JP5350478B2 - 電子顕微鏡に使用される直接衝撃検出器および二次検出器を含む装置 - Google Patents

電子顕微鏡に使用される直接衝撃検出器および二次検出器を含む装置 Download PDF

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JP5350478B2
JP5350478B2 JP2011521340A JP2011521340A JP5350478B2 JP 5350478 B2 JP5350478 B2 JP 5350478B2 JP 2011521340 A JP2011521340 A JP 2011521340A JP 2011521340 A JP2011521340 A JP 2011521340A JP 5350478 B2 JP5350478 B2 JP 5350478B2
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detector
electron microscope
direct impact
sample
electron
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JP2011530145A (ja
JP2011530145A5 (enExample
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ビー ビルホーン、ロバート
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Direct Electron LP
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Direct Electron LP
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/043—Beam blanking
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2441—Semiconductor detectors, e.g. diodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2443—Scintillation detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24455—Transmitted particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2446—Position sensitive detectors
    • H01J2237/2447—Imaging plates

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2011521340A 2008-08-01 2009-07-30 電子顕微鏡に使用される直接衝撃検出器および二次検出器を含む装置 Active JP5350478B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/184,995 US7952073B2 (en) 2008-08-01 2008-08-01 Apparatus and method including a direct bombardment detector and a secondary detector for use in electron microscopy
US12/184,995 2008-08-01
PCT/US2009/052309 WO2010014850A2 (en) 2008-08-01 2009-07-30 Apparatus and method including a direct bombardment detector and a secondary detector for use in electron microscopy

Publications (3)

Publication Number Publication Date
JP2011530145A JP2011530145A (ja) 2011-12-15
JP2011530145A5 JP2011530145A5 (enExample) 2012-02-02
JP5350478B2 true JP5350478B2 (ja) 2013-11-27

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JP2011521340A Active JP5350478B2 (ja) 2008-08-01 2009-07-30 電子顕微鏡に使用される直接衝撃検出器および二次検出器を含む装置

Country Status (4)

Country Link
US (1) US7952073B2 (enExample)
EP (2) EP2426694B1 (enExample)
JP (1) JP5350478B2 (enExample)
WO (1) WO2010014850A2 (enExample)

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JP5065516B2 (ja) * 2010-08-04 2012-11-07 エフ イー アイ カンパニ 薄い電子検出器における後方散乱の減少
EP2509097A1 (en) * 2011-04-07 2012-10-10 FEI Company Method of protecting a radiation detector in a charged particle instrument
WO2013013134A2 (en) 2011-07-21 2013-01-24 The Trustees Of Columbia University In The City Of New York Method of collecting and processing electron diffraction data
WO2014134400A1 (en) * 2013-02-28 2014-09-04 Direct Electron, Lp Method of electron beam imaging of a specimen by combining images of an image sequence
JP6546933B2 (ja) * 2014-04-17 2019-07-17 ガタン インコーポレイテッドＧａｔａｎ，Ｉｎｃ． ハイブリッドエネルギー変換器
CN105376723B (zh) * 2014-08-21 2019-06-14 中兴通讯股份有限公司 一种实现无线链路处理的方法、基站及终端
JP6914978B2 (ja) * 2019-02-26 2021-08-04 日本電子株式会社 試料交換装置及び荷電粒子線装置
NL2022756B1 (en) * 2019-03-18 2020-09-25 Delmic Ip B V Integrated optical and charged particle inspection apparatus
CA3215592A1 (en) * 2021-04-16 2022-10-20 Ruth Shewmon Bloom Arbitrary electron dose waveforms for electron microscopy
US20230179885A1 (en) * 2021-12-08 2023-06-08 Fei Company Methods and Systems for Processing of Microscopy Images
US12237147B2 (en) 2023-01-31 2025-02-25 Integrated Dynamic Electron Solutions, Inc. Methods and systems for event modulated electron microscopy

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JPH01117259A (ja) * 1987-10-30 1989-05-10 Fuji Photo Film Co Ltd 電子顕微鏡
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JPH0225737A (ja) * 1988-07-15 1990-01-29 Hitachi Ltd 表面分析方法および装置
JP2793818B2 (ja) * 1988-10-24 1998-09-03 株式会社日立製作所 表面分析方法およびその装置
JP2717429B2 (ja) * 1989-01-24 1998-02-18 富士写真フイルム株式会社 電子顕微鏡像記録読取方法
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Also Published As

Publication number Publication date
JP2011530145A (ja) 2011-12-15
EP2311064A2 (en) 2011-04-20
EP2426694A1 (en) 2012-03-07
US7952073B2 (en) 2011-05-31
US20100025579A1 (en) 2010-02-04
EP2426694B1 (en) 2013-02-13
WO2010014850A3 (en) 2010-04-01
WO2010014850A2 (en) 2010-02-04

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