JP2012517711A5 - - Google Patents

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JP2012517711A5
JP2012517711A5 JP2011549695A JP2011549695A JP2012517711A5 JP 2012517711 A5 JP2012517711 A5 JP 2012517711A5 JP 2011549695 A JP2011549695 A JP 2011549695A JP 2011549695 A JP2011549695 A JP 2011549695A JP 2012517711 A5 JP2012517711 A5 JP 2012517711A5
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species
plasma
substrate
supply
plasma processing
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JP2011549695A
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JP2012517711A (ja
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JP2011549695A 2009-02-11 2010-02-10 マイグレーション及びプラズマ増強化学蒸着 Pending JP2012517711A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
CA2653581 2009-02-11
CA2653581A CA2653581A1 (en) 2009-02-11 2009-02-11 Migration and plasma enhanced chemical vapour deposition
US18595309P 2009-06-10 2009-06-10
US61/185,953 2009-06-10
PCT/IB2010/000390 WO2010092482A2 (en) 2009-02-11 2010-02-10 Migration and plasma enhanced chemical vapor deposition

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JP2012517711A JP2012517711A (ja) 2012-08-02
JP2012517711A5 true JP2012517711A5 (enExample) 2013-03-21

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JP2011549695A Pending JP2012517711A (ja) 2009-02-11 2010-02-10 マイグレーション及びプラズマ増強化学蒸着

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US (2) US8580670B2 (enExample)
EP (1) EP2396808B1 (enExample)
JP (1) JP2012517711A (enExample)
AU (1) AU2010212553B2 (enExample)
CA (2) CA2653581A1 (enExample)
WO (1) WO2010092482A2 (enExample)

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