JP2012518902A5 - - Google Patents

Download PDF

Info

Publication number
JP2012518902A5
JP2012518902A5 JP2011550596A JP2011550596A JP2012518902A5 JP 2012518902 A5 JP2012518902 A5 JP 2012518902A5 JP 2011550596 A JP2011550596 A JP 2011550596A JP 2011550596 A JP2011550596 A JP 2011550596A JP 2012518902 A5 JP2012518902 A5 JP 2012518902A5
Authority
JP
Japan
Prior art keywords
lithographic apparatus
common
rows
charged particle
robot
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011550596A
Other languages
English (en)
Japanese (ja)
Other versions
JP5539406B2 (ja
JP2012518902A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2010/052221 external-priority patent/WO2010094804A1/en
Publication of JP2012518902A publication Critical patent/JP2012518902A/ja
Publication of JP2012518902A5 publication Critical patent/JP2012518902A5/ja
Application granted granted Critical
Publication of JP5539406B2 publication Critical patent/JP5539406B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2011550596A 2009-02-22 2010-02-22 リソグラフィマシン及び基板処理構成体 Expired - Fee Related JP5539406B2 (ja)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
US15441509P 2009-02-22 2009-02-22
US15441109P 2009-02-22 2009-02-22
US61/154,411 2009-02-22
US61/154,415 2009-02-22
US28940709P 2009-12-23 2009-12-23
US61/289,407 2009-12-23
US30633310P 2010-02-19 2010-02-19
US61/306,333 2010-02-19
PCT/EP2010/052221 WO2010094804A1 (en) 2009-02-22 2010-02-22 Lithography machine and substrate handling arrangement

Publications (3)

Publication Number Publication Date
JP2012518902A JP2012518902A (ja) 2012-08-16
JP2012518902A5 true JP2012518902A5 (enExample) 2013-04-11
JP5539406B2 JP5539406B2 (ja) 2014-07-02

Family

ID=42035939

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011550596A Expired - Fee Related JP5539406B2 (ja) 2009-02-22 2010-02-22 リソグラフィマシン及び基板処理構成体

Country Status (6)

Country Link
US (1) US20110049393A1 (enExample)
EP (1) EP2399271B1 (enExample)
JP (1) JP5539406B2 (enExample)
KR (1) KR20110139699A (enExample)
CN (1) CN102414776A (enExample)
WO (1) WO2010094804A1 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5315100B2 (ja) * 2009-03-18 2013-10-16 株式会社ニューフレアテクノロジー 描画装置
RU2579533C2 (ru) * 2010-12-14 2016-04-10 МЭППЕР ЛИТОГРАФИ АйПи Б. В. Литографическая система и способ обработки подложек в такой литографической системе
JP6239583B2 (ja) * 2012-03-20 2017-11-29 マッパー・リソグラフィー・アイピー・ビー．ブイ． ラジカルを輸送するための装置および方法
WO2013171229A1 (en) 2012-05-14 2013-11-21 Mapper Lithography Ip B.V. Charged particle lithography system and beam generator
US10586625B2 (en) 2012-05-14 2020-03-10 Asml Netherlands B.V. Vacuum chamber arrangement for charged particle beam generator
US11348756B2 (en) 2012-05-14 2022-05-31 Asml Netherlands B.V. Aberration correction in charged particle system
NL2010624C2 (en) 2013-04-08 2014-10-09 Mapper Lithography Ip Bv Cabinet for electronic equipment.
CN105637422A (zh) * 2013-08-16 2016-06-01 Asml荷兰有限公司 光刻设备、可编程图案形成装置和光刻方法
KR102919104B1 (ko) 2020-02-03 2026-01-29 아이엠에스 나노패브릭케이션 게엠베하 멀티―빔 라이터의 블러 변화 보정
KR102922552B1 (ko) 2020-04-24 2026-02-04 아이엠에스 나노패브릭케이션 게엠베하 대전 입자 소스
EP4095882A1 (en) 2021-05-25 2022-11-30 IMS Nanofabrication GmbH Pattern data processing for programmable direct-write apparatus
US12500060B2 (en) 2021-07-14 2025-12-16 Ims Nanofabrication Gmbh Electromagnetic lens
US12154756B2 (en) 2021-08-12 2024-11-26 Ims Nanofabrication Gmbh Beam pattern device having beam absorber structure
WO2024028194A1 (en) * 2022-08-05 2024-02-08 Asml Netherlands B.V. High-throughput load lock chamber

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3157308A (en) 1961-09-05 1964-11-17 Clark Mfg Co J L Canister type container and method of making the same
US3159408A (en) 1961-10-05 1964-12-01 Grace W R & Co Chuck
US3365091A (en) * 1964-10-30 1968-01-23 Welding Research Inc Vacuum chamber
US4524308A (en) 1984-06-01 1985-06-18 Sony Corporation Circuits for accomplishing electron beam convergence in color cathode ray tubes
JPH04352410A (ja) * 1991-05-30 1992-12-07 Canon Inc 半導体製造装置
WO1994025880A1 (en) 1993-04-30 1994-11-10 Board Of Regents, The University Of Texas System Megavoltage scanning imager and method for its use
JPH0936198A (ja) * 1995-07-19 1997-02-07 Hitachi Ltd 真空処理装置およびそれを用いた半導体製造ライン
EP0766405A1 (en) 1995-09-29 1997-04-02 STMicroelectronics S.r.l. Successive approximation register without redundancy
JPH09209150A (ja) * 1996-02-06 1997-08-12 Tokyo Electron Ltd 真空チャンバ及びその製造方法
JPH1054369A (ja) * 1996-05-21 1998-02-24 Ebara Corp 真空ポンプの制御装置
US6235634B1 (en) * 1997-10-08 2001-05-22 Applied Komatsu Technology, Inc. Modular substrate processing system
JP3463855B2 (ja) * 1997-12-18 2003-11-05 富士重工業株式会社 無段変速機の変速制御装置
CA2367204A1 (en) * 1999-03-19 2000-09-28 Electron Vision Corporation Cluster tool for wafer processing having an electron beam exposure module
JP3019260B1 (ja) * 1999-03-26 2000-03-13 株式会社日立製作所 電子ビ―ム描画装置
JP2007147648A (ja) * 2000-12-01 2007-06-14 Ebara Corp 欠陥検査方法及び基板検査装置
EP1339100A1 (en) * 2000-12-01 2003-08-27 Ebara Corporation Inspection method and apparatus using electron beam, and device production method using it
EP2302459A3 (en) 2002-10-25 2011-04-06 Mapper Lithography Ip B.V. Lithography system
CN101414129B (zh) 2002-10-30 2012-11-28 迈普尔平版印刷Ip有限公司 电子束曝光系统
JP4484868B2 (ja) 2003-03-10 2010-06-16 マッパー・リソグラフィー・アイピー・ビー．ブイ． 複数の小ビームを発生させるための装置
KR101168200B1 (ko) 2003-05-28 2012-07-25 마퍼 리쏘그라피 아이피 비.브이. 대전 입자 빔렛 노광 시스템
JP2005016255A (ja) * 2003-06-27 2005-01-20 Sumitomo Heavy Ind Ltd 扉ロック装置、及び扉システム
JP2005032505A (ja) * 2003-07-10 2005-02-03 Nikon Corp 磁気シールド構造及び露光装置
WO2005010618A2 (en) 2003-07-30 2005-02-03 Mapper Lithography Ip B.V. Modulator circuitry
US7819079B2 (en) * 2004-12-22 2010-10-26 Applied Materials, Inc. Cartesian cluster tool configuration for lithography type processes
US8229585B2 (en) * 2005-09-18 2012-07-24 Flitsch Frederick A Methods and apparatus for vertically orienting substrate processing tools in a clean space
US7709815B2 (en) 2005-09-16 2010-05-04 Mapper Lithography Ip B.V. Lithography system and projection method
CN107407595B (zh) 2015-04-03 2018-09-07 株式会社日立高新技术 光量检测装置、利用其的免疫分析装置及电荷粒子束装置

Similar Documents

Publication Publication Date Title
JP7643842B2 (ja) 垂直バッチ炉組立体
JP2017108112A5 (enExample)
TWI379378B (enExample)
TWI585889B (zh) 連結型真空處理工具及使用該工具之方法
JP2014501442A5 (enExample)
CN202786403U (zh) 有机层沉积设备和有机发光显示装置
TWI702678B (zh) 收納單元、搬送裝置及基板處理系統
TW201417209A (zh) 有關半導體處理設備之方法與系統
WO2009079448A3 (en) Disk drive testing
WO2009079449A3 (en) Disk drive testing
JP2013045989A5 (enExample)
JP2013032587A5 (enExample)
JP6747136B2 (ja) 基板処理装置
US20110318143A1 (en) Vacuum processing apparatus
JP2012238623A5 (ja) 荷電粒子線描画装置およびそのクリーニング方法ならびにデバイスの製造方法
JP6266349B2 (ja) 蒸着マスク
KR101934621B1 (ko) 마스크 스토커를 구비한 대면적 기판용 인라인 시스템
JP2008189951A5 (enExample)
JP2013077819A5 (enExample)
TW201727808A (zh) 採用三維之模組系統配置
JP2017515301A5 (enExample)
JP3202183U (ja) 各システムがマスクチャンバを有するマルチシステム
CN106469669B (zh) 基板移送系统
JP2024051304A (ja) 基板搬送モジュール及び基板搬送方法
JP2014530496A5 (enExample)