JP2012237854A5 - - Google Patents
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- Publication number
- JP2012237854A5 JP2012237854A5 JP2011106297A JP2011106297A JP2012237854A5 JP 2012237854 A5 JP2012237854 A5 JP 2012237854A5 JP 2011106297 A JP2011106297 A JP 2011106297A JP 2011106297 A JP2011106297 A JP 2011106297A JP 2012237854 A5 JP2012237854 A5 JP 2012237854A5
- Authority
- JP
- Japan
- Prior art keywords
- general formula
- represented
- less
- change rate
- epoxy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 150000001875 compounds Chemical class 0.000 description 5
- 238000006459 hydrosilylation reaction Methods 0.000 description 5
- -1 cyclic siloxane compounds Chemical class 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- PUNGSQUVTIDKNU-UHFFFAOYSA-N 2,4,6,8,10-pentamethyl-1,3,5,7,9,2$l^{3},4$l^{3},6$l^{3},8$l^{3},10$l^{3}-pentaoxapentasilecane Chemical compound C[Si]1O[Si](C)O[Si](C)O[Si](C)O[Si](C)O1 PUNGSQUVTIDKNU-UHFFFAOYSA-N 0.000 description 2
- WZJUBBHODHNQPW-UHFFFAOYSA-N 2,4,6,8-tetramethyl-1,3,5,7,2$l^{3},4$l^{3},6$l^{3},8$l^{3}-tetraoxatetrasilocane Chemical compound C[Si]1O[Si](C)O[Si](C)O[Si](C)O1 WZJUBBHODHNQPW-UHFFFAOYSA-N 0.000 description 2
- 241000233855 Orchidaceae Species 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- QEWJHQNELKTCDD-UHFFFAOYSA-N 2,2,4,6,8-pentamethyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound C[SiH]1O[SiH](C)O[Si](C)(C)O[SiH](C)O1 QEWJHQNELKTCDD-UHFFFAOYSA-N 0.000 description 1
- VVGBXPHOAJBGJF-UHFFFAOYSA-N 2,4,6,8,10,12-hexaethyl-1,3,5,7,9,11-hexaoxa-2,4,6,8,10,12-hexasilacyclododecane Chemical compound CC[SiH]1O[SiH](CC)O[SiH](CC)O[SiH](CC)O[SiH](CC)O[SiH](CC)O1 VVGBXPHOAJBGJF-UHFFFAOYSA-N 0.000 description 1
- KHRAMGTWHCXSPR-UHFFFAOYSA-N 2,4,6,8,10,12-hexakis-phenyl-1,3,5,7,9,11-hexaoxa-2,4,6,8,10,12-hexasilacyclododecane Chemical compound O1[SiH](C=2C=CC=CC=2)O[SiH](C=2C=CC=CC=2)O[SiH](C=2C=CC=CC=2)O[SiH](C=2C=CC=CC=2)O[SiH](C=2C=CC=CC=2)O[SiH]1C1=CC=CC=C1 KHRAMGTWHCXSPR-UHFFFAOYSA-N 0.000 description 1
- PGSRCRCASLLTFK-UHFFFAOYSA-N 2,4,6,8,10-pentaethyl-1,3,5,7,9,2,4,6,8,10-pentaoxapentasilecane Chemical compound CC[SiH]1O[SiH](CC)O[SiH](CC)O[SiH](CC)O[SiH](CC)O1 PGSRCRCASLLTFK-UHFFFAOYSA-N 0.000 description 1
- KITRARKKJBQJFV-UHFFFAOYSA-N 2,4,6,8,10-pentakis-phenyl-1,3,5,7,9,2,4,6,8,10-pentaoxapentasilecane Chemical compound O1[SiH](O[SiH](O[SiH](O[SiH](O[SiH]1c1ccccc1)c1ccccc1)c1ccccc1)c1ccccc1)c1ccccc1 KITRARKKJBQJFV-UHFFFAOYSA-N 0.000 description 1
- KOJCPAMHGPVAEW-UHFFFAOYSA-N 2,4,6,8-tetraethyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound CC[SiH]1O[SiH](CC)O[SiH](CC)O[SiH](CC)O1 KOJCPAMHGPVAEW-UHFFFAOYSA-N 0.000 description 1
- HCLSTWDGAWHFME-UHFFFAOYSA-N 2,4,6-triethyl-1,3,5,2,4,6-trioxatrisilinane Chemical compound CC[SiH]1O[SiH](CC)O[SiH](CC)O1 HCLSTWDGAWHFME-UHFFFAOYSA-N 0.000 description 1
- VLQZJOLYNOGECD-UHFFFAOYSA-N 2,4,6-trimethyl-1,3,5,2,4,6-trioxatrisilinane Chemical compound C[SiH]1O[SiH](C)O[SiH](C)O1 VLQZJOLYNOGECD-UHFFFAOYSA-N 0.000 description 1
- SWBSRFCYZCHNRI-UHFFFAOYSA-N 2,4,6-trimethyl-8-phenyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound C[SiH]1O[SiH](C)O[SiH](O[SiH](C)O1)c1ccccc1 SWBSRFCYZCHNRI-UHFFFAOYSA-N 0.000 description 1
- NXJQTYOZFVTCEM-UHFFFAOYSA-N 2,4,6-triphenyl-1,3,5,2,4,6-trioxatrisilinane Chemical compound O1[SiH](C=2C=CC=CC=2)O[SiH](C=2C=CC=CC=2)O[SiH]1C1=CC=CC=C1 NXJQTYOZFVTCEM-UHFFFAOYSA-N 0.000 description 1
- HJLARPLSJYOZTN-UHFFFAOYSA-N O1[SiH](C=2C=CC=CC=2)O[SiH](C=2C=CC=CC=2)O[SiH](C=2C=CC=CC=2)O[SiH]1C1=CC=CC=C1 Chemical compound O1[SiH](C=2C=CC=CC=2)O[SiH](C=2C=CC=CC=2)O[SiH](C=2C=CC=CC=2)O[SiH]1C1=CC=CC=C1 HJLARPLSJYOZTN-UHFFFAOYSA-N 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- DDJSWKLBKSLAAZ-UHFFFAOYSA-N cyclotetrasiloxane Chemical compound O1[SiH2]O[SiH2]O[SiH2]O[SiH2]1 DDJSWKLBKSLAAZ-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- KAKZBPTYRLMSJV-UHFFFAOYSA-N vinyl-ethylene Natural products C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011106297A JP5698070B2 (ja) | 2011-05-11 | 2011-05-11 | ポジ型感光性組成物及びその硬化物 |
| KR1020137020225A KR20140006855A (ko) | 2011-05-11 | 2012-04-26 | 포지티브형 감광성 조성물 및 그 경화물 |
| PCT/JP2012/061246 WO2012153648A1 (ja) | 2011-05-11 | 2012-04-26 | ポジ型感光性組成物及びその硬化物 |
| CN201280007372.6A CN103380400B (zh) | 2011-05-11 | 2012-04-26 | 正型感光性组合物及其固化物 |
| TW101116248A TWI530761B (zh) | 2011-05-11 | 2012-05-07 | A positive type photosensitive composition and a hardened product thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011106297A JP5698070B2 (ja) | 2011-05-11 | 2011-05-11 | ポジ型感光性組成物及びその硬化物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012237854A JP2012237854A (ja) | 2012-12-06 |
| JP2012237854A5 true JP2012237854A5 (enExample) | 2014-04-24 |
| JP5698070B2 JP5698070B2 (ja) | 2015-04-08 |
Family
ID=47139132
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011106297A Expired - Fee Related JP5698070B2 (ja) | 2011-05-11 | 2011-05-11 | ポジ型感光性組成物及びその硬化物 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP5698070B2 (enExample) |
| KR (1) | KR20140006855A (enExample) |
| CN (1) | CN103380400B (enExample) |
| TW (1) | TWI530761B (enExample) |
| WO (1) | WO2012153648A1 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6086739B2 (ja) * | 2013-01-21 | 2017-03-01 | 東京応化工業株式会社 | 絶縁膜形成用組成物、絶縁膜の製造方法、及び絶縁膜 |
| JP6438259B2 (ja) * | 2014-10-01 | 2018-12-12 | 旭化成株式会社 | オルガノポリシロキサン、オルガノポリシロキサン組成物、オルガノポリシロキサンの製造方法、硬化性樹脂組成物、光半導体用封止材、光半導体用ダイボンド材、及び光半導体パッケージ |
| CN107075255B (zh) * | 2014-10-21 | 2020-05-22 | 日产化学工业株式会社 | Led用封装材料组合物 |
| JP6484428B2 (ja) | 2014-10-31 | 2019-03-13 | 東京応化工業株式会社 | レジストパターン形成装置およびレジストパターン形成方法 |
| JP2016092120A (ja) * | 2014-10-31 | 2016-05-23 | 東京応化工業株式会社 | レジストパターン形成装置およびレジストパターン形成方法 |
| EP3255494A4 (en) * | 2015-02-04 | 2018-10-10 | AZ Electronic Materials (Luxembourg) S.à.r.l. | Positive photosensitive siloxane composition, active matrix substrate, display device, and method for producing active matrix substrate |
| JP6688003B2 (ja) * | 2015-02-26 | 2020-04-28 | 旭化成株式会社 | 硬化性樹脂組成物及びその製造方法、並びに、光半導体用封止材、光半導体用ダイボンド材、及び光半導体パッケージ |
| JP6683423B2 (ja) * | 2015-02-26 | 2020-04-22 | 旭化成株式会社 | 硬化性樹脂組成物及びその製造方法、並びに、光半導体用封止材、光半導体用ダイボンド材、及び光半導体パッケージ |
| JP6518548B2 (ja) | 2015-08-10 | 2019-05-22 | 東京応化工業株式会社 | 紫外線照射装置、レジストパターン形成装置、紫外線照射方法及びレジストパターン形成方法 |
| JPWO2024150630A1 (enExample) * | 2023-01-10 | 2024-07-18 | ||
| JPWO2024150635A1 (enExample) * | 2023-01-10 | 2024-07-18 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1662322B1 (en) * | 2004-11-26 | 2017-01-11 | Toray Industries, Inc. | Positive type photo-sensitive siloxane composition, curing film formed by the composition and device with the curing film |
| US8211619B2 (en) * | 2007-11-13 | 2012-07-03 | Adeka Corporation | Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist |
| JP4960330B2 (ja) * | 2008-10-21 | 2012-06-27 | 株式会社Adeka | ポジ型感光性組成物及び永久レジスト |
| JP5336161B2 (ja) * | 2008-12-11 | 2013-11-06 | 株式会社カネカ | 金属酸化物微粒子含有硬化性樹脂組成物、その硬化物、及び光拡散材 |
| JP5338532B2 (ja) * | 2009-07-13 | 2013-11-13 | Jnc株式会社 | ポジ型感光性組成物 |
-
2011
- 2011-05-11 JP JP2011106297A patent/JP5698070B2/ja not_active Expired - Fee Related
-
2012
- 2012-04-26 KR KR1020137020225A patent/KR20140006855A/ko not_active Ceased
- 2012-04-26 CN CN201280007372.6A patent/CN103380400B/zh not_active Expired - Fee Related
- 2012-04-26 WO PCT/JP2012/061246 patent/WO2012153648A1/ja not_active Ceased
- 2012-05-07 TW TW101116248A patent/TWI530761B/zh not_active IP Right Cessation
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