JP2010522102A5 - - Google Patents

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Publication number
JP2010522102A5
JP2010522102A5 JP2009554625A JP2009554625A JP2010522102A5 JP 2010522102 A5 JP2010522102 A5 JP 2010522102A5 JP 2009554625 A JP2009554625 A JP 2009554625A JP 2009554625 A JP2009554625 A JP 2009554625A JP 2010522102 A5 JP2010522102 A5 JP 2010522102A5
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JP
Japan
Prior art keywords
film
lite
pattern
photothermal conversion
conversion layer
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Application number
JP2009554625A
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English (en)
Japanese (ja)
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JP5475474B2 (ja
JP2010522102A (ja
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Priority claimed from US11/689,853 external-priority patent/US20080233404A1/en
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Publication of JP2010522102A publication Critical patent/JP2010522102A/ja
Publication of JP2010522102A5 publication Critical patent/JP2010522102A5/ja
Application granted granted Critical
Publication of JP5475474B2 publication Critical patent/JP5475474B2/ja
Expired - Fee Related legal-status Critical Current
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JP2009554625A 2007-03-22 2008-02-29 レーザー誘起熱エンボス加工を使用する微細複製工具及びパターン Expired - Fee Related JP5475474B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/689,853 US20080233404A1 (en) 2007-03-22 2007-03-22 Microreplication tools and patterns using laser induced thermal embossing
US11/689,853 2007-03-22
PCT/US2008/055403 WO2008118610A1 (en) 2007-03-22 2008-02-29 Microreplication tools and patterns using laser induced thermal embossing

Publications (3)

Publication Number Publication Date
JP2010522102A JP2010522102A (ja) 2010-07-01
JP2010522102A5 true JP2010522102A5 (enExample) 2011-03-31
JP5475474B2 JP5475474B2 (ja) 2014-04-16

Family

ID=39775041

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009554625A Expired - Fee Related JP5475474B2 (ja) 2007-03-22 2008-02-29 レーザー誘起熱エンボス加工を使用する微細複製工具及びパターン

Country Status (6)

Country Link
US (2) US20080233404A1 (enExample)
EP (1) EP2136948A1 (enExample)
JP (1) JP5475474B2 (enExample)
KR (1) KR20090122468A (enExample)
TW (1) TW200900245A (enExample)
WO (1) WO2008118610A1 (enExample)

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