JP2013510335A5 - - Google Patents
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- Publication number
- JP2013510335A5 JP2013510335A5 JP2012537364A JP2012537364A JP2013510335A5 JP 2013510335 A5 JP2013510335 A5 JP 2013510335A5 JP 2012537364 A JP2012537364 A JP 2012537364A JP 2012537364 A JP2012537364 A JP 2012537364A JP 2013510335 A5 JP2013510335 A5 JP 2013510335A5
- Authority
- JP
- Japan
- Prior art keywords
- photopolymer formulation
- photopolymer
- temperature
- additives
- writing monomer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 238000000034 method Methods 0.000 claims description 16
- 238000009472 formulation Methods 0.000 claims description 13
- 239000000203 mixture Substances 0.000 claims description 13
- 239000000178 monomer Substances 0.000 claims description 10
- 239000000654 additive Substances 0.000 claims description 4
- 239000004615 ingredient Substances 0.000 claims description 4
- 229920000642 polymer Polymers 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 4
- 239000011159 matrix material Substances 0.000 claims description 3
- 150000003254 radicals Chemical class 0.000 claims description 3
- 239000003054 catalyst Substances 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims description 2
- 238000001035 drying Methods 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 239000002904 solvent Substances 0.000 claims description 2
- 239000003381 stabilizer Substances 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 125000001153 fluoro group Chemical group F* 0.000 description 3
- 125000000962 organic group Chemical group 0.000 description 3
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 125000005842 heteroatom Chemical group 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 125000006700 (C1-C6) alkylthio group Chemical group 0.000 description 1
- -1 Branched Chemical group 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate group Chemical group C(C=C)(=O)[O-] NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP09013765.4 | 2009-11-03 | ||
| EP09013765 | 2009-11-03 | ||
| PCT/EP2010/066589 WO2011054793A1 (de) | 2009-11-03 | 2010-11-02 | Verfahren zur herstellung von holographischen medien |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013510335A JP2013510335A (ja) | 2013-03-21 |
| JP2013510335A5 true JP2013510335A5 (cg-RX-API-DMAC7.html) | 2013-12-19 |
| JP5925687B2 JP5925687B2 (ja) | 2016-05-25 |
Family
ID=41398930
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012537364A Expired - Fee Related JP5925687B2 (ja) | 2009-11-03 | 2010-11-02 | ホログラフィック媒体の製造方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US8771904B2 (cg-RX-API-DMAC7.html) |
| EP (1) | EP2497081B1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP5925687B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR101746886B1 (cg-RX-API-DMAC7.html) |
| CN (1) | CN102667936B (cg-RX-API-DMAC7.html) |
| RU (1) | RU2542981C9 (cg-RX-API-DMAC7.html) |
| TW (1) | TWI489204B (cg-RX-API-DMAC7.html) |
| WO (1) | WO2011054793A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (70)
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| TWI489205B (zh) * | 2009-11-03 | 2015-06-21 | Bayer Materialscience Ag | 包含不同寫入共聚單體之光聚合物調配物 |
| WO2011054799A2 (de) * | 2009-11-03 | 2011-05-12 | Bayer Materialscience Ag | Urethane als additive in einer photopolymer-formulierung |
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| JP5792746B2 (ja) * | 2010-02-02 | 2015-10-14 | バイエル・インテレクチュアル・プロパティ・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツングＢａｙｅｒ Ｉｎｔｅｌｌｅｃｔｕａｌ Ｐｒｏｐｅｒｔｙ ＧｍｂＨ | エステル系書込モノマー含有感光性ポリマー組成物 |
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| CN111323867A (zh) | 2015-01-12 | 2020-06-23 | 迪吉伦斯公司 | 环境隔离的波导显示器 |
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| US10459145B2 (en) | 2015-03-16 | 2019-10-29 | Digilens Inc. | Waveguide device incorporating a light pipe |
| WO2016156776A1 (en) | 2015-03-31 | 2016-10-06 | Milan Momcilo Popovich | Method and apparatus for contact image sensing |
| JP6598269B2 (ja) | 2015-10-05 | 2019-10-30 | ディジレンズ インコーポレイテッド | 導波管ディスプレイ |
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| EP3504251A4 (en) | 2016-08-23 | 2020-05-06 | The Regents of the University of Colorado, a Body Corporate | NETWORK POLYMERS AND METHOD FOR THE PRODUCTION AND USE THEREOF |
| US11513350B2 (en) | 2016-12-02 | 2022-11-29 | Digilens Inc. | Waveguide device with uniform output illumination |
| WO2018129398A1 (en) | 2017-01-05 | 2018-07-12 | Digilens, Inc. | Wearable heads up displays |
| EP3698214A4 (en) | 2017-10-16 | 2021-10-27 | Digilens Inc. | SYSTEMS AND METHODS FOR MULTIPLICATION OF THE IMAGE RESOLUTION OF A PIXELIZED DISPLAY |
| CN108153133B (zh) * | 2017-11-17 | 2020-04-03 | 昆明理工大学 | 一种光致聚合物全息记录材料的封装体及其封装方法 |
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| CN112088332B (zh) | 2018-03-16 | 2024-11-29 | 迪吉伦斯公司 | 包含双折射控制的全息波导及用于它们的制造的方法 |
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| US8771903B2 (en) * | 2009-11-03 | 2014-07-08 | Bayer Materialscience Ag | Method for producing a holographic film |
| RU2012137134A (ru) * | 2010-02-02 | 2014-03-10 | Байер Интеллектуэль Проперти Гмбх | Фотополимерная композиция с записывающими мономерами на основе триазина |
| JP5792746B2 (ja) * | 2010-02-02 | 2015-10-14 | バイエル・インテレクチュアル・プロパティ・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツングＢａｙｅｒ Ｉｎｔｅｌｌｅｃｔｕａｌ Ｐｒｏｐｅｒｔｙ ＧｍｂＨ | エステル系書込モノマー含有感光性ポリマー組成物 |
| EP2372454A1 (de) * | 2010-03-29 | 2011-10-05 | Bayer MaterialScience AG | Photopolymer-Formulierung zur Herstellung sichtbarer Hologramme |
| JP6088971B2 (ja) * | 2010-08-11 | 2017-03-01 | バイエル・インテレクチュアル・プロパティ・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツングＢａｙｅｒ Ｉｎｔｅｌｌｅｃｔｕａｌ Ｐｒｏｐｅｒｔｙ ＧｍｂＨ | 二官能性（メタ）アクリレート書込モノマー |
| EP2450893A1 (de) * | 2010-11-08 | 2012-05-09 | Bayer MaterialScience AG | Photopolymer-Formulierung zur Herstellung holographischer Medien mit hoch vernetzten Matrixpolymeren |
| PL2613318T3 (pl) * | 2012-01-05 | 2014-12-31 | Bayer Ip Gmbh | Struktura warstwowa z warstwą ochronną i naświetloną warstwą fotopolimerową |
-
2010
- 2010-11-02 TW TW099137564A patent/TWI489204B/zh not_active IP Right Cessation
- 2010-11-02 JP JP2012537364A patent/JP5925687B2/ja not_active Expired - Fee Related
- 2010-11-02 CN CN201080060490.4A patent/CN102667936B/zh not_active Expired - Fee Related
- 2010-11-02 WO PCT/EP2010/066589 patent/WO2011054793A1/de not_active Ceased
- 2010-11-02 EP EP10771478.4A patent/EP2497081B1/de not_active Not-in-force
- 2010-11-02 KR KR1020127014265A patent/KR101746886B1/ko not_active Expired - Fee Related
- 2010-11-02 US US13/505,154 patent/US8771904B2/en not_active Expired - Fee Related
- 2010-11-02 RU RU2012122591/04A patent/RU2542981C9/ru not_active IP Right Cessation
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