JP2010538147A5 - - Google Patents
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- Publication number
- JP2010538147A5 JP2010538147A5 JP2010524107A JP2010524107A JP2010538147A5 JP 2010538147 A5 JP2010538147 A5 JP 2010538147A5 JP 2010524107 A JP2010524107 A JP 2010524107A JP 2010524107 A JP2010524107 A JP 2010524107A JP 2010538147 A5 JP2010538147 A5 JP 2010538147A5
- Authority
- JP
- Japan
- Prior art keywords
- refractive index
- index layer
- low refractive
- low
- coating composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000203 mixture Substances 0.000 claims description 20
- 239000008199 coating composition Substances 0.000 claims description 19
- 239000002105 nanoparticle Substances 0.000 claims description 14
- 125000001153 fluoro group Chemical group F* 0.000 claims description 9
- 239000011368 organic material Substances 0.000 claims description 8
- 230000003667 anti-reflective effect Effects 0.000 claims description 5
- 239000012756 surface treatment agent Substances 0.000 claims description 5
- 239000002904 solvent Substances 0.000 claims description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 7
- 229910000077 silane Inorganic materials 0.000 description 7
- 238000000034 method Methods 0.000 description 5
- 229920000058 polyacrylate Polymers 0.000 description 5
- 229920002313 fluoropolymer Polymers 0.000 description 4
- 150000002902 organometallic compounds Chemical class 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 239000004721 Polyphenylene oxide Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 229920000570 polyether Polymers 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- ZYMKZMDQUPCXRP-UHFFFAOYSA-N fluoro prop-2-enoate Chemical compound FOC(=O)C=C ZYMKZMDQUPCXRP-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000004971 Cross linker Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910003455 mixed metal oxide Inorganic materials 0.000 description 1
- 239000007777 multifunctional material Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- RQAGEUFKLGHJPA-UHFFFAOYSA-N prop-2-enoylsilicon Chemical compound [Si]C(=O)C=C RQAGEUFKLGHJPA-UHFFFAOYSA-N 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US97054107P | 2007-09-07 | 2007-09-07 | |
| PCT/US2008/074988 WO2009035874A1 (en) | 2007-09-07 | 2008-09-02 | Self-assembling antireflective coating comprising surface modified high refractive index nanoparticles |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010538147A JP2010538147A (ja) | 2010-12-09 |
| JP2010538147A5 true JP2010538147A5 (enExample) | 2011-09-29 |
Family
ID=40014981
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010524107A Pending JP2010538147A (ja) | 2007-09-07 | 2008-09-02 | 表面改質高屈折率ナノ粒子を含む自己組織化反射防止コーティング |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8202573B2 (enExample) |
| EP (1) | EP2193174A1 (enExample) |
| JP (1) | JP2010538147A (enExample) |
| KR (1) | KR20100080788A (enExample) |
| CN (1) | CN101796146B (enExample) |
| WO (1) | WO2009035874A1 (enExample) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101878276B (zh) * | 2007-11-29 | 2013-08-07 | Lg化学株式会社 | 具有增强的耐磨性和指纹痕迹可除去性的涂料组合物和涂膜 |
| CN102597116B (zh) | 2009-07-21 | 2013-12-11 | 3M创新有限公司 | 可固化组合物、涂覆底片的方法、以及被涂覆的底片 |
| US9051423B2 (en) | 2009-09-16 | 2015-06-09 | 3M Innovative Properties Company | Fluorinated coating and phototools made therewith |
| CN102985499B (zh) * | 2010-07-08 | 2015-04-01 | Lg化学株式会社 | 防反射膜及其制备方法 |
| KR20140002704A (ko) * | 2010-12-22 | 2014-01-08 | 미쯔비시 레이온 가부시끼가이샤 | 전사 필름 및 그의 제조방법 및 적층체 및 그의 제조방법 |
| US9310527B2 (en) | 2011-03-09 | 2016-04-12 | 3M Innovative Properties Company | Antireflective film comprising large particle size fumed silica |
| US9272947B2 (en) * | 2011-05-02 | 2016-03-01 | Corning Incorporated | Glass article having antireflective layer and method of making |
| US8568958B2 (en) * | 2011-06-21 | 2013-10-29 | Az Electronic Materials Usa Corp. | Underlayer composition and process thereof |
| CN103764567A (zh) * | 2011-08-31 | 2014-04-30 | 住友大阪水泥股份有限公司 | 无机氧化物透明分散液、透明复合体形成用树脂组合物及透明复合体以及光学构件 |
| US20150017386A1 (en) * | 2012-02-01 | 2015-01-15 | 3M Innovative Properties Company | Nanostructured materials and methods of making the same |
| CN102759761B (zh) * | 2012-07-17 | 2014-10-08 | 宁波激智科技股份有限公司 | 一种高遮盖高辉度的光学薄膜及包括该光学薄膜的显示器件 |
| FR3009302B1 (fr) * | 2013-08-05 | 2018-01-12 | Saint-Gobain Glass France | Substrat portant un revetement fonctionnel et une couche de protection temporaire |
| US10213993B2 (en) | 2013-12-19 | 2019-02-26 | 3M Innovative Properties Company | Multilayer composite article |
| US9994676B2 (en) | 2014-06-23 | 2018-06-12 | 3M Innovative Properties Company | Silicon-containing polymer and method of making a silicon-containing polymer |
| JP2016097594A (ja) * | 2014-11-21 | 2016-05-30 | マツダ株式会社 | 積層塗膜及び塗装物 |
| US9499698B2 (en) | 2015-02-11 | 2016-11-22 | Az Electronic Materials (Luxembourg)S.A.R.L. | Metal hardmask composition and processes for forming fine patterns on semiconductor substrates |
| WO2016146825A1 (en) * | 2015-03-18 | 2016-09-22 | Coelux S.R.L. | Composite system comprising a matrix and scattering elements, process for preparing it and use thereof |
| CN104845484B (zh) * | 2015-04-29 | 2017-03-08 | 广德嘉宝莉化工有限公司 | 一种高机械性能防水工程机械涂料 |
| JP6688875B2 (ja) * | 2016-03-14 | 2020-04-28 | 富士フイルム株式会社 | 組成物、膜、硬化膜、光学センサおよび膜の製造方法 |
| HUP1600384A1 (hu) * | 2016-06-15 | 2018-01-29 | Hungaro Lux Light Kft | Antireflexiós bevonat |
| SG11202001741PA (en) | 2017-09-06 | 2020-03-30 | Merck Patent Gmbh | Spin-on inorganic oxide containing composition useful as hard masks and filling materials with improved thermal stability |
| KR102731347B1 (ko) * | 2017-12-08 | 2024-11-15 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 가요성 하드코트 |
| KR102709863B1 (ko) * | 2018-03-30 | 2024-09-26 | 니끼 쇼꾸바이 카세이 가부시키가이샤 | 막 형성용 도포액 및 막이 형성된 기재의 제조 방법 |
| KR102522013B1 (ko) | 2018-04-04 | 2023-04-14 | 삼성전자주식회사 | 고분자 및 무기입자를 포함하는 조성물, 폴리이미드-무기입자 복합체, 상기 복합체를 포함하는 성형품, 및 상기 성형품을 포함하는 광학 장치 |
| KR102032316B1 (ko) * | 2018-07-09 | 2019-10-15 | 에스케이씨 주식회사 | 광학 다층 필름, 이를 포함하는 광학 부품 및 표시장치 |
| US12265203B2 (en) * | 2019-01-10 | 2025-04-01 | Dai Nippon Printing Co., Ltd. | Antireflective member, and polarizing plate, image display device and antireflective article each equipped with same |
| KR20220110783A (ko) | 2019-12-06 | 2022-08-09 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 광학 층 및 광학 시스템 |
| CN111440382B (zh) * | 2020-04-14 | 2022-11-25 | 江苏源源山富数码喷绘科技有限公司 | 一种冷裱膜用柔性pp颗粒及其制备方法 |
| CN115715312B (zh) * | 2020-04-21 | 2024-04-26 | Ppg工业俄亥俄公司 | 逆反射涂层组合物、由其形成的涂层以及形成此类涂层的方法 |
| CN120740764B (zh) * | 2025-08-26 | 2025-12-09 | 秦皇岛微晶科技有限公司 | 一种防爆窗口结构及其制备方法和应用 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06211945A (ja) | 1993-01-20 | 1994-08-02 | Nissin High Voltage Co Ltd | ハードコートシートとその製造方法 |
| US6589650B1 (en) * | 2000-08-07 | 2003-07-08 | 3M Innovative Properties Company | Microscope cover slip materials |
| DE19829172A1 (de) * | 1998-06-30 | 2000-01-05 | Univ Konstanz | Verfahren zur Herstellung von Antireflexschichten |
| JP3897938B2 (ja) * | 1998-10-22 | 2007-03-28 | 宇部日東化成株式会社 | 有機−無機複合傾斜材料、その製造方法及びその用途 |
| JP3760669B2 (ja) | 1999-04-22 | 2006-03-29 | 株式会社Ｎｈｖコーポレーション | ハードコートシートとその製造方法 |
| US7125926B2 (en) * | 2001-03-21 | 2006-10-24 | Daikin Industries, Ltd. | Surface treatment agent comprising inorganic-organic hybrid material |
| DE60205094T2 (de) * | 2001-03-30 | 2006-05-24 | Koninklijke Dsm N.V. | Härtbare zusammensetzung, deren gehärtetes produkt sowie laminiertes material |
| WO2003102500A1 (en) * | 2002-06-04 | 2003-12-11 | Olympus Corporation | Method of obtaining 3-d coordinates |
| KR20050083597A (ko) * | 2002-09-19 | 2005-08-26 | 옵티맥스 테크놀러지 코포레이션 | 표면 활성화 나노 분자의 반사 방지 및 반사 차단 코팅 |
| EP1418448A1 (en) * | 2002-11-06 | 2004-05-12 | Koninklijke DSM N.V. | Preparation of a mechanically durable single layer coating with anti-reflective properties |
| JP3960307B2 (ja) * | 2003-05-15 | 2007-08-15 | Ｊｓｒ株式会社 | 液状樹脂組成物、硬化膜及び積層体 |
| JP2005148376A (ja) * | 2003-11-14 | 2005-06-09 | Sumitomo Osaka Cement Co Ltd | 膜及び反射防止膜 |
| KR20070003944A (ko) * | 2004-03-18 | 2007-01-05 | 제이에스알 가부시끼가이샤 | 적층체의 제조 방법 |
| US20090061114A1 (en) | 2004-09-13 | 2009-03-05 | Fujifilm Corporation | Anti-reflection film, polarizing plate, and liquid crystal display device |
| JP5075333B2 (ja) * | 2005-11-11 | 2012-11-21 | 富士フイルム株式会社 | 光学フィルム、偏光板、及び画像表示装置 |
| US20070286994A1 (en) * | 2006-06-13 | 2007-12-13 | Walker Christopher B | Durable antireflective film |
| US7615283B2 (en) | 2006-06-13 | 2009-11-10 | 3M Innovative Properties Company | Fluoro(meth)acrylate polymer composition suitable for low index layer of antireflective film |
| WO2009117029A2 (en) | 2007-12-19 | 2009-09-24 | E. I. Du Pont De Nemours And Company | Bilayer anti-reflective films containing nanoparticles in both layers |
-
2008
- 2008-09-02 EP EP08799058A patent/EP2193174A1/en not_active Withdrawn
- 2008-09-02 JP JP2010524107A patent/JP2010538147A/ja active Pending
- 2008-09-02 WO PCT/US2008/074988 patent/WO2009035874A1/en not_active Ceased
- 2008-09-02 CN CN2008801058962A patent/CN101796146B/zh not_active Expired - Fee Related
- 2008-09-02 US US12/670,124 patent/US8202573B2/en not_active Expired - Fee Related
- 2008-09-02 KR KR1020107007453A patent/KR20100080788A/ko not_active Ceased
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