JP4129215B2 - 基板処理装置 - Google Patents
基板処理装置 Download PDFInfo
- Publication number
- JP4129215B2 JP4129215B2 JP2003324432A JP2003324432A JP4129215B2 JP 4129215 B2 JP4129215 B2 JP 4129215B2 JP 2003324432 A JP2003324432 A JP 2003324432A JP 2003324432 A JP2003324432 A JP 2003324432A JP 4129215 B2 JP4129215 B2 JP 4129215B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- processing
- block
- unit
- transfer robot
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67276—Production flow monitoring, e.g. for increasing throughput
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
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- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Description
図1は、第1実施形態の基板処理装置の平面図である。また、図2は基板処理装置の液処理部の正面図であり、図3は熱処理部の正面図であり、図4は基板載置部の周辺構成を示す図である。なお、図1から図4にはそれらの方向関係を明確にするためZ軸方向を鉛直方向とし、XY平面を水平面とするXYZ直交座標系を付している。
次に、本発明の第2実施形態について説明する。第2実施形態の基板処理装置の装置構成および基板Wの処理手順は第1実施形態と同じである。第2実施形態が第1実施形態と異なるのは、処理不良の基板Wが検出されたときの異常箇所の特定手法である。
次に、本発明の第3実施形態について説明する。第3実施形態の基板処理装置の装置構成は第1実施形態と同じである。第3実施形態における基板Wのフォトリソグラフィー処理の手順も第1実施形態と概ね同じであるが、但し、第3実施形態では基板Wの検査を行わず、処理に供される基板Wは検査ブロックIBを単に通過するだけである。従って、第3実施形態では、検査ブロックIBにて処理不良の基板Wが検出されることはない。
以上、本発明の実施の形態について説明したが、この発明は上記の例に限定されるものではない。例えば、上記実施形態においてはメインコントローラMCが処理履歴データと基準データとの比較を行うようにしていたが、各ユニットコントローラやセルコントローラCCが処理履歴データの判定を行うようにしても良い。また、上記基板処理装置をデータ収集専用のサーバに接続し、そのデータ収集専用サーバが基板処理装置から送信された処理履歴データの判定を行うようにしても良い。
2 バークブロック
3 レジスト塗布ブロック
4 現像処理ブロック
5 インターフェイスブロック
12 基板移載機構
21,31,41,42 熱処理タワー
55 搬送機構
80 膜厚測定ユニット
85 線幅測定ユニット
90 マクロ欠陥検査ユニット
AHL1〜AHL3 密着強化処理部
BRC1〜BRC3,SC1〜SC3 塗布処理ユニット
C キャリア
CC セルコントローラ
CP1〜CP13 クールプレート
HP1〜HP11 ホットプレート
IB 検査ブロック
MC メインコントローラ
MP メインパネル
PASS1〜PASS12 基板載置部
PHP1〜PHP12 加熱部
SD1〜SD5 現像処理ユニット
TC 搬送ロボットコントローラ
TR1〜TR5 搬送ロボット
W 基板
Claims (1)
- 搬送ロボットによって基板を複数の処理部に搬送して該基板に所定の処理を行う基板処理装置であって、
前記基板に前記所定の処理を行ったときの当該基板についての処理の履歴を前記搬送ロボットおよび前記複数の処理部のそれぞれごとに集積した処理履歴データを取得する取得手段と、
前記取得手段によって取得された処理履歴データが予め設定された所定範囲内に収まっているか否かを判定することによって不良の処理部または搬送ロボットを特定する不良処理部特定手段と、
前記所定の処理が完了した基板または処理途中の基板の検査を行う検査部と、
を備え、
前記検査部によって処理不良の基板が検出されたときに、前記不良処理部特定手段はその処理不良の内容と予め関連付けられた処理部および搬送ロボットについての当該基板に処理を行ったときの処理履歴データの判定を他の処理部および搬送ロボットについての処理履歴データの判定よりも優先して行って不良の処理部または搬送ロボットを特定することを特徴とする基板処理装置。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003324432A JP4129215B2 (ja) | 2003-09-17 | 2003-09-17 | 基板処理装置 |
US10/940,158 US7128481B2 (en) | 2003-09-17 | 2004-09-14 | Substrate processing apparatus for inspecting processing history data |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003324432A JP4129215B2 (ja) | 2003-09-17 | 2003-09-17 | 基板処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005093671A JP2005093671A (ja) | 2005-04-07 |
JP4129215B2 true JP4129215B2 (ja) | 2008-08-06 |
Family
ID=34270063
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003324432A Expired - Fee Related JP4129215B2 (ja) | 2003-09-17 | 2003-09-17 | 基板処理装置 |
Country Status (2)
Country | Link |
---|---|
US (1) | US7128481B2 (ja) |
JP (1) | JP4129215B2 (ja) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4955977B2 (ja) * | 2005-01-21 | 2012-06-20 | 東京エレクトロン株式会社 | 塗布、現像装置及びその方法 |
KR100752357B1 (ko) * | 2005-10-19 | 2007-08-27 | 오에프티 주식회사 | 멀티 스피너 |
JP4882505B2 (ja) | 2006-05-19 | 2012-02-22 | 東京エレクトロン株式会社 | 異物分布パターンの照合方法及びその装置 |
JP4877075B2 (ja) * | 2007-05-29 | 2012-02-15 | 東京エレクトロン株式会社 | 塗布、現像装置及び塗布、現像装置の運転方法並びに記憶媒体 |
KR100904392B1 (ko) * | 2007-06-18 | 2009-06-26 | 세메스 주식회사 | 기판 처리 장치 |
JP5392190B2 (ja) * | 2010-06-01 | 2014-01-22 | 東京エレクトロン株式会社 | 基板処理システム及び基板処理方法 |
JP5590201B2 (ja) * | 2013-08-13 | 2014-09-17 | 東京エレクトロン株式会社 | 塗布、現像装置、塗布、現像方法及び記憶媒体 |
JP2013243406A (ja) * | 2013-08-13 | 2013-12-05 | Tokyo Electron Ltd | 塗布、現像装置、塗布、現像方法及び記憶媒体 |
JP5644916B2 (ja) * | 2013-08-13 | 2014-12-24 | 東京エレクトロン株式会社 | 塗布、現像装置 |
US20150192924A1 (en) * | 2014-01-03 | 2015-07-09 | Samsung Electronics Co., Ltd. | Method of monitoring environmental variations in a semiconductor fabrication equipment and apparatus for performing the same |
US10651066B2 (en) * | 2017-11-24 | 2020-05-12 | Taiwan Semiconductor Manufacturing Co., Ltd. | Metrology method in wafer transportation |
KR102622988B1 (ko) * | 2020-08-28 | 2024-01-10 | 세메스 주식회사 | 기판 처리 장치 모니터링 방법 및 기판 처리 장치 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6701204B1 (en) * | 2000-05-22 | 2004-03-02 | Mosel Vitelic Inc. | System and method for finding defective tools in a semiconductor fabrication facility |
JP2002280278A (ja) | 2001-03-15 | 2002-09-27 | Toshiba Corp | 半導体製造装置の制御方法及びその制御システム |
JP3957475B2 (ja) | 2001-05-18 | 2007-08-15 | 東京エレクトロン株式会社 | 基板処理装置 |
JP3870052B2 (ja) * | 2001-09-20 | 2007-01-17 | 株式会社日立製作所 | 半導体装置の製造方法及び欠陥検査データ処理方法 |
-
2003
- 2003-09-17 JP JP2003324432A patent/JP4129215B2/ja not_active Expired - Fee Related
-
2004
- 2004-09-14 US US10/940,158 patent/US7128481B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US7128481B2 (en) | 2006-10-31 |
US20050058447A1 (en) | 2005-03-17 |
JP2005093671A (ja) | 2005-04-07 |
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