CN103052876A - 使用具有不等的狭缝宽度的光栅的x射线相衬成像 - Google Patents
使用具有不等的狭缝宽度的光栅的x射线相衬成像 Download PDFInfo
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- CN103052876A CN103052876A CN2011800379169A CN201180037916A CN103052876A CN 103052876 A CN103052876 A CN 103052876A CN 2011800379169 A CN2011800379169 A CN 2011800379169A CN 201180037916 A CN201180037916 A CN 201180037916A CN 103052876 A CN103052876 A CN 103052876A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
- G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
- G01N23/041—Phase-contrast imaging, e.g. using grating interferometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
- G01N23/06—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption
- G01N23/083—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption the radiation being X-rays
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/067—Construction details
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2207/00—Particular details of imaging devices or methods using ionizing electromagnetic radiation such as X-rays or gamma rays
- G21K2207/005—Methods and devices obtaining contrast from non-absorbing interaction of the radiation with matter, e.g. phase contrast
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- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- General Engineering & Computer Science (AREA)
- Toxicology (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Radiology & Medical Imaging (AREA)
- Crystallography & Structural Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Apparatus For Radiation Diagnosis (AREA)
- Measurement Of Radiation (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010-177062 | 2010-08-06 | ||
| JP2010177062A JP5646906B2 (ja) | 2010-08-06 | 2010-08-06 | X線装置およびx線測定方法 |
| PCT/JP2011/068000 WO2012018129A1 (en) | 2010-08-06 | 2011-08-01 | X-ray phase contrast imaging using a grating with unequal slit widths |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103052876A true CN103052876A (zh) | 2013-04-17 |
Family
ID=44584552
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011800379169A Pending CN103052876A (zh) | 2010-08-06 | 2011-08-01 | 使用具有不等的狭缝宽度的光栅的x射线相衬成像 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9234856B2 (enExample) |
| EP (1) | EP2601516A1 (enExample) |
| JP (1) | JP5646906B2 (enExample) |
| CN (1) | CN103052876A (enExample) |
| WO (1) | WO2012018129A1 (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106097288A (zh) * | 2015-04-30 | 2016-11-09 | 卡尔蔡司显微镜有限公司 | 用于生成物体结构的衬度图像的方法及其相关的装置 |
| CN109780993A (zh) * | 2017-11-14 | 2019-05-21 | 骆远 | 微分相位对比显微系统与方法 |
| CN109920577A (zh) * | 2014-07-24 | 2019-06-21 | 佳能株式会社 | 结构体、其制造方法和塔尔博干涉仪 |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB201119257D0 (en) * | 2011-11-08 | 2011-12-21 | Eshtech Ltd | X-ray detection apparatus |
| WO2013160153A1 (de) * | 2012-04-24 | 2013-10-31 | Siemens Aktiengesellschaft | Röntgenvorrichtung |
| WO2013187012A1 (en) * | 2012-06-15 | 2013-12-19 | Canon Kabushiki Kaisha | X-ray apparatus and x-ray measurement method |
| CN102768931B (zh) * | 2012-07-30 | 2015-05-06 | 深圳大学 | 用于大视场x射线相衬成像的x射线源 |
| WO2014132347A1 (ja) * | 2013-02-27 | 2014-09-04 | 株式会社日立製作所 | X線分析方法及びx線撮像装置 |
| US10295485B2 (en) | 2013-12-05 | 2019-05-21 | Sigray, Inc. | X-ray transmission spectrometer system |
| USRE48612E1 (en) | 2013-10-31 | 2021-06-29 | Sigray, Inc. | X-ray interferometric imaging system |
| JP6292988B2 (ja) | 2014-06-12 | 2018-03-14 | キヤノン株式会社 | 物体情報取得方法及び物体情報取得装置 |
| US10393890B2 (en) * | 2015-04-09 | 2019-08-27 | Shimadzu Corporation | X-ray imaging device |
| US10234402B2 (en) | 2017-01-05 | 2019-03-19 | Kla-Tencor Corporation | Systems and methods for defect material classification |
| WO2019236384A1 (en) | 2018-06-04 | 2019-12-12 | Sigray, Inc. | Wavelength dispersive x-ray spectrometer |
| CN112470245B (zh) | 2018-07-26 | 2025-03-18 | 斯格瑞公司 | 高亮度x射线反射源 |
| WO2020051061A1 (en) * | 2018-09-04 | 2020-03-12 | Sigray, Inc. | System and method for x-ray fluorescence with filtering |
| US11056308B2 (en) | 2018-09-07 | 2021-07-06 | Sigray, Inc. | System and method for depth-selectable x-ray analysis |
| CN109273847B (zh) * | 2018-12-18 | 2019-08-13 | 瑞声光电科技(常州)有限公司 | 天线系统及通讯终端 |
| DE112020004169T5 (de) | 2019-09-03 | 2022-05-25 | Sigray, Inc. | System und verfahren zur computergestützten laminografieröntgenfluoreszenz-bildgebung |
| US11175243B1 (en) | 2020-02-06 | 2021-11-16 | Sigray, Inc. | X-ray dark-field in-line inspection for semiconductor samples |
| US11391679B2 (en) | 2020-02-07 | 2022-07-19 | The Board Of Trustees Of The Leland Stanford Junior University | Holographic x-ray detection |
| CN115667896B (zh) | 2020-05-18 | 2024-06-21 | 斯格瑞公司 | 使用晶体分析器和多个检测元件的x射线吸收光谱的系统和方法 |
| US11549895B2 (en) | 2020-09-17 | 2023-01-10 | Sigray, Inc. | System and method using x-rays for depth-resolving metrology and analysis |
| US12480892B2 (en) | 2020-12-07 | 2025-11-25 | Sigray, Inc. | High throughput 3D x-ray imaging system using a transmission x-ray source |
| WO2022126071A1 (en) | 2020-12-07 | 2022-06-16 | Sigray, Inc. | High throughput 3d x-ray imaging system using a transmission x-ray source |
| US12360067B2 (en) | 2022-03-02 | 2025-07-15 | Sigray, Inc. | X-ray fluorescence system and x-ray source with electrically insulative target material |
| WO2023177981A1 (en) | 2022-03-15 | 2023-09-21 | Sigray, Inc. | System and method for compact laminography utilizing microfocus transmission x-ray source and variable magnification x-ray detector |
| WO2023215204A1 (en) | 2022-05-02 | 2023-11-09 | Sigray, Inc. | X-ray sequential array wavelength dispersive spectrometer |
| US12209977B2 (en) | 2023-02-16 | 2025-01-28 | Sigray, Inc. | X-ray detector system with at least two stacked flat Bragg diffractors |
| US12181423B1 (en) | 2023-09-07 | 2024-12-31 | Sigray, Inc. | Secondary image removal using high resolution x-ray transmission sources |
| US12429437B2 (en) | 2023-11-07 | 2025-09-30 | Sigray, Inc. | System and method for x-ray absorption spectroscopy using spectral information from two orthogonal planes |
| US12429436B2 (en) | 2024-01-08 | 2025-09-30 | Sigray, Inc. | X-ray analysis system with focused x-ray beam and non-x-ray microscope |
| US12431256B2 (en) | 2024-02-15 | 2025-09-30 | Sigray, Inc. | System and method for generating a focused x-ray beam |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001212127A (ja) * | 2000-02-03 | 2001-08-07 | Ge Yokogawa Medical Systems Ltd | X線ctシステム及びその制御方法及び記憶媒体 |
| CN101011254A (zh) * | 2006-02-01 | 2007-08-08 | 西门子公司 | 用于产生相位对比图像的x射线装置的焦点/检测器系统 |
| US20070183584A1 (en) * | 2006-02-01 | 2007-08-09 | Joachim Baumann | Focus-detector arrangement with X-ray optical grating for phase contrast measurement |
| JP2007203063A (ja) * | 2006-02-01 | 2007-08-16 | Siemens Ag | X線装置の焦点‐検出器システム |
| EP1879020A1 (en) * | 2006-07-12 | 2008-01-16 | Paul Scherrer Institut | X-ray interferometer for phase contrast imaging |
| WO2008029107A2 (en) * | 2006-09-08 | 2008-03-13 | Ucl Business Plc | Phase contrast imaging |
| CN101257851A (zh) * | 2005-06-06 | 2008-09-03 | 保罗·谢勒学院 | 用于利用不相干的多色x射线源进行定量相衬成像和断层照相术的干涉仪 |
| WO2010082688A2 (en) * | 2009-01-15 | 2010-07-22 | Canon Kabushiki Kaisha | X-ray imaging apparatus and method of x-ray imaging |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AUPN201295A0 (en) * | 1995-03-28 | 1995-04-27 | Commonwealth Scientific And Industrial Research Organisation | Simplified conditions and configurations for phase-contrast imaging with hard x-rays |
| JP2002102215A (ja) * | 2000-09-27 | 2002-04-09 | Konica Corp | 乳房x画像撮影装置 |
| JP2006058279A (ja) * | 2004-07-23 | 2006-03-02 | Osaka Industrial Promotion Organization | X線シアリング干渉計 |
| JP4512660B2 (ja) * | 2008-03-12 | 2010-07-28 | キヤノン株式会社 | X線撮像装置、x線撮像方法、x線撮像装置の制御方法 |
| JP4847568B2 (ja) * | 2008-10-24 | 2011-12-28 | キヤノン株式会社 | X線撮像装置およびx線撮像方法 |
| GB2479329B (en) * | 2009-01-15 | 2013-08-14 | Canon Kk | X-ray imaging apparatus and method of X-ray imaging |
| JP2010177062A (ja) | 2009-01-30 | 2010-08-12 | Hitachi Ltd | リチウム二次電池 |
| JP2010249533A (ja) * | 2009-04-10 | 2010-11-04 | Canon Inc | タルボ・ロー干渉計用の線源格子 |
| JP5675169B2 (ja) | 2009-06-18 | 2015-02-25 | キヤノン株式会社 | X線撮像装置およびx線撮像方法 |
| JP5697370B2 (ja) | 2009-07-24 | 2015-04-08 | キヤノン株式会社 | X線撮像装置 |
| JP5269041B2 (ja) | 2009-12-04 | 2013-08-21 | キヤノン株式会社 | X線撮像装置およびx線撮像方法 |
| JP2013116270A (ja) * | 2011-12-05 | 2013-06-13 | Canon Inc | X線撮像装置 |
-
2010
- 2010-08-06 JP JP2010177062A patent/JP5646906B2/ja not_active Expired - Fee Related
-
2011
- 2011-08-01 CN CN2011800379169A patent/CN103052876A/zh active Pending
- 2011-08-01 US US13/809,335 patent/US9234856B2/en not_active Expired - Fee Related
- 2011-08-01 EP EP11746328.1A patent/EP2601516A1/en not_active Withdrawn
- 2011-08-01 WO PCT/JP2011/068000 patent/WO2012018129A1/en not_active Ceased
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001212127A (ja) * | 2000-02-03 | 2001-08-07 | Ge Yokogawa Medical Systems Ltd | X線ctシステム及びその制御方法及び記憶媒体 |
| CN101257851A (zh) * | 2005-06-06 | 2008-09-03 | 保罗·谢勒学院 | 用于利用不相干的多色x射线源进行定量相衬成像和断层照相术的干涉仪 |
| CN101011254A (zh) * | 2006-02-01 | 2007-08-08 | 西门子公司 | 用于产生相位对比图像的x射线装置的焦点/检测器系统 |
| US20070183584A1 (en) * | 2006-02-01 | 2007-08-09 | Joachim Baumann | Focus-detector arrangement with X-ray optical grating for phase contrast measurement |
| JP2007203063A (ja) * | 2006-02-01 | 2007-08-16 | Siemens Ag | X線装置の焦点‐検出器システム |
| EP1879020A1 (en) * | 2006-07-12 | 2008-01-16 | Paul Scherrer Institut | X-ray interferometer for phase contrast imaging |
| WO2008029107A2 (en) * | 2006-09-08 | 2008-03-13 | Ucl Business Plc | Phase contrast imaging |
| WO2010082688A2 (en) * | 2009-01-15 | 2010-07-22 | Canon Kabushiki Kaisha | X-ray imaging apparatus and method of x-ray imaging |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109920577A (zh) * | 2014-07-24 | 2019-06-21 | 佳能株式会社 | 结构体、其制造方法和塔尔博干涉仪 |
| CN109920577B (zh) * | 2014-07-24 | 2024-01-19 | 佳能株式会社 | 结构体、其制造方法和塔尔博干涉仪 |
| CN106097288A (zh) * | 2015-04-30 | 2016-11-09 | 卡尔蔡司显微镜有限公司 | 用于生成物体结构的衬度图像的方法及其相关的装置 |
| CN106097288B (zh) * | 2015-04-30 | 2020-12-04 | 卡尔蔡司显微镜有限公司 | 用于生成物体结构的衬度图像的方法及其相关的装置 |
| CN109780993A (zh) * | 2017-11-14 | 2019-05-21 | 骆远 | 微分相位对比显微系统与方法 |
| CN109780993B (zh) * | 2017-11-14 | 2021-06-22 | 骆远 | 微分相位对比显微系统与方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2012037352A (ja) | 2012-02-23 |
| US9234856B2 (en) | 2016-01-12 |
| US20130108020A1 (en) | 2013-05-02 |
| EP2601516A1 (en) | 2013-06-12 |
| JP5646906B2 (ja) | 2014-12-24 |
| WO2012018129A1 (en) | 2012-02-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20130417 |