JP2012072478A5 - - Google Patents
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- Publication number
- JP2012072478A5 JP2012072478A5 JP2010220263A JP2010220263A JP2012072478A5 JP 2012072478 A5 JP2012072478 A5 JP 2012072478A5 JP 2010220263 A JP2010220263 A JP 2010220263A JP 2010220263 A JP2010220263 A JP 2010220263A JP 2012072478 A5 JP2012072478 A5 JP 2012072478A5
- Authority
- JP
- Japan
- Prior art keywords
- drive mechanism
- drive device
- movement base
- base portion
- side movement
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010220263A JP5639431B2 (ja) | 2010-09-30 | 2010-09-30 | 成膜装置 |
| PCT/JP2011/070119 WO2012043150A1 (ja) | 2010-09-30 | 2011-09-05 | 成膜装置 |
| KR1020137006250A KR101846982B1 (ko) | 2010-09-30 | 2011-09-05 | 성막 장치 |
| CN201180046526.8A CN103154304B (zh) | 2010-09-30 | 2011-09-05 | 成膜装置 |
| TW100134788A TWI585222B (zh) | 2010-09-30 | 2011-09-27 | Film forming device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010220263A JP5639431B2 (ja) | 2010-09-30 | 2010-09-30 | 成膜装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012072478A JP2012072478A (ja) | 2012-04-12 |
| JP2012072478A5 true JP2012072478A5 (https=) | 2013-11-14 |
| JP5639431B2 JP5639431B2 (ja) | 2014-12-10 |
Family
ID=45892623
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010220263A Active JP5639431B2 (ja) | 2010-09-30 | 2010-09-30 | 成膜装置 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP5639431B2 (https=) |
| KR (1) | KR101846982B1 (https=) |
| CN (1) | CN103154304B (https=) |
| TW (1) | TWI585222B (https=) |
| WO (1) | WO2012043150A1 (https=) |
Families Citing this family (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014015633A (ja) * | 2012-07-05 | 2014-01-30 | Sumitomo Heavy Ind Ltd | 成膜装置、及び成膜装置用搬送トレイ |
| JP2014077170A (ja) * | 2012-10-10 | 2014-05-01 | Sumitomo Heavy Ind Ltd | 成膜装置 |
| CN103132016B (zh) * | 2013-02-22 | 2015-05-13 | 京东方科技集团股份有限公司 | 一种膜边调整器 |
| CN104018117A (zh) * | 2013-03-01 | 2014-09-03 | 昆山允升吉光电科技有限公司 | 一种掩模框架及其对应的掩模组件 |
| JP2014177683A (ja) * | 2013-03-15 | 2014-09-25 | Sumitomo Heavy Ind Ltd | 基板搬送トレイ、及び成膜装置 |
| JP6250999B2 (ja) * | 2013-09-27 | 2017-12-20 | キヤノントッキ株式会社 | アライメント方法並びにアライメント装置 |
| CN107002219B (zh) | 2014-12-10 | 2021-09-03 | 应用材料公司 | 掩模布置、在基板上沉积层的设备和对准掩模布置的方法 |
| CN104404466A (zh) * | 2014-12-26 | 2015-03-11 | 合肥京东方光电科技有限公司 | 磁控溅射镀膜方法及系统 |
| WO2016112951A1 (en) * | 2015-01-12 | 2016-07-21 | Applied Materials, Inc. | Holding arrangement for supporting a substrate carrier and a mask carrier during layer deposition in a processing chamber, apparatus for depositing a layer on a substrate, and method for aligning a substrate carrier supporting a substrate and a mask carrier |
| TWI576302B (zh) * | 2015-05-28 | 2017-04-01 | 友達光電股份有限公司 | 板體分離設備及板體分離方法 |
| KR101965370B1 (ko) * | 2016-05-18 | 2019-04-03 | 어플라이드 머티어리얼스, 인코포레이티드 | 캐리어 또는 기판의 운송을 위한 장치 및 방법 |
| KR20180056990A (ko) * | 2016-11-21 | 2018-05-30 | 한국알박(주) | 막 증착 장치 및 방법 |
| KR102359244B1 (ko) * | 2016-11-21 | 2022-02-08 | 한국알박(주) | 막 증착 방법 |
| KR20180056989A (ko) * | 2016-11-21 | 2018-05-30 | 한국알박(주) | 막 증착 장치 및 방법 |
| CN109563608A (zh) * | 2017-02-24 | 2019-04-02 | 应用材料公司 | 用于基板载体和掩模载体的定位配置、用于基板载体和掩模载体的传送系统及其方法 |
| WO2018166634A1 (en) * | 2017-03-17 | 2018-09-20 | Applied Materials,Inc. | Methods of handling a mask device in a vacuum system, mask handling apparatus, and vacuum system |
| US20200251691A1 (en) * | 2017-03-17 | 2020-08-06 | Applied Materials, Inc. | Apparatus for vacuum processing of a substrate, system for vacuum processing of a substrate, and method for transportation of a substrate carrier and a mask carrier in a vacuum chamber |
| CN106987798B (zh) * | 2017-04-17 | 2020-02-11 | 京东方科技集团股份有限公司 | 一种镀膜装置 |
| KR102378672B1 (ko) * | 2017-05-17 | 2022-03-24 | 이매진 코퍼레이션 | 고정밀 섀도 마스크 증착 시스템 및 그 방법 |
| CN109563616B (zh) * | 2017-06-29 | 2021-07-23 | 株式会社爱发科 | 成膜装置 |
| TWI673375B (zh) * | 2017-06-30 | 2019-10-01 | 日商愛發科股份有限公司 | 成膜裝置、遮罩框架、對準方法 |
| KR102223849B1 (ko) * | 2017-10-05 | 2021-03-05 | 가부시키가이샤 아루박 | 스퍼터링 장치 |
| JP6662840B2 (ja) * | 2017-12-11 | 2020-03-11 | 株式会社アルバック | 蒸着装置 |
| JP6662841B2 (ja) * | 2017-12-21 | 2020-03-11 | 株式会社アルバック | 蒸着装置 |
| JP2020518123A (ja) * | 2018-04-03 | 2020-06-18 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 真空チャンバ内でキャリアを位置合わせするための装置および真空システム、ならびにキャリアを位置合わせする方法 |
| WO2019192676A1 (en) * | 2018-04-03 | 2019-10-10 | Applied Materials, Inc. | Arrangement for clamping a carrier to a device |
| CN110557952A (zh) * | 2018-04-03 | 2019-12-10 | 应用材料公司 | 用于在真空腔室中处理载体的设备、真空沉积系统和在真空腔室中处理载体的方法 |
| WO2020030252A1 (en) * | 2018-08-07 | 2020-02-13 | Applied Materials, Inc. | Material deposition apparatus, vacuum deposition system and method of processing a large area substrate |
| JP7222073B2 (ja) * | 2018-08-29 | 2023-02-14 | アプライド マテリアルズ インコーポレイテッド | 第1のキャリア及び第2のキャリアを搬送するための装置、基板を垂直に処理するための処理システム、及びそれらの方法 |
| JP2019206761A (ja) * | 2019-07-09 | 2019-12-05 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 処理チャンバにおいて基板をマスキングするためのマスク構成 |
| KR20230155655A (ko) * | 2022-05-03 | 2023-11-13 | 삼성디스플레이 주식회사 | 표시 장치의 제조장치 및 표시 장치의 제조방법 |
| KR20230155654A (ko) * | 2022-05-03 | 2023-11-13 | 삼성디스플레이 주식회사 | 표시 장치의 제조장치 및 표시 장치의 제조방법 |
| KR102676831B1 (ko) * | 2023-11-14 | 2024-06-20 | 파인원 주식회사 | 블랭크-존 코팅이 가능한 마스크용 트레이 시스템 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3789857B2 (ja) * | 2002-06-25 | 2006-06-28 | トッキ株式会社 | 蒸着装置 |
| JP4463492B2 (ja) * | 2003-04-10 | 2010-05-19 | 株式会社半導体エネルギー研究所 | 製造装置 |
| JP4596794B2 (ja) * | 2004-02-27 | 2010-12-15 | 日立造船株式会社 | 真空蒸着用アライメント装置 |
| JP4609756B2 (ja) | 2005-02-23 | 2011-01-12 | 三井造船株式会社 | 成膜装置のマスク位置合わせ機構および成膜装置 |
| WO2007023552A1 (ja) * | 2005-08-25 | 2007-03-01 | Hitachi Zosen Corporation | 真空蒸着用アライメント装置 |
| JP5074368B2 (ja) * | 2008-12-15 | 2012-11-14 | 株式会社日立ハイテクノロジーズ | 成膜装置 |
| TWI401832B (zh) * | 2008-12-15 | 2013-07-11 | Hitachi High Tech Corp | Organic electroluminescent light making device, film forming apparatus and film forming method, liquid crystal display substrate manufacturing apparatus, and calibration apparatus and calibration method |
| JP2011096393A (ja) * | 2009-10-27 | 2011-05-12 | Hitachi High-Technologies Corp | 有機elデバイス製造装置及びその製造方法並びに成膜装置及び成膜方法 |
-
2010
- 2010-09-30 JP JP2010220263A patent/JP5639431B2/ja active Active
-
2011
- 2011-09-05 CN CN201180046526.8A patent/CN103154304B/zh active Active
- 2011-09-05 KR KR1020137006250A patent/KR101846982B1/ko active Active
- 2011-09-05 WO PCT/JP2011/070119 patent/WO2012043150A1/ja not_active Ceased
- 2011-09-27 TW TW100134788A patent/TWI585222B/zh active
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