MX2010006214A - Unidad de recubrimiento al vacio de pvd. - Google Patents
Unidad de recubrimiento al vacio de pvd.Info
- Publication number
- MX2010006214A MX2010006214A MX2010006214A MX2010006214A MX2010006214A MX 2010006214 A MX2010006214 A MX 2010006214A MX 2010006214 A MX2010006214 A MX 2010006214A MX 2010006214 A MX2010006214 A MX 2010006214A MX 2010006214 A MX2010006214 A MX 2010006214A
- Authority
- MX
- Mexico
- Prior art keywords
- substrate carrier
- pvd coating
- sheet
- cutting edge
- coating unit
- Prior art date
Links
- 238000001771 vacuum deposition Methods 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 7
- 239000011248 coating agent Substances 0.000 abstract 4
- 238000000576 coating method Methods 0.000 abstract 4
- 238000005240 physical vapour deposition Methods 0.000 abstract 4
- 238000000034 method Methods 0.000 abstract 1
- 230000002093 peripheral effect Effects 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Battery Electrode And Active Subsutance (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH18902007 | 2007-12-06 | ||
| PCT/CH2008/000485 WO2009070903A1 (de) | 2007-12-06 | 2008-11-17 | Pvd - vakuumbeschichtungsanlage |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MX2010006214A true MX2010006214A (es) | 2010-06-23 |
Family
ID=39186114
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MX2010006214A MX2010006214A (es) | 2007-12-06 | 2008-11-17 | Unidad de recubrimiento al vacio de pvd. |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US8968830B2 (enExample) |
| EP (1) | EP2220265A1 (enExample) |
| JP (1) | JP5449185B2 (enExample) |
| KR (1) | KR20100094558A (enExample) |
| CN (1) | CN101889102B (enExample) |
| BR (1) | BRPI0820014A2 (enExample) |
| CA (1) | CA2707581A1 (enExample) |
| MX (1) | MX2010006214A (enExample) |
| RU (1) | RU2486280C2 (enExample) |
| SG (2) | SG186624A1 (enExample) |
| TW (1) | TWI498442B (enExample) |
| WO (1) | WO2009070903A1 (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2454393B1 (de) * | 2009-07-14 | 2016-09-28 | MSM Krystall GBR | Verfahren zur herstellung von wendeschneidplatten |
| CZ304905B6 (cs) * | 2009-11-23 | 2015-01-14 | Shm, S.R.O. | Způsob vytváření PVD vrstev s pomocí rotační cylindrické katody a zařízení k provádění tohoto způsobu |
| DE102010038077B4 (de) | 2010-10-08 | 2018-05-30 | Msm Krystall Gbr (Vertretungsberechtigte Gesellschafter: Dr. Rainer Schneider, 12165 Berlin; Arno Mecklenburg, 10999 Berlin) | Wendeschneidplatte und Verfahren zu deren Herstellung |
| ES2532898T3 (es) * | 2011-06-30 | 2015-04-01 | Lamina Technologies Sa | Deposición por arco catódico |
| CN104004993B (zh) * | 2013-02-25 | 2018-01-12 | 北京中科三环高技术股份有限公司 | 一种表面处理装置 |
| DE102015004856A1 (de) * | 2015-04-15 | 2016-10-20 | Oerlikon Metaplas Gmbh | Bipolares Arc-Beschichtungsverfahren |
| KR102079460B1 (ko) | 2015-12-17 | 2020-02-19 | 가부시키가이샤 알박 | 진공 처리 장치 |
| US11322338B2 (en) * | 2017-08-31 | 2022-05-03 | Taiwan Semiconductor Manufacturing Co., Ltd. | Sputter target magnet |
| DE102018004086A1 (de) * | 2018-05-18 | 2019-11-21 | Singulus Technologies Ag | Durchlaufanlage und Verfahren zum Beschichten von Substraten |
| US11851740B2 (en) | 2018-12-17 | 2023-12-26 | Applied Materials, Inc. | PVD directional deposition for encapsulation |
| US20200255941A1 (en) * | 2019-02-11 | 2020-08-13 | Kennametal Inc. | Supports for chemical vapor deposition coating applications |
| ES2928498T3 (es) * | 2019-05-07 | 2022-11-18 | Light Med Usa Inc | Método de fase líquida transitoria de plata-indio de unión de dispositivo semiconductor y soporte de dispersión de calor y estructura semiconductora que tiene una junta de unión de fase líquida transitoria de plata-indio |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1264025A (en) | 1987-05-29 | 1989-12-27 | James A.E. Bell | Apparatus and process for coloring objects by plasma coating |
| DE4209384C1 (enExample) | 1992-03-23 | 1993-04-22 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De | |
| RU2058427C1 (ru) * | 1993-06-01 | 1996-04-20 | Александр Иванович Дерюгин | Вакуумная установка для нанесения покрытий |
| RU2099439C1 (ru) * | 1995-05-06 | 1997-12-20 | Самарская государственная архитектурно-строительная академия | Устройство для нанесения покрытий (варианты) |
| DE29615190U1 (de) | 1996-03-11 | 1996-11-28 | Balzers Verschleissschutz GmbH, 55411 Bingen | Anlage zur Beschichtung von Werkstücken |
| CN1169477A (zh) * | 1996-05-10 | 1998-01-07 | 萨蒂斯真空工业销售股份公司 | 在光学基片上蒸镀镀膜的方法 |
| US5803971A (en) * | 1997-01-13 | 1998-09-08 | United Technologies Corporation | Modular coating fixture |
| JP4345869B2 (ja) | 1997-05-16 | 2009-10-14 | Ｈｏｙａ株式会社 | スパッタ成膜用の膜厚補正機構 |
| EP0928977A4 (en) | 1997-05-16 | 2000-01-05 | Hoya Kabushiki Kaisha | PLASTIC OPTICAL COMPONENT WITH A REFLECTION-PREVENTING FILM AND MECHANISM FOR THE SAME-SHAPED FILM THICKNESS PRODUCTION OF THIS FILM |
| SE517046C2 (sv) | 1997-11-26 | 2002-04-09 | Sandvik Ab | Plasmaaktiverad CVD-metod för beläggning av skärverktyg med finkornig aluminiumoxid |
| JP2000141108A (ja) | 1999-01-01 | 2000-05-23 | Hitachi Tool Engineering Ltd | 被覆スロ―アウェイチップの製造方法 |
| JP2001049428A (ja) | 1999-08-05 | 2001-02-20 | Nippon Sheet Glass Co Ltd | 基体に被膜を被覆する方法およびその方法に用いるスパッタリング装置 |
| EP1186681B1 (de) | 2000-09-05 | 2010-03-31 | Oerlikon Trading AG, Trübbach | Vakuumanlage mit koppelbarem Werkstückträger |
| US20020160620A1 (en) * | 2001-02-26 | 2002-10-31 | Rudolf Wagner | Method for producing coated workpieces, uses and installation for the method |
| DE202004011179U1 (de) * | 2003-07-21 | 2004-12-02 | Unaxis Balzers Ag | Trog zum Stapeln, Aufnehmen und Transportieren von kleinen Teilen, insbesondere Werkzeugen |
| KR100771026B1 (ko) * | 2004-04-30 | 2007-10-29 | 스미또모 덴꼬오 하드메탈 가부시끼가이샤 | 표면 피복 입방정 질화 붕소 소결체 공구 및 그 제조 방법 |
| MX2007011703A (es) | 2005-03-24 | 2008-03-10 | Oerlikon Trading Ag | Capa de material duro. |
-
2008
- 2008-11-13 US US12/270,415 patent/US8968830B2/en not_active Expired - Fee Related
- 2008-11-17 WO PCT/CH2008/000485 patent/WO2009070903A1/de not_active Ceased
- 2008-11-17 CN CN200880119186.5A patent/CN101889102B/zh not_active Expired - Fee Related
- 2008-11-17 MX MX2010006214A patent/MX2010006214A/es unknown
- 2008-11-17 KR KR1020107014904A patent/KR20100094558A/ko not_active Ceased
- 2008-11-17 RU RU2010127857/02A patent/RU2486280C2/ru not_active IP Right Cessation
- 2008-11-17 CA CA2707581A patent/CA2707581A1/en not_active Abandoned
- 2008-11-17 EP EP08856536A patent/EP2220265A1/de not_active Withdrawn
- 2008-11-17 JP JP2010536303A patent/JP5449185B2/ja not_active Expired - Fee Related
- 2008-11-17 BR BRPI0820014-9A patent/BRPI0820014A2/pt not_active IP Right Cessation
- 2008-11-17 SG SG2012089439A patent/SG186624A1/en unknown
- 2008-11-17 SG SG10201604607PA patent/SG10201604607PA/en unknown
- 2008-12-04 TW TW097147045A patent/TWI498442B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| RU2010127857A (ru) | 2012-01-20 |
| CN101889102B (zh) | 2013-04-10 |
| US20090148599A1 (en) | 2009-06-11 |
| CN101889102A (zh) | 2010-11-17 |
| KR20100094558A (ko) | 2010-08-26 |
| US8968830B2 (en) | 2015-03-03 |
| TW200936795A (en) | 2009-09-01 |
| TWI498442B (zh) | 2015-09-01 |
| RU2486280C2 (ru) | 2013-06-27 |
| WO2009070903A1 (de) | 2009-06-11 |
| JP2011505262A (ja) | 2011-02-24 |
| EP2220265A1 (de) | 2010-08-25 |
| SG186624A1 (en) | 2013-01-30 |
| CA2707581A1 (en) | 2009-06-11 |
| JP5449185B2 (ja) | 2014-03-19 |
| BRPI0820014A2 (pt) | 2015-05-19 |
| SG10201604607PA (en) | 2016-07-28 |
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