JP7127036B2 - カソード材料の製造方法、及び当該方法を行うことに適する反応器 - Google Patents
カソード材料の製造方法、及び当該方法を行うことに適する反応器 Download PDFInfo
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Description
(a)リチウム化ニッケル-コバルトアルミニウムオキシド及び層状リチウム遷移金属オキシドから選択された粒子材料を供給する工程と、
(b)流動床中で、前記カソード活物質を金属アルコキシド又は金属アミド又はアルキル金属化合物で処理する工程と、
(c)流動床中で、工程(b)で得られた材料を湿気(moisture)で処理する工程と、
任意に、一連の工程(b)及び(c)を繰り返す工程と、を含み、
工程(b)及び(c)において、前記流動床におけるガス空塔速度(superficial gas velocity)が、反応器の高さの増加に伴って低減する。
0≦x≦0.2、
0.1≦a≦0.8、
0≦b≦0.5、
0.1≦c≦0.6、
0≦d≦0.1、及びa+b+c+d=1)の化合物である。
Li(1+x)[NiaCobMncM4 d](1-x)O2 (I)
による化合物において、M4はCa、Mg、Al及びBaから選択され、さらなる変数は上記のように定義される。
hが0.8~0.90の範囲にあり、
iが0.15~0.19の範囲にあり、
jが0.01~0.05の範囲にあり、
rが0~0.4の範囲にある。
R1が、同一又は異なり、直鎖又は分岐状のC1~C8-アルキルから選択され、
R2が、同一又は異なり、直鎖又は分岐状のC1~C4-アルキルから選択され、
M1がMg及びZnから選択され、
M2がAl及びBから選択され、
M3がSi、Sn、Ti、Zr及びHf、好ましくはSn及びTiから選択され、
変数yが、0~4から選択され、特に0及び1である。
1:一次流動化ガスの入口
2:パルスガスの入口
3:コーティングされた粒子の出口
4:流動床
5:反応器の円錐形部分、混合栓での直径d1
6:反応器の円筒形部分、直径d2
7:任意の:固体-ガスの分離手段、例えばフィルタキャンドル又はフィルターカートリッジ
8:任意の:コーティングされていない粒子の導入のための入口
9:任意の:固体粒子の導入
特定の固体材料は、頂部から、又は入口8により、又は反応器の底部から導入することが可能である。
Claims (15)
- 少なくとも部分的にコーティングされた粒子材料の製造方法であって、前記方法が、以下の工程:
(a)リチウム化ニッケル-コバルトアルミニウムオキシド及び層状リチウム遷移金属オキシドから選択された粒子材料を供給する工程と、
(b)流動床中で、工程(a)で供給された粒子材料を金属アルコキシド又は金属アミド又はアルキル金属化合物で処理する工程と、
(c)流動床中で、工程(b)で得られた材料を湿気で処理する工程と、
任意に、一連の工程(b)及び(c)を繰り返す工程と、を含み、
工程(b)及び(c)において、前記流動床中で、反応器の内表面に関するガス速度であるガス空塔速度が、反応器の高さの増加に伴って低減する、方法。 - アルキル金属化合物又は金属アルコキシド又は金属アミドが、それぞれ、M1(R1)2、M2(R1)3、M3(R1)4-yHy、M1(OR2)2、M2(OR2)3、M3(OR2)4、M3[NR2)2]4及びメチルアルモキサン、
(式中、R1が、同一又は異なり、直鎖又は分岐状のC1~C8-アルキルから選択され、
R2が、同一又は異なり、直鎖又は分岐状のC1~C4-アルキルから選択され、
M1がMg及びZnから選択され、
M2がAl及びBから選択され、
M3がSi、Sn、Ti、Zr及びHfから選択され、
変数yが0~4から選択される)
から選択される、請求項1に記載の方法。 - 層状リチウム遷移金属オキシドが一般式(I)、
Li(1+x)[NiaCobMncM4 d](1-x)O2 (I)
(式中、M4がMg、Ca、Ba、Al、Ti、Zr、Zn、Mo、V及びFeから選択され、
0≦x≦0.2、
0.1≦a≦0.8、
0≦b≦0.5、
0.1≦c≦0.6、
0≦d≦0.1、及び
a+b+c+d=1)
の材料である、請求項1又は2に記載の方法。 - 工程(b)及び(c)における前記流動床が噴流床である、請求項1から3のいずれか一項に記載の方法。
- 工程(b)、及び必要な場合に工程(c)において、前記反応器の入口での前記ガス空塔速度が、20~100m/sの範囲である、請求項1から4のいずれか一項に記載の方法。
- リチウム化ニッケル-コバルトアルミニウムオキシド又は層状リチウム遷移金属オキシドの粒子がそれぞれ、凝集性である、請求項1から5のいずれか一項に記載の方法。
- 工程(b)が15~1000℃の範囲の温度で行われる、請求項1から6のいずれか一項に記載の方法。
- 工程(b)と(c)との間に、前記反応器が不活性ガスでフラッシュされる、請求項1から7のいずれか一項に記載の方法。
- 工程(b)及び(c)が、円錐形の流動床反応器で行われる、請求項1から8のいずれか一項に記載の方法。
- 工程(b)及び(c)が、パルスガス流を有する噴流床で行われる、請求項1から9のいずれか一項に記載の方法。
- 前記流動床のための前記反応器が、反応ゾーンの下で合流する少なくとも3つの入口を有し、そのうち、1つが一次流動化ガスの導入に使用され、1つが粒子の出口として使用され、1つがパルスガスに使用される、請求項10に記載の方法。
- 少なくとも1つの円錐形部分、及び任意に少なくとも1つの一定の直径を有する部分を含む管状反応器であって、前記管状反応器が、反応ゾーンの下で合流する少なくとも4つの合流入口を有し、そのうち、1つが反応性ガスの入口として使用され、1つがフィルターパージガスの入口として使用され、1つが一次流動化ガスの導入に使用され、1つが粒子の出口として使用され、前記管状反応器が請求項1から11のいずれか一項に記載の方法を行うことに適する、管状反応器。
- 壁材が、酸化アルミニウムでコーティングすることが可能であるセラミック材料及びステンレス鋼から選択される、請求項12に記載の管状反応器。
- さらなるガス分配要素がない、請求項12又は13に記載の管状反応器。
- 粒子材料を化学的にコーティングする方法に、請求項12から14のいずれか一項に記載の管状反応器を使用する方法。
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