JP2012501941A5 - - Google Patents
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- JP2012501941A5 JP2012501941A5 JP2011525509A JP2011525509A JP2012501941A5 JP 2012501941 A5 JP2012501941 A5 JP 2012501941A5 JP 2011525509 A JP2011525509 A JP 2011525509A JP 2011525509 A JP2011525509 A JP 2011525509A JP 2012501941 A5 JP2012501941 A5 JP 2012501941A5
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- JP
- Japan
- Prior art keywords
- particles
- dispersion
- och
- independently
- alkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000002245 particle Substances 0.000 claims 18
- 239000006185 dispersion Substances 0.000 claims 6
- 229910052760 oxygen Inorganic materials 0.000 claims 6
- 229910052717 sulfur Inorganic materials 0.000 claims 6
- 239000002612 dispersion medium Substances 0.000 claims 5
- 238000000034 method Methods 0.000 claims 5
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims 4
- 239000003607 modifier Substances 0.000 claims 4
- 229910052711 selenium Inorganic materials 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- 239000002131 composite material Substances 0.000 claims 3
- 229910052799 carbon Inorganic materials 0.000 claims 2
- 229910052739 hydrogen Inorganic materials 0.000 claims 2
- 239000007788 liquid Substances 0.000 claims 2
- 125000000896 monocarboxylic acid group Chemical group 0.000 claims 2
- 239000011787 zinc oxide Substances 0.000 claims 2
- 239000000010 aprotic solvent Substances 0.000 claims 1
- 238000009835 boiling Methods 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 238000000354 decomposition reaction Methods 0.000 claims 1
- 230000005670 electromagnetic radiation Effects 0.000 claims 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 238000002156 mixing Methods 0.000 claims 1
- 229920000307 polymer substrate Polymers 0.000 claims 1
- 230000001376 precipitating effect Effects 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP08163703 | 2008-09-04 | ||
| EP08163703.5 | 2008-09-04 | ||
| PCT/EP2009/061103 WO2010026102A1 (de) | 2008-09-04 | 2009-08-28 | Modifizierte partikel und diese enthaltende dispersionen |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012501941A JP2012501941A (ja) | 2012-01-26 |
| JP2012501941A5 true JP2012501941A5 (cg-RX-API-DMAC7.html) | 2012-10-11 |
| JP5599797B2 JP5599797B2 (ja) | 2014-10-01 |
Family
ID=41277503
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011525509A Expired - Fee Related JP5599797B2 (ja) | 2008-09-04 | 2009-08-28 | 変性された粒子、及びこれらを含む分散液 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8734899B2 (cg-RX-API-DMAC7.html) |
| EP (1) | EP2321373A1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP5599797B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR20110066162A (cg-RX-API-DMAC7.html) |
| CN (1) | CN102144004B (cg-RX-API-DMAC7.html) |
| TW (1) | TWI488815B (cg-RX-API-DMAC7.html) |
| WO (1) | WO2010026102A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5637997B2 (ja) | 2008-12-11 | 2014-12-10 | ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ | 鉱山廃棄物（捨石）からの価値のある鉱石の富化 |
| US8940814B2 (en) * | 2008-12-12 | 2015-01-27 | Basf Se | Dispersions comprising functionalized oxidic nanoparticles |
| AR075716A1 (es) | 2009-03-04 | 2011-04-20 | Siemens Ag | Separacion magnetica de minerales metalicos no ferrosos por acondicionamiento en multiples etapas |
| CN102612406A (zh) * | 2009-11-20 | 2012-07-25 | 巴斯夫欧洲公司 | 用于制备羧酸和/或羧酸酐的在至少一个催化剂层中具有锑酸钒的多层催化剂及具有低热点温度的制备邻苯二甲酸酐的方法 |
| JP2013514643A (ja) | 2009-12-18 | 2013-04-25 | ビーエーエスエフ ソシエタス・ヨーロピア | 機械的に可撓性のポリマー基体上に低温で溶液から処理可能な誘電体を有する金属酸化物電界効果トランジスタ |
| US20110230668A1 (en) * | 2010-03-19 | 2011-09-22 | Basf Se | Catalyst for gas phase oxidations based on low-sulfur and low-calcium titanium dioxide |
| US8901320B2 (en) | 2010-04-13 | 2014-12-02 | Basf Se | Process for controlling a gas phase oxidation reactor for preparation of phthalic anhydride |
| CN105931697B (zh) | 2010-04-23 | 2018-04-06 | 皮瑟莱根特科技有限责任公司 | 纳米晶体的合成、盖帽和分散 |
| KR20130057439A (ko) | 2010-04-28 | 2013-05-31 | 바스프 에스이 | 아연 착물 용액의 제조 방법 |
| US8865000B2 (en) | 2010-06-11 | 2014-10-21 | Basf Se | Utilization of the naturally occurring magnetic constituents of ores |
| US8859459B2 (en) | 2010-06-30 | 2014-10-14 | Basf Se | Multilayer catalyst for preparing phthalic anhydride and process for preparing phthalic anhydride |
| US9212157B2 (en) | 2010-07-30 | 2015-12-15 | Basf Se | Catalyst for the oxidation of o-xylene and/or naphthalene to phthalic anhydride |
| US9376457B2 (en) | 2010-09-03 | 2016-06-28 | Basf Se | Hydrophobic, functionalized particles |
| KR101945383B1 (ko) | 2010-10-27 | 2019-02-07 | 픽셀리전트 테크놀로지스 엘엘씨 | 나노결정의 합성, 캐핑 및 분산 |
| US9359689B2 (en) | 2011-10-26 | 2016-06-07 | Pixelligent Technologies, Llc | Synthesis, capping and dispersion of nanocrystals |
| KR101978835B1 (ko) * | 2012-03-16 | 2019-05-15 | 한국전자통신연구원 | 박막 트랜지스터 |
| JP6108563B2 (ja) * | 2013-02-04 | 2017-04-05 | 国立研究開発法人産業技術総合研究所 | 抵抗体、誘電体等の電子部品用無機材料ペースト及び該無機材料ペーストの製造方法 |
| FI130559B (en) * | 2021-06-23 | 2023-11-21 | Turun Yliopisto | Semiconductor structure, semiconductor device, and method |
| KR102756449B1 (ko) * | 2022-02-11 | 2025-01-21 | 한인정밀화학(주) | 양자점 조성물, 이로부터 형성된 경화 패턴, 및 이를 포함하는 디스플레이 장치 |
| CN118039856A (zh) * | 2024-02-19 | 2024-05-14 | 贵州大学 | 锂电池用包覆及掺杂改性的高镍正极材料和低温电解液 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2303330A (en) * | 1942-02-02 | 1942-12-01 | New Jersey Zinc Co | Zinc oxide |
| DE19907704A1 (de) * | 1999-02-23 | 2000-08-24 | Bayer Ag | Nanopartikuläres, redispergierbares Fällungszinkoxid |
| DE10063092A1 (de) | 2000-12-18 | 2002-06-20 | Henkel Kgaa | Nanoskalige Materialien in Hygiene-Produkten |
| JP2003073122A (ja) * | 2001-09-04 | 2003-03-12 | Mitsui Chemicals Inc | 無機微粒子分散液及びそれを用いて製造される複合材料組成物 |
| US7553512B2 (en) | 2001-11-02 | 2009-06-30 | Cabot Corporation | Method for fabricating an inorganic resistor |
| JP2004010807A (ja) * | 2002-06-10 | 2004-01-15 | Toyo Ink Mfg Co Ltd | 水性分散体の製造方法 |
| US20050182153A1 (en) * | 2002-06-12 | 2005-08-18 | Koji Yokoi | Porous metal oxide material in flake form, method for producing the same and cosmetic, coating material resin composition ink composition and paper comprising the same |
| JP2004182483A (ja) * | 2002-11-29 | 2004-07-02 | Mitsubishi Chemicals Corp | 酸化亜鉛超微粒子の製造方法 |
| DE10257388A1 (de) | 2002-12-06 | 2004-06-24 | Sustech Gmbh & Co. Kg | Nanopartikuläres redispergierbares Zinkoxidpulver |
| DE10304849A1 (de) * | 2003-02-06 | 2004-08-19 | Institut für Neue Materialien gemeinnützige Gesellschaft mit beschränkter Haftung | Chemomechanische Herstellung von Funktionskolloiden |
| AU2004226052B2 (en) | 2003-03-31 | 2009-06-11 | Toto Ltd. | Surface-modified titanium dioxide fine particles and dispersion comprising the same, and method for producing the same |
| JP5014796B2 (ja) * | 2004-09-30 | 2012-08-29 | 株式会社カネカ | ポリマー修飾金属カルコゲン化物ナノ粒子の製造方法 |
| DE102004048230A1 (de) * | 2004-10-04 | 2006-04-06 | Institut für Neue Materialien Gemeinnützige GmbH | Verfahren zur Herstellung von Nanopartikeln mit maßgeschneiderter Oberflächenchemie und entsprechenden Kolloiden |
| DE102005007374A1 (de) | 2005-02-17 | 2006-08-24 | Universität Ulm | Nanopartikel und deren Verwendung |
| JP4918994B2 (ja) * | 2005-05-30 | 2012-04-18 | 住友電気工業株式会社 | 金属被膜の形成方法および金属配線 |
| DE102005047807A1 (de) | 2005-06-04 | 2006-12-07 | Solvay Infra Bad Hönningen GmbH | Modifizierte Nanopartikel |
| US7402506B2 (en) * | 2005-06-16 | 2008-07-22 | Eastman Kodak Company | Methods of making thin film transistors comprising zinc-oxide-based semiconductor materials and transistors made thereby |
| US7691666B2 (en) * | 2005-06-16 | 2010-04-06 | Eastman Kodak Company | Methods of making thin film transistors comprising zinc-oxide-based semiconductor materials and transistors made thereby |
| JP4738931B2 (ja) * | 2005-07-29 | 2011-08-03 | 富士フイルム株式会社 | ナノ粒子分散液、それを用いた半導体デバイスの製造方法及び半導体デバイス |
| KR100768632B1 (ko) * | 2006-10-30 | 2007-10-18 | 삼성전자주식회사 | 나노입자의 분산방법 및 이를 이용한 나노입자 박막의제조방법 |
| KR20080108767A (ko) * | 2007-06-11 | 2008-12-16 | 삼성에스디아이 주식회사 | 전극 단자부 코팅재 및 이를 구비한 플라즈마 디스플레이패널 |
-
2009
- 2009-08-28 JP JP2011525509A patent/JP5599797B2/ja not_active Expired - Fee Related
- 2009-08-28 US US13/062,229 patent/US8734899B2/en not_active Expired - Fee Related
- 2009-08-28 KR KR1020117007826A patent/KR20110066162A/ko not_active Abandoned
- 2009-08-28 EP EP09782305A patent/EP2321373A1/de not_active Withdrawn
- 2009-08-28 WO PCT/EP2009/061103 patent/WO2010026102A1/de not_active Ceased
- 2009-08-28 CN CN200980134455.XA patent/CN102144004B/zh not_active Expired - Fee Related
- 2009-09-03 TW TW098129750A patent/TWI488815B/zh not_active IP Right Cessation
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