JP5798035B2 - オプトエレクトロニクス半導体コンポーネント - Google Patents
オプトエレクトロニクス半導体コンポーネント Download PDFInfo
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- JP5798035B2 JP5798035B2 JP2011532492A JP2011532492A JP5798035B2 JP 5798035 B2 JP5798035 B2 JP 5798035B2 JP 2011532492 A JP2011532492 A JP 2011532492A JP 2011532492 A JP2011532492 A JP 2011532492A JP 5798035 B2 JP5798035 B2 JP 5798035B2
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- 239000004065 semiconductor Substances 0.000 title claims description 73
- 230000005693 optoelectronics Effects 0.000 title claims description 36
- 229910052751 metal Inorganic materials 0.000 claims description 22
- 239000002184 metal Substances 0.000 claims description 22
- 230000005855 radiation Effects 0.000 claims description 22
- 239000002019 doping agent Substances 0.000 claims description 20
- -1 nitride compound Chemical class 0.000 claims description 17
- 229910001092 metal group alloy Inorganic materials 0.000 claims description 14
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 6
- 229910052749 magnesium Inorganic materials 0.000 claims description 6
- 239000011777 magnesium Substances 0.000 claims description 6
- 239000000463 material Substances 0.000 description 24
- 239000013078 crystal Substances 0.000 description 13
- 230000012010 growth Effects 0.000 description 11
- 229910052739 hydrogen Inorganic materials 0.000 description 8
- 239000001257 hydrogen Substances 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 7
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 6
- 230000004913 activation Effects 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 229910000679 solder Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000011787 zinc oxide Substances 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 239000000370 acceptor Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000013139 quantization Methods 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 230000007480 spreading Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- 229910017911 MgIn Inorganic materials 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 229910007717 ZnSnO Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- CXKCTMHTOKXKQT-UHFFFAOYSA-N cadmium oxide Inorganic materials [Cd]=O CXKCTMHTOKXKQT-UHFFFAOYSA-N 0.000 description 1
- CFEAAQFZALKQPA-UHFFFAOYSA-N cadmium(2+);oxygen(2-) Chemical compound [O-2].[Cd+2] CFEAAQFZALKQPA-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000009647 facial growth Effects 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 239000002096 quantum dot Substances 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
Description
Claims (14)
- 窒化物化合物半導体をベースとする半導体積層体(3)を備えているオプトエレクトロニクス半導体コンポーネントであって、
前記半導体積層体(3)が、n型ドープ領域(4)と、p型ドープ領域(8)と、前記n型ドープ領域(4)と前記p型ドープ領域(8)との間に配置されている活性ゾーン(5)と、を含んでおり、前記p型ドープ領域(8)が、InxAlyGa1−x−yN(0≦x≦1、0≦y≦1、かつx+y≦1)からなるp型コンタクト層(7)を備えており、前記p型コンタクト層(7)が、金属、金属合金、または透明導電性酸化物からなる接続層(9)に隣接しており、
前記p型コンタクト層(7)がマグネシウムでドーピングされており、
前記p型コンタクト層(7)のドーパント濃度が5*10 19 cm −3 〜2*10 21 cm −3 の範囲内であり、
前記p型コンタクト層(7)の厚さが5nm〜200nmの範囲内であり、
前記p型コンタクト層(7)が、前記接続層(9)との界面に、Ga面方位を有する第1のドメイン(1)と、N面方位を有する第2のドメイン(2)とを有する、
オプトエレクトロニクス半導体コンポーネント。 - 前記p型コンタクト層(7)が、前記接続層(9)との界面において、Ga面方位を有するドメイン(1)を面積割合として少なくとも10%、最大で90%有する、
請求項1に記載のオプトエレクトロニクス半導体コンポーネント。 - 前記p型コンタクト層(7)が、前記接続層(9)との界面において、Ga面方位を有するドメイン(1)を面積割合として少なくとも40%、最大で70%有する、
請求項2に記載のオプトエレクトロニクス半導体コンポーネント。 - 前記第1のドメイン(1)もしくは前記第2のドメイン(2)またはその両方が、それぞれ、10nm〜5μmの横方向範囲を有する、
請求項1〜3のいずれか1項に記載のオプトエレクトロニクス半導体コンポーネント。 - 前記第2のドメイン(2)が1μm未満の横方向範囲を有する、
請求項1〜4のいずれか1項に記載のオプトエレクトロニクス半導体コンポーネント。 - 前記p型コンタクト層(7)が、1*1020cm−3より高いドーパント濃度を有する、
請求項1〜5のいずれか1項に記載のオプトエレクトロニクス半導体コンポーネント。 - 前記p型コンタクト層(7)が30nm以下の厚さを有する、
請求項1〜6のいずれか1項に記載のオプトエレクトロニクス半導体コンポーネント。 - 前記活性ゾーン(5)が放射放出層であり、前記接続層(9)が前記コンポーネントの放射出口面に配置されている、
請求項1〜7のいずれか1項に記載のオプトエレクトロニクス半導体コンポーネント。 - 前記接続層(9)が透明導電性酸化物を備えている、
請求項8に記載のオプトエレクトロニクス半導体コンポーネント。 - 前記活性ゾーン(5)が放射放出層であり、前記コンポーネントの放射出口面が、前記放射放出層(5)から見て前記接続層(9)とは反対側に位置している、
請求項1〜7のいずれか1項に記載のオプトエレクトロニクス半導体コンポーネント。 - 前記接続層(9)が、金属または金属合金からなるミラー層である、
請求項10に記載のオプトエレクトロニクス半導体コンポーネント。 - 前記接続層(9)が透明導電性酸化物を備えている、
請求項10に記載のオプトエレクトロニクス半導体コンポーネント。 - 前記活性層(5)から見て前記接続層(9)の後ろにミラー層(15)が存在している、
請求項12に記載のオプトエレクトロニクス半導体コンポーネント。 - 前記ミラー層(15)が誘電体ミラーである、
請求項13に記載のオプトエレクトロニクス半導体コンポーネント。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102008052405A DE102008052405A1 (de) | 2008-10-21 | 2008-10-21 | Optoelektronisches Halbleiterbauelement |
DE102008052405.0 | 2008-10-21 | ||
PCT/DE2009/001322 WO2010045907A1 (de) | 2008-10-21 | 2009-09-16 | Optoelektronisches halbleiterbauelement |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012506624A JP2012506624A (ja) | 2012-03-15 |
JP5798035B2 true JP5798035B2 (ja) | 2015-10-21 |
Family
ID=41600865
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011532492A Active JP5798035B2 (ja) | 2008-10-21 | 2009-09-16 | オプトエレクトロニクス半導体コンポーネント |
Country Status (8)
Country | Link |
---|---|
US (1) | US8907359B2 (ja) |
EP (1) | EP2338182B1 (ja) |
JP (1) | JP5798035B2 (ja) |
KR (1) | KR101645755B1 (ja) |
CN (1) | CN102187484B (ja) |
DE (1) | DE102008052405A1 (ja) |
TW (1) | TWI437725B (ja) |
WO (1) | WO2010045907A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102012106998A1 (de) | 2012-07-31 | 2014-02-06 | Osram Opto Semiconductors Gmbh | Reflektierendes Kontaktschichtsystem für ein optoelektronisches Bauelement und Verfahren zu dessen Herstellung |
DE102014115740A1 (de) * | 2014-10-29 | 2016-05-04 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip |
JP6576257B2 (ja) * | 2016-01-29 | 2019-09-18 | 株式会社日立ハイテクノロジーズ | 荷電粒子検出器、及び荷電粒子線装置 |
DE102017119931A1 (de) | 2017-08-30 | 2019-02-28 | Osram Opto Semiconductors Gmbh | Optoelektronisches Halbleiterbauelement |
DE102017123154A1 (de) * | 2017-10-05 | 2019-04-11 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung eines optoelektronischen Bauelements und optoelektronisches Bauelement |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW569474B (en) | 2002-10-25 | 2004-01-01 | Nat Univ Chung Hsing | Superluminent light emitting diode with plated substrate having reflecting mirror and the manufacturing method thereof |
WO2006013698A1 (ja) | 2004-08-02 | 2006-02-09 | Nec Corporation | 窒化物半導体素子、及びその製造方法 |
US7943949B2 (en) * | 2004-09-09 | 2011-05-17 | Bridgelux, Inc. | III-nitride based on semiconductor device with low-resistance ohmic contacts |
WO2006116030A2 (en) * | 2005-04-21 | 2006-11-02 | Aonex Technologies, Inc. | Bonded intermediate substrate and method of making same |
US7335924B2 (en) | 2005-07-12 | 2008-02-26 | Visual Photonics Epitaxy Co., Ltd. | High-brightness light emitting diode having reflective layer |
DE102005046190A1 (de) * | 2005-09-27 | 2007-04-05 | Osram Opto Semiconductors Gmbh | Optoelektronisches Halbleiterbauelement mit Stromaufweitungsschicht |
DE102006015788A1 (de) * | 2006-01-27 | 2007-09-13 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip |
US20080111144A1 (en) * | 2006-11-15 | 2008-05-15 | The Regents Of The University Of California | LIGHT EMITTING DIODE AND LASER DIODE USING N-FACE GaN, InN, AND AlN AND THEIR ALLOYS |
JP2008159606A (ja) | 2006-12-20 | 2008-07-10 | Rohm Co Ltd | 窒化物半導体発光素子およびその製造方法 |
US8021904B2 (en) * | 2007-02-01 | 2011-09-20 | Cree, Inc. | Ohmic contacts to nitrogen polarity GaN |
-
2008
- 2008-10-21 DE DE102008052405A patent/DE102008052405A1/de not_active Withdrawn
-
2009
- 2009-09-16 JP JP2011532492A patent/JP5798035B2/ja active Active
- 2009-09-16 US US13/124,707 patent/US8907359B2/en active Active
- 2009-09-16 CN CN200980141726.4A patent/CN102187484B/zh active Active
- 2009-09-16 WO PCT/DE2009/001322 patent/WO2010045907A1/de active Application Filing
- 2009-09-16 EP EP09748013.1A patent/EP2338182B1/de active Active
- 2009-09-16 KR KR1020117011457A patent/KR101645755B1/ko active IP Right Grant
- 2009-09-28 TW TW098132633A patent/TWI437725B/zh active
Also Published As
Publication number | Publication date |
---|---|
CN102187484A (zh) | 2011-09-14 |
TW201017938A (en) | 2010-05-01 |
KR20110086096A (ko) | 2011-07-27 |
US20110316028A1 (en) | 2011-12-29 |
TWI437725B (zh) | 2014-05-11 |
EP2338182B1 (de) | 2018-11-07 |
WO2010045907A1 (de) | 2010-04-29 |
JP2012506624A (ja) | 2012-03-15 |
CN102187484B (zh) | 2014-08-06 |
EP2338182A1 (de) | 2011-06-29 |
DE102008052405A1 (de) | 2010-04-22 |
US8907359B2 (en) | 2014-12-09 |
KR101645755B1 (ko) | 2016-08-04 |
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