KR20100080788A - 표면 개질된 고굴절률 나노입자를 포함하는 자기-조립 반사방지 코팅 - Google Patents

표면 개질된 고굴절률 나노입자를 포함하는 자기-조립 반사방지 코팅 Download PDF

Info

Publication number
KR20100080788A
KR20100080788A KR1020107007453A KR20107007453A KR20100080788A KR 20100080788 A KR20100080788 A KR 20100080788A KR 1020107007453 A KR1020107007453 A KR 1020107007453A KR 20107007453 A KR20107007453 A KR 20107007453A KR 20100080788 A KR20100080788 A KR 20100080788A
Authority
KR
South Korea
Prior art keywords
refractive index
index layer
meth
antireflective film
low refractive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020107007453A
Other languages
English (en)
Korean (ko)
Inventor
리차드 제이 포코르니
토마스 피 클룬
마크 디 래드클리프
로버트 에프 캄라트
크리스토퍼 비 주니어 워커
Original Assignee
쓰리엠 이노베이티브 프로퍼티즈 컴파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 쓰리엠 이노베이티브 프로퍼티즈 컴파니 filed Critical 쓰리엠 이노베이티브 프로퍼티즈 컴파니
Publication of KR20100080788A publication Critical patent/KR20100080788A/ko
Ceased legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D127/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers
    • C09D127/02—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment
    • C09D127/12—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/006—Anti-reflective coatings
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/61—Additives non-macromolecular inorganic
    • C09D7/62—Additives non-macromolecular inorganic modified by treatment with other compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C08K3/22—Oxides; Hydroxides of metals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00—Use of pretreated ingredients
    • C08K9/04—Ingredients treated with organic substances
    • C08K9/06—Ingredients treated with organic substances with silicon-containing compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B2207/00—Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
    • G02B2207/101—Nanooptics
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nanotechnology (AREA)
  • Biophysics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)
  • Paints Or Removers (AREA)
KR1020107007453A 2007-09-07 2008-09-02 표면 개질된 고굴절률 나노입자를 포함하는 자기-조립 반사방지 코팅 Ceased KR20100080788A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US97054107P 2007-09-07 2007-09-07
US60/970,541 2007-09-07

Publications (1)

Publication Number Publication Date
KR20100080788A true KR20100080788A (ko) 2010-07-12

Family

ID=40014981

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020107007453A Ceased KR20100080788A (ko) 2007-09-07 2008-09-02 표면 개질된 고굴절률 나노입자를 포함하는 자기-조립 반사방지 코팅

Country Status (6)

Country Link
US (1) US8202573B2 (enExample)
EP (1) EP2193174A1 (enExample)
JP (1) JP2010538147A (enExample)
KR (1) KR20100080788A (enExample)
CN (1) CN101796146B (enExample)
WO (1) WO2009035874A1 (enExample)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009069974A2 (en) * 2007-11-29 2009-06-04 Lg Chem, Ltd. Coating composition and coating film having enhanced abrasion resistance and fingerprint traces removability
EP2456823A4 (en) 2009-07-21 2012-12-26 3M Innovative Properties Co CURABLE COMPOSITION, METHOD FOR COATING A PHOTO TOOL, AND COATED PHOTO TOOL
KR101768237B1 (ko) * 2009-09-16 2017-08-14 쓰리엠 이노베이티브 프로퍼티즈 컴파니 플루오르화된 코팅 및 그로 제조된 포토툴
WO2012005542A2 (ko) * 2010-07-08 2012-01-12 주식회사 엘지화학 반사 방지 필름 및 이의 제조 방법
WO2012086749A1 (ja) * 2010-12-22 2012-06-28 三菱レイヨン株式会社 転写フィルムおよびその製造方法並びに積層体およびその製造方法
WO2012121858A1 (en) * 2011-03-09 2012-09-13 3M Innovative Properties Company Antireflective film comprising large particle size fumed silica
US9272947B2 (en) * 2011-05-02 2016-03-01 Corning Incorporated Glass article having antireflective layer and method of making
US8568958B2 (en) * 2011-06-21 2013-10-29 Az Electronic Materials Usa Corp. Underlayer composition and process thereof
CN103764567A (zh) * 2011-08-31 2014-04-30 住友大阪水泥股份有限公司 无机氧化物透明分散液、透明复合体形成用树脂组合物及透明复合体以及光学构件
BR112014018980A8 (pt) * 2012-02-01 2017-07-11 3M Innovative Properties Company Materiais nanoestruturados e métodos para a produção dos mesmos
CN102759761B (zh) * 2012-07-17 2014-10-08 宁波激智科技股份有限公司 一种高遮盖高辉度的光学薄膜及包括该光学薄膜的显示器件
FR3009302B1 (fr) * 2013-08-05 2018-01-12 Saint-Gobain Glass France Substrat portant un revetement fonctionnel et une couche de protection temporaire
US10213993B2 (en) 2013-12-19 2019-02-26 3M Innovative Properties Company Multilayer composite article
WO2015200003A1 (en) 2014-06-23 2015-12-30 3M Innovative Properties Company Silicon-containing polymer and method of making a silicon-containing polymer
JP2016097594A (ja) * 2014-11-21 2016-05-30 マツダ株式会社 積層塗膜及び塗装物
US9499698B2 (en) 2015-02-11 2016-11-22 Az Electronic Materials (Luxembourg)S.A.R.L. Metal hardmask composition and processes for forming fine patterns on semiconductor substrates
KR20170129821A (ko) 2015-03-18 2017-11-27 코에룩스 에스알엘 매트릭스 및 산란 요소를 포함하는 복합 시스템, 그 제조방법 및 그 용도
CN104845484B (zh) * 2015-04-29 2017-03-08 广德嘉宝莉化工有限公司 一种高机械性能防水工程机械涂料
WO2017159190A1 (ja) * 2016-03-14 2017-09-21 富士フイルム株式会社 組成物、膜、硬化膜、光学センサおよび膜の製造方法
HUP1600384A1 (hu) * 2016-06-15 2018-01-29 Hungaro Lux Light Kft Antireflexiós bevonat
CN111051570B (zh) 2017-09-06 2022-05-10 默克专利股份有限公司 具有改善的热稳定性可用作硬掩膜的含旋涂式无机氧化物的组合物和填充材料
US11787970B2 (en) * 2017-12-08 2023-10-17 3M Innovative Properties Company Flexible hardcoat
WO2019189880A1 (ja) * 2018-03-30 2019-10-03 日揮触媒化成株式会社 膜形成用の塗布液および膜付基材の製造方法
KR102522013B1 (ko) 2018-04-04 2023-04-14 삼성전자주식회사 고분자 및 무기입자를 포함하는 조성물, 폴리이미드-무기입자 복합체, 상기 복합체를 포함하는 성형품, 및 상기 성형품을 포함하는 광학 장치
KR102032316B1 (ko) * 2018-07-09 2019-10-15 에스케이씨 주식회사 광학 다층 필름, 이를 포함하는 광학 부품 및 표시장치
CN113272136B (zh) * 2019-01-10 2023-07-14 大日本印刷株式会社 防反射构件、以及具备该防反射构件的偏振片、图像显示装置和防反射性物品
CN114761836B (zh) 2019-12-06 2024-12-17 3M创新有限公司 光学层和光学系统
CN111440382B (zh) * 2020-04-14 2022-11-25 江苏源源山富数码喷绘科技有限公司 一种冷裱膜用柔性pp颗粒及其制备方法
EP4139405A1 (en) * 2020-04-21 2023-03-01 PPG Industries Ohio Inc. Retroreflective coating compositions, coatings formed therefrom, and methods of forming such coatings
CN120740764B (zh) * 2025-08-26 2025-12-09 秦皇岛微晶科技有限公司 一种防爆窗口结构及其制备方法和应用

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06211945A (ja) 1993-01-20 1994-08-02 Nissin High Voltage Co Ltd ハードコートシートとその製造方法
US6589650B1 (en) 2000-08-07 2003-07-08 3M Innovative Properties Company Microscope cover slip materials
DE19829172A1 (de) 1998-06-30 2000-01-05 Univ Konstanz Verfahren zur Herstellung von Antireflexschichten
JP3897938B2 (ja) 1998-10-22 2007-03-28 宇部日東化成株式会社 有機−無機複合傾斜材料、その製造方法及びその用途
JP3760669B2 (ja) 1999-04-22 2006-03-29 株式会社Ｎｈｖコーポレーション ハードコートシートとその製造方法
US7125926B2 (en) 2001-03-21 2006-10-24 Daikin Industries, Ltd. Surface treatment agent comprising inorganic-organic hybrid material
DE60205094T2 (de) * 2001-03-30 2006-05-24 Koninklijke Dsm N.V. Härtbare zusammensetzung, deren gehärtetes produkt sowie laminiertes material
WO2003102500A1 (en) 2002-06-04 2003-12-11 Olympus Corporation Method of obtaining 3-d coordinates
US20060074172A1 (en) 2002-09-19 2006-04-06 Optimax Technology Corporation Antiglare and antireflection coatings of surface active nanoparticles
EP1418448A1 (en) 2002-11-06 2004-05-12 Koninklijke DSM N.V. Preparation of a mechanically durable single layer coating with anti-reflective properties
JP3960307B2 (ja) * 2003-05-15 2007-08-15 Ｊｓｒ株式会社 液状樹脂組成物、硬化膜及び積層体
JP2005148376A (ja) * 2003-11-14 2005-06-09 Sumitomo Osaka Cement Co Ltd 膜及び反射防止膜
JP4715746B2 (ja) * 2004-03-18 2011-07-06 Ｊｓｒ株式会社 積層体の製造方法
US20090061114A1 (en) * 2004-09-13 2009-03-05 Fujifilm Corporation Anti-reflection film, polarizing plate, and liquid crystal display device
JP5075333B2 (ja) * 2005-11-11 2012-11-21 富士フイルム株式会社 光学フィルム、偏光板、及び画像表示装置
US20070286994A1 (en) 2006-06-13 2007-12-13 Walker Christopher B Durable antireflective film
US7615283B2 (en) 2006-06-13 2009-11-10 3M Innovative Properties Company Fluoro(meth)acrylate polymer composition suitable for low index layer of antireflective film
WO2009117029A2 (en) 2007-12-19 2009-09-24 E. I. Du Pont De Nemours And Company Bilayer anti-reflective films containing nanoparticles in both layers

Also Published As

Publication number Publication date
JP2010538147A (ja) 2010-12-09
WO2009035874A1 (en) 2009-03-19
US20100189970A1 (en) 2010-07-29
CN101796146A (zh) 2010-08-04
EP2193174A1 (en) 2010-06-09
CN101796146B (zh) 2013-09-04
US8202573B2 (en) 2012-06-19

Similar Documents

Publication Publication Date Title
KR20100080788A (ko) 표면 개질된 고굴절률 나노입자를 포함하는 자기-조립 반사방지 코팅
US8343622B2 (en) Flexible high refractive index hardcoat
JP5341751B2 (ja) 反射防止フィルムの低屈折率層に好適なフルオロ（メタ）アクリレートポリマー組成物
KR101375897B1 (ko) 내구성 반사방지 필름
CN101124273B (zh) 用于减反射涂层的耐久性高折射率纳米级复合材料
US8231973B2 (en) Fluoro(meth)acrylate polymer composition suitable for low index layer of antireflective film
US20150011668A1 (en) Nanostructured materials and methods of making the same
US8343624B2 (en) Durable antireflective film
JP2008527417A (ja) 反射防止ポリマーフィルムのためのオレフィンシランを有するフルオロポリマー塗料組成物
US20070286992A1 (en) Low refractive index composition comprising fluoropolyether urethane compound
JP2003292826A (ja) 複合体、コーティング組成物、その塗膜、反射防止膜、反射防止フィルム、及び、画像表示装置
WO2012121858A1 (en) Antireflective film comprising large particle size fumed silica
JP2003041152A (ja) 複合体、コーティング組成物、その塗膜、反射防止膜、反射防止フィルム、及び、画像表示装置

Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20100406

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
A201 Request for examination
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20130813

Comment text: Request for Examination of Application

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20140725

Patent event code: PE09021S01D

E601 Decision to refuse application
PE0601 Decision on rejection of patent

Patent event date: 20141120

Comment text: Decision to Refuse Application

Patent event code: PE06012S01D

Patent event date: 20140725

Comment text: Notification of reason for refusal

Patent event code: PE06011S01I