JP2011080142A5 - - Google Patents

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Publication number
JP2011080142A5
JP2011080142A5 JP2010198850A JP2010198850A JP2011080142A5 JP 2011080142 A5 JP2011080142 A5 JP 2011080142A5 JP 2010198850 A JP2010198850 A JP 2010198850A JP 2010198850 A JP2010198850 A JP 2010198850A JP 2011080142 A5 JP2011080142 A5 JP 2011080142A5
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JP
Japan
Prior art keywords
compound
workpiece
precursor gas
purification
nitrogen
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JP2010198850A
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English (en)
Japanese (ja)
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JP2011080142A (ja
JP5677700B2 (ja
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Priority claimed from US12/565,707 external-priority patent/US8617668B2/en
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Publication of JP2011080142A publication Critical patent/JP2011080142A/ja
Publication of JP2011080142A5 publication Critical patent/JP2011080142A5/ja
Application granted granted Critical
Publication of JP5677700B2 publication Critical patent/JP5677700B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2010198850A 2009-09-23 2010-09-06 ビーム誘起処理における窒素ベース化合物の使用 Expired - Fee Related JP5677700B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/565,707 2009-09-23
US12/565,707 US8617668B2 (en) 2009-09-23 2009-09-23 Method of using nitrogen based compounds to reduce contamination in beam-induced thin film deposition

Publications (3)

Publication Number Publication Date
JP2011080142A JP2011080142A (ja) 2011-04-21
JP2011080142A5 true JP2011080142A5 (enExample) 2013-10-24
JP5677700B2 JP5677700B2 (ja) 2015-02-25

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JP2010198850A Expired - Fee Related JP5677700B2 (ja) 2009-09-23 2010-09-06 ビーム誘起処理における窒素ベース化合物の使用

Country Status (3)

Country Link
US (1) US8617668B2 (enExample)
EP (1) EP2309020B1 (enExample)
JP (1) JP5677700B2 (enExample)

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