NL2002590C2 - Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport. - Google Patents
Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport. Download PDFInfo
- Publication number
- NL2002590C2 NL2002590C2 NL2002590A NL2002590A NL2002590C2 NL 2002590 C2 NL2002590 C2 NL 2002590C2 NL 2002590 A NL2002590 A NL 2002590A NL 2002590 A NL2002590 A NL 2002590A NL 2002590 C2 NL2002590 C2 NL 2002590C2
- Authority
- NL
- Netherlands
- Prior art keywords
- tube
- particles
- reactant
- injection
- injection points
- Prior art date
Links
- 239000002245 particle Substances 0.000 title claims description 83
- 238000000034 method Methods 0.000 title claims description 43
- 230000008021 deposition Effects 0.000 title claims description 14
- 239000002052 molecular layer Substances 0.000 title claims description 8
- 238000002347 injection Methods 0.000 claims description 64
- 239000007924 injection Substances 0.000 claims description 64
- 239000000376 reactant Substances 0.000 claims description 56
- 238000006243 chemical reaction Methods 0.000 claims description 44
- 239000012159 carrier gas Substances 0.000 claims description 31
- 238000000231 atomic layer deposition Methods 0.000 claims description 25
- 238000000151 deposition Methods 0.000 claims description 25
- 238000005229 chemical vapour deposition Methods 0.000 claims description 13
- 238000000576 coating method Methods 0.000 claims description 10
- 239000011248 coating agent Substances 0.000 claims description 9
- 239000006227 byproduct Substances 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 4
- 238000001816 cooling Methods 0.000 claims description 3
- 239000011261 inert gas Substances 0.000 claims description 3
- 238000011144 upstream manufacturing Methods 0.000 claims description 3
- 238000005137 deposition process Methods 0.000 claims description 2
- 230000032258 transport Effects 0.000 claims 3
- 238000011010 flushing procedure Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 description 22
- 238000010926 purge Methods 0.000 description 10
- 239000002184 metal Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 150000002902 organometallic compounds Chemical class 0.000 description 7
- 239000007795 chemical reaction product Substances 0.000 description 5
- 238000010924 continuous production Methods 0.000 description 5
- 239000002356 single layer Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000011021 bench scale process Methods 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000003889 chemical engineering Methods 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000009977 dual effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 239000010779 crude oil Substances 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000004231 fluid catalytic cracking Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000006557 surface reaction Methods 0.000 description 1
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4417—Methods specially adapted for coating powder
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/442—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using fluidised bed process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
- C23C16/45548—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction
- C23C16/45551—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction for relative movement of the substrate and the gas injectors or half-reaction reactor compartments
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Combustion & Propulsion (AREA)
- Chemical Vapour Deposition (AREA)
- Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Priority Applications (12)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL2002590A NL2002590C2 (en) | 2009-03-04 | 2009-03-04 | Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport. |
| US13/254,854 US9845532B2 (en) | 2009-03-04 | 2010-03-04 | Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport |
| CN201080019618.2A CN102414342B (zh) | 2009-03-04 | 2010-03-04 | 用于在气动传输期间在颗粒上进行原子或分子层沉积的设备和方法 |
| DK10707270T DK2403976T3 (da) | 2009-03-04 | 2010-03-04 | Apparat og proces til atomar eller molekulær lagafsætning ovenpå partikler under pneumatisk transport |
| CA2754093A CA2754093C (en) | 2009-03-04 | 2010-03-04 | Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport |
| EP20100707270 EP2403976B1 (en) | 2009-03-04 | 2010-03-04 | Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport |
| JP2011552450A JP5438779B2 (ja) | 2009-03-04 | 2010-03-04 | 圧気輸送の間の粒子への原子又は分子層堆積のための装置及び方法 |
| KR1020117022758A KR101696946B1 (ko) | 2009-03-04 | 2010-03-04 | 공기압 운반 동안 입자로의 원자층 또는 분자층 피착을 위한 장치 및 공정 |
| PCT/EP2010/052769 WO2010100235A1 (en) | 2009-03-04 | 2010-03-04 | Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport |
| US15/813,840 US20180073138A1 (en) | 2009-03-04 | 2017-11-15 | Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport |
| US17/099,565 US20210102288A1 (en) | 2009-03-04 | 2020-11-16 | Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport |
| US18/217,741 US20230340665A1 (en) | 2009-03-04 | 2023-07-03 | Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL2002590A NL2002590C2 (en) | 2009-03-04 | 2009-03-04 | Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport. |
| NL2002590 | 2009-03-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL2002590C2 true NL2002590C2 (en) | 2010-09-07 |
Family
ID=42167451
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL2002590A NL2002590C2 (en) | 2009-03-04 | 2009-03-04 | Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport. |
Country Status (9)
| Country | Link |
|---|---|
| US (4) | US9845532B2 (https=) |
| EP (1) | EP2403976B1 (https=) |
| JP (1) | JP5438779B2 (https=) |
| KR (1) | KR101696946B1 (https=) |
| CN (1) | CN102414342B (https=) |
| CA (1) | CA2754093C (https=) |
| DK (1) | DK2403976T3 (https=) |
| NL (1) | NL2002590C2 (https=) |
| WO (1) | WO2010100235A1 (https=) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0747371Y2 (ja) | 1989-08-30 | 1995-11-01 | 三菱原子燃料株式会社 | 円柱体の搬送装置 |
| NL2002590C2 (en) * | 2009-03-04 | 2010-09-07 | Univ Delft Technology | Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport. |
| FI20095307A0 (fi) * | 2009-03-25 | 2009-03-25 | Beneq Oy | Päällystysmenetelmä ja -laitteisto |
| JP2016508544A (ja) * | 2013-01-23 | 2016-03-22 | ピコサン オーワイＰｉｃｏｓｕｎ Ｏｙ | 粒子材料の処理のための方法及び装置 |
| KR101550500B1 (ko) | 2013-02-28 | 2015-09-04 | 고려대학교 산학협력단 | 파우더 이송형 원자층 증착 장치 |
| US10030851B2 (en) | 2013-03-20 | 2018-07-24 | Lumileds Llc | Encapsulated quantum dots in porous particles |
| US9873940B2 (en) | 2013-12-31 | 2018-01-23 | Lam Research Corporation | Coating system and method for coating interior fluid wetted surfaces of a component of a semiconductor substrate processing apparatus |
| JP6732658B2 (ja) | 2014-04-01 | 2020-07-29 | ニューマティコート テクノロジーズ リミティド ライアビリティ カンパニー | 被覆ナノ粒子を含む受動電子部品及びその製造と使用方法 |
| NL2014348B1 (en) * | 2015-02-25 | 2016-10-13 | Univ Delft Tech | Controlled release from particles encapsulated by molecular layer deposition. |
| WO2016205242A1 (en) | 2015-06-15 | 2016-12-22 | Ald Nanosolutions, Inc. | Continuous spatial atomic layer deposition process and apparatus for applying films on particles |
| WO2018050954A1 (en) | 2016-09-16 | 2018-03-22 | Picosun Oy | Particle coating by atomic layer depostion (ald) |
| JP7127036B2 (ja) | 2017-01-23 | 2022-08-29 | ビーエーエスエフ ソシエタス・ヨーロピア | カソード材料の製造方法、及び当該方法を行うことに適する反応器 |
| KR102086574B1 (ko) | 2018-04-03 | 2020-03-09 | 전남대학교산학협력단 | 분말 입자를 코팅할 수 있는 증착장치 및 분말 입자의 코팅 방법 |
| TW202229622A (zh) | 2019-04-24 | 2022-08-01 | 美商應用材料股份有限公司 | 用於在具有旋轉槳的固定的腔室中塗覆顆粒的反應器 |
| TWI765795B (zh) | 2019-04-24 | 2022-05-21 | 美商應用材料股份有限公司 | 具有旋轉葉片與氣體注入之用於在固定腔室中塗覆粒子的反應器 |
| WO2021097143A2 (en) | 2019-11-12 | 2021-05-20 | Forge Nano Inc. | Coatings on particles of high energy materials and methods of forming same |
| US12220678B2 (en) | 2020-07-30 | 2025-02-11 | Applied Materials, Inc. | Paddle configuration for a particle coating reactor |
| NL2026635B1 (en) | 2020-10-07 | 2022-06-07 | Univ Delft Tech | Integrated manufacturing of core-shell particles for Li-ion batteries |
| EP4289632A1 (en) | 2022-06-09 | 2023-12-13 | Continental Reifen Deutschland GmbH | Method for producing a rubber composition using pretreated filler |
| NL2036587B1 (en) | 2023-12-19 | 2025-07-01 | Powall Holding B V | Particulate Composite Iridium Oxide Materials and Preparation Method and Application Thereof |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4991541A (en) * | 1986-09-25 | 1991-02-12 | Canon Kabushiki Kaisha | Device and process for treating fine particles |
| US5227196A (en) * | 1989-02-16 | 1993-07-13 | Semiconductor Energy Laboratory Co., Ltd. | Method of forming a carbon film on a substrate made of an oxide material |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
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| SE393967B (sv) * | 1974-11-29 | 1977-05-31 | Sateko Oy | Forfarande och for utforande av stroleggning mellan lagren i ett virkespaket |
| CA1304572C (en) | 1988-01-18 | 1992-07-07 | Leonard George Wiseman | System for coating particles employing a pneumatic transport reactor |
| US5227195A (en) | 1989-04-04 | 1993-07-13 | Sri International | Low temperature method of forming materials using one or more metal reactants and a halogen-containing reactant to form one or more reactive intermediates |
| US5198029A (en) * | 1989-08-01 | 1993-03-30 | Gte Products Corporation | Apparatus for coating small solids |
| US5169913A (en) * | 1991-05-31 | 1992-12-08 | Procedyne Corp. | Fluidized multistaged reaction system for polymerization |
| ES2095118T3 (es) * | 1993-11-27 | 1997-02-01 | Basf Ag | Procedimiento para el recubrimiento o el tratamiento superficial de particulas de producto solido mediante una capa fluidificada de plasma. |
| US5876793A (en) * | 1996-02-21 | 1999-03-02 | Ultramet | Fine powders and method for manufacturing |
| US6383301B1 (en) * | 1998-08-04 | 2002-05-07 | E. I. Du Pont De Nemours And Company | Treatment of deagglomerated particles with plasma-activated species |
| US6713177B2 (en) * | 2000-06-21 | 2004-03-30 | Regents Of The University Of Colorado | Insulating and functionalizing fine metal-containing particles with conformal ultra-thin films |
| DE60232884D1 (de) * | 2001-07-18 | 2009-08-20 | Univ Colorado | Isolierende und funktionelle feine metallhaltige teilchen mit konformen ultradünnen filmen |
| US6773813B2 (en) * | 2001-09-27 | 2004-08-10 | Osram Sylvania Inc. | Particles with vapor deposition coating |
| US7250148B2 (en) * | 2002-07-31 | 2007-07-31 | Carbon Nanotechnologies, Inc. | Method for making single-wall carbon nanotubes using supported catalysts |
| KR100452946B1 (ko) * | 2002-11-26 | 2004-10-14 | 한국전자통신연구원 | 저전력형 미세 열순환 소자 및 그 제조 방법 |
| ITTO20021124A1 (it) * | 2002-12-24 | 2004-06-25 | Giuliano Cavaglia | Reattore e metodo per polimerizzare in continuo in fase solida il polietilentereftalato (pet). |
| US7306823B2 (en) | 2004-09-18 | 2007-12-11 | Nanosolar, Inc. | Coated nanoparticles and quantum dots for solution-based fabrication of photovoltaic cells |
| US20050214737A1 (en) * | 2004-03-26 | 2005-09-29 | Dejneka Matthew J | Transparent filtered capillaries |
| US8298666B2 (en) * | 2006-01-26 | 2012-10-30 | Global Tungsten & Powders Corp. | Moisture resistant electroluminescent phosphor with high initial brightness and method of making |
| US20070280895A1 (en) * | 2006-06-02 | 2007-12-06 | Weimer Alan W | Coated particles and sunscreen and cosmetic products containing same |
| US7789961B2 (en) * | 2007-01-08 | 2010-09-07 | Eastman Kodak Company | Delivery device comprising gas diffuser for thin film deposition |
| NL2002590C2 (en) * | 2009-03-04 | 2010-09-07 | Univ Delft Technology | Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport. |
-
2009
- 2009-03-04 NL NL2002590A patent/NL2002590C2/en not_active IP Right Cessation
-
2010
- 2010-03-04 DK DK10707270T patent/DK2403976T3/da active
- 2010-03-04 WO PCT/EP2010/052769 patent/WO2010100235A1/en not_active Ceased
- 2010-03-04 KR KR1020117022758A patent/KR101696946B1/ko active Active
- 2010-03-04 US US13/254,854 patent/US9845532B2/en active Active
- 2010-03-04 JP JP2011552450A patent/JP5438779B2/ja active Active
- 2010-03-04 CN CN201080019618.2A patent/CN102414342B/zh active Active
- 2010-03-04 EP EP20100707270 patent/EP2403976B1/en active Active
- 2010-03-04 CA CA2754093A patent/CA2754093C/en active Active
-
2017
- 2017-11-15 US US15/813,840 patent/US20180073138A1/en not_active Abandoned
-
2020
- 2020-11-16 US US17/099,565 patent/US20210102288A1/en not_active Abandoned
-
2023
- 2023-07-03 US US18/217,741 patent/US20230340665A1/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4991541A (en) * | 1986-09-25 | 1991-02-12 | Canon Kabushiki Kaisha | Device and process for treating fine particles |
| US5227196A (en) * | 1989-02-16 | 1993-07-13 | Semiconductor Energy Laboratory Co., Ltd. | Method of forming a carbon film on a substrate made of an oxide material |
Non-Patent Citations (1)
| Title |
|---|
| kING d.m. ET AL., "Atomic layer deposition on particles using a fluidized bad reactor with in situ mass spectrometry" in: Surface & Coatings Technolgy, vol. 201, 9 august 2007, blz. 9163-9171, doi:10.1016/j.surfcoat.2007.05.002. * |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2012519773A (ja) | 2012-08-30 |
| WO2010100235A1 (en) | 2010-09-10 |
| US20210102288A1 (en) | 2021-04-08 |
| DK2403976T3 (da) | 2013-10-14 |
| CA2754093C (en) | 2017-04-04 |
| KR20110139241A (ko) | 2011-12-28 |
| US20120009343A1 (en) | 2012-01-12 |
| KR101696946B1 (ko) | 2017-01-16 |
| EP2403976B1 (en) | 2013-07-10 |
| US20180073138A1 (en) | 2018-03-15 |
| CA2754093A1 (en) | 2010-09-10 |
| CN102414342B (zh) | 2014-05-21 |
| EP2403976A1 (en) | 2012-01-11 |
| CN102414342A (zh) | 2012-04-11 |
| US9845532B2 (en) | 2017-12-19 |
| US20230340665A1 (en) | 2023-10-26 |
| JP5438779B2 (ja) | 2014-03-12 |
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