトンネル、道路標識、表示板、乗り物、建物。 |
| US7294731B1 (en) * | 2006-08-28 | 2007-11-13 | 3M Innovative Properties Company | Perfluoropolyether silanes and use thereof |
| EP2078977A4 (en) * | 2006-10-31 | 2014-05-21 | Nikon Essilor Co Ltd | LASER LENS AND METHOD FOR THE PRODUCTION THEREOF |
| JP5082520B2 (ja) * | 2007-03-16 | 2012-11-28 | ダイキン工業株式会社 | 含フッ素ジオール化合物の製造方法 |
| JP5422855B2 (ja) * | 2008-05-28 | 2014-02-19 | 小川 一文 | 転写ロールとその製造方法およびそれを用いて製造したフィルムまたはシート |
| EP2463348B1 (en) * | 2009-08-03 | 2015-10-07 | Asahi Glass Company, Limited | Composition for formation of water-repellent film, base material having water-repellent film attached thereto and process for production thereof, and article for transport device |
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2009
- 2009-11-11 WO PCT/US2009/064016 patent/WO2011059430A1/en not_active Ceased
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2010
- 2010-11-10 KR KR1020127014890A patent/KR101419153B1/ko not_active Expired - Fee Related
- 2010-11-10 KR KR1020147013962A patent/KR101599655B1/ko not_active Expired - Fee Related
- 2010-11-10 EP EP10779410.9A patent/EP2499209B8/en not_active Not-in-force
- 2010-11-10 CA CA2779655A patent/CA2779655C/en active Active
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