JP2010510494A5 - - Google Patents
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- Publication number
- JP2010510494A5 JP2010510494A5 JP2009537384A JP2009537384A JP2010510494A5 JP 2010510494 A5 JP2010510494 A5 JP 2010510494A5 JP 2009537384 A JP2009537384 A JP 2009537384A JP 2009537384 A JP2009537384 A JP 2009537384A JP 2010510494 A5 JP2010510494 A5 JP 2010510494A5
- Authority
- JP
- Japan
- Prior art keywords
- optical system
- curved
- layers
- rays
- diffractive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims description 18
- 239000013078 crystal Substances 0.000 claims description 15
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- 230000003287 optical effect Effects 0.000 claims 42
- 239000000463 material Substances 0.000 claims 10
- 239000012212 insulator Substances 0.000 claims 6
- 230000000694 effects Effects 0.000 claims 5
- 239000000203 mixture Substances 0.000 claims 5
- 239000000853 adhesive Substances 0.000 claims 3
- 230000001070 adhesive effect Effects 0.000 claims 3
- 238000002441 X-ray diffraction Methods 0.000 claims 2
- 238000010030 laminating Methods 0.000 claims 2
- 238000004026 adhesive bonding Methods 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 239000000758 substrate Substances 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US86613406P | 2006-11-16 | 2006-11-16 | |
| US60/866,134 | 2006-11-16 | ||
| PCT/US2007/084938 WO2008061221A2 (en) | 2006-11-16 | 2007-11-16 | X-ray focusing optic having multiple layers with respective crystal orientations |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010510494A JP2010510494A (ja) | 2010-04-02 |
| JP2010510494A5 true JP2010510494A5 (https=) | 2013-06-13 |
| JP5315251B2 JP5315251B2 (ja) | 2013-10-16 |
Family
ID=39358362
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009537384A Expired - Fee Related JP5315251B2 (ja) | 2006-11-16 | 2007-11-16 | それぞれの結晶方位を持つ多層を有するｘ線集束光学系及びこの光学系を形成する方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7738629B2 (https=) |
| EP (1) | EP2097907B1 (https=) |
| JP (1) | JP5315251B2 (https=) |
| CN (1) | CN101558454B (https=) |
| WO (1) | WO2008061221A2 (https=) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6084222B2 (ja) | 2011-08-15 | 2017-02-22 | エックス−レイ オプティカル システムズ インコーポレーテッド | 重質試料用の試料粘度／流量制御およびそのｘ線分析応用 |
| CN103946693B (zh) | 2011-10-06 | 2017-05-03 | X射线光学系统公司 | 可移除式x‑射线分析仪用的可移动型运输及屏蔽装置 |
| EP3168606A1 (en) | 2011-10-26 | 2017-05-17 | X-Ray Optical Systems, Inc. | X-ray monochromator and support |
| US20150117599A1 (en) * | 2013-10-31 | 2015-04-30 | Sigray, Inc. | X-ray interferometric imaging system |
| EP2843362A4 (en) * | 2012-04-25 | 2015-12-02 | Nippon Steel & Sumitomo Metal Corp | METHOD AND DEVICE FOR DETERMINING THE FE-ZN ALLOYING PHASE THICKNESS OF A HOTZIN-COATED STEEL PLATE |
| JP5928363B2 (ja) * | 2013-02-01 | 2016-06-01 | 信越半導体株式会社 | シリコン単結晶ウエーハの評価方法 |
| US9883793B2 (en) | 2013-08-23 | 2018-02-06 | The Schepens Eye Research Institute, Inc. | Spatial modeling of visual fields |
| US10295485B2 (en) | 2013-12-05 | 2019-05-21 | Sigray, Inc. | X-ray transmission spectrometer system |
| MX356909B (es) | 2013-10-25 | 2018-06-20 | Nippon Steel & Sumitomo Metal Corp | Dispositivo de determinación de adhesión de platinado en línea para lámina de acero galvanizada y línea de producción de lámina de acero galvanizada. |
| USRE48612E1 (en) | 2013-10-31 | 2021-06-29 | Sigray, Inc. | X-ray interferometric imaging system |
| JP6069609B2 (ja) * | 2015-03-26 | 2017-02-01 | 株式会社リガク | 二重湾曲ｘ線集光素子およびその構成体、二重湾曲ｘ線分光素子およびその構成体の製造方法 |
| US10020087B1 (en) * | 2015-04-21 | 2018-07-10 | Michael Kozhukh | Highly reflective crystalline mosaic neutron monochromator |
| US10677744B1 (en) * | 2016-06-03 | 2020-06-09 | U.S. Department Of Energy | Multi-cone x-ray imaging Bragg crystal spectrometer |
| US10845491B2 (en) | 2018-06-04 | 2020-11-24 | Sigray, Inc. | Energy-resolving x-ray detection system |
| KR102718046B1 (ko) * | 2018-07-04 | 2024-10-17 | 가부시키가이샤 리가쿠 | 형광 x선 분석 장치 |
| GB2591630B (en) | 2018-07-26 | 2023-05-24 | Sigray Inc | High brightness x-ray reflection source |
| US10656105B2 (en) | 2018-08-06 | 2020-05-19 | Sigray, Inc. | Talbot-lau x-ray source and interferometric system |
| US10962491B2 (en) | 2018-09-04 | 2021-03-30 | Sigray, Inc. | System and method for x-ray fluorescence with filtering |
| DE112019004478T5 (de) | 2018-09-07 | 2021-07-08 | Sigray, Inc. | System und verfahren zur röntgenanalyse mit wählbarer tiefe |
| US11217357B2 (en) | 2020-02-10 | 2022-01-04 | Sigray, Inc. | X-ray mirror optics with multiple hyperboloidal/hyperbolic surface profiles |
| US12247934B2 (en) | 2022-07-29 | 2025-03-11 | X-Ray Optical Systems, Inc. | Polarized, energy dispersive x-ray fluorescence system and method |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4261771A (en) | 1979-10-31 | 1981-04-14 | Bell Telephone Laboratories, Incorporated | Method of fabricating periodic monolayer semiconductor structures by molecular beam epitaxy |
| US4675889A (en) * | 1985-07-08 | 1987-06-23 | Ovonic Synthetic Materials Company, Inc. | Multiple wavelength X-ray dispersive devices and method of making the devices |
| US5127028A (en) * | 1990-08-01 | 1992-06-30 | Wittry David B | Diffractord with doubly curved surface steps |
| JP2968993B2 (ja) * | 1990-11-29 | 1999-11-02 | 株式会社リコー | Ｘ線分光器 |
| JP2968995B2 (ja) | 1990-11-30 | 1999-11-02 | 株式会社リコー | 多波長分光素子 |
| US5164975A (en) * | 1991-06-13 | 1992-11-17 | The United States Of America As Represented By The United States Department Of Energy | Multiple wavelength X-ray monochromators |
| CN1030551C (zh) * | 1991-07-30 | 1995-12-20 | 双向合成材料有限公司 | 改进型中子反射超级镜面结构 |
| JPH10502741A (ja) * | 1995-04-26 | 1998-03-10 | フィリップス エレクトロニクス ネムローゼ フェンノートシャップ | Ｘ線分析装置用のｘ線光学素子の製造方法 |
| US6285506B1 (en) * | 1999-01-21 | 2001-09-04 | X-Ray Optical Systems, Inc. | Curved optical device and method of fabrication |
| US6498830B2 (en) * | 1999-02-12 | 2002-12-24 | David B. Wittry | Method and apparatus for fabricating curved crystal x-ray optics |
| CN1122830C (zh) * | 2000-03-10 | 2003-10-01 | 中国科学院高能物理研究所 | 同步辐射x射线多层膜反射率计装置 |
| AU2003256831A1 (en) * | 2002-08-02 | 2004-02-23 | X-Ray Optical Systems, Inc. | An optical device for directing x-rays having a plurality of optical crystals |
| EP1634065A2 (en) * | 2003-06-02 | 2006-03-15 | X-Ray Optical Systems, Inc. | Method and apparatus for implementing xanes analysis |
-
2007
- 2007-11-16 US US11/941,377 patent/US7738629B2/en active Active
- 2007-11-16 CN CN200780046503.0A patent/CN101558454B/zh not_active Expired - Fee Related
- 2007-11-16 WO PCT/US2007/084938 patent/WO2008061221A2/en not_active Ceased
- 2007-11-16 JP JP2009537384A patent/JP5315251B2/ja not_active Expired - Fee Related
- 2007-11-16 EP EP07871499.5A patent/EP2097907B1/en not_active Not-in-force
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