JP2013218985A5 - - Google Patents

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Publication number
JP2013218985A5
JP2013218985A5 JP2012090921A JP2012090921A JP2013218985A5 JP 2013218985 A5 JP2013218985 A5 JP 2013218985A5 JP 2012090921 A JP2012090921 A JP 2012090921A JP 2012090921 A JP2012090921 A JP 2012090921A JP 2013218985 A5 JP2013218985 A5 JP 2013218985A5
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JP
Japan
Prior art keywords
plasma
cathode
guns
magnetic flux
electrode
Prior art date
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Application number
JP2012090921A
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English (en)
Japanese (ja)
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JP2013218985A (ja
JP5700695B2 (ja
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Priority claimed from JP2012090921A external-priority patent/JP5700695B2/ja
Priority to JP2012090921A priority Critical patent/JP5700695B2/ja
Priority to CN201380019358.2A priority patent/CN104221477B/zh
Priority to US14/391,499 priority patent/US9824867B2/en
Priority to PCT/JP2013/055231 priority patent/WO2013153865A1/ja
Priority to EP13775531.0A priority patent/EP2838323B1/en
Priority to KR1020147027089A priority patent/KR101953946B1/ko
Priority to TW102111671A priority patent/TWI558275B/zh
Publication of JP2013218985A publication Critical patent/JP2013218985A/ja
Publication of JP2013218985A5 publication Critical patent/JP2013218985A5/ja
Publication of JP5700695B2 publication Critical patent/JP5700695B2/ja
Application granted granted Critical
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2012090921A 2012-04-12 2012-04-12 プラズマ発生装置および蒸着装置並びにプラズマ発生方法 Expired - Fee Related JP5700695B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2012090921A JP5700695B2 (ja) 2012-04-12 2012-04-12 プラズマ発生装置および蒸着装置並びにプラズマ発生方法
EP13775531.0A EP2838323B1 (en) 2012-04-12 2013-02-27 Plasma generation device, vapor deposition device, and plasma generation method
US14/391,499 US9824867B2 (en) 2012-04-12 2013-02-27 Plasma generation apparatus, deposition apparatus, and plasma generation method
PCT/JP2013/055231 WO2013153865A1 (ja) 2012-04-12 2013-02-27 プラズマ発生装置および蒸着装置並びにプラズマ発生方法
CN201380019358.2A CN104221477B (zh) 2012-04-12 2013-02-27 等离子体产生装置、蒸镀装置以及等离子体产生方法
KR1020147027089A KR101953946B1 (ko) 2012-04-12 2013-02-27 플라스마 발생 장치와 증착 장치 및 플라스마 발생 방법
TW102111671A TWI558275B (zh) 2012-04-12 2013-04-01 電漿產生裝置、蒸氣沈積裝置及電漿產生方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012090921A JP5700695B2 (ja) 2012-04-12 2012-04-12 プラズマ発生装置および蒸着装置並びにプラズマ発生方法

Publications (3)

Publication Number Publication Date
JP2013218985A JP2013218985A (ja) 2013-10-24
JP2013218985A5 true JP2013218985A5 (enExample) 2015-01-29
JP5700695B2 JP5700695B2 (ja) 2015-04-15

Family

ID=49327444

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012090921A Expired - Fee Related JP5700695B2 (ja) 2012-04-12 2012-04-12 プラズマ発生装置および蒸着装置並びにプラズマ発生方法

Country Status (7)

Country Link
US (1) US9824867B2 (enExample)
EP (1) EP2838323B1 (enExample)
JP (1) JP5700695B2 (enExample)
KR (1) KR101953946B1 (enExample)
CN (1) CN104221477B (enExample)
TW (1) TWI558275B (enExample)
WO (1) WO2013153865A1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180066575A (ko) * 2016-12-09 2018-06-19 (주)트리플코어스코리아 아크 방전을 이용하는 플라즈마 토치용 양극 구조물 및 이를 구비하는 플라즈마 토치
CN117244174B (zh) * 2023-10-09 2024-07-19 深圳市国商联健康管理有限公司 用于智能清除癌细胞的等离子发生装置及其操作办法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4863581A (en) * 1987-02-12 1989-09-05 Kawasaki Steel Corp. Hollow cathode gun and deposition device for ion plating process
JP2898652B2 (ja) * 1988-06-23 1999-06-02 川崎製鉄株式会社 イオンプレーティング用蒸発装置
US5009743A (en) * 1989-11-06 1991-04-23 Gatan Incorporated Chemically-assisted ion beam milling system for the preparation of transmission electron microscope specimens
JPH073442A (ja) * 1993-06-16 1995-01-06 Asahi Glass Co Ltd 蒸着装置
JPH07254315A (ja) * 1994-03-14 1995-10-03 Nippon Sheet Glass Co Ltd 被膜の形成方法
JP2874548B2 (ja) * 1994-03-25 1999-03-24 日本板硝子株式会社 アーク放電プラズマによる被膜の形成方法
JP2955916B2 (ja) * 1994-06-02 1999-10-04 住友重機械工業株式会社 シートプラズマの形成方法及び装置
US6103074A (en) * 1998-02-14 2000-08-15 Phygen, Inc. Cathode arc vapor deposition method and apparatus
JP4287936B2 (ja) * 1999-02-01 2009-07-01 中外炉工業株式会社 真空成膜装置
DE19824077A1 (de) * 1998-05-29 1999-12-02 Leybold Systems Gmbh Vorrichtung zur Erzeugung von Plasma
EP1390964B1 (en) 2001-04-20 2011-12-07 General Plasma, Inc. Dipole ion source
WO2002098812A1 (en) * 2001-06-04 2002-12-12 Nippon Sheet Glass Co., Ltd. Method of producing transparent substrate and trasparent substrate, and organic electroluminescence element having the transparent substrate
US20100012033A1 (en) * 2005-12-06 2010-01-21 Shinmaywa Industries, Ltd. Sheet Plasma Film Forming Apparatus
JP4906331B2 (ja) * 2005-12-06 2012-03-28 新明和工業株式会社 シートプラズマ成膜装置
WO2007099658A1 (ja) * 2006-03-01 2007-09-07 Shinmaywa Industries, Ltd. プラズマガン及びそれを備えるプラズマガン成膜装置
CN101652498B (zh) 2007-04-24 2011-06-15 佳能安内华股份有限公司 等离子生成设备和使用等离子生成设备的膜形成设备
JP4901696B2 (ja) * 2007-11-06 2012-03-21 キヤノンアネルバ株式会社 成膜装置
CN202072760U (zh) * 2011-04-26 2011-12-14 中国科学院金属研究所 一种电弧离子镀设备

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