JP2013503967A5 - - Google Patents
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- Publication number
- JP2013503967A5 JP2013503967A5 JP2012527326A JP2012527326A JP2013503967A5 JP 2013503967 A5 JP2013503967 A5 JP 2013503967A5 JP 2012527326 A JP2012527326 A JP 2012527326A JP 2012527326 A JP2012527326 A JP 2012527326A JP 2013503967 A5 JP2013503967 A5 JP 2013503967A5
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- physical vapor
- noble metal
- substrate
- pressure level
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 16
- 238000005240 physical vapour deposition Methods 0.000 claims 9
- 229910000510 noble metal Inorganic materials 0.000 claims 8
- 239000000758 substrate Substances 0.000 claims 7
- 238000000151 deposition Methods 0.000 claims 4
- 229910052751 metal Inorganic materials 0.000 claims 4
- 239000002184 metal Substances 0.000 claims 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 2
- 238000005229 chemical vapour deposition Methods 0.000 claims 2
- 230000003750 conditioning effect Effects 0.000 claims 2
- 230000008021 deposition Effects 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 230000003647 oxidation Effects 0.000 claims 2
- 238000007254 oxidation reaction Methods 0.000 claims 2
- 230000001590 oxidative effect Effects 0.000 claims 2
- 238000002294 plasma sputter deposition Methods 0.000 claims 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims 2
- 239000000376 reactant Substances 0.000 claims 2
- 239000000126 substance Substances 0.000 claims 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims 1
- 229910000831 Steel Inorganic materials 0.000 claims 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims 1
- 229910052786 argon Inorganic materials 0.000 claims 1
- -1 argon ion Chemical class 0.000 claims 1
- 238000004140 cleaning Methods 0.000 claims 1
- 238000007735 ion beam assisted deposition Methods 0.000 claims 1
- 150000002500 ions Chemical class 0.000 claims 1
- 229910052741 iridium Inorganic materials 0.000 claims 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- 239000007800 oxidant agent Substances 0.000 claims 1
- 229910052697 platinum Inorganic materials 0.000 claims 1
- 229910052707 ruthenium Inorganic materials 0.000 claims 1
- 239000010959 steel Substances 0.000 claims 1
- 239000010936 titanium Substances 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IT001531A ITMI20091531A1 (it) | 2009-09-03 | 2009-09-03 | Attivazione continua di strutture elettrodiche mediante tecniche di deposizione in vuoto |
| ITMI2009A001531 | 2009-09-03 | ||
| PCT/EP2010/062902 WO2011026914A1 (en) | 2009-09-03 | 2010-09-02 | Activation of electrode surfaces by means of vacuum deposition techniques in a continuous process |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013503967A JP2013503967A (ja) | 2013-02-04 |
| JP2013503967A5 true JP2013503967A5 (cg-RX-API-DMAC7.html) | 2013-09-26 |
| JP5693583B2 JP5693583B2 (ja) | 2015-04-01 |
Family
ID=41650354
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012527326A Expired - Fee Related JP5693583B2 (ja) | 2009-09-03 | 2010-09-02 | 連続プロセスでの真空蒸着技術による電極表面の活性化 |
Country Status (16)
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9567681B2 (en) * | 2013-02-12 | 2017-02-14 | Treadstone Technologies, Inc. | Corrosion resistant and electrically conductive surface of metallic components for electrolyzers |
| US20150056493A1 (en) * | 2013-08-21 | 2015-02-26 | GM Global Technology Operations LLC | Coated porous separators and coated electrodes for lithium batteries |
| KR102491154B1 (ko) * | 2021-01-21 | 2023-01-26 | 주식회사 테크로스 | 전기분해용 이중코팅 촉매 전극 및 이의 제조방법 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2405662A (en) * | 1941-08-30 | 1946-08-13 | Crown Cork & Seal Co | Coating |
| US4331523A (en) * | 1980-03-31 | 1982-05-25 | Showa Denko Kk | Method for electrolyzing water or aqueous solutions |
| US4544473A (en) * | 1980-05-12 | 1985-10-01 | Energy Conversion Devices, Inc. | Catalytic electrolytic electrode |
| JPS6379955A (ja) * | 1986-09-20 | 1988-04-09 | Nippon Steel Corp | ろう付け性に優れたステンレス鋼帯の製造方法 |
| JPS63204726A (ja) * | 1987-02-20 | 1988-08-24 | Anelva Corp | 真空処理装置 |
| US5003428A (en) * | 1989-07-17 | 1991-03-26 | National Semiconductor Corporation | Electrodes for ceramic oxide capacitors |
| US5236509A (en) * | 1992-02-06 | 1993-08-17 | Spire Corporation | Modular ibad apparatus for continuous coating |
| GB9316926D0 (en) * | 1993-08-13 | 1993-09-29 | Ici Plc | Electrode |
| AU719341B2 (en) * | 1997-01-22 | 2000-05-04 | De Nora Elettrodi S.P.A. | Method of forming robust metal, metal oxide, and metal alloy layers on ion-conductive polymer membranes |
| US6673127B1 (en) * | 1997-01-22 | 2004-01-06 | Denora S.P.A. | Method of forming robust metal, metal oxide, and metal alloy layers on ion-conductive polymer membranes |
| JPH1129863A (ja) * | 1997-07-10 | 1999-02-02 | Canon Inc | 堆積膜製造方法 |
| US5879827A (en) * | 1997-10-10 | 1999-03-09 | Minnesota Mining And Manufacturing Company | Catalyst for membrane electrode assembly and method of making |
| US6866958B2 (en) * | 2002-06-05 | 2005-03-15 | General Motors Corporation | Ultra-low loadings of Au for stainless steel bipolar plates |
| US7193934B2 (en) * | 2002-06-07 | 2007-03-20 | Carnegie Mellon University | Domain position detection magnetic amplifying magneto-optical system |
| US8460841B2 (en) * | 2005-07-01 | 2013-06-11 | Basf Fuel Cell Gmbh | Gas diffusion electrodes, membrane-electrode assemblies and method for the production thereof |
| JP4670530B2 (ja) * | 2005-08-01 | 2011-04-13 | アイテック株式会社 | 電解用の貴金属電極とその製造方法 |
| DE102006057386A1 (de) * | 2006-12-04 | 2008-06-05 | Uhde Gmbh | Verfahren zum Beschichten von Substraten |
| JP5189781B2 (ja) * | 2007-03-23 | 2013-04-24 | ペルメレック電極株式会社 | 水素発生用電極 |
| US7806641B2 (en) * | 2007-08-30 | 2010-10-05 | Ascentool, Inc. | Substrate processing system having improved substrate transport system |
-
2009
- 2009-09-03 IT IT001531A patent/ITMI20091531A1/it unknown
-
2010
- 2010-09-02 CA CA2769818A patent/CA2769818A1/en not_active Abandoned
- 2010-09-02 BR BR112012004765A patent/BR112012004765A2/pt not_active IP Right Cessation
- 2010-09-02 KR KR1020127007956A patent/KR20120049380A/ko not_active Ceased
- 2010-09-02 CN CN201080039017.8A patent/CN102482770B/zh not_active Expired - Fee Related
- 2010-09-02 EP EP10762880A patent/EP2473647A1/en not_active Withdrawn
- 2010-09-02 EA EA201270368A patent/EA024663B1/ru not_active IP Right Cessation
- 2010-09-02 WO PCT/EP2010/062902 patent/WO2011026914A1/en not_active Ceased
- 2010-09-02 JP JP2012527326A patent/JP5693583B2/ja not_active Expired - Fee Related
- 2010-09-02 MX MX2012002713A patent/MX2012002713A/es active IP Right Grant
- 2010-09-02 AU AU2010291209A patent/AU2010291209B2/en not_active Ceased
- 2010-09-03 AR ARP100103249A patent/AR078328A1/es not_active Application Discontinuation
-
2012
- 2012-01-29 IL IL217803A patent/IL217803A0/en unknown
- 2012-02-27 ZA ZA2012/01432A patent/ZA201201432B/en unknown
- 2012-03-04 EG EG2012030387A patent/EG26695A/en active
- 2012-03-06 US US13/413,121 patent/US20120164344A1/en not_active Abandoned
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