JP2016523157A5 - - Google Patents

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Publication number
JP2016523157A5
JP2016523157A5 JP2016522531A JP2016522531A JP2016523157A5 JP 2016523157 A5 JP2016523157 A5 JP 2016523157A5 JP 2016522531 A JP2016522531 A JP 2016522531A JP 2016522531 A JP2016522531 A JP 2016522531A JP 2016523157 A5 JP2016523157 A5 JP 2016523157A5
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JP
Japan
Prior art keywords
ray
calibration
diffraction grating
filter
grating
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JP2016522531A
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English (en)
Japanese (ja)
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JP2016523157A (ja
JP6261730B2 (ja
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Priority claimed from PCT/EP2014/063679 external-priority patent/WO2014207193A1/en
Publication of JP2016523157A publication Critical patent/JP2016523157A/ja
Publication of JP2016523157A5 publication Critical patent/JP2016523157A5/ja
Application granted granted Critical
Publication of JP6261730B2 publication Critical patent/JP6261730B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2016522531A 2013-06-28 2014-06-27 スリット走査位相コントラストイメージングにおける補正 Expired - Fee Related JP6261730B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP13174345.2 2013-06-28
EP13174345 2013-06-28
PCT/EP2014/063679 WO2014207193A1 (en) 2013-06-28 2014-06-27 Correction in slit-scanning phase contrast imaging

Publications (3)

Publication Number Publication Date
JP2016523157A JP2016523157A (ja) 2016-08-08
JP2016523157A5 true JP2016523157A5 (enExample) 2017-08-10
JP6261730B2 JP6261730B2 (ja) 2018-01-17

Family

ID=48699640

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016522531A Expired - Fee Related JP6261730B2 (ja) 2013-06-28 2014-06-27 スリット走査位相コントラストイメージングにおける補正

Country Status (5)

Country Link
US (1) US9839407B2 (enExample)
EP (1) EP3013233B1 (enExample)
JP (1) JP6261730B2 (enExample)
CN (1) CN105338901B (enExample)
WO (1) WO2014207193A1 (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015165765A1 (en) * 2014-05-02 2015-11-05 Koninklijke Philips N.V. Method to calibrate a photon detector, absorption filter assembly and imaging apparatus
EP3149459A1 (en) * 2014-05-27 2017-04-05 Koninklijke Philips N.V. Calibration hardware phantom for differential phase contrast imaging
JP6451400B2 (ja) * 2015-02-26 2019-01-16 コニカミノルタ株式会社 画像処理システム及び画像処理装置
US10779776B2 (en) * 2015-12-01 2020-09-22 Koninklijke Philips N.V. Apparatus for X-ray imaging an object
WO2017216354A1 (en) * 2016-06-16 2017-12-21 Koninklijke Philips N.V. Apparatus for x-ray imaging an object
CN107543835B (zh) * 2016-06-27 2021-05-14 上海一影信息科技有限公司 多能成像方法、装置及其系统
WO2018114734A1 (en) * 2016-12-22 2018-06-28 Koninklijke Philips N.V. Phantom device, dark field imaging system and method for acquiring a dark field image
US11073487B2 (en) * 2017-05-11 2021-07-27 Kla-Tencor Corporation Methods and systems for characterization of an x-ray beam with high spatial resolution
JP6844461B2 (ja) * 2017-07-20 2021-03-17 株式会社島津製作所 Ｘ線位相イメージング装置および情報取得手法
EP3459461A1 (en) * 2017-09-25 2019-03-27 Koninklijke Philips N.V. X-ray imaging reference scan
EP3498170A1 (en) * 2017-12-12 2019-06-19 Koninklijke Philips N.V. Device and method for aligning an x-ray grating to an x-ray radiation source, and x-ray image acquisition system
US10816486B2 (en) * 2018-03-28 2020-10-27 Kla-Tencor Corporation Multilayer targets for calibration and alignment of X-ray based measurement systems
JP2021156578A (ja) * 2018-06-27 2021-10-07 株式会社ニコン Ｘ線装置、ｘ線画像生成方法および構造物の製造方法
CN111096761B (zh) * 2018-10-29 2024-03-08 上海西门子医疗器械有限公司 修正楔形滤波器散射的方法、装置和相关设备
EP3821810A1 (en) * 2019-11-13 2021-05-19 Koninklijke Philips N.V. Active gratings position tracking in gratings-based phase-contrast and dark-field imaging
US12232896B2 (en) * 2020-06-10 2025-02-25 Siemens Shanghai Medical Equipment Ltd. Method and apparatus for determining target location of single-slot collimating plate and collimator assembly

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2442722B1 (en) 2009-06-16 2017-03-29 Koninklijke Philips N.V. Correction method for differential phase contrast imaging
JP2013513418A (ja) * 2009-12-10 2013-04-22 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 微分位相コントラストイメージングシステム
CN102781327B (zh) * 2009-12-10 2015-06-17 皇家飞利浦电子股份有限公司 相衬成像
JP2012090944A (ja) 2010-03-30 2012-05-17 Fujifilm Corp 放射線撮影システム及び放射線撮影方法
CN102221565B (zh) 2010-04-19 2013-06-12 清华大学 X射线源光栅步进成像系统与成像方法
BR112013014562A2 (pt) * 2010-12-13 2017-07-04 Koninl Philips Electronics Nv método de análise de uma região de interesse em um objeto, dispositivo de análise de uma região de interesse em um objeto, produto de programa de computador e meio legível por computador
JP2012143549A (ja) 2010-12-21 2012-08-02 Fujifilm Corp 放射線画像生成方法および放射線画像撮影装置
JP6353361B2 (ja) 2011-07-04 2018-07-04 コーニンクレッカ フィリップス エヌ ヴェＫｏｎｉｎｋｌｉｊｋｅ Ｐｈｉｌｉｐｓ Ｎ．Ｖ． 位相コントラストイメージング装置

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