JP2011256946A - 減圧処理装置 - Google Patents
減圧処理装置 Download PDFInfo
- Publication number
- JP2011256946A JP2011256946A JP2010132329A JP2010132329A JP2011256946A JP 2011256946 A JP2011256946 A JP 2011256946A JP 2010132329 A JP2010132329 A JP 2010132329A JP 2010132329 A JP2010132329 A JP 2010132329A JP 2011256946 A JP2011256946 A JP 2011256946A
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- JP
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- ring
- container
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- gas
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- 239000007789 gas Substances 0.000 claims abstract description 37
- 239000011261 inert gas Substances 0.000 claims abstract description 21
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims abstract description 20
- 238000007789 sealing Methods 0.000 claims abstract description 17
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 18
- 229910052782 aluminium Inorganic materials 0.000 claims description 18
- 229920003002 synthetic resin Polymers 0.000 claims description 14
- 239000000057 synthetic resin Substances 0.000 claims description 14
- 239000010935 stainless steel Substances 0.000 claims description 11
- 229910001220 stainless steel Inorganic materials 0.000 claims description 11
- 230000000903 blocking effect Effects 0.000 claims description 8
- 230000006835 compression Effects 0.000 claims description 8
- 238000007906 compression Methods 0.000 claims description 8
- 230000006837 decompression Effects 0.000 claims description 8
- 229910000838 Al alloy Inorganic materials 0.000 claims description 5
- 229920006169 Perfluoroelastomer Polymers 0.000 claims description 3
- 230000001681 protective effect Effects 0.000 claims description 3
- 238000007743 anodising Methods 0.000 claims description 2
- 239000007864 aqueous solution Substances 0.000 claims description 2
- 229920005989 resin Polymers 0.000 claims description 2
- 239000011347 resin Substances 0.000 claims description 2
- 238000000197 pyrolysis Methods 0.000 abstract 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 16
- 238000000034 method Methods 0.000 description 10
- 230000001590 oxidative effect Effects 0.000 description 10
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001973 fluoroelastomer Polymers 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32513—Sealing means, e.g. sealing between different parts of the vessel
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4409—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber characterised by sealing means
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Gasket Seals (AREA)
- Chemical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
- Plasma Technology (AREA)
Abstract
【解決手段】処理容器と蓋体とを気密封止するOリングの外気側に、不活性ガスを流すと共に、Oリングの外気側に形成される気体通路を封止カバーによって覆う構成の外気遮断容器が得られる。更に、Oリングの接触面に、酸化アルミニウム層を形成することによって、Oリングの熱分解温度を上昇させることができる。
【選択図】 図1
Description
圧縮率(%)=(P/D)×100
であらわすことができる。
12 処理容器
14 蓋体
16 気密構造部
18 ガス供給管
19 ガス排出管
20 不活性ガス供給源
22 Oリング
25 封止カバー
12a フランジ部
14a 蓋体突出部
121、141 酸化アルミニウム層
Claims (10)
- 容器と、当該容器上に搭載される蓋体と、前記容器と前記蓋体とを気密に封止する気密構造部とを備え、前記気密構造部は、前記容器と前記蓋体との間に規定される気体通路と、該気体連通路を遮断するシール部とを有し、前記シール部は、Oリングを含むと共に、前記Oリングの外気側に設けられた封止カバーとを有することを特徴とする外気遮断容器。
- 前記Oリングは樹脂製であることを特徴とする請求項1記載の外気遮断容器。
- 前記Oリングの外気側と前記封止カバーとの間の前記基体連通路に対して不活性ガスを流入、流出させるガス流入出口を有することを特徴とする請求項2記載の外気遮断容器。
- 前記ガス流入出口は複数存在することを特徴とする請求項3記載の外気遮断容器。
- 内側に処理空間を規定した処理容器と、当該処理容器上に搭載される蓋体と、前記処理容器と前記蓋体とを気密に封止する気密構造部とを備え、前記気密構造部は前記容器と前記蓋体の間に規定される気体連通路と、該気体連通路を遮断する合成樹脂製のOリングとを有し、前記気体連通路の少なくとも前記Oリングと接触する部分は、酸化アルミニウム層によって形成されていることを特徴とする減圧処理装置。
- 前記酸化アルミニウム層は、アルミ合金の容器の表面を非水溶液での陽極酸化することによって得られた陽極酸化膜であることを特徴とする請求項5記載の減圧処理装置。
- 前記酸化アルミニウム層は、アルミを含有するステンレススチールと、前記ステンレススチールの表面に形成されたアルミ酸化物の保護膜であることを特徴とする請求項5記載の減圧処理装置。
- 前記Oリングの合成樹脂はパーフロロエラストマーであることを特徴とする請求項5〜7のいずれか一項に記載の減圧処理装置。
- 前記気密構造部は、前記Oリングの外気側に設けられた封止カバーを有することを特徴とする請求項5〜8のいずれか一項に記載の減圧処理装置。
- 前記Oリングの圧縮率が10〜30%であることを特徴とする請求項1〜9のいずれか一項に記載の外気遮断容器又は減圧処理装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010132329A JP2011256946A (ja) | 2010-06-09 | 2010-06-09 | 減圧処理装置 |
TW100119370A TWI517201B (zh) | 2010-06-09 | 2011-06-02 | 外側空氣遮斷容器及可減壓處理設備 |
US13/153,796 US20110303361A1 (en) | 2010-06-09 | 2011-06-06 | Outside Air Shut-Off Container and Pressure-Reducible Processing Apparatus |
KR1020110055193A KR20110134846A (ko) | 2010-06-09 | 2011-06-08 | 외기 차단 용기 및 감압 처리 장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010132329A JP2011256946A (ja) | 2010-06-09 | 2010-06-09 | 減圧処理装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2011256946A true JP2011256946A (ja) | 2011-12-22 |
Family
ID=45095269
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010132329A Pending JP2011256946A (ja) | 2010-06-09 | 2010-06-09 | 減圧処理装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20110303361A1 (ja) |
JP (1) | JP2011256946A (ja) |
KR (1) | KR20110134846A (ja) |
TW (1) | TWI517201B (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015178069A (ja) * | 2014-03-19 | 2015-10-08 | 国立大学法人東北大学 | 遠心式薄膜蒸発器及び光学材料用脂環構造含有重合体の製造方法 |
JP2021011594A (ja) * | 2019-07-03 | 2021-02-04 | 東京エレクトロン株式会社 | シール構造、真空処理装置及びシール方法 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20180065277A (ko) | 2016-12-07 | 2018-06-18 | 한밭대학교 산학협력단 | 매트랩 시뮬링크를 활용한 자동차 통신시스템 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004262133A (ja) * | 2003-03-03 | 2004-09-24 | Tadahiro Omi | 樹脂成型機および不働態膜を有する部材 |
JP2008179884A (ja) * | 2006-12-28 | 2008-08-07 | Tohoku Univ | 金属酸化物膜を有する金属部材及びその製造方法 |
JP2009041586A (ja) * | 2007-08-06 | 2009-02-26 | Nok Corp | 密封装置 |
WO2009060756A1 (ja) * | 2007-11-06 | 2009-05-14 | Tohoku University | プラズマ処理装置及び外気遮断容器 |
JP2009206341A (ja) * | 2008-02-28 | 2009-09-10 | Tohoku Univ | マイクロ波プラズマ処理装置、それに用いる誘電体窓部材および誘電体窓部材の製造方法 |
Family Cites Families (11)
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US4943334A (en) * | 1986-09-15 | 1990-07-24 | Compositech Ltd. | Method for making reinforced plastic laminates for use in the production of circuit boards |
US5116216A (en) * | 1991-02-28 | 1992-05-26 | The United States Of America As Represented By The Secretary Of The Navy | Apparatus for preparing thermoplastic composites |
US5561735A (en) * | 1994-08-30 | 1996-10-01 | Vortek Industries Ltd. | Rapid thermal processing apparatus and method |
US6073577A (en) * | 1998-06-30 | 2000-06-13 | Lam Research Corporation | Electrode for plasma processes and method for manufacture and use thereof |
US6444083B1 (en) * | 1999-06-30 | 2002-09-03 | Lam Research Corporation | Corrosion resistant component of semiconductor processing equipment and method of manufacturing thereof |
JP2001185542A (ja) * | 1999-12-27 | 2001-07-06 | Hitachi Ltd | プラズマ処理装置及びそれを用いたプラズマ処理方法 |
JP2004319871A (ja) * | 2003-04-18 | 2004-11-11 | Advanced Lcd Technologies Development Center Co Ltd | 処理装置、処理方法およびプラズマ処理装置 |
WO2005062424A1 (ja) * | 2003-12-18 | 2005-07-07 | Fujitsu Limited | アンテナ装置、電波受信装置、及び、電波送信装置 |
US8821637B2 (en) * | 2007-01-29 | 2014-09-02 | Applied Materials, Inc. | Temperature controlled lid assembly for tungsten nitride deposition |
JP2008192802A (ja) * | 2007-02-05 | 2008-08-21 | Spansion Llc | 半導体製造装置およびその製造方法 |
CN101680090B (zh) * | 2007-06-19 | 2012-11-07 | 东京毅力科创株式会社 | 真空处理装置 |
-
2010
- 2010-06-09 JP JP2010132329A patent/JP2011256946A/ja active Pending
-
2011
- 2011-06-02 TW TW100119370A patent/TWI517201B/zh active
- 2011-06-06 US US13/153,796 patent/US20110303361A1/en not_active Abandoned
- 2011-06-08 KR KR1020110055193A patent/KR20110134846A/ko not_active Application Discontinuation
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004262133A (ja) * | 2003-03-03 | 2004-09-24 | Tadahiro Omi | 樹脂成型機および不働態膜を有する部材 |
JP2008179884A (ja) * | 2006-12-28 | 2008-08-07 | Tohoku Univ | 金属酸化物膜を有する金属部材及びその製造方法 |
JP2009041586A (ja) * | 2007-08-06 | 2009-02-26 | Nok Corp | 密封装置 |
WO2009060756A1 (ja) * | 2007-11-06 | 2009-05-14 | Tohoku University | プラズマ処理装置及び外気遮断容器 |
JP2009206341A (ja) * | 2008-02-28 | 2009-09-10 | Tohoku Univ | マイクロ波プラズマ処理装置、それに用いる誘電体窓部材および誘電体窓部材の製造方法 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015178069A (ja) * | 2014-03-19 | 2015-10-08 | 国立大学法人東北大学 | 遠心式薄膜蒸発器及び光学材料用脂環構造含有重合体の製造方法 |
JP2021011594A (ja) * | 2019-07-03 | 2021-02-04 | 東京エレクトロン株式会社 | シール構造、真空処理装置及びシール方法 |
JP7334507B2 (ja) | 2019-07-03 | 2023-08-29 | 東京エレクトロン株式会社 | シール構造、真空処理装置及びシール方法 |
Also Published As
Publication number | Publication date |
---|---|
TW201205638A (en) | 2012-02-01 |
TWI517201B (zh) | 2016-01-11 |
KR20110134846A (ko) | 2011-12-15 |
US20110303361A1 (en) | 2011-12-15 |
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