JP2012037352A5 - - Google Patents

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Publication number
JP2012037352A5
JP2012037352A5 JP2010177062A JP2010177062A JP2012037352A5 JP 2012037352 A5 JP2012037352 A5 JP 2012037352A5 JP 2010177062 A JP2010177062 A JP 2010177062A JP 2010177062 A JP2010177062 A JP 2010177062A JP 2012037352 A5 JP2012037352 A5 JP 2012037352A5
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JP
Japan
Prior art keywords
ray
rays
detected
optical element
dividing
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JP2010177062A
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English (en)
Japanese (ja)
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JP2012037352A (ja
JP5646906B2 (ja
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Priority claimed from JP2010177062A external-priority patent/JP5646906B2/ja
Priority to JP2010177062A priority Critical patent/JP5646906B2/ja
Priority to PCT/JP2011/068000 priority patent/WO2012018129A1/en
Priority to CN2011800379169A priority patent/CN103052876A/zh
Priority to US13/809,335 priority patent/US9234856B2/en
Priority to EP11746328.1A priority patent/EP2601516A1/en
Publication of JP2012037352A publication Critical patent/JP2012037352A/ja
Publication of JP2012037352A5 publication Critical patent/JP2012037352A5/ja
Publication of JP5646906B2 publication Critical patent/JP5646906B2/ja
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Expired - Fee Related legal-status Critical Current
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JP2010177062A 2010-08-06 2010-08-06 Ｘ線装置およびｘ線測定方法 Expired - Fee Related JP5646906B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2010177062A JP5646906B2 (ja) 2010-08-06 2010-08-06 Ｘ線装置およびｘ線測定方法
EP11746328.1A EP2601516A1 (en) 2010-08-06 2011-08-01 X-ray phase contrast imaging using a grating with unequal slit widths
CN2011800379169A CN103052876A (zh) 2010-08-06 2011-08-01 使用具有不等的狭缝宽度的光栅的x射线相衬成像
US13/809,335 US9234856B2 (en) 2010-08-06 2011-08-01 X-ray apparatus and X-ray measuring method
PCT/JP2011/068000 WO2012018129A1 (en) 2010-08-06 2011-08-01 X-ray phase contrast imaging using a grating with unequal slit widths

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010177062A JP5646906B2 (ja) 2010-08-06 2010-08-06 Ｘ線装置およびｘ線測定方法

Publications (3)

Publication Number Publication Date
JP2012037352A JP2012037352A (ja) 2012-02-23
JP2012037352A5 true JP2012037352A5 (enExample) 2013-09-12
JP5646906B2 JP5646906B2 (ja) 2014-12-24

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Family Applications (1)

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JP2010177062A Expired - Fee Related JP5646906B2 (ja) 2010-08-06 2010-08-06 Ｘ線装置およびｘ線測定方法

Country Status (5)

Country Link
US (1) US9234856B2 (enExample)
EP (1) EP2601516A1 (enExample)
JP (1) JP5646906B2 (enExample)
CN (1) CN103052876A (enExample)
WO (1) WO2012018129A1 (enExample)

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US11175243B1 (en) 2020-02-06 2021-11-16 Sigray, Inc. X-ray dark-field in-line inspection for semiconductor samples
US11391679B2 (en) 2020-02-07 2022-07-19 The Board Of Trustees Of The Leland Stanford Junior University Holographic x-ray detection
CN115667896B (zh) 2020-05-18 2024-06-21 斯格瑞公司 使用晶体分析器和多个检测元件的x射线吸收光谱的系统和方法
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US12480892B2 (en) 2020-12-07 2025-11-25 Sigray, Inc. High throughput 3D x-ray imaging system using a transmission x-ray source
KR102927910B1 (ko) 2020-12-07 2026-02-19 시그레이, 아이엔씨. 투과 x-선 소스를 이용한 고처리량 3D x-선 이미징 시스템
US12360067B2 (en) 2022-03-02 2025-07-15 Sigray, Inc. X-ray fluorescence system and x-ray source with electrically insulative target material
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