JP2010511079A - プラスチック表面にナノ構造を製造する方法 - Google Patents
プラスチック表面にナノ構造を製造する方法 Download PDFInfo
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- JP2010511079A JP2010511079A JP2009538587A JP2009538587A JP2010511079A JP 2010511079 A JP2010511079 A JP 2010511079A JP 2009538587 A JP2009538587 A JP 2009538587A JP 2009538587 A JP2009538587 A JP 2009538587A JP 2010511079 A JP2010511079 A JP 2010511079A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
- B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/12—Chemical modification
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
- C23C14/0652—Silicon nitride
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5873—Removal of material
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
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- Chemical Kinetics & Catalysis (AREA)
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- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Health & Medical Sciences (AREA)
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- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Laminated Bodies (AREA)
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Abstract
Description
Claims (19)
- プラズマエッチングプロセスによりプラスチックからの基板(1)の表面にナノ構造(6)を作製する方法において、2nmまたはそれ未満の平均厚さを有する薄膜(2)を基板(1)に施与し、続けてプラズマエッチングプロセスを実施することを特徴とする方法。
- 薄膜(2)が、酸化物膜、窒化物膜または弗化物膜であることを特徴とする、請求項1記載の方法。
- 薄膜(2)が、酸化ケイ素、窒化ケイ素、酸化チタンまたは弗化マグネシウムを含有することを特徴とする、請求項2記載の方法。
- 薄膜(2)を、スパッタリングまたは真空蒸着によって施与することを特徴とする、請求項1から3までのいずれか1項記載の方法。
- 薄膜(2)を、ゴム状の膜の摩耗によってか、または接着テープの施与および剥離によって施与することを特徴とする、請求項1から4までのいずれか1項記載の方法。
- 薄膜(2)が島状の膜であることを特徴とする、請求項1から5までのいずれか1項記載の方法。
- 基板が(1)が、ポリカーボネート、シクロオレフィンポリマー、ポリエーテルスルホン、ポリエーテルイミド、ポリアミド、PET、PMMAまたはCR39を含有することを特徴とする、請求項1から6までのいずれか1項記載の方法。
- プラズマエッチングプロセスの継続時間が400秒またはそれ未満であることを特徴とする、請求項1から7までのいずれか1項記載の方法。
- 様々なプラスチックからの複数の基板(1)上へのナノ構造(6)の作製を、同一の真空チャンバー内で同時に実施することを特徴とする、請求項1から8までのいずれか1項記載の方法。
- ナノ構造(6)が、基板(1)の表面から50nmまたはそれを上回る深さまで基板(1)内に伸びていることを特徴とする、請求項1から9までのいずれか1項記載の方法。
- ナノ構造(6)が、基板(1)の表面から50nmから200nmまでの深さまで基板(1)内に伸びていることを特徴とする、請求項10記載の方法。
- 基板(1)が光学素子であることを特徴とする、請求項1から11までのいずれか1項記載の方法。
- 基板(1)が光学的な表示デバイスの透明なカバーであることを特徴とする、請求項1から11までのいずれか1項記載の方法。
- 基板(1)がプラスチックフィルムであることを特徴とする、請求項1から11までのいずれか1項記載の方法。
- ナノ構造が、基板(1)の反射を低減させることを特徴とする、請求項1から14までのいずれか1項記載の方法。
- 透明な保護膜(7)をナノ構造(6)上に施与することを特徴とする、請求項1から15までのいずれか1項記載の方法。
- 透明な保護膜(7)が10nm以上から50nm以内の厚さを有することを特徴とする、請求項16記載の方法。
- 透明な保護膜(7)がSiO2膜であることを特徴とする、請求項16または17記載の方法。
- プラズマエッチングプロセスの継続時間が200秒またはそれ未満であることを特徴とする、請求項16から18までのいずれか1項記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102006056578A DE102006056578A1 (de) | 2006-11-30 | 2006-11-30 | Verfahren zur Herstellung einer Nanostruktur an einer Kunststoffoberfläche |
DE102006056578.9 | 2006-11-30 | ||
PCT/DE2007/002151 WO2008064663A1 (de) | 2006-11-30 | 2007-11-28 | Verfahren zur herstellung einer nanostruktur an einer kunststoffoberfläche |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010511079A true JP2010511079A (ja) | 2010-04-08 |
JP5268931B2 JP5268931B2 (ja) | 2013-08-21 |
Family
ID=39198257
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009538587A Active JP5268931B2 (ja) | 2006-11-30 | 2007-11-28 | プラスチック表面にナノ構造を製造する方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20090261063A1 (ja) |
EP (1) | EP2083991B8 (ja) |
JP (1) | JP5268931B2 (ja) |
KR (1) | KR101430561B1 (ja) |
CN (1) | CN101588912B (ja) |
DE (1) | DE102006056578A1 (ja) |
WO (1) | WO2008064663A1 (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012514242A (ja) * | 2008-12-30 | 2012-06-21 | スリーエム イノベイティブ プロパティズ カンパニー | ナノ構造化表面を製造する方法 |
JP2013521534A (ja) * | 2010-03-03 | 2013-06-10 | スリーエム イノベイティブ プロパティズ カンパニー | ナノ構造化表面を有するコーティングされた偏光子、及びこれを作製する方法 |
JP2014530297A (ja) * | 2011-09-28 | 2014-11-17 | ライボルト オプティクス ゲゼルシャフトミット ベシュレンクテル ハフツングLeybold Optics GmbH | 基板上に反射低減層を生成するための方法および装置 |
US9709704B2 (en) | 2011-10-12 | 2017-07-18 | Tamron Co., Ltd. | Anti-reflection film and method for manufacturing anti-reflection film |
JP2017528600A (ja) * | 2014-09-11 | 2017-09-28 | フラウンホーファー−ゲゼルシャフト ツル フェルデルング デル アンゲヴァンテン フォルシュング エー ファウFraunhofer−Gesellschaft zur Foerderung der angewandten Forschung e.V. | 基材における汚れの付着を低減する方法 |
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DE102006056578A1 (de) | 2006-11-30 | 2008-06-05 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung einer Nanostruktur an einer Kunststoffoberfläche |
GR1006618B (el) * | 2008-06-13 | 2009-12-03 | Εθνικο Κεντρο Ερευνας Φυσικων Επιστημων (Εκεφε) "Δημοκριτος" | Μεθοδος για την κατασκευη περιοδικων δομων σε πολυμερη με διεργασιες πλασματος |
CN102325719A (zh) * | 2008-12-30 | 2012-01-18 | 3M创新有限公司 | 纳米结构化制品和制备纳米结构化制品的方法 |
KR20110110240A (ko) | 2008-12-30 | 2011-10-06 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 반사방지 용품 및 이의 제조 방법 |
KR100931896B1 (ko) * | 2009-08-13 | 2009-12-16 | 제이엠아이 주식회사 | Led조명등용 보호패널과 그 제조방법 |
US20120328829A1 (en) * | 2010-03-03 | 2012-12-27 | Vang Kalc C | Composite with nano-structured layer |
CN102883870B (zh) * | 2010-05-03 | 2015-09-16 | 3M创新有限公司 | 制备纳米结构的方法 |
JP2012032690A (ja) * | 2010-08-02 | 2012-02-16 | Seiko Epson Corp | 光学物品およびその製造方法 |
DE102011013822A1 (de) * | 2011-03-14 | 2012-09-20 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Modifizierung einer Oberfläche eines Substrats durch Ionenbeschuss |
KR20130027852A (ko) * | 2011-09-08 | 2013-03-18 | 씨제이제일제당 (주) | 나노구조의 소수성 표면을 갖는 식품용기 및 그의 제조방법 |
DE102012100294B4 (de) * | 2012-01-13 | 2018-11-29 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung eines Kunststoffsubstrats mit einer Lackschicht und Kunststoffsubstrat mit einer Lackschicht |
KR101447531B1 (ko) * | 2012-09-05 | 2014-10-08 | 한국과학기술원 | 이산화티탄층의 물에 대한 습윤성을 조정하는 방법 |
DE102014105939B4 (de) | 2014-04-28 | 2019-08-29 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung einer Entspiegelungsschicht auf einer Silikonoberfläche und optisches Element |
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KR101976564B1 (ko) * | 2017-09-13 | 2019-05-10 | 한국기계연구원 | 이온빔을 이용한 나노 주름 구조가 형성된 폴리머 및 이의 제조방법 |
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KR102507549B1 (ko) * | 2018-08-31 | 2023-03-07 | 주식회사 엘지화학 | 장식 부재의 제조방법 및 장식 부재 |
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2006
- 2006-11-30 DE DE102006056578A patent/DE102006056578A1/de not_active Withdrawn
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2007
- 2007-11-28 EP EP07846367.6A patent/EP2083991B8/de active Active
- 2007-11-28 KR KR1020097013716A patent/KR101430561B1/ko active IP Right Grant
- 2007-11-28 WO PCT/DE2007/002151 patent/WO2008064663A1/de active Application Filing
- 2007-11-28 CN CN2007800439229A patent/CN101588912B/zh active Active
- 2007-11-28 JP JP2009538587A patent/JP5268931B2/ja active Active
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2009
- 2009-05-28 US US12/474,008 patent/US20090261063A1/en not_active Abandoned
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JPS56108879A (en) * | 1978-11-01 | 1981-08-28 | Minnesota Mining & Mfg | Article having fine interface structure and method |
JPH04359932A (ja) * | 1991-03-07 | 1992-12-14 | Minnesota Mining & Mfg Co <3M> | 加速プラズマ又はイオンによる表面改質 |
JP2001272505A (ja) * | 2000-03-24 | 2001-10-05 | Japan Science & Technology Corp | 表面処理方法 |
JP2005099707A (ja) * | 2003-08-29 | 2005-04-14 | Nikon Corp | 透過型光学素子及びその製造方法、並びに投影露光装置 |
JP2008508553A (ja) * | 2004-07-27 | 2008-03-21 | ヒューレット−パッカード デベロップメント カンパニー エル.ピー. | ナノ構造反射防止表面 |
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JP2012514242A (ja) * | 2008-12-30 | 2012-06-21 | スリーエム イノベイティブ プロパティズ カンパニー | ナノ構造化表面を製造する方法 |
JP2013521534A (ja) * | 2010-03-03 | 2013-06-10 | スリーエム イノベイティブ プロパティズ カンパニー | ナノ構造化表面を有するコーティングされた偏光子、及びこれを作製する方法 |
JP2014530297A (ja) * | 2011-09-28 | 2014-11-17 | ライボルト オプティクス ゲゼルシャフトミット ベシュレンクテル ハフツングLeybold Optics GmbH | 基板上に反射低減層を生成するための方法および装置 |
KR20170060183A (ko) * | 2011-09-28 | 2017-05-31 | 뷔흘러 알제나우 게엠베하 | 기판 위에 반사 감소층을 형성하기 위한 방법 및 장치 |
KR102013503B1 (ko) * | 2011-09-28 | 2019-08-22 | 뷔흘러 알제나우 게엠베하 | 기판 위에 반사 감소층을 형성하기 위한 방법 및 장치 |
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JP2017528600A (ja) * | 2014-09-11 | 2017-09-28 | フラウンホーファー−ゲゼルシャフト ツル フェルデルング デル アンゲヴァンテン フォルシュング エー ファウFraunhofer−Gesellschaft zur Foerderung der angewandten Forschung e.V. | 基材における汚れの付着を低減する方法 |
Also Published As
Publication number | Publication date |
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DE102006056578A1 (de) | 2008-06-05 |
WO2008064663A1 (de) | 2008-06-05 |
CN101588912B (zh) | 2012-03-21 |
US20090261063A1 (en) | 2009-10-22 |
JP5268931B2 (ja) | 2013-08-21 |
EP2083991B8 (de) | 2014-01-08 |
KR20090094355A (ko) | 2009-09-04 |
KR101430561B1 (ko) | 2014-08-14 |
CN101588912A (zh) | 2009-11-25 |
EP2083991B1 (de) | 2013-09-18 |
EP2083991A1 (de) | 2009-08-05 |
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