JP2010538147A5 - - Google Patents
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- Publication number
- JP2010538147A5 JP2010538147A5 JP2010524107A JP2010524107A JP2010538147A5 JP 2010538147 A5 JP2010538147 A5 JP 2010538147A5 JP 2010524107 A JP2010524107 A JP 2010524107A JP 2010524107 A JP2010524107 A JP 2010524107A JP 2010538147 A5 JP2010538147 A5 JP 2010538147A5
- Authority
- JP
- Japan
- Prior art keywords
- refractive index
- index layer
- low refractive
- low
- coating composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000203 mixture Substances 0.000 claims description 20
- 239000008199 coating composition Substances 0.000 claims description 19
- 239000002105 nanoparticle Substances 0.000 claims description 14
- 125000001153 fluoro group Chemical group F* 0.000 claims description 9
- 239000011368 organic material Substances 0.000 claims description 8
- 230000003667 anti-reflective effect Effects 0.000 claims description 5
- 239000012756 surface treatment agent Substances 0.000 claims description 5
- 239000002904 solvent Substances 0.000 claims description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 7
- 229910000077 silane Inorganic materials 0.000 description 7
- 238000000034 method Methods 0.000 description 5
- 229920000058 polyacrylate Polymers 0.000 description 5
- 229920002313 fluoropolymer Polymers 0.000 description 4
- 150000002902 organometallic compounds Chemical class 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 239000004721 Polyphenylene oxide Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 229920000570 polyether Polymers 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- ZYMKZMDQUPCXRP-UHFFFAOYSA-N fluoro prop-2-enoate Chemical compound FOC(=O)C=C ZYMKZMDQUPCXRP-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000004971 Cross linker Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910003455 mixed metal oxide Inorganic materials 0.000 description 1
- 239000007777 multifunctional material Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- RQAGEUFKLGHJPA-UHFFFAOYSA-N prop-2-enoylsilicon Chemical compound [Si]C(=O)C=C RQAGEUFKLGHJPA-UHFFFAOYSA-N 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US97054107P | 2007-09-07 | 2007-09-07 | |
| PCT/US2008/074988 WO2009035874A1 (en) | 2007-09-07 | 2008-09-02 | Self-assembling antireflective coating comprising surface modified high refractive index nanoparticles |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010538147A JP2010538147A (ja) | 2010-12-09 |
| JP2010538147A5 true JP2010538147A5 (enExample) | 2011-09-29 |
Family
ID=40014981
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010524107A Pending JP2010538147A (ja) | 2007-09-07 | 2008-09-02 | 表面改質高屈折率ナノ粒子を含む自己組織化反射防止コーティング |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8202573B2 (enExample) |
| EP (1) | EP2193174A1 (enExample) |
| JP (1) | JP2010538147A (enExample) |
| KR (1) | KR20100080788A (enExample) |
| CN (1) | CN101796146B (enExample) |
| WO (1) | WO2009035874A1 (enExample) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101878276B (zh) * | 2007-11-29 | 2013-08-07 | Lg化学株式会社 | 具有增强的耐磨性和指纹痕迹可除去性的涂料组合物和涂膜 |
| WO2011011167A2 (en) | 2009-07-21 | 2011-01-27 | 3M Innovative Properties Company | Curable composition, method of coating a phototool, and coated phototool |
| KR101768237B1 (ko) | 2009-09-16 | 2017-08-14 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 플루오르화된 코팅 및 그로 제조된 포토툴 |
| TWI435922B (zh) * | 2010-07-08 | 2014-05-01 | Lg Chemical Ltd | 抗反射膜及其製造方法 |
| JP6142531B2 (ja) * | 2010-12-22 | 2017-06-07 | 三菱ケミカル株式会社 | 転写フィルムおよびその製造方法並びに積層体およびその製造方法 |
| KR20140015443A (ko) * | 2011-03-09 | 2014-02-06 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 입자 크기가 큰 건식 실리카를 포함하는 반사 방지 필름 |
| US9272947B2 (en) * | 2011-05-02 | 2016-03-01 | Corning Incorporated | Glass article having antireflective layer and method of making |
| US8568958B2 (en) * | 2011-06-21 | 2013-10-29 | Az Electronic Materials Usa Corp. | Underlayer composition and process thereof |
| US20140206801A1 (en) * | 2011-08-31 | 2014-07-24 | Sumitomo Osaka Cement Co., Ltd. | Inorganic oxide transparent dispersion, resin composition used to form transparent composite, transparent composite, and optical member |
| SG11201404580QA (en) * | 2012-02-01 | 2014-10-30 | 3M Innovative Properties Co | Nanostructured materials and methods of making the same |
| CN102759761B (zh) * | 2012-07-17 | 2014-10-08 | 宁波激智科技股份有限公司 | 一种高遮盖高辉度的光学薄膜及包括该光学薄膜的显示器件 |
| FR3009302B1 (fr) * | 2013-08-05 | 2018-01-12 | Saint-Gobain Glass France | Substrat portant un revetement fonctionnel et une couche de protection temporaire |
| US10213993B2 (en) | 2013-12-19 | 2019-02-26 | 3M Innovative Properties Company | Multilayer composite article |
| WO2015200003A1 (en) | 2014-06-23 | 2015-12-30 | 3M Innovative Properties Company | Silicon-containing polymer and method of making a silicon-containing polymer |
| JP2016097594A (ja) | 2014-11-21 | 2016-05-30 | マツダ株式会社 | 積層塗膜及び塗装物 |
| US9499698B2 (en) | 2015-02-11 | 2016-11-22 | Az Electronic Materials (Luxembourg)S.A.R.L. | Metal hardmask composition and processes for forming fine patterns on semiconductor substrates |
| CN107709430B (zh) * | 2015-03-18 | 2019-11-01 | 科勒克斯有限责任公司 | 包含基体和散射成分的复合材料系统及其制备方法和用途 |
| CN104845484B (zh) * | 2015-04-29 | 2017-03-08 | 广德嘉宝莉化工有限公司 | 一种高机械性能防水工程机械涂料 |
| JP6688875B2 (ja) * | 2016-03-14 | 2020-04-28 | 富士フイルム株式会社 | 組成物、膜、硬化膜、光学センサおよび膜の製造方法 |
| HUP1600384A1 (hu) | 2016-06-15 | 2018-01-29 | Hungaro Lux Light Kft | Antireflexiós bevonat |
| JP6978594B2 (ja) | 2017-09-06 | 2021-12-08 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツングMerck Patent Gesellschaft mit beschraenkter Haftung | 向上した熱安定性を有する、ハードマスク及び充填材料として有用なスピンオン無機酸化物含有組成物 |
| KR102731347B1 (ko) * | 2017-12-08 | 2024-11-15 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 가요성 하드코트 |
| WO2019189880A1 (ja) * | 2018-03-30 | 2019-10-03 | 日揮触媒化成株式会社 | 膜形成用の塗布液および膜付基材の製造方法 |
| KR102522013B1 (ko) | 2018-04-04 | 2023-04-14 | 삼성전자주식회사 | 고분자 및 무기입자를 포함하는 조성물, 폴리이미드-무기입자 복합체, 상기 복합체를 포함하는 성형품, 및 상기 성형품을 포함하는 광학 장치 |
| KR102032316B1 (ko) * | 2018-07-09 | 2019-10-15 | 에스케이씨 주식회사 | 광학 다층 필름, 이를 포함하는 광학 부품 및 표시장치 |
| TWI889080B (zh) * | 2019-01-10 | 2025-07-01 | 日商大日本印刷股份有限公司 | 抗反射構件、與具備其之偏光板、影像顯示裝置及抗反射性物品 |
| JP2023505183A (ja) | 2019-12-06 | 2023-02-08 | スリーエム イノベイティブ プロパティズ カンパニー | 光学層及び光学システム |
| CN111440382B (zh) * | 2020-04-14 | 2022-11-25 | 江苏源源山富数码喷绘科技有限公司 | 一种冷裱膜用柔性pp颗粒及其制备方法 |
| US20230242772A1 (en) * | 2020-04-21 | 2023-08-03 | Ppg Industries Ohio, Inc. | Retroreflective coating compositions, coatings formed therefrom, and methods of forming such coatings |
| CN120740764B (zh) * | 2025-08-26 | 2025-12-09 | 秦皇岛微晶科技有限公司 | 一种防爆窗口结构及其制备方法和应用 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06211945A (ja) | 1993-01-20 | 1994-08-02 | Nissin High Voltage Co Ltd | ハードコートシートとその製造方法 |
| US6589650B1 (en) * | 2000-08-07 | 2003-07-08 | 3M Innovative Properties Company | Microscope cover slip materials |
| DE19829172A1 (de) * | 1998-06-30 | 2000-01-05 | Univ Konstanz | Verfahren zur Herstellung von Antireflexschichten |
| JP3897938B2 (ja) * | 1998-10-22 | 2007-03-28 | 宇部日東化成株式会社 | 有機−無機複合傾斜材料、その製造方法及びその用途 |
| JP3760669B2 (ja) | 1999-04-22 | 2006-03-29 | 株式会社Ｎｈｖコーポレーション | ハードコートシートとその製造方法 |
| WO2002077116A1 (en) * | 2001-03-21 | 2002-10-03 | Daikin Industries, Ltd. | Surface-treating agent comprising inorganic/organic composite material |
| EP1373415B1 (en) * | 2001-03-30 | 2005-07-20 | Koninklijke DSM N.V. | Curable composition, cured product thereof, and laminated material |
| WO2003102500A1 (en) * | 2002-06-04 | 2003-12-11 | Olympus Corporation | Method of obtaining 3-d coordinates |
| JP3930884B2 (ja) * | 2002-09-19 | 2007-06-13 | オプティマックス テクノロジー コーポレーション | 表面活性化ナノ粒子の惑光防止および反射防止コーティング |
| EP1418448A1 (en) * | 2002-11-06 | 2004-05-12 | Koninklijke DSM N.V. | Preparation of a mechanically durable single layer coating with anti-reflective properties |
| JP3960307B2 (ja) * | 2003-05-15 | 2007-08-15 | Ｊｓｒ株式会社 | 液状樹脂組成物、硬化膜及び積層体 |
| JP2005148376A (ja) * | 2003-11-14 | 2005-06-09 | Sumitomo Osaka Cement Co Ltd | 膜及び反射防止膜 |
| KR20070003944A (ko) * | 2004-03-18 | 2007-01-05 | 제이에스알 가부시끼가이샤 | 적층체의 제조 방법 |
| WO2006030721A1 (en) * | 2004-09-13 | 2006-03-23 | Fujifilm Corporation | Anti-reflection film, polarizing plate, and liquid crystal display device |
| JP5075333B2 (ja) * | 2005-11-11 | 2012-11-21 | 富士フイルム株式会社 | 光学フィルム、偏光板、及び画像表示装置 |
| US7615283B2 (en) | 2006-06-13 | 2009-11-10 | 3M Innovative Properties Company | Fluoro(meth)acrylate polymer composition suitable for low index layer of antireflective film |
| US20070286994A1 (en) * | 2006-06-13 | 2007-12-13 | Walker Christopher B | Durable antireflective film |
| US20100291364A1 (en) | 2007-12-19 | 2010-11-18 | E.I. Dupont Nemours And Company | Bilayer anti-reflective films containing nanoparticles in both layers |
-
2008
- 2008-09-02 EP EP08799058A patent/EP2193174A1/en not_active Withdrawn
- 2008-09-02 KR KR1020107007453A patent/KR20100080788A/ko not_active Ceased
- 2008-09-02 CN CN2008801058962A patent/CN101796146B/zh not_active Expired - Fee Related
- 2008-09-02 WO PCT/US2008/074988 patent/WO2009035874A1/en not_active Ceased
- 2008-09-02 JP JP2010524107A patent/JP2010538147A/ja active Pending
- 2008-09-02 US US12/670,124 patent/US8202573B2/en not_active Expired - Fee Related
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