BRPI0820014A2 - Unidade de revestimento a vácuo de pvd - Google Patents

Unidade de revestimento a vácuo de pvd

Info

Publication number
BRPI0820014A2
BRPI0820014A2 BRPI0820014-9A BRPI0820014A BRPI0820014A2 BR PI0820014 A2 BRPI0820014 A2 BR PI0820014A2 BR PI0820014 A BRPI0820014 A BR PI0820014A BR PI0820014 A2 BRPI0820014 A2 BR PI0820014A2
Authority
BR
Brazil
Prior art keywords
coating unit
vacuum coating
pvd vacuum
pvd
unit
Prior art date
Application number
BRPI0820014-9A
Other languages
English (en)
Portuguese (pt)
Inventor
Juergen Ramm
Christian Wohlrab
Original Assignee
Oerlikon Trading Ag Trübbach
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oerlikon Trading Ag Trübbach filed Critical Oerlikon Trading Ag Trübbach
Publication of BRPI0820014A2 publication Critical patent/BRPI0820014A2/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Battery Electrode And Active Subsutance (AREA)
BRPI0820014-9A 2007-12-06 2008-11-17 Unidade de revestimento a vácuo de pvd BRPI0820014A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH18902007 2007-12-06
PCT/CH2008/000485 WO2009070903A1 (de) 2007-12-06 2008-11-17 Pvd - vakuumbeschichtungsanlage

Publications (1)

Publication Number Publication Date
BRPI0820014A2 true BRPI0820014A2 (pt) 2015-05-19

Family

ID=39186114

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0820014-9A BRPI0820014A2 (pt) 2007-12-06 2008-11-17 Unidade de revestimento a vácuo de pvd

Country Status (12)

Country Link
US (1) US8968830B2 (enExample)
EP (1) EP2220265A1 (enExample)
JP (1) JP5449185B2 (enExample)
KR (1) KR20100094558A (enExample)
CN (1) CN101889102B (enExample)
BR (1) BRPI0820014A2 (enExample)
CA (1) CA2707581A1 (enExample)
MX (1) MX2010006214A (enExample)
RU (1) RU2486280C2 (enExample)
SG (2) SG186624A1 (enExample)
TW (1) TWI498442B (enExample)
WO (1) WO2009070903A1 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2454393B1 (de) * 2009-07-14 2016-09-28 MSM Krystall GBR Verfahren zur herstellung von wendeschneidplatten
CZ304905B6 (cs) * 2009-11-23 2015-01-14 Shm, S.R.O. Způsob vytváření PVD vrstev s pomocí rotační cylindrické katody a zařízení k provádění tohoto způsobu
DE102010038077B4 (de) 2010-10-08 2018-05-30 Msm Krystall Gbr (Vertretungsberechtigte Gesellschafter: Dr. Rainer Schneider, 12165 Berlin; Arno Mecklenburg, 10999 Berlin) Wendeschneidplatte und Verfahren zu deren Herstellung
ES2532898T3 (es) * 2011-06-30 2015-04-01 Lamina Technologies Sa Deposición por arco catódico
CN104004993B (zh) * 2013-02-25 2018-01-12 北京中科三环高技术股份有限公司 一种表面处理装置
DE102015004856A1 (de) * 2015-04-15 2016-10-20 Oerlikon Metaplas Gmbh Bipolares Arc-Beschichtungsverfahren
KR102079460B1 (ko) 2015-12-17 2020-02-19 가부시키가이샤 알박 진공 처리 장치
US11322338B2 (en) * 2017-08-31 2022-05-03 Taiwan Semiconductor Manufacturing Co., Ltd. Sputter target magnet
DE102018004086A1 (de) * 2018-05-18 2019-11-21 Singulus Technologies Ag Durchlaufanlage und Verfahren zum Beschichten von Substraten
US11851740B2 (en) 2018-12-17 2023-12-26 Applied Materials, Inc. PVD directional deposition for encapsulation
US20200255941A1 (en) * 2019-02-11 2020-08-13 Kennametal Inc. Supports for chemical vapor deposition coating applications
ES2928498T3 (es) * 2019-05-07 2022-11-18 Light Med Usa Inc Método de fase líquida transitoria de plata-indio de unión de dispositivo semiconductor y soporte de dispersión de calor y estructura semiconductora que tiene una junta de unión de fase líquida transitoria de plata-indio

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1264025A (en) 1987-05-29 1989-12-27 James A.E. Bell Apparatus and process for coloring objects by plasma coating
DE4209384C1 (enExample) 1992-03-23 1993-04-22 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De
RU2058427C1 (ru) * 1993-06-01 1996-04-20 Александр Иванович Дерюгин Вакуумная установка для нанесения покрытий
RU2099439C1 (ru) * 1995-05-06 1997-12-20 Самарская государственная архитектурно-строительная академия Устройство для нанесения покрытий (варианты)
DE29615190U1 (de) 1996-03-11 1996-11-28 Balzers Verschleissschutz GmbH, 55411 Bingen Anlage zur Beschichtung von Werkstücken
CN1169477A (zh) * 1996-05-10 1998-01-07 萨蒂斯真空工业销售股份公司 在光学基片上蒸镀镀膜的方法
US5803971A (en) * 1997-01-13 1998-09-08 United Technologies Corporation Modular coating fixture
JP4345869B2 (ja) 1997-05-16 2009-10-14 Ｈｏｙａ株式会社 スパッタ成膜用の膜厚補正機構
EP0928977A4 (en) 1997-05-16 2000-01-05 Hoya Kabushiki Kaisha PLASTIC OPTICAL COMPONENT WITH A REFLECTION-PREVENTING FILM AND MECHANISM FOR THE SAME-SHAPED FILM THICKNESS PRODUCTION OF THIS FILM
SE517046C2 (sv) 1997-11-26 2002-04-09 Sandvik Ab Plasmaaktiverad CVD-metod för beläggning av skärverktyg med finkornig aluminiumoxid
JP2000141108A (ja) 1999-01-01 2000-05-23 Hitachi Tool Engineering Ltd 被覆スロ―アウェイチップの製造方法
JP2001049428A (ja) 1999-08-05 2001-02-20 Nippon Sheet Glass Co Ltd 基体に被膜を被覆する方法およびその方法に用いるスパッタリング装置
EP1186681B1 (de) 2000-09-05 2010-03-31 Oerlikon Trading AG, Trübbach Vakuumanlage mit koppelbarem Werkstückträger
US20020160620A1 (en) * 2001-02-26 2002-10-31 Rudolf Wagner Method for producing coated workpieces, uses and installation for the method
DE202004011179U1 (de) * 2003-07-21 2004-12-02 Unaxis Balzers Ag Trog zum Stapeln, Aufnehmen und Transportieren von kleinen Teilen, insbesondere Werkzeugen
KR100771026B1 (ko) * 2004-04-30 2007-10-29 스미또모 덴꼬오 하드메탈 가부시끼가이샤 표면 피복 입방정 질화 붕소 소결체 공구 및 그 제조 방법
MX2007011703A (es) 2005-03-24 2008-03-10 Oerlikon Trading Ag Capa de material duro.

Also Published As

Publication number Publication date
MX2010006214A (es) 2010-06-23
RU2010127857A (ru) 2012-01-20
CN101889102B (zh) 2013-04-10
US20090148599A1 (en) 2009-06-11
CN101889102A (zh) 2010-11-17
KR20100094558A (ko) 2010-08-26
US8968830B2 (en) 2015-03-03
TW200936795A (en) 2009-09-01
TWI498442B (zh) 2015-09-01
RU2486280C2 (ru) 2013-06-27
WO2009070903A1 (de) 2009-06-11
JP2011505262A (ja) 2011-02-24
EP2220265A1 (de) 2010-08-25
SG186624A1 (en) 2013-01-30
CA2707581A1 (en) 2009-06-11
JP5449185B2 (ja) 2014-03-19
SG10201604607PA (en) 2016-07-28

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Legal Events

Date Code Title Description
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

Free format text: REFERENTE A 7A ANUIDADE.

B25G Requested change of headquarter approved

Owner name: OERLIKON TRADING AG, TRUEBBACH (CH)

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2343 DE 01-12-2015 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.