JP2012519773A5 - - Google Patents

Download PDF

Info

Publication number
JP2012519773A5
JP2012519773A5 JP2011552450A JP2011552450A JP2012519773A5 JP 2012519773 A5 JP2012519773 A5 JP 2012519773A5 JP 2011552450 A JP2011552450 A JP 2011552450A JP 2011552450 A JP2011552450 A JP 2011552450A JP 2012519773 A5 JP2012519773 A5 JP 2012519773A5
Authority
JP
Japan
Prior art keywords
tube
injection
reactant
injection point
particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011552450A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012519773A (ja
JP5438779B2 (ja
Filing date
Publication date
Priority claimed from NL2002590A external-priority patent/NL2002590C2/en
Application filed filed Critical
Publication of JP2012519773A publication Critical patent/JP2012519773A/ja
Publication of JP2012519773A5 publication Critical patent/JP2012519773A5/ja
Application granted granted Critical
Publication of JP5438779B2 publication Critical patent/JP5438779B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2011552450A 2009-03-04 2010-03-04 圧気輸送の間の粒子への原子又は分子層堆積のための装置及び方法 Active JP5438779B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
NL2002590A NL2002590C2 (en) 2009-03-04 2009-03-04 Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport.
NL2002590 2009-03-04
PCT/EP2010/052769 WO2010100235A1 (en) 2009-03-04 2010-03-04 Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport

Publications (3)

Publication Number Publication Date
JP2012519773A JP2012519773A (ja) 2012-08-30
JP2012519773A5 true JP2012519773A5 (https=) 2013-04-18
JP5438779B2 JP5438779B2 (ja) 2014-03-12

Family

ID=42167451

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011552450A Active JP5438779B2 (ja) 2009-03-04 2010-03-04 圧気輸送の間の粒子への原子又は分子層堆積のための装置及び方法

Country Status (9)

Country Link
US (4) US9845532B2 (https=)
EP (1) EP2403976B1 (https=)
JP (1) JP5438779B2 (https=)
KR (1) KR101696946B1 (https=)
CN (1) CN102414342B (https=)
CA (1) CA2754093C (https=)
DK (1) DK2403976T3 (https=)
NL (1) NL2002590C2 (https=)
WO (1) WO2010100235A1 (https=)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0747371Y2 (ja) 1989-08-30 1995-11-01 三菱原子燃料株式会社 円柱体の搬送装置
NL2002590C2 (en) * 2009-03-04 2010-09-07 Univ Delft Technology Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport.
FI20095307A0 (fi) * 2009-03-25 2009-03-25 Beneq Oy Päällystysmenetelmä ja -laitteisto
JP2016508544A (ja) * 2013-01-23 2016-03-22 ピコサン オーワイPicosun Oy 粒子材料の処理のための方法及び装置
KR101550500B1 (ko) 2013-02-28 2015-09-04 고려대학교 산학협력단 파우더 이송형 원자층 증착 장치
US10030851B2 (en) 2013-03-20 2018-07-24 Lumileds Llc Encapsulated quantum dots in porous particles
US9873940B2 (en) 2013-12-31 2018-01-23 Lam Research Corporation Coating system and method for coating interior fluid wetted surfaces of a component of a semiconductor substrate processing apparatus
JP6732658B2 (ja) 2014-04-01 2020-07-29 ニューマティコート テクノロジーズ リミティド ライアビリティ カンパニー 被覆ナノ粒子を含む受動電子部品及びその製造と使用方法
NL2014348B1 (en) * 2015-02-25 2016-10-13 Univ Delft Tech Controlled release from particles encapsulated by molecular layer deposition.
WO2016205242A1 (en) 2015-06-15 2016-12-22 Ald Nanosolutions, Inc. Continuous spatial atomic layer deposition process and apparatus for applying films on particles
WO2018050954A1 (en) 2016-09-16 2018-03-22 Picosun Oy Particle coating by atomic layer depostion (ald)
JP7127036B2 (ja) 2017-01-23 2022-08-29 ビーエーエスエフ ソシエタス・ヨーロピア カソード材料の製造方法、及び当該方法を行うことに適する反応器
KR102086574B1 (ko) 2018-04-03 2020-03-09 전남대학교산학협력단 분말 입자를 코팅할 수 있는 증착장치 및 분말 입자의 코팅 방법
TW202229622A (zh) 2019-04-24 2022-08-01 美商應用材料股份有限公司 用於在具有旋轉槳的固定的腔室中塗覆顆粒的反應器
TWI765795B (zh) 2019-04-24 2022-05-21 美商應用材料股份有限公司 具有旋轉葉片與氣體注入之用於在固定腔室中塗覆粒子的反應器
WO2021097143A2 (en) 2019-11-12 2021-05-20 Forge Nano Inc. Coatings on particles of high energy materials and methods of forming same
US12220678B2 (en) 2020-07-30 2025-02-11 Applied Materials, Inc. Paddle configuration for a particle coating reactor
NL2026635B1 (en) 2020-10-07 2022-06-07 Univ Delft Tech Integrated manufacturing of core-shell particles for Li-ion batteries
EP4289632A1 (en) 2022-06-09 2023-12-13 Continental Reifen Deutschland GmbH Method for producing a rubber composition using pretreated filler
NL2036587B1 (en) 2023-12-19 2025-07-01 Powall Holding B V Particulate Composite Iridium Oxide Materials and Preparation Method and Application Thereof

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE393967B (sv) * 1974-11-29 1977-05-31 Sateko Oy Forfarande och for utforande av stroleggning mellan lagren i ett virkespaket
JPH074523B2 (ja) * 1986-09-25 1995-01-25 キヤノン株式会社 反応装置
CA1304572C (en) 1988-01-18 1992-07-07 Leonard George Wiseman System for coating particles employing a pneumatic transport reactor
US5227196A (en) * 1989-02-16 1993-07-13 Semiconductor Energy Laboratory Co., Ltd. Method of forming a carbon film on a substrate made of an oxide material
US5227195A (en) 1989-04-04 1993-07-13 Sri International Low temperature method of forming materials using one or more metal reactants and a halogen-containing reactant to form one or more reactive intermediates
US5198029A (en) * 1989-08-01 1993-03-30 Gte Products Corporation Apparatus for coating small solids
US5169913A (en) * 1991-05-31 1992-12-08 Procedyne Corp. Fluidized multistaged reaction system for polymerization
ES2095118T3 (es) * 1993-11-27 1997-02-01 Basf Ag Procedimiento para el recubrimiento o el tratamiento superficial de particulas de producto solido mediante una capa fluidificada de plasma.
US5876793A (en) * 1996-02-21 1999-03-02 Ultramet Fine powders and method for manufacturing
US6383301B1 (en) * 1998-08-04 2002-05-07 E. I. Du Pont De Nemours And Company Treatment of deagglomerated particles with plasma-activated species
US6713177B2 (en) * 2000-06-21 2004-03-30 Regents Of The University Of Colorado Insulating and functionalizing fine metal-containing particles with conformal ultra-thin films
DE60232884D1 (de) * 2001-07-18 2009-08-20 Univ Colorado Isolierende und funktionelle feine metallhaltige teilchen mit konformen ultradünnen filmen
US6773813B2 (en) * 2001-09-27 2004-08-10 Osram Sylvania Inc. Particles with vapor deposition coating
US7250148B2 (en) * 2002-07-31 2007-07-31 Carbon Nanotechnologies, Inc. Method for making single-wall carbon nanotubes using supported catalysts
KR100452946B1 (ko) * 2002-11-26 2004-10-14 한국전자통신연구원 저전력형 미세 열순환 소자 및 그 제조 방법
ITTO20021124A1 (it) * 2002-12-24 2004-06-25 Giuliano Cavaglia Reattore e metodo per polimerizzare in continuo in fase solida il polietilentereftalato (pet).
US7306823B2 (en) 2004-09-18 2007-12-11 Nanosolar, Inc. Coated nanoparticles and quantum dots for solution-based fabrication of photovoltaic cells
US20050214737A1 (en) * 2004-03-26 2005-09-29 Dejneka Matthew J Transparent filtered capillaries
US8298666B2 (en) * 2006-01-26 2012-10-30 Global Tungsten & Powders Corp. Moisture resistant electroluminescent phosphor with high initial brightness and method of making
US20070280895A1 (en) * 2006-06-02 2007-12-06 Weimer Alan W Coated particles and sunscreen and cosmetic products containing same
US7789961B2 (en) * 2007-01-08 2010-09-07 Eastman Kodak Company Delivery device comprising gas diffuser for thin film deposition
NL2002590C2 (en) * 2009-03-04 2010-09-07 Univ Delft Technology Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport.

Similar Documents

Publication Publication Date Title
JP2012519773A5 (https=)
JP5438779B2 (ja) 圧気輸送の間の粒子への原子又は分子層堆積のための装置及び方法
JP5989682B2 (ja) 原子層堆積のための装置及びプロセス
JP2012146939A5 (https=)
EA029749B1 (ru) Форсунка и форсуночная головка
JP2016540124A5 (https=)
WO2010076973A3 (ko) 폴리 실리콘 증착장치
CN104975271B (zh) 进气装置以及半导体加工设备
CN106795629B (zh) 原子层沉积装置及使用装置处理基板的方法
JP2004079904A5 (https=)
JP2011029603A5 (https=)
JP2019067820A5 (https=)
KR100791073B1 (ko) 난류 날개들을 갖는 배기 배관 및 배기 시스템
TW202125677A (zh) 用於晶圓釋氣的電漿增強式退火腔室
CN107759070A (zh) 粉末堆积体的制造装置及制造方法
JP2012526190A5 (https=)
KR102337807B1 (ko) 박막 증착 장치
WO2013064737A3 (en) Apparatus and method for processing substrate
JP2010232376A (ja) 気相成長装置の原料ガス供給ノズル
JP2009191355A (ja) ガス供給ユニット及び化学気相蒸着装置
CN115404465B (zh) 连续纤维表面制备复合界面的设备及方法
RU2014129899A (ru) Управляемая инжекция твердых частиц
KR101559629B1 (ko) 원자층 증착장치
CN109196141B (zh) 连续化学气相沉积(cvd)多区域处理套件
CN103080374B (zh) 装置