JP2012507859A5 - - Google Patents

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Publication number
JP2012507859A5
JP2012507859A5 JP2011534499A JP2011534499A JP2012507859A5 JP 2012507859 A5 JP2012507859 A5 JP 2012507859A5 JP 2011534499 A JP2011534499 A JP 2011534499A JP 2011534499 A JP2011534499 A JP 2011534499A JP 2012507859 A5 JP2012507859 A5 JP 2012507859A5
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JP
Japan
Prior art keywords
vacuum pressure
substrate
air cavity
polymerizable material
template
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011534499A
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English (en)
Japanese (ja)
Other versions
JP2012507859A (ja
JP5258973B2 (ja
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Publication date
Priority claimed from US12/603,270 external-priority patent/US8309008B2/en
Application filed filed Critical
Publication of JP2012507859A publication Critical patent/JP2012507859A/ja
Publication of JP2012507859A5 publication Critical patent/JP2012507859A5/ja
Application granted granted Critical
Publication of JP5258973B2 publication Critical patent/JP5258973B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011534499A 2008-10-30 2009-10-23 インプリント・リソグラフィ工程における剥離 Active JP5258973B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US10955708P 2008-10-30 2008-10-30
US61/109,557 2008-10-30
US12/603,270 2009-10-21
US12/603,270 US8309008B2 (en) 2008-10-30 2009-10-21 Separation in an imprint lithography process
PCT/US2009/005794 WO2010096043A1 (en) 2008-10-30 2009-10-23 Separation in an imprint lithogaphy process

Publications (3)

Publication Number Publication Date
JP2012507859A JP2012507859A (ja) 2012-03-29
JP2012507859A5 true JP2012507859A5 (enExample) 2012-11-22
JP5258973B2 JP5258973B2 (ja) 2013-08-07

Family

ID=42130980

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011534499A Active JP5258973B2 (ja) 2008-10-30 2009-10-23 インプリント・リソグラフィ工程における剥離

Country Status (5)

Country Link
US (1) US8309008B2 (enExample)
JP (1) JP5258973B2 (enExample)
MY (1) MY152453A (enExample)
TW (1) TWI408045B (enExample)
WO (1) WO2010096043A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2660239B1 (en) * 2008-07-25 2016-11-23 VIIV Healthcare Company Chemical compounds as synthetic intermediates
US8652393B2 (en) 2008-10-24 2014-02-18 Molecular Imprints, Inc. Strain and kinetics control during separation phase of imprint process
WO2011139782A1 (en) * 2010-04-27 2011-11-10 Molecular Imprints, Inc. Separation control substrate/template for nanoimprint lithography
JP5875250B2 (ja) * 2011-04-28 2016-03-02 キヤノン株式会社 インプリント装置、インプリント方法及びデバイス製造方法
JP6004738B2 (ja) * 2011-09-07 2016-10-12 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
JP6140966B2 (ja) 2011-10-14 2017-06-07 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
JP6472189B2 (ja) * 2014-08-14 2019-02-20 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
US10620532B2 (en) * 2014-11-11 2020-04-14 Canon Kabushiki Kaisha Imprint method, imprint apparatus, mold, and article manufacturing method
JP6774178B2 (ja) * 2015-11-16 2020-10-21 キヤノン株式会社 基板を処理する装置、及び物品の製造方法
US10578984B2 (en) * 2016-12-20 2020-03-03 Canon Kabushiki Kaisha Adaptive chucking system
WO2025154743A1 (ja) * 2024-01-17 2025-07-24 Ｓｃｉｖａｘ株式会社 離型方法、インプリント方法、ウェーブガイド製造方法、メタレンズ製造方法、光学部品の製造方法、ウエハ、ウェーブガイドデバイス

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6873087B1 (en) * 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
SE515607C2 (sv) 1999-12-10 2001-09-10 Obducat Ab Anordning och metod vid tillverkning av strukturer
US7179079B2 (en) * 2002-07-08 2007-02-20 Molecular Imprints, Inc. Conforming template for patterning liquids disposed on substrates
MY164487A (en) * 2002-07-11 2017-12-29 Molecular Imprints Inc Step and repeat imprint lithography processes
US7641840B2 (en) * 2002-11-13 2010-01-05 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold
EP1567913B1 (en) 2002-11-13 2009-07-29 Molecular Imprints, Inc. A chucking system and method for modulating shapes of substrates
US20040168613A1 (en) * 2003-02-27 2004-09-02 Molecular Imprints, Inc. Composition and method to form a release layer
US7396475B2 (en) * 2003-04-25 2008-07-08 Molecular Imprints, Inc. Method of forming stepped structures employing imprint lithography
US7157036B2 (en) * 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
US7150622B2 (en) * 2003-07-09 2006-12-19 Molecular Imprints, Inc. Systems for magnification and distortion correction for imprint lithography processes
EP1594001B1 (en) * 2004-05-07 2015-12-30 Obducat AB Device and method for imprint lithography
WO2005118914A2 (en) * 2004-05-28 2005-12-15 Board Of Regents, The University Of Texas System Substrate support system and method
WO2005119802A2 (en) * 2004-05-28 2005-12-15 Board Of Regents, The University Of Texas System Adaptive shape substrate support system and method
US7768624B2 (en) * 2004-06-03 2010-08-03 Board Of Regents, The University Of Texas System Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques
US20070164476A1 (en) * 2004-09-01 2007-07-19 Wei Wu Contact lithography apparatus and method employing substrate deformation
US20060145398A1 (en) * 2004-12-30 2006-07-06 Board Of Regents, The University Of Texas System Release layer comprising diamond-like carbon (DLC) or doped DLC with tunable composition for imprint lithography templates and contact masks
US7635263B2 (en) * 2005-01-31 2009-12-22 Molecular Imprints, Inc. Chucking system comprising an array of fluid chambers
US7798801B2 (en) * 2005-01-31 2010-09-21 Molecular Imprints, Inc. Chucking system for nano-manufacturing
US7636999B2 (en) * 2005-01-31 2009-12-29 Molecular Imprints, Inc. Method of retaining a substrate to a wafer chuck
US20070035717A1 (en) * 2005-08-12 2007-02-15 Wei Wu Contact lithography apparatus, system and method
JP2007083626A (ja) * 2005-09-22 2007-04-05 Ricoh Co Ltd 微細構造転写装置
JP4533358B2 (ja) 2005-10-18 2010-09-01 キヤノン株式会社 インプリント方法、インプリント装置およびチップの製造方法
JP2007134368A (ja) * 2005-11-08 2007-05-31 Nikon Corp パターン転写装置、露光装置及びパターン転写方法
US7803308B2 (en) * 2005-12-01 2010-09-28 Molecular Imprints, Inc. Technique for separating a mold from solidified imprinting material
EP1957249B1 (en) * 2005-12-08 2014-11-12 Canon Nanotechnologies, Inc. Method and system for double-sided patterning of substrates
US7670530B2 (en) * 2006-01-20 2010-03-02 Molecular Imprints, Inc. Patterning substrates employing multiple chucks
US20070231422A1 (en) * 2006-04-03 2007-10-04 Molecular Imprints, Inc. System to vary dimensions of a thin template
EP2007566A4 (en) * 2006-04-03 2010-10-13 Molecular Imprints Inc CHUCK SYSTEM COMPRISING A NETWORK OF FLUID CHAMBERS
US20070238815A1 (en) 2006-04-11 2007-10-11 Lai On Products Industrial, Ltd. Sponge-like sculpturing compound
WO2007136832A2 (en) 2006-05-18 2007-11-29 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold
JP4810319B2 (ja) * 2006-06-09 2011-11-09 キヤノン株式会社 加工装置及びデバイス製造方法
EP1884830A1 (en) * 2006-08-04 2008-02-06 Sony Deutschland GmbH A method of applying a material on a substrate

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