JP2011505262A5 - - Google Patents

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Publication number
JP2011505262A5
JP2011505262A5 JP2010536303A JP2010536303A JP2011505262A5 JP 2011505262 A5 JP2011505262 A5 JP 2011505262A5 JP 2010536303 A JP2010536303 A JP 2010536303A JP 2010536303 A JP2010536303 A JP 2010536303A JP 2011505262 A5 JP2011505262 A5 JP 2011505262A5
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JP
Japan
Prior art keywords
substrate
substrate carrier
substrates
coating
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010536303A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011505262A (ja
JP5449185B2 (ja
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Publication date
Application filed filed Critical
Priority claimed from PCT/CH2008/000485 external-priority patent/WO2009070903A1/de
Publication of JP2011505262A publication Critical patent/JP2011505262A/ja
Publication of JP2011505262A5 publication Critical patent/JP2011505262A5/ja
Application granted granted Critical
Publication of JP5449185B2 publication Critical patent/JP5449185B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2010536303A 2007-12-06 2008-11-17 Ｐｖｄ真空コーティングユニット Expired - Fee Related JP5449185B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH18902007 2007-12-06
CH1890/07 2007-12-06
PCT/CH2008/000485 WO2009070903A1 (de) 2007-12-06 2008-11-17 Pvd - vakuumbeschichtungsanlage

Publications (3)

Publication Number Publication Date
JP2011505262A JP2011505262A (ja) 2011-02-24
JP2011505262A5 true JP2011505262A5 (enExample) 2012-04-05
JP5449185B2 JP5449185B2 (ja) 2014-03-19

Family

ID=39186114

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010536303A Expired - Fee Related JP5449185B2 (ja) 2007-12-06 2008-11-17 Ｐｖｄ真空コーティングユニット

Country Status (12)

Country Link
US (1) US8968830B2 (enExample)
EP (1) EP2220265A1 (enExample)
JP (1) JP5449185B2 (enExample)
KR (1) KR20100094558A (enExample)
CN (1) CN101889102B (enExample)
BR (1) BRPI0820014A2 (enExample)
CA (1) CA2707581A1 (enExample)
MX (1) MX2010006214A (enExample)
RU (1) RU2486280C2 (enExample)
SG (2) SG186624A1 (enExample)
TW (1) TWI498442B (enExample)
WO (1) WO2009070903A1 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2454393B1 (de) * 2009-07-14 2016-09-28 MSM Krystall GBR Verfahren zur herstellung von wendeschneidplatten
CZ304905B6 (cs) * 2009-11-23 2015-01-14 Shm, S.R.O. Způsob vytváření PVD vrstev s pomocí rotační cylindrické katody a zařízení k provádění tohoto způsobu
DE102010038077B4 (de) 2010-10-08 2018-05-30 Msm Krystall Gbr (Vertretungsberechtigte Gesellschafter: Dr. Rainer Schneider, 12165 Berlin; Arno Mecklenburg, 10999 Berlin) Wendeschneidplatte und Verfahren zu deren Herstellung
ES2532898T3 (es) * 2011-06-30 2015-04-01 Lamina Technologies Sa Deposición por arco catódico
CN104004993B (zh) * 2013-02-25 2018-01-12 北京中科三环高技术股份有限公司 一种表面处理装置
DE102015004856A1 (de) * 2015-04-15 2016-10-20 Oerlikon Metaplas Gmbh Bipolares Arc-Beschichtungsverfahren
KR102079460B1 (ko) 2015-12-17 2020-02-19 가부시키가이샤 알박 진공 처리 장치
US11322338B2 (en) * 2017-08-31 2022-05-03 Taiwan Semiconductor Manufacturing Co., Ltd. Sputter target magnet
DE102018004086A1 (de) * 2018-05-18 2019-11-21 Singulus Technologies Ag Durchlaufanlage und Verfahren zum Beschichten von Substraten
US11851740B2 (en) 2018-12-17 2023-12-26 Applied Materials, Inc. PVD directional deposition for encapsulation
US20200255941A1 (en) * 2019-02-11 2020-08-13 Kennametal Inc. Supports for chemical vapor deposition coating applications
ES2928498T3 (es) * 2019-05-07 2022-11-18 Light Med Usa Inc Método de fase líquida transitoria de plata-indio de unión de dispositivo semiconductor y soporte de dispersión de calor y estructura semiconductora que tiene una junta de unión de fase líquida transitoria de plata-indio

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1264025A (en) 1987-05-29 1989-12-27 James A.E. Bell Apparatus and process for coloring objects by plasma coating
DE4209384C1 (enExample) 1992-03-23 1993-04-22 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De
RU2058427C1 (ru) * 1993-06-01 1996-04-20 Александр Иванович Дерюгин Вакуумная установка для нанесения покрытий
RU2099439C1 (ru) * 1995-05-06 1997-12-20 Самарская государственная архитектурно-строительная академия Устройство для нанесения покрытий (варианты)
DE29615190U1 (de) 1996-03-11 1996-11-28 Balzers Verschleissschutz GmbH, 55411 Bingen Anlage zur Beschichtung von Werkstücken
CN1169477A (zh) * 1996-05-10 1998-01-07 萨蒂斯真空工业销售股份公司 在光学基片上蒸镀镀膜的方法
US5803971A (en) * 1997-01-13 1998-09-08 United Technologies Corporation Modular coating fixture
JP4345869B2 (ja) 1997-05-16 2009-10-14 Ｈｏｙａ株式会社 スパッタ成膜用の膜厚補正機構
EP0928977A4 (en) 1997-05-16 2000-01-05 Hoya Kabushiki Kaisha PLASTIC OPTICAL COMPONENT WITH A REFLECTION-PREVENTING FILM AND MECHANISM FOR THE SAME-SHAPED FILM THICKNESS PRODUCTION OF THIS FILM
SE517046C2 (sv) 1997-11-26 2002-04-09 Sandvik Ab Plasmaaktiverad CVD-metod för beläggning av skärverktyg med finkornig aluminiumoxid
JP2000141108A (ja) 1999-01-01 2000-05-23 Hitachi Tool Engineering Ltd 被覆スロ―アウェイチップの製造方法
JP2001049428A (ja) 1999-08-05 2001-02-20 Nippon Sheet Glass Co Ltd 基体に被膜を被覆する方法およびその方法に用いるスパッタリング装置
EP1186681B1 (de) 2000-09-05 2010-03-31 Oerlikon Trading AG, Trübbach Vakuumanlage mit koppelbarem Werkstückträger
US20020160620A1 (en) * 2001-02-26 2002-10-31 Rudolf Wagner Method for producing coated workpieces, uses and installation for the method
DE202004011179U1 (de) * 2003-07-21 2004-12-02 Unaxis Balzers Ag Trog zum Stapeln, Aufnehmen und Transportieren von kleinen Teilen, insbesondere Werkzeugen
KR100771026B1 (ko) * 2004-04-30 2007-10-29 스미또모 덴꼬오 하드메탈 가부시끼가이샤 표면 피복 입방정 질화 붕소 소결체 공구 및 그 제조 방법
MX2007011703A (es) 2005-03-24 2008-03-10 Oerlikon Trading Ag Capa de material duro.

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