JP2011530145A5 - - Google Patents

Download PDF

Info

Publication number
JP2011530145A5
JP2011530145A5 JP2011521340A JP2011521340A JP2011530145A5 JP 2011530145 A5 JP2011530145 A5 JP 2011530145A5 JP 2011521340 A JP2011521340 A JP 2011521340A JP 2011521340 A JP2011521340 A JP 2011521340A JP 2011530145 A5 JP2011530145 A5 JP 2011530145A5
Authority
JP
Japan
Prior art keywords
detector
electron microscope
direct impact
microscope signal
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011521340A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011530145A (ja
JP5350478B2 (ja
Filing date
Publication date
Priority claimed from US12/184,995 external-priority patent/US7952073B2/en
Application filed filed Critical
Publication of JP2011530145A publication Critical patent/JP2011530145A/ja
Publication of JP2011530145A5 publication Critical patent/JP2011530145A5/ja
Application granted granted Critical
Publication of JP5350478B2 publication Critical patent/JP5350478B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2011521340A 2008-08-01 2009-07-30 電子顕微鏡に使用される直接衝撃検出器および二次検出器を含む装置 Active JP5350478B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/184,995 US7952073B2 (en) 2008-08-01 2008-08-01 Apparatus and method including a direct bombardment detector and a secondary detector for use in electron microscopy
US12/184,995 2008-08-01
PCT/US2009/052309 WO2010014850A2 (en) 2008-08-01 2009-07-30 Apparatus and method including a direct bombardment detector and a secondary detector for use in electron microscopy

Publications (3)

Publication Number Publication Date
JP2011530145A JP2011530145A (ja) 2011-12-15
JP2011530145A5 true JP2011530145A5 (enExample) 2012-02-02
JP5350478B2 JP5350478B2 (ja) 2013-11-27

Family

ID=41165553

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011521340A Active JP5350478B2 (ja) 2008-08-01 2009-07-30 電子顕微鏡に使用される直接衝撃検出器および二次検出器を含む装置

Country Status (4)

Country Link
US (1) US7952073B2 (enExample)
EP (2) EP2426694B1 (enExample)
JP (1) JP5350478B2 (enExample)
WO (1) WO2010014850A2 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5540088B2 (ja) * 2009-06-26 2014-07-02 ガタン インコーポレイテッド 薄い電子感受性層を有する撮像電子検出器において後方散乱電子と入射電子とを弁別する方法
JP5065516B2 (ja) * 2010-08-04 2012-11-07 エフ イー アイ カンパニ 薄い電子検出器における後方散乱の減少
EP2509097A1 (en) * 2011-04-07 2012-10-10 FEI Company Method of protecting a radiation detector in a charged particle instrument
WO2013013134A2 (en) 2011-07-21 2013-01-24 The Trustees Of Columbia University In The City Of New York Method of collecting and processing electron diffraction data
JP6093865B2 (ja) * 2013-02-28 2017-03-08 ダイレクト エレクトロン エルピーＤｉｒｅｃｔ Ｅｌｅｃｔｒｏｎ，Ｌｐ イメージシーケンスのイメージ同士を組み合わせることによる試料の電子ビームイメージングの方法
CN106796861B (zh) * 2014-04-17 2019-05-03 加坦公司 混合能量转换与处理检测器
CN105376723B (zh) * 2014-08-21 2019-06-14 中兴通讯股份有限公司 一种实现无线链路处理的方法、基站及终端
JP6914978B2 (ja) * 2019-02-26 2021-08-04 日本電子株式会社 試料交換装置及び荷電粒子線装置
NL2022756B1 (en) * 2019-03-18 2020-09-25 Delmic Ip B V Integrated optical and charged particle inspection apparatus
CA3215592A1 (en) * 2021-04-16 2022-10-20 Ruth Shewmon Bloom Arbitrary electron dose waveforms for electron microscopy
US20230179885A1 (en) * 2021-12-08 2023-06-08 Fei Company Methods and Systems for Processing of Microscopy Images
US12237147B2 (en) 2023-01-31 2025-02-25 Integrated Dynamic Electron Solutions, Inc. Methods and systems for event modulated electron microscopy

Family Cites Families (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4038543A (en) * 1975-07-08 1977-07-26 Siemens Aktiengesellschaft Scanning transmission electron microscope including an improved image detector
JPS5248964A (en) 1975-10-17 1977-04-19 Hitachi Ltd Transmission-type scanning electronic microscope
JPS59163506A (ja) * 1983-03-09 1984-09-14 Hitachi Ltd 電子ビ−ム測長装置
US4588890A (en) * 1984-12-31 1986-05-13 International Business Machines Corporation Apparatus and method for composite image formation by scanning electron beam
JPH01117259A (ja) * 1987-10-30 1989-05-10 Fuji Photo Film Co Ltd 電子顕微鏡
US4847947A (en) * 1988-04-11 1989-07-18 Tsong Chi Lin Base for setting a hinge
JPH0225737A (ja) * 1988-07-15 1990-01-29 Hitachi Ltd 表面分析方法および装置
JP2793818B2 (ja) * 1988-10-24 1998-09-03 株式会社日立製作所 表面分析方法およびその装置
JP2717429B2 (ja) * 1989-01-24 1998-02-18 富士写真フイルム株式会社 電子顕微鏡像記録読取方法
US4941980A (en) * 1989-02-17 1990-07-17 Opal, Inc. System for measuring a topographical feature on a specimen
US4958079A (en) * 1989-02-21 1990-09-18 Galileo Electro-Optics Corps. Detector for scanning electron microscopy apparatus
US5097127A (en) * 1990-02-23 1992-03-17 Ibm Corporation Multiple detector system for specimen inspection using high energy backscatter electrons
DE19649514A1 (de) * 1996-11-29 1998-06-04 Bosch Gmbh Robert Handwerkzeugmaschine
US6184526B1 (en) 1997-01-08 2001-02-06 Nikon Corporation Apparatus and method for inspecting predetermined region on surface of specimen using electron beam
JP3434165B2 (ja) * 1997-04-18 2003-08-04 株式会社日立製作所 走査電子顕微鏡
DE19828476A1 (de) * 1998-06-26 1999-12-30 Leo Elektronenmikroskopie Gmbh Teilchenstrahlgerät
US6642520B2 (en) * 1999-04-13 2003-11-04 Kabushiki Kaisha Topcon Scanning electron microscope
US6583413B1 (en) * 1999-09-01 2003-06-24 Hitachi, Ltd. Method of inspecting a circuit pattern and inspecting instrument
JP2001093455A (ja) * 1999-09-21 2001-04-06 Nikon Corp 電子ビーム装置
JP4073149B2 (ja) * 2000-05-26 2008-04-09 株式会社日立製作所 電子線装置
JP4434446B2 (ja) * 2000-07-21 2010-03-17 Ｏｋｉセミコンダクタ株式会社 走査型電子顕微鏡の校正方法
EP1358623B1 (en) * 2000-12-15 2011-03-16 Kla Tencor Corporation Method and apparatus for inspecting a substrate
DE10156275B4 (de) * 2001-11-16 2006-08-03 Leo Elektronenmikroskopie Gmbh Detektoranordnung und Detektionsverfahren
JP2003331770A (ja) * 2002-05-15 2003-11-21 Seiko Instruments Inc 電子線装置
JP2004039453A (ja) * 2002-07-03 2004-02-05 Seiko Instruments Inc 微細ステンシル構造修正装置
US6812462B1 (en) * 2003-02-21 2004-11-02 Kla-Tencor Technologies Corporation Dual electron beam instrument for multi-perspective
DE60332808D1 (de) * 2003-03-24 2010-07-15 Integrated Circuit Testing Ladungsträgerstrahlvorrichtung
PL207199B1 (pl) * 2003-04-17 2010-11-30 Politechnika Wroclawska Układ detekcyjny elektronów wtórnych do skaningowego mikroskopu elektronowego
DE10317894B9 (de) * 2003-04-17 2007-03-22 Leo Elektronenmikroskopie Gmbh Fokussiersystem für geladene Teilchen, Elektronenmikroskopiesystem und Elektronenmikroskopieverfahren
WO2004099740A2 (en) * 2003-05-08 2004-11-18 Council For The Central Laboratory Of The Research Councils Accelerated particle and high energy radiation sensor
US7601956B2 (en) 2003-09-02 2009-10-13 Avilov Anatoly Sergeevich Method for measuring diffraction patterns from a transmission electron microscopy to determine crystal structures and a device therefor
WO2005098895A2 (en) 2004-04-02 2005-10-20 California Institute Of Technology Method and system for ultrafast photoelectron microscope
US7135678B2 (en) * 2004-07-09 2006-11-14 Credence Systems Corporation Charged particle guide
EP1619495A1 (en) 2004-07-23 2006-01-25 Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO Method and Apparatus for inspecting a specimen surface and use of fluorescent materials
US7262411B2 (en) * 2004-12-08 2007-08-28 The Regents Of The University Of California Direct collection transmission electron microscopy
JP5403852B2 (ja) * 2005-08-12 2014-01-29 株式会社荏原製作所 検出装置及び検査装置
JP4908934B2 (ja) * 2006-06-08 2012-04-04 株式会社日立ハイテクノロジーズ 半導体ウェーハ検査装置および半導体ウェーハ検査方法

Similar Documents

Publication Publication Date Title
CN105158789B (zh) 一种空间分辨辐射流探测设备
KR101666688B1 (ko) 복합 구조물의 비파괴 검사 장치 및 비파괴 검사 방법
JP6397690B2 (ja) Ｘ線透過検査装置及び異物検出方法
JP2010500576A5 (enExample)
JP5553300B2 (ja) 蛍光ｘ線検査装置及び蛍光ｘ線検査方法
JP2012053048A5 (ja) 位置検出装置、位置検出方法、露光装置、露光方法、およびデバイス製造方法
JP2013500113A5 (enExample)
JP2009182253A5 (enExample)
WO2010014850A3 (en) Apparatus and method including a direct bombardment detector and a secondary detector for use in electron microscopy
JP2009252854A5 (enExample)
JP6783456B2 (ja) Ｘ線透過検査装置
JP6411775B2 (ja) Ｘ線撮像システムおよびｘ線撮像方法
JP4908283B2 (ja) 放射線画像撮影装置及び画素欠陥情報取得方法
Turkoglu et al. A low-cost neutron radiography device
CN101571384B (zh) 零点标定装置及其测量方法
JP2014169981A (ja) 表面汚染測定装置
Taketani et al. Quantification of localized water image in under-film corroded steel with high spatial resolution, high time resolution, and wide view by neutron radiography
JP2012021900A5 (enExample)
US20190302277A1 (en) Detector strip for radiographic film
JP2011232163A5 (enExample)
CN204989494U (zh) 一种空间分辨辐射流探测设备
CN209182267U (zh) 一种用于水体质量检测的中子探测装置
Ren et al. Calibration of the linear response range of x-ray imaging plates and their reader based on image grayscale values
JP2008004596A5 (enExample)
JP2004061479A (ja) Ｘ線異物検出装置