KR101514093B1 - 광활성화가능한 질소 염기 - Google Patents

광활성화가능한 질소 염기 Download PDF

Info

Publication number
KR101514093B1
KR101514093B1 KR1020097022890A KR20097022890A KR101514093B1 KR 101514093 B1 KR101514093 B1 KR 101514093B1 KR 1020097022890 A KR1020097022890 A KR 1020097022890A KR 20097022890 A KR20097022890 A KR 20097022890A KR 101514093 B1 KR101514093 B1 KR 101514093B1
Authority
KR
South Korea
Prior art keywords
alkyl
alkylene
substituted
hydrogen
alkenyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020097022890A
Other languages
English (en)
Korean (ko)
Other versions
KR20100016136A (ko
Inventor
쿠르트 디틀리커
카타리나 미스텔리
캬티아 스뛰데르
툰야 융
로타르 알렉산더 엥겔브레흐트
Original Assignee
바스프 에스이
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 바스프 에스이 filed Critical 바스프 에스이
Publication of KR20100016136A publication Critical patent/KR20100016136A/ko
Application granted granted Critical
Publication of KR101514093B1 publication Critical patent/KR101514093B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
    • C07D487/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Ceramic Engineering (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Indole Compounds (AREA)
  • Plural Heterocyclic Compounds (AREA)
KR1020097022890A 2007-04-03 2008-03-25 광활성화가능한 질소 염기 Expired - Fee Related KR101514093B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP07105510.7 2007-04-03
EP07105510 2007-04-03
PCT/EP2008/053456 WO2008119688A1 (en) 2007-04-03 2008-03-25 Photoactivable nitrogen bases

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020147033474A Division KR101944734B1 (ko) 2007-04-03 2008-03-25 광활성화가능한 질소 염기

Publications (2)

Publication Number Publication Date
KR20100016136A KR20100016136A (ko) 2010-02-12
KR101514093B1 true KR101514093B1 (ko) 2015-04-21

Family

ID=38016564

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020097022890A Expired - Fee Related KR101514093B1 (ko) 2007-04-03 2008-03-25 광활성화가능한 질소 염기
KR1020147033474A Expired - Fee Related KR101944734B1 (ko) 2007-04-03 2008-03-25 광활성화가능한 질소 염기

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020147033474A Expired - Fee Related KR101944734B1 (ko) 2007-04-03 2008-03-25 광활성화가능한 질소 염기

Country Status (9)

Country Link
US (3) US9921477B2 (enExample)
EP (1) EP2145231B1 (enExample)
JP (1) JP5606308B2 (enExample)
KR (2) KR101514093B1 (enExample)
CN (1) CN101641643B (enExample)
AT (1) ATE524765T1 (enExample)
CA (1) CA2681201C (enExample)
MX (1) MX2009010309A (enExample)
WO (1) WO2008119688A1 (enExample)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101522745B (zh) * 2006-09-29 2013-06-19 西巴控股有限公司 以封闭异氰酸酯为基础的体系的光潜碱
EP2145231B1 (en) 2007-04-03 2011-09-14 Basf Se Photoactivable nitrogen bases
CN102112497B (zh) * 2008-06-06 2013-04-10 巴斯夫欧洲公司 光引发剂混合物
CN101967343A (zh) * 2010-10-22 2011-02-09 广州市博兴化工科技有限公司 一种光固化色漆
GB2491643A (en) 2011-06-10 2012-12-12 Lambson Ltd Method of forming a polymeric material on a substrate
US9616460B2 (en) 2011-12-02 2017-04-11 Toyota Motor Engineering & Manufacturing North America, Inc. Terminate-on-demand cationic polymerization method for forming a two-dimensional coating
US9758607B2 (en) 2013-10-10 2017-09-12 Research Foundation Of The City University Of New York Polymer with antibacterial activity
DE102014202609B4 (de) 2014-02-13 2020-06-04 tooz technologies GmbH Aminkatalysierte Thiolhärtung von Epoxidharzen
JP2017519055A (ja) * 2014-04-18 2017-07-13 ダウ グローバル テクノロジーズ エルエルシー Ｌｃｄのカラーフィルタに使用されるアントラキノン化合物
CN106687861B (zh) * 2014-06-23 2022-01-11 卡本有限公司 由具有多重硬化机制的材料制备三维物体的方法
MX2017010111A (es) 2015-02-05 2017-11-23 Carbon Inc Metodo de fabricacion aditiva mediante exposicion intermitente.
US10391711B2 (en) 2015-03-05 2019-08-27 Carbon, Inc. Fabrication of three dimensional objects with multiple operating modes
CA2984145A1 (en) 2015-04-29 2016-11-03 3M Innovative Properties Company Method of making a polymer network from a polythiol and a polyepoxide
WO2017040883A1 (en) 2015-09-04 2017-03-09 Carbon, Inc. Cyanate ester dual cure resins for additive manufacturing
US10975193B2 (en) 2015-09-09 2021-04-13 Carbon, Inc. Epoxy dual cure resins for additive manufacturing
US10647873B2 (en) 2015-10-30 2020-05-12 Carbon, Inc. Dual cure article of manufacture with portions of differing solubility
WO2017079502A1 (en) 2015-11-05 2017-05-11 Carbon, Inc. Silicone dual cure resins for additive manufacturing
WO2017112571A1 (en) 2015-12-22 2017-06-29 Carbon, Inc. Dual cure additive manufacturing of rigid intermediates that generate semi-rigid, flexible, or elastic final products
US10501572B2 (en) 2015-12-22 2019-12-10 Carbon, Inc. Cyclic ester dual cure resins for additive manufacturing
JP7189015B2 (ja) 2015-12-22 2022-12-13 カーボン，インコーポレイテッド 二重硬化樹脂を用いた積層造形のための二重前駆体樹脂システム
US10787583B2 (en) 2015-12-22 2020-09-29 Carbon, Inc. Method of forming a three-dimensional object comprised of a silicone polymer or co-polymer
US10639844B2 (en) 2015-12-22 2020-05-05 Carbon, Inc. Fabrication of compound products from multiple intermediates by additive manufacturing with dual cure resins
US10647054B2 (en) 2015-12-22 2020-05-12 Carbon, Inc. Accelerants for additive manufacturing with dual cure resins
US10343331B2 (en) 2015-12-22 2019-07-09 Carbon, Inc. Wash liquids for use in additive manufacturing with dual cure resins
US10500786B2 (en) 2016-06-22 2019-12-10 Carbon, Inc. Dual cure resins containing microwave absorbing materials and methods of using the same
EP3526301B1 (en) 2016-10-14 2021-06-16 Basf Se Hardenable polymer composition
WO2018094131A1 (en) * 2016-11-21 2018-05-24 Carbon, Inc. Method of making three-dimensional object by delivering reactive component for subsequent cure
CN110036342A (zh) 2016-12-05 2019-07-19 阿科玛股份有限公司 引发剂共混物和可用于3d打印的含有此类引发剂共混物的可光固化组合物
US11535686B2 (en) 2017-03-09 2022-12-27 Carbon, Inc. Tough, high temperature polymers produced by stereolithography
US10367228B2 (en) 2017-04-07 2019-07-30 Seeo, Inc. Diester-based polymer electrolytes for high voltage lithium ion batteries
US10316213B1 (en) 2017-05-01 2019-06-11 Formlabs, Inc. Dual-cure resins and related methods
US11458673B2 (en) 2017-06-21 2022-10-04 Carbon, Inc. Resin dispenser for additive manufacturing
CR20200238A (es) 2017-11-24 2020-12-04 Lunella Biotech Inc Compuestos derivados de trifenilfosfonio para erradicar células madre cancerosas
US11135649B2 (en) * 2018-02-27 2021-10-05 Arizona Board Of Regents On Behalf Of Arizona State University Direct metal printing with stereolithography
US11504903B2 (en) 2018-08-28 2022-11-22 Carbon, Inc. 1K alcohol dual cure resins for additive manufacturing
EP3848179A1 (de) 2020-01-10 2021-07-14 Carl Zeiss Vision International GmbH Inkjet-verfahren zur herstellung eines brillenglases
US20220011670A1 (en) * 2020-07-08 2022-01-13 International Business Machines Corporation Resist underlayer surface modification
DE102022110540A1 (de) 2022-04-29 2023-11-02 tooz technologies GmbH Verfahren zur anpassung des brechungsindex
CN117466862B (zh) * 2022-07-20 2025-10-21 天津久日新材料股份有限公司 一种含硫光引发剂及其制备方法和应用

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040242867A1 (en) 2001-10-17 2004-12-02 Gisele Baudin Photoactivable nitrogen bases

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0448154A1 (en) * 1990-03-20 1991-09-25 Akzo Nobel N.V. Coating composition including a blocked basic catalyst
WO1994028075A1 (en) 1993-05-26 1994-12-08 Akzo Nobel N.V. Coating composition including a uv-deblockable basic catalyst
US6362301B1 (en) 1994-06-13 2002-03-26 Rohm And Haas Company Curable composition
US5998496A (en) * 1995-10-31 1999-12-07 Spectra Group Limited, Inc. Photosensitive intramolecular electron transfer compounds
AU713498B2 (en) 1996-02-22 1999-12-02 Ciba Specialty Chemicals Holding Inc. Anionic photocatalyst
DE69807322T2 (de) * 1997-01-22 2003-04-17 Ciba Speciality Chemicals Holding Inc., Basel Fotoaktivierbare stickstoffhaltige basen, die auf alpha-aminoketonen basieren
EP1032576B1 (en) * 1997-02-26 2008-01-16 Ciba SC Holding AG Photoactivatable nitrogen-containing bases based on alpha-ammonium ketones, iminium ketones or amidinium ketones and aryl borates
CA2283446C (en) * 1997-03-18 2008-05-06 Ciba Specialty Chemicals Holding Inc. Photoactivatable nitrogen-containing bases based on .alpha.-amino alkenes
EP0898202B1 (en) 1997-08-22 2000-07-19 Ciba SC Holding AG Photogeneration of amines from alpha-aminoacetophenones
WO2000010964A1 (de) 1998-08-21 2000-03-02 Ciba Specialty Chemicals Holding Inc. Photoaktivierbare stickstoffhaltige basen
EP1285012B1 (en) 2000-05-26 2007-01-10 Akzo Nobel Coatings International B.V. Photoactivatable coating composition
ATE479713T1 (de) * 2002-04-19 2010-09-15 Basf Se Plasmainduzierte härtung von beschichtungen
KR101166746B1 (ko) 2004-07-21 2012-07-27 시바 홀딩 인크 반전 2단계 공정에 의한 촉매의 광활성화 방법 및 당해촉매의 용도
JP5465528B2 (ja) 2006-07-17 2014-04-09 チバ ホールディング インコーポレーテッド 接着方法
CN101522745B (zh) 2006-09-29 2013-06-19 西巴控股有限公司 以封闭异氰酸酯为基础的体系的光潜碱
EP2145231B1 (en) 2007-04-03 2011-09-14 Basf Se Photoactivable nitrogen bases

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040242867A1 (en) 2001-10-17 2004-12-02 Gisele Baudin Photoactivable nitrogen bases

Also Published As

Publication number Publication date
KR101944734B1 (ko) 2019-02-07
JP2010523515A (ja) 2010-07-15
WO2008119688A1 (en) 2008-10-09
US10928728B2 (en) 2021-02-23
CN101641643A (zh) 2010-02-03
US20100105794A1 (en) 2010-04-29
ATE524765T1 (de) 2011-09-15
EP2145231B1 (en) 2011-09-14
KR20150005683A (ko) 2015-01-14
JP5606308B2 (ja) 2014-10-15
CN101641643B (zh) 2013-08-07
US20180217498A1 (en) 2018-08-02
US9921477B2 (en) 2018-03-20
EP2145231A1 (en) 2010-01-20
CA2681201A1 (en) 2008-10-09
CA2681201C (en) 2016-06-14
US20210033972A1 (en) 2021-02-04
KR20100016136A (ko) 2010-02-12
MX2009010309A (es) 2009-10-16

Similar Documents

Publication Publication Date Title
KR101514093B1 (ko) 광활성화가능한 질소 염기
US8252784B2 (en) Photoactivable nitrogen bases
DE69807322T2 (de) Fotoaktivierbare stickstoffhaltige basen, die auf alpha-aminoketonen basieren
AU2002346968A1 (en) Photoactivable nitrogen bases
AU720834B2 (en) Photoactivatable nitrogen-containing bases based on alpha-amino alkenes
DE69839020T2 (de) Photoaktivierbare stickstoffhaltige Basen auf Basis von ALPHA-Ammonium-, Iminium- oder Amidiniumketonen und Arylboraten
EP1105368A1 (de) Photoaktivierbare stickstoffhaltige basen

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
AMND Amendment
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

AMND Amendment
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E601 Decision to refuse application
PE0601 Decision on rejection of patent

St.27 status event code: N-2-6-B10-B15-exm-PE0601

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

A107 Divisional application of patent
AMND Amendment
J201 Request for trial against refusal decision
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0104 Divisional application for international application

St.27 status event code: A-0-1-A10-A18-div-PA0104

St.27 status event code: A-0-1-A10-A16-div-PA0104

PJ0201 Trial against decision of rejection

St.27 status event code: A-3-3-V10-V11-apl-PJ0201

PB0901 Examination by re-examination before a trial

St.27 status event code: A-6-3-E10-E12-rex-PB0901

B701 Decision to grant
PB0701 Decision of registration after re-examination before a trial

St.27 status event code: A-3-4-F10-F13-rex-PB0701

PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

FPAY Annual fee payment

Payment date: 20180329

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

FPAY Annual fee payment

Payment date: 20190410

Year of fee payment: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20220416

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20220416

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000