JP2011150286A - 光学部品 - Google Patents
光学部品 Download PDFInfo
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- JP2011150286A JP2011150286A JP2010229516A JP2010229516A JP2011150286A JP 2011150286 A JP2011150286 A JP 2011150286A JP 2010229516 A JP2010229516 A JP 2010229516A JP 2010229516 A JP2010229516 A JP 2010229516A JP 2011150286 A JP2011150286 A JP 2011150286A
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- optical component
- refractive index
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- baf
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- 230000003287 optical effect Effects 0.000 title claims abstract description 46
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 claims abstract description 20
- 239000000463 material Substances 0.000 claims abstract description 15
- 230000003746 surface roughness Effects 0.000 claims abstract description 13
- 229910016036 BaF 2 Inorganic materials 0.000 claims description 29
- 239000000758 substrate Substances 0.000 claims description 23
- 239000006104 solid solution Substances 0.000 claims description 7
- 150000002222 fluorine compounds Chemical class 0.000 claims description 6
- -1 lanthanoid fluorides Chemical class 0.000 claims description 5
- 229910052747 lanthanoid Inorganic materials 0.000 claims description 3
- 230000002349 favourable effect Effects 0.000 abstract 2
- 238000002834 transmittance Methods 0.000 abstract 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 7
- 238000010521 absorption reaction Methods 0.000 description 7
- 239000000941 radioactive substance Substances 0.000 description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910017768 LaF 3 Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 238000007707 calorimetry Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
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- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Physical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
Abstract
【解決手段】 基材と赤外反射防止膜とからなる光学部品であって、基材はZnSeからなり、少なくとも一面に赤外反射防止膜が形成されている。また、赤外反射防止膜は、BaF2からなる低屈折率層、ZnSe、ZnSもしくはGeからなる高屈折率層、およびアモルファスもしくは異方性を有する中間層から形成されている。このような構成とすることにより、ThF4を使用しなくとも、高い透過率を有し、表面粗さが良好な光学部品を得ることが出来る。
【選択図】 図1
Description
2 低屈折率層
3 高屈折率層
4 中間層
5 赤外反射防止膜
Claims (8)
- 基材と赤外反射防止膜とからなる光学部品であって、
前記基材はZnSeであり、
前記赤外反射防止膜は、前記基板の少なくとも一面に形成されているとともに、
主としてBaF2からなる低屈折率層と、
ZnSe、ZnSもしくはGeからなる高屈折率層と、
アモルファスもしくは異方性を有する材料からなる中間層からなり、
前記赤外反射防止膜の表面粗さRaが3nm以下であることを特徴とする光学部品。 - 波長10.6μmにおける吸収率が0.25%以下である請求項1に記載の光学部品。
- 波長10.6μmにおける吸収率が0.18%以上0.24%以下である請求項1または2に記載の光学部品。
- 前記中間層はランタノイドのフッ化物、PbF2、YF3からなる群から選ばれる一種類以上のフッ化物からなる層、またはこれらの群から選ばれる一種類以上のフッ化物とBaF2とを含む固溶体からなる層である請求項1〜3いずれかに記載の光学部品。
- 前記中間層は、低屈折率層と基板との間に形成された第1の中間層である請求項1〜4のいずれかに記載の光学部品。
- 前記第1の中間層の厚みは、10nm以上である請求項5に記載の光学部品。
- 前記第1の中間層の厚みは、1000nm以下である請求項5に記載の光学部品。
- 前記中間層は、高屈折率層と低屈折率層との間に形成された第2の中間層をさらに含み、前記第1の中間層の厚みが10nm以上100nm以下である請求項7に記載の光学部品。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010229516A JP5854347B2 (ja) | 2009-12-23 | 2010-10-12 | 光学部品 |
EP11832330.2A EP2535745B1 (en) | 2010-10-12 | 2011-06-20 | Optical component |
US13/634,228 US9188706B2 (en) | 2010-10-12 | 2011-06-20 | Optical element |
KR1020127024202A KR101470718B1 (ko) | 2010-10-12 | 2011-06-20 | 광학 부품 |
PCT/JP2011/064012 WO2012049888A1 (ja) | 2010-10-12 | 2011-06-20 | 光学部品 |
CN201180013633.0A CN102812386B (zh) | 2010-10-12 | 2011-06-20 | 光学元件 |
TW100122067A TWI525335B (zh) | 2010-10-12 | 2011-06-23 | Optical parts |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009291543 | 2009-12-23 | ||
JP2009291543 | 2009-12-23 | ||
JP2010229516A JP5854347B2 (ja) | 2009-12-23 | 2010-10-12 | 光学部品 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011150286A true JP2011150286A (ja) | 2011-08-04 |
JP5854347B2 JP5854347B2 (ja) | 2016-02-09 |
Family
ID=45939055
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010229516A Active JP5854347B2 (ja) | 2009-12-23 | 2010-10-12 | 光学部品 |
Country Status (7)
Country | Link |
---|---|
US (1) | US9188706B2 (ja) |
EP (1) | EP2535745B1 (ja) |
JP (1) | JP5854347B2 (ja) |
KR (1) | KR101470718B1 (ja) |
CN (1) | CN102812386B (ja) |
TW (1) | TWI525335B (ja) |
WO (1) | WO2012049888A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2018193742A1 (ja) * | 2017-04-20 | 2018-10-25 | 信越化学工業株式会社 | 反射防止部材及びその製造方法 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104459835B (zh) * | 2014-12-24 | 2016-06-29 | 南京波长光电科技股份有限公司 | 一种红外玻璃gasir1增透膜及其制备方法 |
CN111630415B (zh) * | 2018-01-25 | 2022-03-01 | 三菱电机株式会社 | 光学部件及激光加工机 |
CN110146943B (zh) * | 2018-12-20 | 2021-03-23 | 上海欧菲尔光电技术有限公司 | 一种硅基底中波红外增透膜及其制备方法 |
CN111090134B (zh) * | 2019-11-21 | 2022-03-29 | 天津津航技术物理研究所 | 硫系玻璃基底激光、中波红外、长波红外复合减反射薄膜 |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS63294501A (ja) * | 1987-05-27 | 1988-12-01 | Nikon Corp | 赤外用光学薄膜 |
JPH06313802A (ja) * | 1993-04-28 | 1994-11-08 | Topcon Corp | 赤外域多層膜 |
JP2000019305A (ja) * | 1998-07-03 | 2000-01-21 | Minolta Co Ltd | 赤外反射防止膜 |
JP2000117482A (ja) * | 1998-10-15 | 2000-04-25 | Sumitomo Electric Ind Ltd | レーザ加工用保護ウィンドウ部材、その再生方法、およびレーザ加工用組レンズ |
JP2000147205A (ja) * | 1998-11-06 | 2000-05-26 | Minolta Co Ltd | 赤外反射防止膜 |
JP2002148407A (ja) * | 2000-11-14 | 2002-05-22 | Sumitomo Electric Ind Ltd | 赤外線レーザ用光学部品とその製造方法 |
JP2003149406A (ja) * | 2002-07-12 | 2003-05-21 | Topcon Corp | 赤外反射防止膜 |
WO2004113966A1 (ja) * | 2003-06-18 | 2004-12-29 | Asahi Kasei Kabushiki Kaisha | 反射防止膜 |
JP2006072031A (ja) * | 2004-09-02 | 2006-03-16 | Mitsubishi Electric Corp | 赤外域用反射防止膜およびこれを用いた赤外線レンズ |
JP2008032804A (ja) * | 2006-07-26 | 2008-02-14 | Jasco Corp | 光学素子 |
JP2009086533A (ja) * | 2007-10-02 | 2009-04-23 | Sumitomo Electric Hardmetal Corp | 赤外用多層膜、赤外反射防止膜及び赤外レーザ用反射ミラー |
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JPS59137901A (ja) * | 1983-01-27 | 1984-08-08 | Matsushita Electric Ind Co Ltd | 反射防止膜 |
JP3249992B2 (ja) * | 1990-12-25 | 2002-01-28 | ミノルタ株式会社 | シリコン基板またはゲルマニウム基板用反射防止膜 |
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-
2010
- 2010-10-12 JP JP2010229516A patent/JP5854347B2/ja active Active
-
2011
- 2011-06-20 KR KR1020127024202A patent/KR101470718B1/ko active IP Right Grant
- 2011-06-20 WO PCT/JP2011/064012 patent/WO2012049888A1/ja active Application Filing
- 2011-06-20 EP EP11832330.2A patent/EP2535745B1/en active Active
- 2011-06-20 US US13/634,228 patent/US9188706B2/en active Active
- 2011-06-20 CN CN201180013633.0A patent/CN102812386B/zh active Active
- 2011-06-23 TW TW100122067A patent/TWI525335B/zh not_active IP Right Cessation
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS63294501A (ja) * | 1987-05-27 | 1988-12-01 | Nikon Corp | 赤外用光学薄膜 |
JPH06313802A (ja) * | 1993-04-28 | 1994-11-08 | Topcon Corp | 赤外域多層膜 |
JP2000019305A (ja) * | 1998-07-03 | 2000-01-21 | Minolta Co Ltd | 赤外反射防止膜 |
JP2000117482A (ja) * | 1998-10-15 | 2000-04-25 | Sumitomo Electric Ind Ltd | レーザ加工用保護ウィンドウ部材、その再生方法、およびレーザ加工用組レンズ |
JP2000147205A (ja) * | 1998-11-06 | 2000-05-26 | Minolta Co Ltd | 赤外反射防止膜 |
JP2002148407A (ja) * | 2000-11-14 | 2002-05-22 | Sumitomo Electric Ind Ltd | 赤外線レーザ用光学部品とその製造方法 |
JP2003149406A (ja) * | 2002-07-12 | 2003-05-21 | Topcon Corp | 赤外反射防止膜 |
WO2004113966A1 (ja) * | 2003-06-18 | 2004-12-29 | Asahi Kasei Kabushiki Kaisha | 反射防止膜 |
JP2006072031A (ja) * | 2004-09-02 | 2006-03-16 | Mitsubishi Electric Corp | 赤外域用反射防止膜およびこれを用いた赤外線レンズ |
JP2008032804A (ja) * | 2006-07-26 | 2008-02-14 | Jasco Corp | 光学素子 |
JP2009086533A (ja) * | 2007-10-02 | 2009-04-23 | Sumitomo Electric Hardmetal Corp | 赤外用多層膜、赤外反射防止膜及び赤外レーザ用反射ミラー |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2018193742A1 (ja) * | 2017-04-20 | 2018-10-25 | 信越化学工業株式会社 | 反射防止部材及びその製造方法 |
CN110537116A (zh) * | 2017-04-20 | 2019-12-03 | 信越化学工业株式会社 | 防反射构件及其制造方法 |
JPWO2018193742A1 (ja) * | 2017-04-20 | 2020-05-21 | 信越化学工業株式会社 | 反射防止部材及びその製造方法 |
CN110537116B (zh) * | 2017-04-20 | 2021-10-29 | 信越化学工业株式会社 | 防反射构件及其制造方法 |
JP7030792B2 (ja) | 2017-04-20 | 2022-03-07 | 信越化学工業株式会社 | 反射防止部材及びその製造方法 |
TWI772388B (zh) * | 2017-04-20 | 2022-08-01 | 日商信越化學工業股份有限公司 | 抗反射構件及其之製造方法 |
US11624858B2 (en) | 2017-04-20 | 2023-04-11 | Shin-Etsu Chemical Co., Ltd. | Antireflective member and method of manufacture therefor |
Also Published As
Publication number | Publication date |
---|---|
JP5854347B2 (ja) | 2016-02-09 |
US20130016425A1 (en) | 2013-01-17 |
KR20120135255A (ko) | 2012-12-12 |
EP2535745A4 (en) | 2017-10-04 |
TW201215909A (en) | 2012-04-16 |
CN102812386A (zh) | 2012-12-05 |
TWI525335B (zh) | 2016-03-11 |
CN102812386B (zh) | 2014-09-24 |
KR101470718B1 (ko) | 2014-12-08 |
US9188706B2 (en) | 2015-11-17 |
EP2535745B1 (en) | 2019-06-19 |
EP2535745A1 (en) | 2012-12-19 |
WO2012049888A1 (ja) | 2012-04-19 |
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