JP4935927B2 - 塗布装置、現像装置、塗布方法、現像方法及び記憶媒体 - Google Patents

塗布装置、現像装置、塗布方法、現像方法及び記憶媒体 Download PDF

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JP4935927B2
JP4935927B2 JP2010290886A JP2010290886A JP4935927B2 JP 4935927 B2 JP4935927 B2 JP 4935927B2 JP 2010290886 A JP2010290886 A JP 2010290886A JP 2010290886 A JP2010290886 A JP 2010290886A JP 4935927 B2 JP4935927 B2 JP 4935927B2
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substrate
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resist film
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JP2011077549A5 (enExample
JP2011077549A (ja
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伸明 松岡
林田　　安
伸一 林
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Tokyo Electron Ltd
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JP2010290886A 2010-12-27 2010-12-27 塗布装置、現像装置、塗布方法、現像方法及び記憶媒体 Expired - Fee Related JP4935927B2 (ja)

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JP2011077549A5 JP2011077549A5 (enExample) 2011-10-13
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Families Citing this family (3)

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Publication number Priority date Publication date Assignee Title
JP5459279B2 (ja) * 2011-09-02 2014-04-02 東京エレクトロン株式会社 基板処理装置、基板処理方法及び記憶媒体
JP2014022578A (ja) * 2012-07-19 2014-02-03 Tokyo Electron Ltd 処理液供給装置及び処理液供給方法
JP7050735B2 (ja) * 2019-10-02 2022-04-08 東京エレクトロン株式会社 塗布、現像装置及び塗布、現像方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
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KR100348938B1 (ko) * 1999-12-06 2002-08-14 한국디엔에스 주식회사 포토리소그라피 공정을 위한 반도체 제조장치
JP2002329661A (ja) * 2001-04-27 2002-11-15 Yoshitake Ito 基板処理装置及び基板処理方法及び基板の製造方法
JP2003158056A (ja) * 2001-11-21 2003-05-30 Tokyo Electron Ltd パターン形成システム
JP4357861B2 (ja) * 2003-04-07 2009-11-04 大日本スクリーン製造株式会社 基板処理装置
JP4202220B2 (ja) * 2003-09-22 2008-12-24 大日本スクリーン製造株式会社 検査装置、基板処理装置および基板処理方法
JP2005142372A (ja) * 2003-11-06 2005-06-02 Tokyo Electron Ltd 基板処理装置及び基板処理方法
JP4381121B2 (ja) * 2003-12-11 2009-12-09 大日本スクリーン製造株式会社 基板処理装置

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