JP2011077549A5 - - Google Patents

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Publication number
JP2011077549A5
JP2011077549A5 JP2010290886A JP2010290886A JP2011077549A5 JP 2011077549 A5 JP2011077549 A5 JP 2011077549A5 JP 2010290886 A JP2010290886 A JP 2010290886A JP 2010290886 A JP2010290886 A JP 2010290886A JP 2011077549 A5 JP2011077549 A5 JP 2011077549A5
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JP
Japan
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block
substrate
carrier
processing
resist film
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JP2010290886A
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English (en)
Japanese (ja)
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JP2011077549A (ja
JP4935927B2 (ja
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Priority to JP2010290886A priority Critical patent/JP4935927B2/ja
Priority claimed from JP2010290886A external-priority patent/JP4935927B2/ja
Publication of JP2011077549A publication Critical patent/JP2011077549A/ja
Publication of JP2011077549A5 publication Critical patent/JP2011077549A5/ja
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Publication of JP4935927B2 publication Critical patent/JP4935927B2/ja
Expired - Fee Related legal-status Critical Current
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JP2010290886A 2010-12-27 2010-12-27 塗布装置、現像装置、塗布方法、現像方法及び記憶媒体 Expired - Fee Related JP4935927B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2010290886A JP4935927B2 (ja) 2010-12-27 2010-12-27 塗布装置、現像装置、塗布方法、現像方法及び記憶媒体

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010290886A JP4935927B2 (ja) 2010-12-27 2010-12-27 塗布装置、現像装置、塗布方法、現像方法及び記憶媒体

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2006112704A Division JP4816217B2 (ja) 2006-04-14 2006-04-14 塗布、現像装置、塗布、現像方法及び記憶媒体

Publications (3)

Publication Number Publication Date
JP2011077549A JP2011077549A (ja) 2011-04-14
JP2011077549A5 true JP2011077549A5 (enExample) 2011-10-13
JP4935927B2 JP4935927B2 (ja) 2012-05-23

Family

ID=44021125

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010290886A Expired - Fee Related JP4935927B2 (ja) 2010-12-27 2010-12-27 塗布装置、現像装置、塗布方法、現像方法及び記憶媒体

Country Status (1)

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JP (1) JP4935927B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5459279B2 (ja) * 2011-09-02 2014-04-02 東京エレクトロン株式会社 基板処理装置、基板処理方法及び記憶媒体
JP2014022578A (ja) * 2012-07-19 2014-02-03 Tokyo Electron Ltd 処理液供給装置及び処理液供給方法
JP7050735B2 (ja) * 2019-10-02 2022-04-08 東京エレクトロン株式会社 塗布、現像装置及び塗布、現像方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100348938B1 (ko) * 1999-12-06 2002-08-14 한국디엔에스 주식회사 포토리소그라피 공정을 위한 반도체 제조장치
JP2002329661A (ja) * 2001-04-27 2002-11-15 Yoshitake Ito 基板処理装置及び基板処理方法及び基板の製造方法
JP2003158056A (ja) * 2001-11-21 2003-05-30 Tokyo Electron Ltd パターン形成システム
JP4357861B2 (ja) * 2003-04-07 2009-11-04 大日本スクリーン製造株式会社 基板処理装置
JP4202220B2 (ja) * 2003-09-22 2008-12-24 大日本スクリーン製造株式会社 検査装置、基板処理装置および基板処理方法
JP2005142372A (ja) * 2003-11-06 2005-06-02 Tokyo Electron Ltd 基板処理装置及び基板処理方法
JP4381121B2 (ja) * 2003-12-11 2009-12-09 大日本スクリーン製造株式会社 基板処理装置

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