JP2012530379A5 - - Google Patents

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Publication number
JP2012530379A5
JP2012530379A5 JP2012516103A JP2012516103A JP2012530379A5 JP 2012530379 A5 JP2012530379 A5 JP 2012530379A5 JP 2012516103 A JP2012516103 A JP 2012516103A JP 2012516103 A JP2012516103 A JP 2012516103A JP 2012530379 A5 JP2012530379 A5 JP 2012530379A5
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JP
Japan
Prior art keywords
liquid
wafer
spray
viscoelastic material
application example
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Application number
JP2012516103A
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English (en)
Japanese (ja)
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JP2012530379A (ja
JP5730298B2 (ja
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Publication date
Priority claimed from US12/485,733 external-priority patent/US9159593B2/en
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Publication of JP2012530379A publication Critical patent/JP2012530379A/ja
Publication of JP2012530379A5 publication Critical patent/JP2012530379A5/ja
Application granted granted Critical
Publication of JP5730298B2 publication Critical patent/JP5730298B2/ja
Active legal-status Critical Current
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JP2012516103A 2009-06-16 2010-05-28 粒子汚染物除去方法およびそのシステム Active JP5730298B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/485,733 2009-06-16
US12/485,733 US9159593B2 (en) 2008-06-02 2009-06-16 Method of particle contaminant removal
PCT/US2010/036754 WO2010147752A1 (en) 2009-06-16 2010-05-28 Method of particle contaminant removal

Publications (3)

Publication Number Publication Date
JP2012530379A JP2012530379A (ja) 2012-11-29
JP2012530379A5 true JP2012530379A5 (enExample) 2013-07-18
JP5730298B2 JP5730298B2 (ja) 2015-06-10

Family

ID=43305323

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012516103A Active JP5730298B2 (ja) 2009-06-16 2010-05-28 粒子汚染物除去方法およびそのシステム

Country Status (7)

Country Link
US (1) US9159593B2 (enExample)
JP (1) JP5730298B2 (enExample)
KR (1) KR101660075B1 (enExample)
CN (1) CN102458697B (enExample)
SG (2) SG10201403214PA (enExample)
TW (1) TWI506669B (enExample)
WO (1) WO2010147752A1 (enExample)

Families Citing this family (11)

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JP5762925B2 (ja) * 2010-12-28 2015-08-12 東京エレクトロン株式会社 液処理装置および液処理方法
US11643946B2 (en) * 2013-10-02 2023-05-09 Aerocore Technologies Llc Cleaning method for jet engine
KR20170056631A (ko) * 2014-09-18 2017-05-23 어플라이드 머티어리얼스, 인코포레이티드 엔지니어링된 점성 유체를 이용한 고효율 ｃｍｐ 후 세정을 위한 방법 및 장치
US10276469B2 (en) * 2015-04-17 2019-04-30 Taiwan Semiconductor Manufacturing Co., Ltd Method for forming semiconductor device structure
TWI621171B (zh) * 2015-10-13 2018-04-11 Usun Technology Co Ltd Sheet surface treatment method and structure
JP6715019B2 (ja) * 2016-02-09 2020-07-01 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
KR102093641B1 (ko) * 2018-06-22 2020-04-23 주식회사 로보스타 파티클제거팁 및 그것을 이용한 인덱스형 파티클 제거장치
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US12198944B2 (en) 2020-11-11 2025-01-14 Applied Materials, Inc. Substrate handling in a modular polishing system with single substrate cleaning chambers

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