CN101889102B - Pvd真空镀层设备 - Google Patents

Pvd真空镀层设备 Download PDF

Info

Publication number
CN101889102B
CN101889102B CN200880119186.5A CN200880119186A CN101889102B CN 101889102 B CN101889102 B CN 101889102B CN 200880119186 A CN200880119186 A CN 200880119186A CN 101889102 B CN101889102 B CN 101889102B
Authority
CN
China
Prior art keywords
coating
substrate carrier
substrate
source
sources
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN200880119186.5A
Other languages
English (en)
Chinese (zh)
Other versions
CN101889102A (zh
Inventor
J·拉姆
C·沃尔拉布
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oerlikon Surface Solutions AG Pfaeffikon
Original Assignee
Oerlikon Trading AG Truebbach
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oerlikon Trading AG Truebbach filed Critical Oerlikon Trading AG Truebbach
Publication of CN101889102A publication Critical patent/CN101889102A/zh
Application granted granted Critical
Publication of CN101889102B publication Critical patent/CN101889102B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Battery Electrode And Active Subsutance (AREA)
CN200880119186.5A 2007-12-06 2008-11-17 Pvd真空镀层设备 Expired - Fee Related CN101889102B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH18902007 2007-12-06
CH1890/07 2007-12-06
PCT/CH2008/000485 WO2009070903A1 (de) 2007-12-06 2008-11-17 Pvd - vakuumbeschichtungsanlage

Publications (2)

Publication Number Publication Date
CN101889102A CN101889102A (zh) 2010-11-17
CN101889102B true CN101889102B (zh) 2013-04-10

Family

ID=39186114

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200880119186.5A Expired - Fee Related CN101889102B (zh) 2007-12-06 2008-11-17 Pvd真空镀层设备

Country Status (12)

Country Link
US (1) US8968830B2 (enExample)
EP (1) EP2220265A1 (enExample)
JP (1) JP5449185B2 (enExample)
KR (1) KR20100094558A (enExample)
CN (1) CN101889102B (enExample)
BR (1) BRPI0820014A2 (enExample)
CA (1) CA2707581A1 (enExample)
MX (1) MX2010006214A (enExample)
RU (1) RU2486280C2 (enExample)
SG (2) SG186624A1 (enExample)
TW (1) TWI498442B (enExample)
WO (1) WO2009070903A1 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2454393B1 (de) * 2009-07-14 2016-09-28 MSM Krystall GBR Verfahren zur herstellung von wendeschneidplatten
CZ304905B6 (cs) * 2009-11-23 2015-01-14 Shm, S.R.O. Způsob vytváření PVD vrstev s pomocí rotační cylindrické katody a zařízení k provádění tohoto způsobu
DE102010038077B4 (de) 2010-10-08 2018-05-30 Msm Krystall Gbr (Vertretungsberechtigte Gesellschafter: Dr. Rainer Schneider, 12165 Berlin; Arno Mecklenburg, 10999 Berlin) Wendeschneidplatte und Verfahren zu deren Herstellung
ES2532898T3 (es) * 2011-06-30 2015-04-01 Lamina Technologies Sa Deposición por arco catódico
CN104004993B (zh) * 2013-02-25 2018-01-12 北京中科三环高技术股份有限公司 一种表面处理装置
DE102015004856A1 (de) * 2015-04-15 2016-10-20 Oerlikon Metaplas Gmbh Bipolares Arc-Beschichtungsverfahren
KR102079460B1 (ko) 2015-12-17 2020-02-19 가부시키가이샤 알박 진공 처리 장치
US11322338B2 (en) * 2017-08-31 2022-05-03 Taiwan Semiconductor Manufacturing Co., Ltd. Sputter target magnet
DE102018004086A1 (de) * 2018-05-18 2019-11-21 Singulus Technologies Ag Durchlaufanlage und Verfahren zum Beschichten von Substraten
US11851740B2 (en) 2018-12-17 2023-12-26 Applied Materials, Inc. PVD directional deposition for encapsulation
US20200255941A1 (en) * 2019-02-11 2020-08-13 Kennametal Inc. Supports for chemical vapor deposition coating applications
ES2928498T3 (es) * 2019-05-07 2022-11-18 Light Med Usa Inc Método de fase líquida transitoria de plata-indio de unión de dispositivo semiconductor y soporte de dispersión de calor y estructura semiconductora que tiene una junta de unión de fase líquida transitoria de plata-indio

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0293229A2 (en) * 1987-05-29 1988-11-30 Inco Limited Apparatus and process for coloring objects by plasma coating
US5709784A (en) * 1996-03-11 1998-01-20 Balzers Aktiengesellschaft Process and apparatus for workpiece coating
US6250758B1 (en) * 1997-05-16 2001-06-26 Hoya Corporation Plastic optical devices having antireflection film and mechanism for equalizing thickness of antireflection film
US6328857B1 (en) * 1999-08-05 2001-12-11 Nippon Sheet Glass Co., Ltd. Method for forming coating on substrate and sputtering apparatus used for the method

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4209384C1 (enExample) 1992-03-23 1993-04-22 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De
RU2058427C1 (ru) * 1993-06-01 1996-04-20 Александр Иванович Дерюгин Вакуумная установка для нанесения покрытий
RU2099439C1 (ru) * 1995-05-06 1997-12-20 Самарская государственная архитектурно-строительная академия Устройство для нанесения покрытий (варианты)
CN1169477A (zh) * 1996-05-10 1998-01-07 萨蒂斯真空工业销售股份公司 在光学基片上蒸镀镀膜的方法
US5803971A (en) * 1997-01-13 1998-09-08 United Technologies Corporation Modular coating fixture
JP4345869B2 (ja) 1997-05-16 2009-10-14 Ｈｏｙａ株式会社 スパッタ成膜用の膜厚補正機構
SE517046C2 (sv) 1997-11-26 2002-04-09 Sandvik Ab Plasmaaktiverad CVD-metod för beläggning av skärverktyg med finkornig aluminiumoxid
JP2000141108A (ja) 1999-01-01 2000-05-23 Hitachi Tool Engineering Ltd 被覆スロ―アウェイチップの製造方法
EP1186681B1 (de) 2000-09-05 2010-03-31 Oerlikon Trading AG, Trübbach Vakuumanlage mit koppelbarem Werkstückträger
US20020160620A1 (en) * 2001-02-26 2002-10-31 Rudolf Wagner Method for producing coated workpieces, uses and installation for the method
DE202004011179U1 (de) * 2003-07-21 2004-12-02 Unaxis Balzers Ag Trog zum Stapeln, Aufnehmen und Transportieren von kleinen Teilen, insbesondere Werkzeugen
KR100771026B1 (ko) * 2004-04-30 2007-10-29 스미또모 덴꼬오 하드메탈 가부시끼가이샤 표면 피복 입방정 질화 붕소 소결체 공구 및 그 제조 방법
MX2007011703A (es) 2005-03-24 2008-03-10 Oerlikon Trading Ag Capa de material duro.

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0293229A2 (en) * 1987-05-29 1988-11-30 Inco Limited Apparatus and process for coloring objects by plasma coating
US5709784A (en) * 1996-03-11 1998-01-20 Balzers Aktiengesellschaft Process and apparatus for workpiece coating
US6250758B1 (en) * 1997-05-16 2001-06-26 Hoya Corporation Plastic optical devices having antireflection film and mechanism for equalizing thickness of antireflection film
US6328857B1 (en) * 1999-08-05 2001-12-11 Nippon Sheet Glass Co., Ltd. Method for forming coating on substrate and sputtering apparatus used for the method

Also Published As

Publication number Publication date
MX2010006214A (es) 2010-06-23
RU2010127857A (ru) 2012-01-20
US20090148599A1 (en) 2009-06-11
CN101889102A (zh) 2010-11-17
KR20100094558A (ko) 2010-08-26
US8968830B2 (en) 2015-03-03
TW200936795A (en) 2009-09-01
TWI498442B (zh) 2015-09-01
RU2486280C2 (ru) 2013-06-27
WO2009070903A1 (de) 2009-06-11
JP2011505262A (ja) 2011-02-24
EP2220265A1 (de) 2010-08-25
SG186624A1 (en) 2013-01-30
CA2707581A1 (en) 2009-06-11
JP5449185B2 (ja) 2014-03-19
BRPI0820014A2 (pt) 2015-05-19
SG10201604607PA (en) 2016-07-28

Similar Documents

Publication Publication Date Title
CN101889102B (zh) Pvd真空镀层设备
ES2252092T3 (es) Sistema de capas de dlc y procedimiento para la fabricacion de un sistema de capas de este tipo.
JP6508746B2 (ja) マクロ粒子低減コーティングを利用したプラズマ源ならびにマクロ粒子低減コーティングを用いたプラズマ源を薄膜コーティングおよび表面改質に使用する方法
CN101743338B (zh) 真空处理设备和真空处理方法
EP1803836B1 (en) Evaporation source and method of depositing thin film using the same
EP2622627B1 (en) Systems and methods for forming a layer of sputtered material
US6869676B2 (en) Method and device for vacuum-coating a substrate
JP6312357B2 (ja) 真空コーティング装置およびナノ・コンポジット被膜を堆積する方法
CN104213076A (zh) Pvd与hipims制备超硬dlc涂层方法及设备
CA2658210A1 (en) Method and apparatus for the coating and for the surface treatment of substrates by means of a plasma beam
CN101457359B (zh) 一种Ti-Si-N纳米晶-非晶复合超硬涂层的制备方法
KR20110115291A (ko) Ｄｌｃ 코팅장치
US6703081B2 (en) Installation and method for vacuum treatment or powder production
TW201608044A (zh) 以旋轉靶材組件在兩個塗佈區域中塗佈基板之濺射沈積裝置及方法和其用途
TW201000669A (en) Method and apparatus for coating a workpiece by means of a plasma enhanced chemical reaction
KR20100001086A (ko) 하이브리드 플라즈마 ｐｖｄ 코팅장치 및 상기 코팅장치를이용한 코팅방법
KR101020773B1 (ko) 아크 이온 플레이팅 장치
CN115466928A (zh) 复合镀膜设备、复合镀膜方法以及镀膜工件
KR20160145737A (ko) Pvd 어레이 코팅기들에서의 에지 균일성 개선
JP7696058B2 (ja) ドープされたダイヤモンド層を生産する装置及び方法
EP2811508B1 (en) Gas configuration for magnetron deposition systems
JP2005036276A (ja) 複合構造薄膜製造方法及び装置
KR20060020415A (ko) 씨알-에스아이-엔계 경질코팅막의 증착방법
Osterle et al. XTEM investigation of PVD and CVD hard coatings
WO2016050284A1 (en) Cathode sputtering mode

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20130410

Termination date: 20131117