JP2010523515A5 - - Google Patents
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- Publication number
- JP2010523515A5 JP2010523515A5 JP2010501474A JP2010501474A JP2010523515A5 JP 2010523515 A5 JP2010523515 A5 JP 2010523515A5 JP 2010501474 A JP2010501474 A JP 2010501474A JP 2010501474 A JP2010501474 A JP 2010501474A JP 2010523515 A5 JP2010523515 A5 JP 2010523515A5
- Authority
- JP
- Japan
- Prior art keywords
- alkylene
- substituted
- alkyl
- unsubstituted
- interrupted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000002947 alkylene group Chemical group 0.000 claims 40
- 229910052739 hydrogen Inorganic materials 0.000 claims 19
- 239000001257 hydrogen Substances 0.000 claims 19
- 229910052736 halogen Inorganic materials 0.000 claims 18
- 150000002367 halogens Chemical class 0.000 claims 18
- 125000000217 alkyl group Chemical group 0.000 claims 16
- 125000006656 (C2-C4) alkenyl group Chemical group 0.000 claims 14
- 150000001875 compounds Chemical class 0.000 claims 14
- 229910052760 oxygen Inorganic materials 0.000 claims 14
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 13
- 239000000203 mixture Substances 0.000 claims 10
- 229910052717 sulfur Inorganic materials 0.000 claims 10
- 125000001589 carboacyl group Chemical group 0.000 claims 9
- 229910052799 carbon Inorganic materials 0.000 claims 9
- 239000002585 base Substances 0.000 claims 7
- 229920000058 polyacrylate Polymers 0.000 claims 7
- 150000002431 hydrogen Chemical class 0.000 claims 6
- 125000003118 aryl group Chemical group 0.000 claims 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 5
- -1 R 21 Chemical compound 0.000 claims 4
- 125000003342 alkenyl group Chemical group 0.000 claims 4
- 125000004457 alkyl amino carbonyl group Chemical group 0.000 claims 4
- 239000012948 isocyanate Substances 0.000 claims 4
- 150000002513 isocyanates Chemical class 0.000 claims 4
- 229910052757 nitrogen Inorganic materials 0.000 claims 4
- 239000005056 polyisocyanate Substances 0.000 claims 4
- 229920001228 polyisocyanate Polymers 0.000 claims 4
- 229920000642 polymer Polymers 0.000 claims 4
- 125000006577 C1-C6 hydroxyalkyl group Chemical group 0.000 claims 3
- 125000001931 aliphatic group Chemical group 0.000 claims 3
- 238000006555 catalytic reaction Methods 0.000 claims 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 3
- 238000000034 method Methods 0.000 claims 3
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims 3
- 229920000647 polyepoxide Polymers 0.000 claims 3
- 229920006395 saturated elastomer Polymers 0.000 claims 3
- 150000003573 thiols Chemical class 0.000 claims 3
- 239000004925 Acrylic resin Substances 0.000 claims 2
- 229920000178 Acrylic resin Polymers 0.000 claims 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims 2
- 238000007259 addition reaction Methods 0.000 claims 2
- 150000001412 amines Chemical class 0.000 claims 2
- 150000008064 anhydrides Chemical group 0.000 claims 2
- 125000005100 aryl amino carbonyl group Chemical group 0.000 claims 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical group C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 claims 2
- 150000001735 carboxylic acids Chemical class 0.000 claims 2
- 125000002091 cationic group Chemical group 0.000 claims 2
- 239000003822 epoxy resin Substances 0.000 claims 2
- 125000005842 heteroatom Chemical group 0.000 claims 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 2
- 150000004658 ketimines Chemical class 0.000 claims 2
- 125000004957 naphthylene group Chemical group 0.000 claims 2
- 229920000728 polyester Polymers 0.000 claims 2
- 229920000570 polyether Polymers 0.000 claims 2
- 238000006467 substitution reaction Methods 0.000 claims 2
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical group C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 claims 2
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 claims 1
- MLIREBYILWEBDM-UHFFFAOYSA-M 2-cyanoacetate Chemical group [O-]C(=O)CC#N MLIREBYILWEBDM-UHFFFAOYSA-M 0.000 claims 1
- 125000004648 C2-C8 alkenyl group Chemical group 0.000 claims 1
- 241001481833 Coryphaena hippurus Species 0.000 claims 1
- 239000004593 Epoxy Substances 0.000 claims 1
- WYNCHZVNFNFDNH-UHFFFAOYSA-N Oxazolidine Chemical compound C1COCN1 WYNCHZVNFNFDNH-UHFFFAOYSA-N 0.000 claims 1
- 229920001744 Polyaldehyde Polymers 0.000 claims 1
- WDJHALXBUFZDSR-UHFFFAOYSA-M acetoacetate Chemical compound CC(=O)CC([O-])=O WDJHALXBUFZDSR-UHFFFAOYSA-M 0.000 claims 1
- 150000004729 acetoacetic acid derivatives Chemical class 0.000 claims 1
- 229920006243 acrylic copolymer Polymers 0.000 claims 1
- 239000000853 adhesive Substances 0.000 claims 1
- 230000001070 adhesive effect Effects 0.000 claims 1
- 229910052783 alkali metal Inorganic materials 0.000 claims 1
- 150000001340 alkali metals Chemical class 0.000 claims 1
- 125000003277 amino group Chemical group 0.000 claims 1
- 125000004653 anthracenylene group Chemical group 0.000 claims 1
- 125000003435 aroyl group Chemical group 0.000 claims 1
- 125000005125 aryl alkyl amino carbonyl group Chemical group 0.000 claims 1
- 239000012965 benzophenone Substances 0.000 claims 1
- 150000008366 benzophenones Chemical class 0.000 claims 1
- 125000002529 biphenylenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C12)* 0.000 claims 1
- 150000001728 carbonyl compounds Chemical class 0.000 claims 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 230000005494 condensation Effects 0.000 claims 1
- 238000006482 condensation reaction Methods 0.000 claims 1
- 239000003431 cross linking reagent Substances 0.000 claims 1
- 239000000539 dimer Substances 0.000 claims 1
- 150000002118 epoxides Chemical class 0.000 claims 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 239000000852 hydrogen donor Substances 0.000 claims 1
- 239000000976 ink Substances 0.000 claims 1
- 150000002500 ions Chemical class 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 238000000465 moulding Methods 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 150000002894 organic compounds Chemical class 0.000 claims 1
- 125000004430 oxygen atom Chemical group O* 0.000 claims 1
- 238000006116 polymerization reaction Methods 0.000 claims 1
- 229920006295 polythiol Polymers 0.000 claims 1
- 238000002360 preparation method Methods 0.000 claims 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 239000007858 starting material Substances 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 239000013638 trimer Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP07105510.7 | 2007-04-03 | ||
| EP07105510 | 2007-04-03 | ||
| PCT/EP2008/053456 WO2008119688A1 (en) | 2007-04-03 | 2008-03-25 | Photoactivable nitrogen bases |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010523515A JP2010523515A (ja) | 2010-07-15 |
| JP2010523515A5 true JP2010523515A5 (enExample) | 2011-11-10 |
| JP5606308B2 JP5606308B2 (ja) | 2014-10-15 |
Family
ID=38016564
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010501474A Expired - Fee Related JP5606308B2 (ja) | 2007-04-03 | 2008-03-25 | 光活性窒素塩基 |
Country Status (9)
| Country | Link |
|---|---|
| US (3) | US9921477B2 (enExample) |
| EP (1) | EP2145231B1 (enExample) |
| JP (1) | JP5606308B2 (enExample) |
| KR (2) | KR101514093B1 (enExample) |
| CN (1) | CN101641643B (enExample) |
| AT (1) | ATE524765T1 (enExample) |
| CA (1) | CA2681201C (enExample) |
| MX (1) | MX2009010309A (enExample) |
| WO (1) | WO2008119688A1 (enExample) |
Families Citing this family (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090298962A1 (en) * | 2006-09-29 | 2009-12-03 | Katia Studer | Photolatent bases for systems based on blocked isocyanates |
| JP5606308B2 (ja) | 2007-04-03 | 2014-10-15 | ビーエーエスエフ ソシエタス・ヨーロピア | 光活性窒素塩基 |
| ATE541865T1 (de) * | 2008-06-06 | 2012-02-15 | Basf Se | Fotoinitiatormischungen |
| CN101967343A (zh) * | 2010-10-22 | 2011-02-09 | 广州市博兴化工科技有限公司 | 一种光固化色漆 |
| GB2491643A (en) | 2011-06-10 | 2012-12-12 | Lambson Ltd | Method of forming a polymeric material on a substrate |
| US9616460B2 (en) | 2011-12-02 | 2017-04-11 | Toyota Motor Engineering & Manufacturing North America, Inc. | Terminate-on-demand cationic polymerization method for forming a two-dimensional coating |
| US9758607B2 (en) | 2013-10-10 | 2017-09-12 | Research Foundation Of The City University Of New York | Polymer with antibacterial activity |
| DE102014202609B4 (de) | 2014-02-13 | 2020-06-04 | tooz technologies GmbH | Aminkatalysierte Thiolhärtung von Epoxidharzen |
| US20170038686A1 (en) * | 2014-04-18 | 2017-02-09 | Rohm And Haas Electronic Materials Llc | Anthraquinone compound used for color filter of lcd |
| AU2015280283B2 (en) | 2014-06-23 | 2019-05-02 | Carbon, Inc. | Methods of producing three-dimensional objects from materials having multiple mechanisms of hardening |
| JP6731930B2 (ja) | 2015-02-05 | 2020-07-29 | カーボン，インコーポレイテッド | 断続的曝露による付加製造方法 |
| US10391711B2 (en) | 2015-03-05 | 2019-08-27 | Carbon, Inc. | Fabrication of three dimensional objects with multiple operating modes |
| BR112017023446A2 (pt) | 2015-04-29 | 2018-07-31 | 3M Innovative Properties Co | método para a fabricação de uma rede polimérica a partir de um politiol e um poliepóxido |
| CN108350145B (zh) | 2015-09-04 | 2021-06-22 | 卡本有限公司 | 用于增材制造的氰酸酯双重固化树脂 |
| US10975193B2 (en) | 2015-09-09 | 2021-04-13 | Carbon, Inc. | Epoxy dual cure resins for additive manufacturing |
| US10647873B2 (en) | 2015-10-30 | 2020-05-12 | Carbon, Inc. | Dual cure article of manufacture with portions of differing solubility |
| US11891485B2 (en) | 2015-11-05 | 2024-02-06 | Carbon, Inc. | Silicone dual cure resins for additive manufacturing |
| US10343331B2 (en) | 2015-12-22 | 2019-07-09 | Carbon, Inc. | Wash liquids for use in additive manufacturing with dual cure resins |
| WO2017112751A1 (en) | 2015-12-22 | 2017-06-29 | Carbon, Inc. | Blocked silicone dual cure resins for additive manufacturing |
| US10647054B2 (en) | 2015-12-22 | 2020-05-12 | Carbon, Inc. | Accelerants for additive manufacturing with dual cure resins |
| EP3341792A1 (en) | 2015-12-22 | 2018-07-04 | Carbon, Inc. | Dual precursor resin systems for additive manufacturing with dual cure resins |
| US10501572B2 (en) | 2015-12-22 | 2019-12-10 | Carbon, Inc. | Cyclic ester dual cure resins for additive manufacturing |
| WO2017112682A1 (en) | 2015-12-22 | 2017-06-29 | Carbon, Inc. | Fabrication of compound products from multiple intermediates by additive manufacturing with dual cure resins |
| WO2017112571A1 (en) | 2015-12-22 | 2017-06-29 | Carbon, Inc. | Dual cure additive manufacturing of rigid intermediates that generate semi-rigid, flexible, or elastic final products |
| US10500786B2 (en) | 2016-06-22 | 2019-12-10 | Carbon, Inc. | Dual cure resins containing microwave absorbing materials and methods of using the same |
| US11098151B2 (en) | 2016-10-14 | 2021-08-24 | Basf Se | Hardenable polymer composition |
| US11135790B2 (en) * | 2016-11-21 | 2021-10-05 | Carbon, Inc. | Method of making three-dimensional object by delivering reactive component for subsequent cure |
| US20190369494A1 (en) | 2016-12-05 | 2019-12-05 | Arkemea Inc. | Initiator blends and photocurable compositions containing such initiator blends useful for 3d printing |
| US11535686B2 (en) | 2017-03-09 | 2022-12-27 | Carbon, Inc. | Tough, high temperature polymers produced by stereolithography |
| WO2018186900A1 (en) * | 2017-04-07 | 2018-10-11 | Seeo, Inc. | Diester-based polymer electrolytes for high voltage lithium ion batteries |
| US10316213B1 (en) | 2017-05-01 | 2019-06-11 | Formlabs, Inc. | Dual-cure resins and related methods |
| CN213006569U (zh) | 2017-06-21 | 2021-04-20 | 卡本有限公司 | 用于增材制造的系统和对分配用于增材制造的树脂有用的分配系统 |
| CR20200238A (es) * | 2017-11-24 | 2020-12-04 | Lunella Biotech Inc | Compuestos derivados de trifenilfosfonio para erradicar células madre cancerosas |
| US11135649B2 (en) | 2018-02-27 | 2021-10-05 | Arizona Board Of Regents On Behalf Of Arizona State University | Direct metal printing with stereolithography |
| US11504903B2 (en) | 2018-08-28 | 2022-11-22 | Carbon, Inc. | 1K alcohol dual cure resins for additive manufacturing |
| EP3848179A1 (de) | 2020-01-10 | 2021-07-14 | Carl Zeiss Vision International GmbH | Inkjet-verfahren zur herstellung eines brillenglases |
| US20220011670A1 (en) * | 2020-07-08 | 2022-01-13 | International Business Machines Corporation | Resist underlayer surface modification |
| DE102022110540A1 (de) | 2022-04-29 | 2023-11-02 | tooz technologies GmbH | Verfahren zur anpassung des brechungsindex |
| CN117466862B (zh) * | 2022-07-20 | 2025-10-21 | 天津久日新材料股份有限公司 | 一种含硫光引发剂及其制备方法和应用 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0448154A1 (en) | 1990-03-20 | 1991-09-25 | Akzo Nobel N.V. | Coating composition including a blocked basic catalyst |
| WO1994028075A1 (en) | 1993-05-26 | 1994-12-08 | Akzo Nobel N.V. | Coating composition including a uv-deblockable basic catalyst |
| US6362301B1 (en) | 1994-06-13 | 2002-03-26 | Rohm And Haas Company | Curable composition |
| US5998496A (en) | 1995-10-31 | 1999-12-07 | Spectra Group Limited, Inc. | Photosensitive intramolecular electron transfer compounds |
| EP0882072B2 (en) | 1996-02-22 | 2005-10-26 | Ciba SC Holding AG | Anionic photocatalyst |
| WO1998032756A1 (en) | 1997-01-22 | 1998-07-30 | Ciba Specialty Chemicals Holding Inc. | Substituted aminoalkylidenamino triazines as herbicides |
| AU726375B2 (en) | 1997-02-26 | 2000-11-02 | Ciba Specialty Chemicals Holding Inc. | Photoactivatable nitrogen-containing bases based on alpha-ammonium ketones, iminium ketones or amidinium ketones and aryl borates |
| CN1128799C (zh) * | 1997-03-18 | 2003-11-26 | 西巴特殊化学品控股有限公司 | 基于α－氨基烯烃的可被光活化的含氮碱 |
| EP0898202B1 (en) | 1997-08-22 | 2000-07-19 | Ciba SC Holding AG | Photogeneration of amines from alpha-aminoacetophenones |
| US6489374B1 (en) | 1998-08-21 | 2002-12-03 | Ciba Specialty Chemicals Corporation | Photoactivatable bases containing nitrogen |
| CN1187388C (zh) | 2000-05-26 | 2005-02-02 | 阿克佐诺贝尔股份有限公司 | 光敏涂料组合物 |
| US7538104B2 (en) * | 2001-10-17 | 2009-05-26 | Ciba Specialty Chemicals Corporation | Photoactivable nitrogen bases |
| PL207529B1 (pl) * | 2002-04-19 | 2010-12-31 | Ciba Sc Holding Ag | Sposób wytwarzania powlekanego podłoża |
| EP1789188A2 (en) | 2004-07-21 | 2007-05-30 | CIBA SPECIALTY CHEMICALS HOLDING INC. Patent Departement | Process for the photoactivation and use of a catalyst by an inverted two-stage procedure |
| EP2041217A2 (en) | 2006-07-17 | 2009-04-01 | Ciba Holding Inc. | Method of bonding |
| US20090298962A1 (en) | 2006-09-29 | 2009-12-03 | Katia Studer | Photolatent bases for systems based on blocked isocyanates |
| JP5606308B2 (ja) | 2007-04-03 | 2014-10-15 | ビーエーエスエフ ソシエタス・ヨーロピア | 光活性窒素塩基 |
-
2008
- 2008-03-25 JP JP2010501474A patent/JP5606308B2/ja not_active Expired - Fee Related
- 2008-03-25 MX MX2009010309A patent/MX2009010309A/es active IP Right Grant
- 2008-03-25 EP EP08718153A patent/EP2145231B1/en not_active Not-in-force
- 2008-03-25 KR KR1020097022890A patent/KR101514093B1/ko not_active Expired - Fee Related
- 2008-03-25 KR KR1020147033474A patent/KR101944734B1/ko not_active Expired - Fee Related
- 2008-03-25 US US12/532,840 patent/US9921477B2/en not_active Expired - Fee Related
- 2008-03-25 CA CA2681201A patent/CA2681201C/en not_active Expired - Fee Related
- 2008-03-25 WO PCT/EP2008/053456 patent/WO2008119688A1/en not_active Ceased
- 2008-03-25 CN CN200880009820XA patent/CN101641643B/zh not_active Expired - Fee Related
- 2008-03-25 AT AT08718153T patent/ATE524765T1/de not_active IP Right Cessation
-
2018
- 2018-01-26 US US15/880,695 patent/US10928728B2/en not_active Expired - Fee Related
-
2020
- 2020-10-09 US US17/066,750 patent/US20210033972A1/en not_active Abandoned
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