JP2011092855A5 - - Google Patents
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- Publication number
- JP2011092855A5 JP2011092855A5 JP2009248905A JP2009248905A JP2011092855A5 JP 2011092855 A5 JP2011092855 A5 JP 2011092855A5 JP 2009248905 A JP2009248905 A JP 2009248905A JP 2009248905 A JP2009248905 A JP 2009248905A JP 2011092855 A5 JP2011092855 A5 JP 2011092855A5
- Authority
- JP
- Japan
- Prior art keywords
- film
- suction
- coating
- suction table
- roll
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010408 film Substances 0.000 description 142
- 238000000576 coating method Methods 0.000 description 53
- 239000011248 coating agent Substances 0.000 description 51
- 238000001514 detection method Methods 0.000 description 30
- 239000000463 material Substances 0.000 description 19
- 238000004804 winding Methods 0.000 description 19
- 230000003028 elevating effect Effects 0.000 description 12
- 230000002093 peripheral effect Effects 0.000 description 8
- 239000004744 fabric Substances 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 239000007772 electrode material Substances 0.000 description 3
- 239000011810 insulating material Substances 0.000 description 3
- 239000010949 copper Substances 0.000 description 2
- 210000005069 ears Anatomy 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000011669 selenium Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009248905A JP5548426B2 (ja) | 2009-10-29 | 2009-10-29 | インクジェット塗布装置及び方法 |
| TW099135744A TWI485008B (zh) | 2009-10-29 | 2010-10-20 | Ink jet coating apparatus and method |
| US12/914,031 US8967075B2 (en) | 2009-10-29 | 2010-10-28 | Inkjet coating device and inkjet coating method |
| KR1020100105651A KR101287784B1 (ko) | 2009-10-29 | 2010-10-28 | 잉크젯 도포 장치 및 방법 |
| CN201010523356.5A CN102049901B (zh) | 2009-10-29 | 2010-10-28 | 喷墨涂敷装置以及方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009248905A JP5548426B2 (ja) | 2009-10-29 | 2009-10-29 | インクジェット塗布装置及び方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011092855A JP2011092855A (ja) | 2011-05-12 |
| JP2011092855A5 true JP2011092855A5 (enExample) | 2012-10-11 |
| JP5548426B2 JP5548426B2 (ja) | 2014-07-16 |
Family
ID=43954856
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009248905A Expired - Fee Related JP5548426B2 (ja) | 2009-10-29 | 2009-10-29 | インクジェット塗布装置及び方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5548426B2 (enExample) |
| KR (1) | KR101287784B1 (enExample) |
| CN (1) | CN102049901B (enExample) |
| TW (1) | TWI485008B (enExample) |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8383202B2 (en) | 2008-06-13 | 2013-02-26 | Kateeva, Inc. | Method and apparatus for load-locked printing |
| US12018857B2 (en) | 2008-06-13 | 2024-06-25 | Kateeva, Inc. | Gas enclosure assembly and system |
| US10434804B2 (en) | 2008-06-13 | 2019-10-08 | Kateeva, Inc. | Low particle gas enclosure systems and methods |
| US12064979B2 (en) | 2008-06-13 | 2024-08-20 | Kateeva, Inc. | Low-particle gas enclosure systems and methods |
| US11975546B2 (en) | 2008-06-13 | 2024-05-07 | Kateeva, Inc. | Gas enclosure assembly and system |
| JP5529673B2 (ja) * | 2010-08-16 | 2014-06-25 | 中外炉工業株式会社 | 両面塗工装置 |
| DE112012001689T5 (de) | 2011-04-13 | 2014-01-09 | Megtec Systems, Inc. | Verfahren und Vorrichtung zum Beschichten von diskreten Segmenten |
| EP2714284B1 (en) | 2011-06-03 | 2020-04-15 | Durr Systems, Inc. | System with web lifter/stabilizer and associated method |
| US9120344B2 (en) * | 2011-08-09 | 2015-09-01 | Kateeva, Inc. | Apparatus and method for control of print gap |
| CN106299116B (zh) * | 2011-08-09 | 2019-07-12 | 科迪华公司 | 面向下的打印设备和方法 |
| JP5896820B2 (ja) * | 2012-04-19 | 2016-03-30 | 株式会社アルバック | フィルム搬送処理装置 |
| KR20220039837A (ko) * | 2012-08-08 | 2022-03-29 | 카티바, 인크. | 프린팅 시스템 |
| KR20140123362A (ko) * | 2013-04-12 | 2014-10-22 | 삼성디스플레이 주식회사 | 표시 장치용 하부 보호 필름의 컬 발생 방지 장치 |
| US10468279B2 (en) | 2013-12-26 | 2019-11-05 | Kateeva, Inc. | Apparatus and techniques for thermal treatment of electronic devices |
| WO2015112454A1 (en) | 2014-01-21 | 2015-07-30 | Kateeva, Inc. | Apparatus and techniques for electronic device encapsulation |
| CN103801482A (zh) * | 2014-01-25 | 2014-05-21 | 东莞东聚电子电讯制品有限公司 | 一种胶水涂布、贴合工艺 |
| JP6528476B2 (ja) * | 2014-03-17 | 2019-06-12 | 株式会社リコー | 塗布装置及び塗布方法 |
| WO2015168036A1 (en) | 2014-04-30 | 2015-11-05 | Kateeva, Inc. | Gas cushion apparatus and techniques for substrate coating |
| CN104124306B (zh) * | 2014-07-11 | 2016-05-18 | 中国电子科技集团公司第四十八研究所 | 喷墨打印制备光伏电池超细栅电极的传送机构及制备方法 |
| CN104494310B (zh) * | 2014-09-16 | 2017-04-12 | 苏州锐发打印技术有限公司 | 用于太阳能电池网格导线制作的3d打印系统及控制方法 |
| JP6254108B2 (ja) | 2015-01-07 | 2017-12-27 | 住友化学株式会社 | 有機elパネルの製造方法 |
| CN105690997A (zh) * | 2016-02-15 | 2016-06-22 | 山东丽鹏股份有限公司 | 板材自动赋码机 |
| JP6782087B2 (ja) * | 2016-03-28 | 2020-11-11 | 株式会社日本マイクロニクス | シート治具、ステージ、製造装置、及び二次電池の製造方法 |
| JP6953823B2 (ja) * | 2017-06-20 | 2021-10-27 | 東洋紡株式会社 | 液体塗布装置、および液体塗布方法。 |
| CN107284032A (zh) * | 2017-08-02 | 2017-10-24 | 中国建筑设计院有限公司 | 一种用于全自动数码蓝图打印机的打印喷头保护装置 |
| KR102410347B1 (ko) * | 2017-09-04 | 2022-06-17 | 세메스 주식회사 | 기판 처리 장치 및 기판 처리 방법 |
| WO2020242867A1 (en) | 2019-05-31 | 2020-12-03 | Kateeva, Inc. | Printer calibration module |
| CN110538777B (zh) * | 2019-09-24 | 2024-12-27 | 威格科技(苏州)股份有限公司 | 一种用于薄柔薄膜基底的固定平台 |
| EP3925787A1 (en) * | 2020-06-19 | 2021-12-22 | Agfa Nv | Inkjet printing method |
| EP3925788B1 (en) * | 2020-06-19 | 2023-02-15 | Agfa Nv | Inkjet printing method |
| JP7391437B1 (ja) * | 2023-05-01 | 2023-12-05 | トムビジネスコンサルティング有限会社 | 表示部形成装置、表示部形成システム、及び表示部形成方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5248233Y2 (enExample) * | 1974-04-18 | 1977-11-01 | ||
| JPS6098629U (ja) * | 1983-12-09 | 1985-07-05 | 三菱重工業株式会社 | 横延伸機 |
| JP2551203B2 (ja) * | 1990-06-05 | 1996-11-06 | 三菱電機株式会社 | 半導体装置 |
| JPH09239968A (ja) * | 1996-03-06 | 1997-09-16 | Toray Ind Inc | プリント装置及びプリント製品の製造方法 |
| US7073902B2 (en) * | 2001-03-30 | 2006-07-11 | L&P Property Management Company | Method and apparatus for ink jet printing |
| JP2003211652A (ja) * | 2002-01-25 | 2003-07-29 | Konica Corp | インクジェットプリンタ |
| JP4042737B2 (ja) * | 2004-10-27 | 2008-02-06 | セイコーエプソン株式会社 | パターン形成システム |
| JP4654948B2 (ja) * | 2006-03-10 | 2011-03-23 | セイコーエプソン株式会社 | 吐出検査装置、液滴吐出装置および電気光学装置の製造方法 |
| JP4848869B2 (ja) * | 2006-07-13 | 2011-12-28 | セイコーエプソン株式会社 | 描画装置 |
| JP5292834B2 (ja) * | 2008-01-29 | 2013-09-18 | Nkワークス株式会社 | デカール機構 |
| JP4983623B2 (ja) * | 2008-01-29 | 2012-07-25 | Nkワークス株式会社 | デカール機構 |
| JP4985434B2 (ja) * | 2008-01-29 | 2012-07-25 | Nkワークス株式会社 | デカール機構 |
-
2009
- 2009-10-29 JP JP2009248905A patent/JP5548426B2/ja not_active Expired - Fee Related
-
2010
- 2010-10-20 TW TW099135744A patent/TWI485008B/zh not_active IP Right Cessation
- 2010-10-28 CN CN201010523356.5A patent/CN102049901B/zh not_active Expired - Fee Related
- 2010-10-28 KR KR1020100105651A patent/KR101287784B1/ko not_active Expired - Fee Related
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