JP2010523515A5 - - Google Patents

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Publication number
JP2010523515A5
JP2010523515A5 JP2010501474A JP2010501474A JP2010523515A5 JP 2010523515 A5 JP2010523515 A5 JP 2010523515A5 JP 2010501474 A JP2010501474 A JP 2010501474A JP 2010501474 A JP2010501474 A JP 2010501474A JP 2010523515 A5 JP2010523515 A5 JP 2010523515A5
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JP
Japan
Prior art keywords
alkylene
substituted
alkyl
unsubstituted
interrupted
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JP2010501474A
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English (en)
Japanese (ja)
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JP2010523515A (ja
JP5606308B2 (ja
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Priority claimed from PCT/EP2008/053456 external-priority patent/WO2008119688A1/en
Publication of JP2010523515A publication Critical patent/JP2010523515A/ja
Publication of JP2010523515A5 publication Critical patent/JP2010523515A5/ja
Application granted granted Critical
Publication of JP5606308B2 publication Critical patent/JP5606308B2/ja
Expired - Fee Related legal-status Critical Current
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JP2010501474A 2007-04-03 2008-03-25 光活性窒素塩基 Expired - Fee Related JP5606308B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP07105510.7 2007-04-03
EP07105510 2007-04-03
PCT/EP2008/053456 WO2008119688A1 (en) 2007-04-03 2008-03-25 Photoactivable nitrogen bases

Publications (3)

Publication Number Publication Date
JP2010523515A JP2010523515A (ja) 2010-07-15
JP2010523515A5 true JP2010523515A5 (enExample) 2011-11-10
JP5606308B2 JP5606308B2 (ja) 2014-10-15

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ID=38016564

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010501474A Expired - Fee Related JP5606308B2 (ja) 2007-04-03 2008-03-25 光活性窒素塩基

Country Status (9)

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US (3) US9921477B2 (enExample)
EP (1) EP2145231B1 (enExample)
JP (1) JP5606308B2 (enExample)
KR (2) KR101514093B1 (enExample)
CN (1) CN101641643B (enExample)
AT (1) ATE524765T1 (enExample)
CA (1) CA2681201C (enExample)
MX (1) MX2009010309A (enExample)
WO (1) WO2008119688A1 (enExample)

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US11535686B2 (en) 2017-03-09 2022-12-27 Carbon, Inc. Tough, high temperature polymers produced by stereolithography
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US10316213B1 (en) 2017-05-01 2019-06-11 Formlabs, Inc. Dual-cure resins and related methods
US11458673B2 (en) 2017-06-21 2022-10-04 Carbon, Inc. Resin dispenser for additive manufacturing
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EP2145231B1 (en) 2007-04-03 2011-09-14 Basf Se Photoactivable nitrogen bases

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