JP2016017966A5 - - Google Patents

Download PDF

Info

Publication number
JP2016017966A5
JP2016017966A5 JP2015137413A JP2015137413A JP2016017966A5 JP 2016017966 A5 JP2016017966 A5 JP 2016017966A5 JP 2015137413 A JP2015137413 A JP 2015137413A JP 2015137413 A JP2015137413 A JP 2015137413A JP 2016017966 A5 JP2016017966 A5 JP 2016017966A5
Authority
JP
Japan
Prior art keywords
sample
detector
scanning
calibration
beam pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2015137413A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016017966A (ja
JP6110439B2 (ja
Filing date
Publication date
Priority claimed from EP14176529.7A external-priority patent/EP2966668B1/en
Application filed filed Critical
Publication of JP2016017966A publication Critical patent/JP2016017966A/ja
Publication of JP2016017966A5 publication Critical patent/JP2016017966A5/ja
Application granted granted Critical
Publication of JP6110439B2 publication Critical patent/JP6110439B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2015137413A 2014-07-10 2015-07-09 走査型透過荷電粒子顕微鏡の校正方法 Active JP6110439B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP14176529.7 2014-07-10
EP14176529.7A EP2966668B1 (en) 2014-07-10 2014-07-10 Method of calibrating a scanning transmission charged-particle microscope

Publications (3)

Publication Number Publication Date
JP2016017966A JP2016017966A (ja) 2016-02-01
JP2016017966A5 true JP2016017966A5 (enExample) 2016-12-08
JP6110439B2 JP6110439B2 (ja) 2017-04-05

Family

ID=51162576

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015137413A Active JP6110439B2 (ja) 2014-07-10 2015-07-09 走査型透過荷電粒子顕微鏡の校正方法

Country Status (4)

Country Link
US (1) US9396907B2 (enExample)
EP (1) EP2966668B1 (enExample)
JP (1) JP6110439B2 (enExample)
CN (1) CN105261544B (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB201715902D0 (en) * 2017-09-29 2017-11-15 Oxford Instr Plc Improved system for electron diffraction analysis
EP3531439B1 (en) * 2018-02-22 2020-06-24 FEI Company Intelligent pre-scan in scanning transmission charged particle microscopy
JP7138066B2 (ja) * 2018-03-20 2022-09-15 テスカン ブルノ エスアールオー 歳差電子回折データマッピングのために走査型透過電子顕微鏡を自動的にアライメントする方法
US12236603B2 (en) 2020-02-12 2025-02-25 Samantree Medical Sa Systems and methods for imaging samples with reduced sample motion artifacts
US11263510B2 (en) * 2020-07-15 2022-03-01 GM Global Technology Operations LLC Method for performing measurements of dendritic structures for all magnifications and camera resolutions of microscopes
JP2024531132A (ja) * 2021-08-04 2024-08-29 サマンツリー メディカル エスアー 並列撮像システムでライブ試料モニタリング情報を提供するシステム及び方法
EP4345447A1 (en) 2022-09-30 2024-04-03 Fei Company A method of automated data acquisition for a transmission electron microscope

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6807314B1 (en) * 1999-07-02 2004-10-19 General Phosphorix, Llc Method of precision calibration of a microscope and the like
JP4434446B2 (ja) * 2000-07-21 2010-03-17 Ｏｋｉセミコンダクタ株式会社 走査型電子顕微鏡の校正方法
US6770867B2 (en) 2001-06-29 2004-08-03 Fei Company Method and apparatus for scanned instrument calibration
JP2005520281A (ja) 2001-07-13 2005-07-07 ナノファクトリー インストルメンツ アーベー 顕微鏡のひずみの影響を低減するためのデバイス
US7164128B2 (en) * 2003-11-25 2007-01-16 Hitachi High-Technologies Corporation Method and apparatus for observing a specimen
JP4587742B2 (ja) * 2004-08-23 2010-11-24 株式会社日立ハイテクノロジーズ 荷電粒子線顕微方法及び荷電粒子線応用装置
CN101461026B (zh) * 2006-06-07 2012-01-18 Fei公司 与包含真空室的装置一起使用的滑动轴承
JP4801518B2 (ja) * 2006-07-07 2011-10-26 株式会社日立ハイテクノロジーズ 荷電粒子線顕微方法および荷電粒子線装置
JP5151277B2 (ja) * 2007-07-04 2013-02-27 富士通株式会社 試料観察装置とその補正方法
EP2166557A1 (en) 2008-09-22 2010-03-24 FEI Company Method for correcting distortions in a particle-optical apparatus
EP2197018A1 (en) 2008-12-12 2010-06-16 FEI Company Method for determining distortions in a particle-optical apparatus
EP2511936B1 (en) 2011-04-13 2013-10-02 Fei Company Distortion free stigmation of a TEM
EP2584584A1 (en) * 2011-10-19 2013-04-24 FEI Company Method for adjusting a STEM equipped with an aberration corrector
US8598527B2 (en) * 2011-11-22 2013-12-03 Mochii, Inc. Scanning transmission electron microscopy
US9188555B2 (en) 2012-07-30 2015-11-17 Fei Company Automated EDS standards calibration

Similar Documents

Publication Publication Date Title
JP2016017966A5 (enExample)
CN110621985B (zh) X线计算机断层装置
CN104251870B (zh) 衍射成像
KR101594794B1 (ko) 엑스선 회절장치 및 엑스선 회절측정방법
JP2010067533A5 (enExample)
US8754935B2 (en) Microstructure inspection method, microstructure inspection apparatus, and microstructure inspection program
JP2013542401A (ja) 形状測定装置、構造物の製造方法及び構造物製造システム
JP2016523157A5 (enExample)
JP5713357B2 (ja) Ｘ線応力測定方法とその装置
JP2012122746A5 (enExample)
JP2019128163A (ja) 計測用ｘ線ｃｔ装置、及び、その校正方法
JP2012104426A5 (enExample)
JP6457574B2 (ja) 計測装置
JP6242185B2 (ja) 補正情報生成方法および補正情報生成装置
JP2016502119A (ja) 面内斜入射回折を用いた表面マッピングのための装置、および、方法
JP5535095B2 (ja) ワーク寸法測定装置
KR100956873B1 (ko) Ｘ선을 이용한 검사 장치
US9562867B2 (en) Optical axis adjustment device for X-ray analyzer
JP5145854B2 (ja) 試料分析装置、試料分析方法および試料分析プログラム
JP2009074849A5 (enExample)
JP6198406B2 (ja) マイクロ回折方法及び装置
JP6666670B2 (ja) 曲面を基準面とする三次元形状計測方法
JP4313322B2 (ja) 欠陥粒子測定装置および欠陥粒子測定方法
JP2003322512A (ja) 供試体の寸法測定装置
JP2009276142A (ja) 放射線検査システム及び放射線検査の撮像方法