WO2010100235A1 - Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport - Google Patents

Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport Download PDF

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Publication number
WO2010100235A1
WO2010100235A1 PCT/EP2010/052769 EP2010052769W WO2010100235A1 WO 2010100235 A1 WO2010100235 A1 WO 2010100235A1 EP 2010052769 W EP2010052769 W EP 2010052769W WO 2010100235 A1 WO2010100235 A1 WO 2010100235A1
Authority
WO
WIPO (PCT)
Prior art keywords
tube
particles
reactant
injection points
injection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2010/052769
Other languages
English (en)
French (fr)
Inventor
Jan Rudolf Van Ommen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Technische Universiteit Delft
Original Assignee
Technische Universiteit Delft
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2011552450A priority Critical patent/JP5438779B2/ja
Priority to CN201080019618.2A priority patent/CN102414342B/zh
Priority to DK10707270T priority patent/DK2403976T3/da
Priority to CA2754093A priority patent/CA2754093C/en
Priority to EP20100707270 priority patent/EP2403976B1/en
Priority to KR1020117022758A priority patent/KR101696946B1/ko
Application filed by Technische Universiteit Delft filed Critical Technische Universiteit Delft
Priority to US13/254,854 priority patent/US9845532B2/en
Publication of WO2010100235A1 publication Critical patent/WO2010100235A1/en
Anticipated expiration legal-status Critical
Priority to US15/813,840 priority patent/US20180073138A1/en
Priority to US17/099,565 priority patent/US20210102288A1/en
Priority to US18/217,741 priority patent/US20230340665A1/en
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4417—Methods specially adapted for coating powder
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/442—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using fluidised bed process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
    • C23C16/45548—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction
    • C23C16/45551—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction for relative movement of the substrate and the gas injectors or half-reaction reactor compartments

Definitions

  • the invention relates generally to a continuous process for depositing layers onto small particles, and more particularly to a continuous process for atomic or molecular layer deposition onto small particles, in particular nanoparticles.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Combustion & Propulsion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
PCT/EP2010/052769 2009-03-04 2010-03-04 Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport Ceased WO2010100235A1 (en)

Priority Applications (10)

Application Number Priority Date Filing Date Title
US13/254,854 US9845532B2 (en) 2009-03-04 2010-03-04 Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport
CN201080019618.2A CN102414342B (zh) 2009-03-04 2010-03-04 用于在气动传输期间在颗粒上进行原子或分子层沉积的设备和方法
DK10707270T DK2403976T3 (da) 2009-03-04 2010-03-04 Apparat og proces til atomar eller molekulær lagafsætning ovenpå partikler under pneumatisk transport
CA2754093A CA2754093C (en) 2009-03-04 2010-03-04 Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport
EP20100707270 EP2403976B1 (en) 2009-03-04 2010-03-04 Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport
JP2011552450A JP5438779B2 (ja) 2009-03-04 2010-03-04 圧気輸送の間の粒子への原子又は分子層堆積のための装置及び方法
KR1020117022758A KR101696946B1 (ko) 2009-03-04 2010-03-04 공기압 운반 동안 입자로의 원자층 또는 분자층 피착을 위한 장치 및 공정
US15/813,840 US20180073138A1 (en) 2009-03-04 2017-11-15 Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport
US17/099,565 US20210102288A1 (en) 2009-03-04 2020-11-16 Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport
US18/217,741 US20230340665A1 (en) 2009-03-04 2023-07-03 Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL2002590A NL2002590C2 (en) 2009-03-04 2009-03-04 Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport.
NL2002590 2009-03-04

Related Child Applications (2)

Application Number Title Priority Date Filing Date
US13/254,854 A-371-Of-International US9845532B2 (en) 2009-03-04 2010-03-04 Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport
US15/813,840 Continuation US20180073138A1 (en) 2009-03-04 2017-11-15 Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport

Publications (1)

Publication Number Publication Date
WO2010100235A1 true WO2010100235A1 (en) 2010-09-10

Family

ID=42167451

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2010/052769 Ceased WO2010100235A1 (en) 2009-03-04 2010-03-04 Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport

Country Status (9)

Country Link
US (4) US9845532B2 (https=)
EP (1) EP2403976B1 (https=)
JP (1) JP5438779B2 (https=)
KR (1) KR101696946B1 (https=)
CN (1) CN102414342B (https=)
CA (1) CA2754093C (https=)
DK (1) DK2403976T3 (https=)
NL (1) NL2002590C2 (https=)
WO (1) WO2010100235A1 (https=)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014147570A1 (en) 2013-03-20 2014-09-25 Koninklijke Philips N.V. Encapsulated quantum dots in porous particles
EP2411557A4 (en) * 2009-03-25 2016-07-27 Beneq Oy COATING METHOD AND DEVICE
WO2016205242A1 (en) 2015-06-15 2016-12-22 Ald Nanosolutions, Inc. Continuous spatial atomic layer deposition process and apparatus for applying films on particles
US11133503B2 (en) 2017-01-23 2021-09-28 Basf Corporation Process for making cathode materials, and reactor suitable for carrying out said process
EP3778986A4 (en) * 2018-04-03 2021-12-15 Industry Foundation of Chonnam National University DEPOSITION DEVICE CAPABLE OF APPLYING POWDER PARTICLES AND METHOD FOR APPLYING POWDER PARTICLES

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0747371Y2 (ja) 1989-08-30 1995-11-01 三菱原子燃料株式会社 円柱体の搬送装置
NL2002590C2 (en) * 2009-03-04 2010-09-07 Univ Delft Technology Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport.
JP2016508544A (ja) * 2013-01-23 2016-03-22 ピコサン オーワイＰｉｃｏｓｕｎ Ｏｙ 粒子材料の処理のための方法及び装置
KR101550500B1 (ko) 2013-02-28 2015-09-04 고려대학교 산학협력단 파우더 이송형 원자층 증착 장치
US9873940B2 (en) 2013-12-31 2018-01-23 Lam Research Corporation Coating system and method for coating interior fluid wetted surfaces of a component of a semiconductor substrate processing apparatus
JP6732658B2 (ja) 2014-04-01 2020-07-29 ニューマティコート テクノロジーズ リミティド ライアビリティ カンパニー 被覆ナノ粒子を含む受動電子部品及びその製造と使用方法
NL2014348B1 (en) * 2015-02-25 2016-10-13 Univ Delft Tech Controlled release from particles encapsulated by molecular layer deposition.
WO2018050954A1 (en) 2016-09-16 2018-03-22 Picosun Oy Particle coating by atomic layer depostion (ald)
TW202229622A (zh) 2019-04-24 2022-08-01 美商應用材料股份有限公司 用於在具有旋轉槳的固定的腔室中塗覆顆粒的反應器
TWI765795B (zh) 2019-04-24 2022-05-21 美商應用材料股份有限公司 具有旋轉葉片與氣體注入之用於在固定腔室中塗覆粒子的反應器
WO2021097143A2 (en) 2019-11-12 2021-05-20 Forge Nano Inc. Coatings on particles of high energy materials and methods of forming same
US12220678B2 (en) 2020-07-30 2025-02-11 Applied Materials, Inc. Paddle configuration for a particle coating reactor
NL2026635B1 (en) 2020-10-07 2022-06-07 Univ Delft Tech Integrated manufacturing of core-shell particles for Li-ion batteries
EP4289632A1 (en) 2022-06-09 2023-12-13 Continental Reifen Deutschland GmbH Method for producing a rubber composition using pretreated filler
NL2036587B1 (en) 2023-12-19 2025-07-01 Powall Holding B V Particulate Composite Iridium Oxide Materials and Preparation Method and Application Thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2214195A (en) 1988-01-18 1989-08-31 Inco Ltd System for coating particles employing a pneumatic transport reactor
WO2003008186A1 (en) * 2001-07-18 2003-01-30 The Regents Of The University Of Colorado Insulating and functionalizing fine metal-containing particles with comformal ultra-thin films
US20060062902A1 (en) 2004-09-18 2006-03-23 Nanosolar, Inc. Coated nanoparticles and quantum dots for solution-based fabrication of photovoltaic cells

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE393967B (sv) * 1974-11-29 1977-05-31 Sateko Oy Forfarande och for utforande av stroleggning mellan lagren i ett virkespaket
JPH074523B2 (ja) * 1986-09-25 1995-01-25 キヤノン株式会社 反応装置
US5227196A (en) * 1989-02-16 1993-07-13 Semiconductor Energy Laboratory Co., Ltd. Method of forming a carbon film on a substrate made of an oxide material
US5227195A (en) 1989-04-04 1993-07-13 Sri International Low temperature method of forming materials using one or more metal reactants and a halogen-containing reactant to form one or more reactive intermediates
US5198029A (en) * 1989-08-01 1993-03-30 Gte Products Corporation Apparatus for coating small solids
US5169913A (en) * 1991-05-31 1992-12-08 Procedyne Corp. Fluidized multistaged reaction system for polymerization
ES2095118T3 (es) * 1993-11-27 1997-02-01 Basf Ag Procedimiento para el recubrimiento o el tratamiento superficial de particulas de producto solido mediante una capa fluidificada de plasma.
US5876793A (en) * 1996-02-21 1999-03-02 Ultramet Fine powders and method for manufacturing
US6383301B1 (en) * 1998-08-04 2002-05-07 E. I. Du Pont De Nemours And Company Treatment of deagglomerated particles with plasma-activated species
US6713177B2 (en) * 2000-06-21 2004-03-30 Regents Of The University Of Colorado Insulating and functionalizing fine metal-containing particles with conformal ultra-thin films
US6773813B2 (en) * 2001-09-27 2004-08-10 Osram Sylvania Inc. Particles with vapor deposition coating
US7250148B2 (en) * 2002-07-31 2007-07-31 Carbon Nanotechnologies, Inc. Method for making single-wall carbon nanotubes using supported catalysts
KR100452946B1 (ko) * 2002-11-26 2004-10-14 한국전자통신연구원 저전력형 미세 열순환 소자 및 그 제조 방법
ITTO20021124A1 (it) * 2002-12-24 2004-06-25 Giuliano Cavaglia Reattore e metodo per polimerizzare in continuo in fase solida il polietilentereftalato (pet).
US20050214737A1 (en) * 2004-03-26 2005-09-29 Dejneka Matthew J Transparent filtered capillaries
US8298666B2 (en) * 2006-01-26 2012-10-30 Global Tungsten & Powders Corp. Moisture resistant electroluminescent phosphor with high initial brightness and method of making
US20070280895A1 (en) * 2006-06-02 2007-12-06 Weimer Alan W Coated particles and sunscreen and cosmetic products containing same
US7789961B2 (en) * 2007-01-08 2010-09-07 Eastman Kodak Company Delivery device comprising gas diffuser for thin film deposition
NL2002590C2 (en) * 2009-03-04 2010-09-07 Univ Delft Technology Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport.

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2214195A (en) 1988-01-18 1989-08-31 Inco Ltd System for coating particles employing a pneumatic transport reactor
WO2003008186A1 (en) * 2001-07-18 2003-01-30 The Regents Of The University Of Colorado Insulating and functionalizing fine metal-containing particles with comformal ultra-thin films
US20060062902A1 (en) 2004-09-18 2006-03-23 Nanosolar, Inc. Coated nanoparticles and quantum dots for solution-based fabrication of photovoltaic cells

Non-Patent Citations (6)

* Cited by examiner, † Cited by third party
Title
FOTOU G P ET AL: "SEQUENTIAL GAS-PHASE FORMATION OF AL2O3 AN SIO2 LAYERS ON AEROSOL-MADE TIO2PARTICLES", ADVANCED MATERIALS, WILEY VCH VERLAG, DE LNKD- DOI:10.1002/ADMA.19970090513, vol. 9, no. 5, 1 April 1997 (1997-04-01), pages 420 - 423, XP000683895, ISSN: 0935-9648 *
HELMSING ET AL.: "Short Contact Time Experiments in a Novel Benchscale FCC Riser Reactor", CHEMICAL ENGINEERING SCIENCE, vol. 51, no. 11, 1996, pages 3039 - 3044, XP002584033
HELMSING M P ET AL: "Short contact time experiments in a novel benchscale FCC riser reactor", CHEMICAL ENGINEERING SCIENCE - CHEMICAL REACTION ENGINEERING: FROM FUNDAMENTALS TO COMMERCIAL PLANTS AND PRODUCTS 1996 JUN PERGAMON PRESS INC LNKD- DOI:10.1016/0009-2509(96)00194-7, vol. 51, no. 11 pt B, 5 May 1996 (1996-05-05), pages 3039 - 3044, XP002584033 *
M.A. DEN HOLLANDER, M. MAKKEE, J.A. MOULIJN: "Coke Formation in fluid catalytic cracking studied with the microriser", CATALYSIS TODAY, vol. 46, no. 1, 2 November 1998 (1998-11-02), pages 27 - 35, XP002584590, DOI: 10.1016/S0920-5861(98)00348-4 *
PUURUNEN: "Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process", JOURNAL OF APPLIED PHYSICS, vol. 97, 2005, pages 121301, XP012070325, DOI: doi:10.1063/1.1940727
VAHLAS C ET AL: "Principles and applications of CVD powder technology", MATERIALS SCIENCE AND ENGINEERING R: REPORTS, ELSEVIER SEQUOIA S.A., LAUSANNE, CH LNKD- DOI:10.1016/J.MSER.2006.05.001, vol. 53, no. 1-2, 30 July 2006 (2006-07-30), pages 1 - 72, XP025137124, ISSN: 0927-796X, [retrieved on 20060730] *

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2411557A4 (en) * 2009-03-25 2016-07-27 Beneq Oy COATING METHOD AND DEVICE
WO2014147570A1 (en) 2013-03-20 2014-09-25 Koninklijke Philips N.V. Encapsulated quantum dots in porous particles
US10030851B2 (en) 2013-03-20 2018-07-24 Lumileds Llc Encapsulated quantum dots in porous particles
WO2016205242A1 (en) 2015-06-15 2016-12-22 Ald Nanosolutions, Inc. Continuous spatial atomic layer deposition process and apparatus for applying films on particles
US11133503B2 (en) 2017-01-23 2021-09-28 Basf Corporation Process for making cathode materials, and reactor suitable for carrying out said process
EP3778986A4 (en) * 2018-04-03 2021-12-15 Industry Foundation of Chonnam National University DEPOSITION DEVICE CAPABLE OF APPLYING POWDER PARTICLES AND METHOD FOR APPLYING POWDER PARTICLES
US11434566B2 (en) 2018-04-03 2022-09-06 Industry Foundation Of Chonnam National University Deposition apparatus capable of applying powder particles, and method for applying powder particles

Also Published As

Publication number Publication date
JP2012519773A (ja) 2012-08-30
US20210102288A1 (en) 2021-04-08
DK2403976T3 (da) 2013-10-14
CA2754093C (en) 2017-04-04
KR20110139241A (ko) 2011-12-28
US20120009343A1 (en) 2012-01-12
KR101696946B1 (ko) 2017-01-16
EP2403976B1 (en) 2013-07-10
US20180073138A1 (en) 2018-03-15
CA2754093A1 (en) 2010-09-10
CN102414342B (zh) 2014-05-21
EP2403976A1 (en) 2012-01-11
CN102414342A (zh) 2012-04-11
US9845532B2 (en) 2017-12-19
US20230340665A1 (en) 2023-10-26
JP5438779B2 (ja) 2014-03-12
NL2002590C2 (en) 2010-09-07

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