JP2010523515A5 - - Google Patents

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Publication number
JP2010523515A5
JP2010523515A5 JP2010501474A JP2010501474A JP2010523515A5 JP 2010523515 A5 JP2010523515 A5 JP 2010523515A5 JP 2010501474 A JP2010501474 A JP 2010501474A JP 2010501474 A JP2010501474 A JP 2010501474A JP 2010523515 A5 JP2010523515 A5 JP 2010523515A5
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Japan
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alkylene
substituted
alkyl
unsubstituted
interrupted
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JP2010501474A
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English (en)
Japanese (ja)
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JP5606308B2 (ja
JP2010523515A (ja
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Priority claimed from PCT/EP2008/053456 external-priority patent/WO2008119688A1/en
Publication of JP2010523515A publication Critical patent/JP2010523515A/ja
Publication of JP2010523515A5 publication Critical patent/JP2010523515A5/ja
Application granted granted Critical
Publication of JP5606308B2 publication Critical patent/JP5606308B2/ja
Expired - Fee Related legal-status Critical Current
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JP2010501474A 2007-04-03 2008-03-25 光活性窒素塩基 Expired - Fee Related JP5606308B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP07105510.7 2007-04-03
EP07105510 2007-04-03
PCT/EP2008/053456 WO2008119688A1 (en) 2007-04-03 2008-03-25 Photoactivable nitrogen bases

Publications (3)

Publication Number Publication Date
JP2010523515A JP2010523515A (ja) 2010-07-15
JP2010523515A5 true JP2010523515A5 (https=) 2011-11-10
JP5606308B2 JP5606308B2 (ja) 2014-10-15

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ID=38016564

Family Applications (1)

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JP2010501474A Expired - Fee Related JP5606308B2 (ja) 2007-04-03 2008-03-25 光活性窒素塩基

Country Status (9)

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US (3) US9921477B2 (https=)
EP (1) EP2145231B1 (https=)
JP (1) JP5606308B2 (https=)
KR (2) KR101944734B1 (https=)
CN (1) CN101641643B (https=)
AT (1) ATE524765T1 (https=)
CA (1) CA2681201C (https=)
MX (1) MX2009010309A (https=)
WO (1) WO2008119688A1 (https=)

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CN107438513B (zh) 2015-02-05 2020-12-29 卡本有限公司 通过间歇曝光的增材制造方法
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WO2017044381A1 (en) 2015-09-09 2017-03-16 Carbon3D, Inc. Epoxy dual cure resins for additive manufacturing
US10647873B2 (en) 2015-10-30 2020-05-12 Carbon, Inc. Dual cure article of manufacture with portions of differing solubility
WO2017079502A1 (en) 2015-11-05 2017-05-11 Carbon, Inc. Silicone dual cure resins for additive manufacturing
CN108475008B (zh) 2015-12-22 2020-11-06 卡本有限公司 一种形成三维物体的方法
US10343331B2 (en) 2015-12-22 2019-07-09 Carbon, Inc. Wash liquids for use in additive manufacturing with dual cure resins
WO2017112653A1 (en) 2015-12-22 2017-06-29 Carbon, Inc. Dual precursor resin systems for additive manufacturing with dual cure resins
WO2017112751A1 (en) 2015-12-22 2017-06-29 Carbon, Inc. Blocked silicone dual cure resins for additive manufacturing
US10501572B2 (en) 2015-12-22 2019-12-10 Carbon, Inc. Cyclic ester dual cure resins for additive manufacturing
WO2017112571A1 (en) 2015-12-22 2017-06-29 Carbon, Inc. Dual cure additive manufacturing of rigid intermediates that generate semi-rigid, flexible, or elastic final products
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KR102426999B1 (ko) 2016-10-14 2022-08-01 바스프 에스이 경질화가능한 중합체 조성물
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JP7109438B2 (ja) 2016-12-05 2022-07-29 アーケマ・インコーポレイテッド 重合開始剤ブレンド物、およびそのような重合開始剤ブレンド物を含む3dプリンティングに有用な光硬化性組成物
WO2018165090A1 (en) 2017-03-09 2018-09-13 Carbon, Inc. Tough, high temperature polymers produced by stereolithography
US10367228B2 (en) * 2017-04-07 2019-07-30 Seeo, Inc. Diester-based polymer electrolytes for high voltage lithium ion batteries
US10316213B1 (en) 2017-05-01 2019-06-11 Formlabs, Inc. Dual-cure resins and related methods
CN213006569U (zh) 2017-06-21 2021-04-20 卡本有限公司 用于增材制造的系统和对分配用于增材制造的树脂有用的分配系统
US10980821B2 (en) 2017-11-24 2021-04-20 Lunella Biotech, Inc. Triphenylphosphonium-derivative compounds for eradicating cancer stem cells
US11135649B2 (en) 2018-02-27 2021-10-05 Arizona Board Of Regents On Behalf Of Arizona State University Direct metal printing with stereolithography
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