JP2011505073A - オプトエレクトロニクス半導体ボディおよびオプトエレクトロニクス半導体ボディの製造方法 - Google Patents
オプトエレクトロニクス半導体ボディおよびオプトエレクトロニクス半導体ボディの製造方法 Download PDFInfo
- Publication number
- JP2011505073A JP2011505073A JP2010535212A JP2010535212A JP2011505073A JP 2011505073 A JP2011505073 A JP 2011505073A JP 2010535212 A JP2010535212 A JP 2010535212A JP 2010535212 A JP2010535212 A JP 2010535212A JP 2011505073 A JP2011505073 A JP 2011505073A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor body
- layer
- recess
- buffer layer
- optoelectronic semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/815—Bodies having stress relaxation structures, e.g. buffer layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/819—Bodies characterised by their shape, e.g. curved or truncated substrates
- H10H20/82—Roughened surfaces, e.g. at the interface between epitaxial layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/822—Materials of the light-emitting regions
- H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
- H10H20/825—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP containing nitrogen, e.g. GaN
- H10H20/8252—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP containing nitrogen, e.g. GaN characterised by the dopants
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102007057756.9A DE102007057756B4 (de) | 2007-11-30 | 2007-11-30 | Verfahren zur Herstellung eines optoelektronischen Halbleiterkörpers |
| PCT/DE2008/001957 WO2009068006A2 (de) | 2007-11-30 | 2008-11-26 | Optoelektronischer halbleiterkörper und verfahren zur herstellung eines optoelektronischen halbleiterkörpers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2011505073A true JP2011505073A (ja) | 2011-02-17 |
| JP2011505073A5 JP2011505073A5 (OSRAM) | 2012-01-05 |
Family
ID=40455567
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010535212A Pending JP2011505073A (ja) | 2007-11-30 | 2008-11-26 | オプトエレクトロニクス半導体ボディおよびオプトエレクトロニクス半導体ボディの製造方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20110204322A1 (OSRAM) |
| JP (1) | JP2011505073A (OSRAM) |
| KR (1) | KR20100097188A (OSRAM) |
| CN (1) | CN101878546B (OSRAM) |
| DE (1) | DE102007057756B4 (OSRAM) |
| TW (1) | TWI474501B (OSRAM) |
| WO (1) | WO2009068006A2 (OSRAM) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016036037A (ja) * | 2011-09-29 | 2016-03-17 | マヌティウス アイピー インコーポレーテッド | 発光素子 |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5052636B2 (ja) | 2010-03-11 | 2012-10-17 | 株式会社東芝 | 半導体発光素子 |
| KR101646664B1 (ko) * | 2010-05-18 | 2016-08-08 | 엘지이노텍 주식회사 | 발광 소자, 발광 소자의 제조방법 및 발광 소자 패키지 |
| DE102010032497A1 (de) | 2010-07-28 | 2012-02-02 | Osram Opto Semiconductors Gmbh | Strahlungsemittierender Halbleiterchip und Verfahren zur Herstellung eines strahlungsemittierenden Halbleiterchips |
| CN102694096A (zh) * | 2011-03-21 | 2012-09-26 | 华新丽华股份有限公司 | 发光二极管及其制造方法 |
| DE102018111324A1 (de) * | 2018-05-11 | 2019-11-14 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip |
| DE102020126442A1 (de) * | 2020-10-08 | 2022-04-14 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Optoelektronische vorrichtung mit einer kontaktschicht und einer darüber angeordneten aufrauschicht sowie herstellungsverfahren |
Citations (18)
| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2003174193A (ja) * | 2001-12-04 | 2003-06-20 | Sharp Corp | 窒化物系化合物半導体発光素子およびその製造方法 |
| JP2004343139A (ja) * | 2001-11-19 | 2004-12-02 | Sanyo Electric Co Ltd | 化合物半導体発光素子 |
| JP2005072585A (ja) * | 2003-08-20 | 2005-03-17 | Shogen Koden Kofun Yugenkoshi | 窒化物系高効率発光素子 |
| JP2005085932A (ja) * | 2003-09-08 | 2005-03-31 | Toyoda Gosei Co Ltd | 発光ダイオード及びその製造方法 |
| JP2005150675A (ja) * | 2003-11-18 | 2005-06-09 | Itswell Co Ltd | 半導体発光ダイオードとその製造方法 |
| JP2005197573A (ja) * | 2004-01-09 | 2005-07-21 | Sharp Corp | Iii族窒化物半導体発光素子 |
| JP2005259832A (ja) * | 2004-03-10 | 2005-09-22 | Sanyo Electric Co Ltd | 窒化物系半導体発光素子 |
| JP2006066903A (ja) * | 2004-07-29 | 2006-03-09 | Showa Denko Kk | 半導体発光素子用正極 |
| JP2006135311A (ja) * | 2004-10-08 | 2006-05-25 | Mitsubishi Cable Ind Ltd | 窒化物半導体を用いた発光ダイオード |
| WO2006109760A1 (ja) * | 2005-04-08 | 2006-10-19 | Mitsubishi Cable Industries, Ltd. | 半導体素子およびその製造方法 |
| JP2006351596A (ja) * | 2005-06-13 | 2006-12-28 | Sumitomo Electric Ind Ltd | 発光装置 |
| JP2007067454A (ja) * | 1997-01-09 | 2007-03-15 | Nichia Chem Ind Ltd | 窒化物半導体素子 |
| JP2007096090A (ja) * | 2005-09-29 | 2007-04-12 | Sanyo Electric Co Ltd | 半導体発光素子及び半導体発光素子の製造方法 |
| JP2007116192A (ja) * | 2002-03-26 | 2007-05-10 | Sanyo Electric Co Ltd | 窒化物系半導体装置 |
| JP2007150076A (ja) * | 2005-11-29 | 2007-06-14 | Rohm Co Ltd | 窒化物半導体発光素子 |
| JP2007150259A (ja) * | 2005-11-02 | 2007-06-14 | Sharp Corp | 窒化物半導体発光素子およびその製造方法 |
| JP2007235109A (ja) * | 2006-03-02 | 2007-09-13 | National Chung Hsing Univ | 発光素子 |
| JP2008047858A (ja) * | 2006-08-21 | 2008-02-28 | Samsung Electro Mech Co Ltd | 垂直構造窒化物系半導体発光素子及びその製造方法 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US104081A (en) * | 1870-06-07 | Improvement in scaffold-bracket | ||
| US5684309A (en) | 1996-07-11 | 1997-11-04 | North Carolina State University | Stacked quantum well aluminum indium gallium nitride light emitting diodes |
| CN1964093B (zh) | 1997-01-09 | 2012-06-27 | 日亚化学工业株式会社 | 氮化物半导体元器件 |
| US5831277A (en) | 1997-03-19 | 1998-11-03 | Northwestern University | III-nitride superlattice structures |
| JPH10294491A (ja) * | 1997-04-22 | 1998-11-04 | Toshiba Corp | 半導体発光素子およびその製造方法ならびに発光装置 |
| JP4119501B2 (ja) * | 1997-07-10 | 2008-07-16 | ローム株式会社 | 半導体発光素子 |
| EP2169733B1 (de) * | 1997-09-29 | 2017-07-19 | OSRAM Opto Semiconductors GmbH | Halbleiterlichtquelle |
| JP4040192B2 (ja) * | 1998-11-26 | 2008-01-30 | ソニー株式会社 | 半導体発光素子の製造方法 |
| JP3804335B2 (ja) * | 1998-11-26 | 2006-08-02 | ソニー株式会社 | 半導体レーザ |
| DE19955747A1 (de) | 1999-11-19 | 2001-05-23 | Osram Opto Semiconductors Gmbh | Optische Halbleitervorrichtung mit Mehrfach-Quantentopf-Struktur |
| EP1277241B1 (de) | 2000-04-26 | 2017-12-13 | OSRAM Opto Semiconductors GmbH | Lumineszenzdiodenchip auf der basis von gan |
| US20020017652A1 (en) | 2000-08-08 | 2002-02-14 | Stefan Illek | Semiconductor chip for optoelectronics |
| US6429460B1 (en) * | 2000-09-28 | 2002-08-06 | United Epitaxy Company, Ltd. | Highly luminous light emitting device |
| US6611002B2 (en) * | 2001-02-23 | 2003-08-26 | Nitronex Corporation | Gallium nitride material devices and methods including backside vias |
| US6649942B2 (en) * | 2001-05-23 | 2003-11-18 | Sanyo Electric Co., Ltd. | Nitride-based semiconductor light-emitting device |
| TW200414563A (en) * | 2003-01-30 | 2004-08-01 | South Epitaxy Corp | Light emitting diode and a method of manufacturing the same |
| TWI234295B (en) * | 2003-10-08 | 2005-06-11 | Epistar Corp | High-efficiency nitride-based light-emitting device |
| TWI244222B (en) * | 2004-03-11 | 2005-11-21 | Epistar Corp | A ternary nitride buffer layer containing nitride light-emitting device and manufacturing method of the same |
| CN100423300C (zh) | 2004-04-29 | 2008-10-01 | 奥斯兰姆奥普托半导体有限责任公司 | 辐射发射的半导体芯片及其制造方法 |
| US7534633B2 (en) * | 2004-07-02 | 2009-05-19 | Cree, Inc. | LED with substrate modifications for enhanced light extraction and method of making same |
| JP2007157853A (ja) * | 2005-12-01 | 2007-06-21 | Sony Corp | 半導体発光素子およびその製造方法 |
| CN100438108C (zh) * | 2006-06-15 | 2008-11-26 | 厦门大学 | 树叶脉络形大功率氮化镓基发光二极管芯片的p、n电极 |
-
2007
- 2007-11-30 DE DE102007057756.9A patent/DE102007057756B4/de active Active
-
2008
- 2008-11-21 TW TW97145091A patent/TWI474501B/zh not_active IP Right Cessation
- 2008-11-26 KR KR1020107014175A patent/KR20100097188A/ko not_active Ceased
- 2008-11-26 CN CN2008801184236A patent/CN101878546B/zh active Active
- 2008-11-26 US US12/745,683 patent/US20110204322A1/en not_active Abandoned
- 2008-11-26 WO PCT/DE2008/001957 patent/WO2009068006A2/de not_active Ceased
- 2008-11-26 JP JP2010535212A patent/JP2011505073A/ja active Pending
Patent Citations (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007067454A (ja) * | 1997-01-09 | 2007-03-15 | Nichia Chem Ind Ltd | 窒化物半導体素子 |
| JP2004343139A (ja) * | 2001-11-19 | 2004-12-02 | Sanyo Electric Co Ltd | 化合物半導体発光素子 |
| JP2003174193A (ja) * | 2001-12-04 | 2003-06-20 | Sharp Corp | 窒化物系化合物半導体発光素子およびその製造方法 |
| JP2007116192A (ja) * | 2002-03-26 | 2007-05-10 | Sanyo Electric Co Ltd | 窒化物系半導体装置 |
| JP2005072585A (ja) * | 2003-08-20 | 2005-03-17 | Shogen Koden Kofun Yugenkoshi | 窒化物系高効率発光素子 |
| JP2005085932A (ja) * | 2003-09-08 | 2005-03-31 | Toyoda Gosei Co Ltd | 発光ダイオード及びその製造方法 |
| JP2005150675A (ja) * | 2003-11-18 | 2005-06-09 | Itswell Co Ltd | 半導体発光ダイオードとその製造方法 |
| JP2005197573A (ja) * | 2004-01-09 | 2005-07-21 | Sharp Corp | Iii族窒化物半導体発光素子 |
| JP2005259832A (ja) * | 2004-03-10 | 2005-09-22 | Sanyo Electric Co Ltd | 窒化物系半導体発光素子 |
| JP2006066903A (ja) * | 2004-07-29 | 2006-03-09 | Showa Denko Kk | 半導体発光素子用正極 |
| JP2006135311A (ja) * | 2004-10-08 | 2006-05-25 | Mitsubishi Cable Ind Ltd | 窒化物半導体を用いた発光ダイオード |
| WO2006109760A1 (ja) * | 2005-04-08 | 2006-10-19 | Mitsubishi Cable Industries, Ltd. | 半導体素子およびその製造方法 |
| JP2006351596A (ja) * | 2005-06-13 | 2006-12-28 | Sumitomo Electric Ind Ltd | 発光装置 |
| JP2007096090A (ja) * | 2005-09-29 | 2007-04-12 | Sanyo Electric Co Ltd | 半導体発光素子及び半導体発光素子の製造方法 |
| JP2007150259A (ja) * | 2005-11-02 | 2007-06-14 | Sharp Corp | 窒化物半導体発光素子およびその製造方法 |
| JP2007150076A (ja) * | 2005-11-29 | 2007-06-14 | Rohm Co Ltd | 窒化物半導体発光素子 |
| JP2007235109A (ja) * | 2006-03-02 | 2007-09-13 | National Chung Hsing Univ | 発光素子 |
| JP2008047858A (ja) * | 2006-08-21 | 2008-02-28 | Samsung Electro Mech Co Ltd | 垂直構造窒化物系半導体発光素子及びその製造方法 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016036037A (ja) * | 2011-09-29 | 2016-03-17 | マヌティウス アイピー インコーポレーテッド | 発光素子 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200933936A (en) | 2009-08-01 |
| KR20100097188A (ko) | 2010-09-02 |
| CN101878546A (zh) | 2010-11-03 |
| TWI474501B (zh) | 2015-02-21 |
| DE102007057756A1 (de) | 2009-06-04 |
| WO2009068006A2 (de) | 2009-06-04 |
| DE102007057756B4 (de) | 2022-03-10 |
| CN101878546B (zh) | 2012-05-23 |
| WO2009068006A3 (de) | 2009-09-11 |
| US20110204322A1 (en) | 2011-08-25 |
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