JP2012037352A5 - - Google Patents

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Publication number
JP2012037352A5
JP2012037352A5 JP2010177062A JP2010177062A JP2012037352A5 JP 2012037352 A5 JP2012037352 A5 JP 2012037352A5 JP 2010177062 A JP2010177062 A JP 2010177062A JP 2010177062 A JP2010177062 A JP 2010177062A JP 2012037352 A5 JP2012037352 A5 JP 2012037352A5
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JP
Japan
Prior art keywords
ray
rays
detected
optical element
dividing
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JP2010177062A
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English (en)
Japanese (ja)
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JP2012037352A (ja
JP5646906B2 (ja
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Priority claimed from JP2010177062A external-priority patent/JP5646906B2/ja
Priority to JP2010177062A priority Critical patent/JP5646906B2/ja
Priority to US13/809,335 priority patent/US9234856B2/en
Priority to CN2011800379169A priority patent/CN103052876A/zh
Priority to EP11746328.1A priority patent/EP2601516A1/en
Priority to PCT/JP2011/068000 priority patent/WO2012018129A1/en
Publication of JP2012037352A publication Critical patent/JP2012037352A/ja
Publication of JP2012037352A5 publication Critical patent/JP2012037352A5/ja
Publication of JP5646906B2 publication Critical patent/JP5646906B2/ja
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Expired - Fee Related legal-status Critical Current
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JP2010177062A 2010-08-06 2010-08-06 Ｘ線装置およびｘ線測定方法 Expired - Fee Related JP5646906B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2010177062A JP5646906B2 (ja) 2010-08-06 2010-08-06 Ｘ線装置およびｘ線測定方法
PCT/JP2011/068000 WO2012018129A1 (en) 2010-08-06 2011-08-01 X-ray phase contrast imaging using a grating with unequal slit widths
CN2011800379169A CN103052876A (zh) 2010-08-06 2011-08-01 使用具有不等的狭缝宽度的光栅的x射线相衬成像
EP11746328.1A EP2601516A1 (en) 2010-08-06 2011-08-01 X-ray phase contrast imaging using a grating with unequal slit widths
US13/809,335 US9234856B2 (en) 2010-08-06 2011-08-01 X-ray apparatus and X-ray measuring method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010177062A JP5646906B2 (ja) 2010-08-06 2010-08-06 Ｘ線装置およびｘ線測定方法

Publications (3)

Publication Number Publication Date
JP2012037352A JP2012037352A (ja) 2012-02-23
JP2012037352A5 true JP2012037352A5 (enExample) 2013-09-12
JP5646906B2 JP5646906B2 (ja) 2014-12-24

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Family Applications (1)

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JP2010177062A Expired - Fee Related JP5646906B2 (ja) 2010-08-06 2010-08-06 Ｘ線装置およびｘ線測定方法

Country Status (5)

Country Link
US (1) US9234856B2 (enExample)
EP (1) EP2601516A1 (enExample)
JP (1) JP5646906B2 (enExample)
CN (1) CN103052876A (enExample)
WO (1) WO2012018129A1 (enExample)

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JP6038278B2 (ja) * 2013-02-27 2016-12-07 株式会社日立製作所 Ｘ線分析方法及びｘ線撮像装置
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CN109273847B (zh) * 2018-12-18 2019-08-13 瑞声光电科技(常州)有限公司 天线系统及通讯终端
CN114729907B (zh) 2019-09-03 2023-05-23 斯格瑞公司 用于计算机层析x射线荧光成像的系统和方法
US11175243B1 (en) 2020-02-06 2021-11-16 Sigray, Inc. X-ray dark-field in-line inspection for semiconductor samples
US11391679B2 (en) 2020-02-07 2022-07-19 The Board Of Trustees Of The Leland Stanford Junior University Holographic x-ray detection
WO2021237237A1 (en) 2020-05-18 2021-11-25 Sigray, Inc. System and method for x-ray absorption spectroscopy using a crystal analyzer and a plurality of detector elements
JP7640682B2 (ja) 2020-09-17 2025-03-05 シグレイ、インコーポレイテッド Ｘ線を用いた深さ分解計測および分析のためのシステムおよび方法
US12480892B2 (en) 2020-12-07 2025-11-25 Sigray, Inc. High throughput 3D x-ray imaging system using a transmission x-ray source
WO2022126071A1 (en) 2020-12-07 2022-06-16 Sigray, Inc. High throughput 3d x-ray imaging system using a transmission x-ray source
US12360067B2 (en) 2022-03-02 2025-07-15 Sigray, Inc. X-ray fluorescence system and x-ray source with electrically insulative target material
DE112023001408T5 (de) 2022-03-15 2025-02-13 Sigray, Inc. System und verfahren für die kompakte laminographie unter verwendung einer mikrofokus-transmissionsröntgenquelle und eines röntgendetektors mit variabler vergrösserung
CN119173759A (zh) 2022-05-02 2024-12-20 斯格瑞公司 X射线顺序阵列波长色散光谱仪
JP7880802B2 (ja) * 2022-12-08 2026-06-26 株式会社日立製作所 情報処理システム及び位相解析システム
WO2024173256A1 (en) 2023-02-16 2024-08-22 Sigray, Inc. X-ray detector system with at least two stacked flat bragg diffractors
US12181423B1 (en) 2023-09-07 2024-12-31 Sigray, Inc. Secondary image removal using high resolution x-ray transmission sources
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US12429436B2 (en) 2024-01-08 2025-09-30 Sigray, Inc. X-ray analysis system with focused x-ray beam and non-x-ray microscope
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