JP2011519156A5 - - Google Patents

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Publication number
JP2011519156A5
JP2011519156A5 JP2011505407A JP2011505407A JP2011519156A5 JP 2011519156 A5 JP2011519156 A5 JP 2011519156A5 JP 2011505407 A JP2011505407 A JP 2011505407A JP 2011505407 A JP2011505407 A JP 2011505407A JP 2011519156 A5 JP2011519156 A5 JP 2011519156A5
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JP
Japan
Prior art keywords
patterning device
lithographic apparatus
radiation beam
cleaning
cleaning electrode
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Application number
JP2011505407A
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English (en)
Japanese (ja)
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JP2011519156A (ja
JP5535194B2 (ja
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Priority claimed from PCT/EP2009/002782 external-priority patent/WO2009129960A1/en
Publication of JP2011519156A publication Critical patent/JP2011519156A/ja
Publication of JP2011519156A5 publication Critical patent/JP2011519156A5/ja
Application granted granted Critical
Publication of JP5535194B2 publication Critical patent/JP5535194B2/ja
Expired - Fee Related legal-status Critical Current
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JP2011505407A 2008-04-23 2009-04-16 リソグラフィ装置、デバイス製造方法、クリーニングシステム、およびパターニングデバイスをクリーニングする方法 Expired - Fee Related JP5535194B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US7134508P 2008-04-23 2008-04-23
US61/071,345 2008-04-23
PCT/EP2009/002782 WO2009129960A1 (en) 2008-04-23 2009-04-16 Lithographic apparatus, device manufacturing method, cleaning system and method for cleaning a patterning device

Publications (3)

Publication Number Publication Date
JP2011519156A JP2011519156A (ja) 2011-06-30
JP2011519156A5 true JP2011519156A5 (https=) 2012-06-07
JP5535194B2 JP5535194B2 (ja) 2014-07-02

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ID=40810613

Family Applications (1)

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JP2011505407A Expired - Fee Related JP5535194B2 (ja) 2008-04-23 2009-04-16 リソグラフィ装置、デバイス製造方法、クリーニングシステム、およびパターニングデバイスをクリーニングする方法

Country Status (7)

Country Link
US (1) US20110037960A1 (https=)
JP (1) JP5535194B2 (https=)
KR (1) KR20110005288A (https=)
CN (1) CN102016723A (https=)
NL (1) NL1036769A1 (https=)
TW (1) TWI453545B (https=)
WO (1) WO2009129960A1 (https=)

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WO2013035415A1 (ja) * 2011-09-05 2013-03-14 株式会社 東芝 レチクルチャッククリーナー及びレチクルチャッククリーニング方法
US20140253887A1 (en) * 2013-03-07 2014-09-11 Applied Materials, Inc. Contamination prevention for photomask in extreme ultraviolet lithography application
US8901523B1 (en) * 2013-09-04 2014-12-02 Asml Netherlands B.V. Apparatus for protecting EUV optical elements
US9378941B2 (en) * 2013-10-02 2016-06-28 Applied Materials, Inc. Interface treatment of semiconductor surfaces with high density low energy plasma
JP2015176934A (ja) * 2014-03-13 2015-10-05 株式会社東芝 静電チャッククリーナ、クリーニング方法、および露光装置
US9539622B2 (en) 2014-03-18 2017-01-10 Asml Netherlands B.V. Apparatus for and method of active cleaning of EUV optic with RF plasma field
US10133196B2 (en) * 2014-04-09 2018-11-20 Asml Netherlands B.V. Apparatus for cleaning an object
WO2016107718A1 (en) * 2014-12-31 2016-07-07 Asml Holding N.V. Lithographic apparatus with a patterning device environment
JP6702672B2 (ja) * 2015-09-03 2020-06-03 キヤノン株式会社 インプリント装置、物品の製造方法及び供給装置
KR20180098784A (ko) 2017-02-27 2018-09-05 김창연 기도용 텐트
US11086238B2 (en) * 2017-06-29 2021-08-10 Asml Netherlands B.V. System, a lithographic apparatus, and a method for reducing oxidation or removing oxide on a substrate support
NL2021410A (en) * 2017-08-28 2019-03-07 Asml Holding Nv Apparatus for and method cleaning a support inside a lithography apparatus
IL273836B2 (en) 2017-10-31 2023-09-01 Asml Netherlands Bv A measuring device, a method for measuring a structure, a method for making a device
EP3506011A1 (en) * 2017-12-28 2019-07-03 ASML Netherlands B.V. Apparatus for and a method of removing contaminant particles from a component of a metrology apparatus
WO2019129456A1 (en) 2017-12-28 2019-07-04 Asml Netherlands B.V. Apparatus for and a method of removing contaminant particles from a component of an apparatus
JP7262939B2 (ja) * 2018-07-20 2023-04-24 キヤノン株式会社 クリーニング装置、インプリント装置、リソグラフィ装置、および、クリーニング方法
CN110899246A (zh) * 2018-09-14 2020-03-24 长鑫存储技术有限公司 光罩缺陷的清洁装置及清洁方法
CN111061129B (zh) * 2018-10-17 2022-11-01 台湾积体电路制造股份有限公司 光刻系统及清洁光刻系统的方法
US11480885B2 (en) * 2018-11-09 2022-10-25 Asml Holding N. V. Apparatus for and method cleaning a support inside a lithography apparatus
CN119493333A (zh) * 2018-11-27 2025-02-21 Asml荷兰有限公司 隔膜清洁设备
WO2020123038A1 (en) 2018-12-10 2020-06-18 Applied Materials, Inc. Attachment feature removal from photomask in extreme ultraviolet lithography application
KR102813711B1 (ko) * 2019-05-02 2025-05-29 삼성전자주식회사 반도체 소자의 제조 장치 및 그를 이용한 반도체 소자의 제조 방법
CN114556227A (zh) * 2019-10-18 2022-05-27 Asml荷兰有限公司 隔膜清洁设备
EP3809204A1 (en) * 2019-10-18 2021-04-21 ASML Netherlands B.V. Patterning device conditioning system and method
KR102788879B1 (ko) 2019-10-30 2025-04-01 삼성전자주식회사 극자외선 노광 시스템
US11294292B2 (en) * 2019-12-30 2022-04-05 Taiwan Semiconductor Manufacturing Co., Ltd. Particle removing assembly and method of cleaning mask for lithography
WO2021148224A1 (en) * 2020-01-23 2021-07-29 Asml Holding N.V. Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debris
US11681235B2 (en) 2021-03-05 2023-06-20 Taiwan Semiconductor Manufacturing Co., Ltd. System and method for cleaning an EUV mask
US12287589B2 (en) * 2021-03-26 2025-04-29 Taiwan Semiconductor Manufacturing Company, Ltd. Method and apparatus for removing contamination
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CN117111409A (zh) * 2022-05-16 2023-11-24 成都高真科技有限公司 一种降低掩膜残留物影响的方法及装置
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