JP2010538147A5 - - Google Patents
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- Publication number
- JP2010538147A5 JP2010538147A5 JP2010524107A JP2010524107A JP2010538147A5 JP 2010538147 A5 JP2010538147 A5 JP 2010538147A5 JP 2010524107 A JP2010524107 A JP 2010524107A JP 2010524107 A JP2010524107 A JP 2010524107A JP 2010538147 A5 JP2010538147 A5 JP 2010538147A5
- Authority
- JP
- Japan
- Prior art keywords
- refractive index
- index layer
- low refractive
- low
- coating composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000203 mixture Substances 0.000 claims description 20
- 239000008199 coating composition Substances 0.000 claims description 19
- 239000002105 nanoparticle Substances 0.000 claims description 14
- 125000001153 fluoro group Chemical group F* 0.000 claims description 9
- 239000011368 organic material Substances 0.000 claims description 8
- 230000003667 anti-reflective effect Effects 0.000 claims description 5
- 239000012756 surface treatment agent Substances 0.000 claims description 5
- 239000002904 solvent Substances 0.000 claims description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 7
- 229910000077 silane Inorganic materials 0.000 description 7
- 238000000034 method Methods 0.000 description 5
- 229920000058 polyacrylate Polymers 0.000 description 5
- 229920002313 fluoropolymer Polymers 0.000 description 4
- 150000002902 organometallic compounds Chemical class 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 239000004721 Polyphenylene oxide Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 229920000570 polyether Polymers 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- ZYMKZMDQUPCXRP-UHFFFAOYSA-N fluoro prop-2-enoate Chemical compound FOC(=O)C=C ZYMKZMDQUPCXRP-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000004971 Cross linker Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910003455 mixed metal oxide Inorganic materials 0.000 description 1
- 239000007777 multifunctional material Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- RQAGEUFKLGHJPA-UHFFFAOYSA-N prop-2-enoylsilicon Chemical compound [Si]C(=O)C=C RQAGEUFKLGHJPA-UHFFFAOYSA-N 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US97054107P | 2007-09-07 | 2007-09-07 | |
| PCT/US2008/074988 WO2009035874A1 (en) | 2007-09-07 | 2008-09-02 | Self-assembling antireflective coating comprising surface modified high refractive index nanoparticles |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010538147A JP2010538147A (ja) | 2010-12-09 |
| JP2010538147A5 true JP2010538147A5 (enExample) | 2011-09-29 |
Family
ID=40014981
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010524107A Pending JP2010538147A (ja) | 2007-09-07 | 2008-09-02 | 表面改質高屈折率ナノ粒子を含む自己組織化反射防止コーティング |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8202573B2 (enExample) |
| EP (1) | EP2193174A1 (enExample) |
| JP (1) | JP2010538147A (enExample) |
| KR (1) | KR20100080788A (enExample) |
| CN (1) | CN101796146B (enExample) |
| WO (1) | WO2009035874A1 (enExample) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2215171B1 (en) * | 2007-11-29 | 2013-07-03 | LG Chem, Ltd. | Coating composition and coating film having enhanced abrasion resistance and fingerprint traces removability |
| EP2456823A4 (en) | 2009-07-21 | 2012-12-26 | 3M Innovative Properties Co | CURABLE COMPOSITION, METHOD FOR COATING A PHOTO TOOL, AND COATED PHOTO TOOL |
| EP2478034A1 (en) * | 2009-09-16 | 2012-07-25 | 3M Innovative Properties Company | Fluorinated coating and phototools made therewith |
| US9127171B2 (en) * | 2010-07-08 | 2015-09-08 | Lg Chem, Ltd. | Anti-reflection film and method for manufacturing the same |
| JP6142531B2 (ja) * | 2010-12-22 | 2017-06-07 | 三菱ケミカル株式会社 | 転写フィルムおよびその製造方法並びに積層体およびその製造方法 |
| WO2012121858A1 (en) * | 2011-03-09 | 2012-09-13 | 3M Innovative Properties Company | Antireflective film comprising large particle size fumed silica |
| US9272947B2 (en) * | 2011-05-02 | 2016-03-01 | Corning Incorporated | Glass article having antireflective layer and method of making |
| US8568958B2 (en) * | 2011-06-21 | 2013-10-29 | Az Electronic Materials Usa Corp. | Underlayer composition and process thereof |
| CN103764567A (zh) * | 2011-08-31 | 2014-04-30 | 住友大阪水泥股份有限公司 | 无机氧化物透明分散液、透明复合体形成用树脂组合物及透明复合体以及光学构件 |
| JP2015511254A (ja) * | 2012-02-01 | 2015-04-16 | スリーエム イノベイティブ プロパティズ カンパニー | ナノ構造化材料及び同材料を製造する方法 |
| CN102759761B (zh) * | 2012-07-17 | 2014-10-08 | 宁波激智科技股份有限公司 | 一种高遮盖高辉度的光学薄膜及包括该光学薄膜的显示器件 |
| FR3009302B1 (fr) * | 2013-08-05 | 2018-01-12 | Saint-Gobain Glass France | Substrat portant un revetement fonctionnel et une couche de protection temporaire |
| US10213993B2 (en) | 2013-12-19 | 2019-02-26 | 3M Innovative Properties Company | Multilayer composite article |
| US9994676B2 (en) | 2014-06-23 | 2018-06-12 | 3M Innovative Properties Company | Silicon-containing polymer and method of making a silicon-containing polymer |
| JP2016097594A (ja) * | 2014-11-21 | 2016-05-30 | マツダ株式会社 | 積層塗膜及び塗装物 |
| US9499698B2 (en) | 2015-02-11 | 2016-11-22 | Az Electronic Materials (Luxembourg)S.A.R.L. | Metal hardmask composition and processes for forming fine patterns on semiconductor substrates |
| EP3271418A1 (en) * | 2015-03-18 | 2018-01-24 | CoeLux S.r.l. | Composite system comprising a matrix and scattering elements, process for preparing it and use thereof |
| CN104845484B (zh) * | 2015-04-29 | 2017-03-08 | 广德嘉宝莉化工有限公司 | 一种高机械性能防水工程机械涂料 |
| JP6688875B2 (ja) * | 2016-03-14 | 2020-04-28 | 富士フイルム株式会社 | 組成物、膜、硬化膜、光学センサおよび膜の製造方法 |
| HUP1600384A1 (hu) * | 2016-06-15 | 2018-01-29 | Hungaro Lux Light Kft | Antireflexiós bevonat |
| US11042091B2 (en) | 2017-09-06 | 2021-06-22 | Merck Patent Gmbh | Spin-on inorganic oxide containing composition useful as hard masks and filling materials with improved thermal stability |
| KR102731347B1 (ko) * | 2017-12-08 | 2024-11-15 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 가요성 하드코트 |
| KR102709863B1 (ko) * | 2018-03-30 | 2024-09-26 | 니끼 쇼꾸바이 카세이 가부시키가이샤 | 막 형성용 도포액 및 막이 형성된 기재의 제조 방법 |
| KR102522013B1 (ko) | 2018-04-04 | 2023-04-14 | 삼성전자주식회사 | 고분자 및 무기입자를 포함하는 조성물, 폴리이미드-무기입자 복합체, 상기 복합체를 포함하는 성형품, 및 상기 성형품을 포함하는 광학 장치 |
| KR102032316B1 (ko) * | 2018-07-09 | 2019-10-15 | 에스케이씨 주식회사 | 광학 다층 필름, 이를 포함하는 광학 부품 및 표시장치 |
| CN113272136B (zh) * | 2019-01-10 | 2023-07-14 | 大日本印刷株式会社 | 防反射构件、以及具备该防反射构件的偏振片、图像显示装置和防反射性物品 |
| WO2021111297A1 (en) | 2019-12-06 | 2021-06-10 | 3M Innovative Properties Company | Optical layer and optical system |
| CN111440382B (zh) * | 2020-04-14 | 2022-11-25 | 江苏源源山富数码喷绘科技有限公司 | 一种冷裱膜用柔性pp颗粒及其制备方法 |
| WO2021216518A1 (en) * | 2020-04-21 | 2021-10-28 | Ppg Industries Ohio, Inc. | Retroreflective coating compositions, coatings formed therefrom, and methods of forming such coatings |
| CN120740764B (zh) * | 2025-08-26 | 2025-12-09 | 秦皇岛微晶科技有限公司 | 一种防爆窗口结构及其制备方法和应用 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06211945A (ja) | 1993-01-20 | 1994-08-02 | Nissin High Voltage Co Ltd | ハードコートシートとその製造方法 |
| US6589650B1 (en) | 2000-08-07 | 2003-07-08 | 3M Innovative Properties Company | Microscope cover slip materials |
| DE19829172A1 (de) | 1998-06-30 | 2000-01-05 | Univ Konstanz | Verfahren zur Herstellung von Antireflexschichten |
| JP3897938B2 (ja) | 1998-10-22 | 2007-03-28 | 宇部日東化成株式会社 | 有機−無機複合傾斜材料、その製造方法及びその用途 |
| JP3760669B2 (ja) | 1999-04-22 | 2006-03-29 | 株式会社Ｎｈｖコーポレーション | ハードコートシートとその製造方法 |
| US7125926B2 (en) | 2001-03-21 | 2006-10-24 | Daikin Industries, Ltd. | Surface treatment agent comprising inorganic-organic hybrid material |
| AU2002246458A1 (en) * | 2001-03-30 | 2002-10-15 | Dsm Ip Assets B.V. | Curable composition, cured product thereof, and laminated material |
| WO2003102500A1 (en) | 2002-06-04 | 2003-12-11 | Olympus Corporation | Method of obtaining 3-d coordinates |
| US20060074172A1 (en) | 2002-09-19 | 2006-04-06 | Optimax Technology Corporation | Antiglare and antireflection coatings of surface active nanoparticles |
| EP1418448A1 (en) | 2002-11-06 | 2004-05-12 | Koninklijke DSM N.V. | Preparation of a mechanically durable single layer coating with anti-reflective properties |
| JP3960307B2 (ja) * | 2003-05-15 | 2007-08-15 | Ｊｓｒ株式会社 | 液状樹脂組成物、硬化膜及び積層体 |
| JP2005148376A (ja) * | 2003-11-14 | 2005-06-09 | Sumitomo Osaka Cement Co Ltd | 膜及び反射防止膜 |
| WO2005090473A1 (ja) * | 2004-03-18 | 2005-09-29 | Jsr Corporation | 積層体の製造方法 |
| WO2006030721A1 (en) | 2004-09-13 | 2006-03-23 | Fujifilm Corporation | Anti-reflection film, polarizing plate, and liquid crystal display device |
| JP5075333B2 (ja) * | 2005-11-11 | 2012-11-21 | 富士フイルム株式会社 | 光学フィルム、偏光板、及び画像表示装置 |
| US7615283B2 (en) | 2006-06-13 | 2009-11-10 | 3M Innovative Properties Company | Fluoro(meth)acrylate polymer composition suitable for low index layer of antireflective film |
| US20070286994A1 (en) * | 2006-06-13 | 2007-12-13 | Walker Christopher B | Durable antireflective film |
| US20100291364A1 (en) | 2007-12-19 | 2010-11-18 | E.I. Dupont Nemours And Company | Bilayer anti-reflective films containing nanoparticles in both layers |
-
2008
- 2008-09-02 WO PCT/US2008/074988 patent/WO2009035874A1/en not_active Ceased
- 2008-09-02 KR KR1020107007453A patent/KR20100080788A/ko not_active Ceased
- 2008-09-02 JP JP2010524107A patent/JP2010538147A/ja active Pending
- 2008-09-02 CN CN2008801058962A patent/CN101796146B/zh not_active Expired - Fee Related
- 2008-09-02 EP EP08799058A patent/EP2193174A1/en not_active Withdrawn
- 2008-09-02 US US12/670,124 patent/US8202573B2/en not_active Expired - Fee Related
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