JP2019513241A5 - - Google Patents
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- JP2019513241A5 JP2019513241A5 JP2018548785A JP2018548785A JP2019513241A5 JP 2019513241 A5 JP2019513241 A5 JP 2019513241A5 JP 2018548785 A JP2018548785 A JP 2018548785A JP 2018548785 A JP2018548785 A JP 2018548785A JP 2019513241 A5 JP2019513241 A5 JP 2019513241A5
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- JP
- Japan
- Prior art keywords
- layer
- graphite
- base substrate
- finishing
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 152
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 132
- 239000010439 graphite Substances 0.000 claims description 128
- 229910002804 graphite Inorganic materials 0.000 claims description 128
- 230000003287 optical effect Effects 0.000 claims description 70
- 238000000034 method Methods 0.000 claims description 32
- 238000004519 manufacturing process Methods 0.000 claims description 25
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 claims description 22
- 229910052580 B4C Inorganic materials 0.000 claims description 21
- 229910052575 non-oxide ceramic Inorganic materials 0.000 claims description 21
- 239000011225 non-oxide ceramic Substances 0.000 claims description 21
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 12
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 11
- 239000000919 ceramic Substances 0.000 claims description 6
- 230000003746 surface roughness Effects 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 332
- 229910000679 solder Inorganic materials 0.000 description 77
- 239000000463 material Substances 0.000 description 29
- 229910052751 metal Inorganic materials 0.000 description 29
- 239000002184 metal Substances 0.000 description 29
- 230000004888 barrier function Effects 0.000 description 16
- 239000012790 adhesive layer Substances 0.000 description 13
- 239000011248 coating agent Substances 0.000 description 12
- 238000000576 coating method Methods 0.000 description 12
- 239000010432 diamond Substances 0.000 description 12
- 229910052710 silicon Inorganic materials 0.000 description 12
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 11
- 229910003460 diamond Inorganic materials 0.000 description 11
- 239000010703 silicon Substances 0.000 description 11
- 239000011241 protective layer Substances 0.000 description 9
- 239000008188 pellet Substances 0.000 description 8
- 238000001465 metallisation Methods 0.000 description 7
- 239000000523 sample Substances 0.000 description 7
- 230000008901 benefit Effects 0.000 description 5
- 238000013461 design Methods 0.000 description 5
- 150000001247 metal acetylides Chemical class 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 230000003595 spectral effect Effects 0.000 description 4
- 229910052950 sphalerite Inorganic materials 0.000 description 4
- 229910052984 zinc sulfide Inorganic materials 0.000 description 4
- 229910052726 zirconium Inorganic materials 0.000 description 4
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 3
- -1 Ta 2 O 5 Inorganic materials 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 230000006978 adaptation Effects 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910052790 beryllium Inorganic materials 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- JJWKPURADFRFRB-UHFFFAOYSA-N carbonyl sulfide Chemical compound O=C=S JJWKPURADFRFRB-UHFFFAOYSA-N 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910052715 tantalum Inorganic materials 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 229910005690 GdF 3 Inorganic materials 0.000 description 2
- 101000929049 Xenopus tropicalis Derriere protein Proteins 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 229910052735 hafnium Inorganic materials 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 229910052761 rare earth metal Inorganic materials 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- 150000003624 transition metals Chemical class 0.000 description 2
- 206010004485 Berylliosis Diseases 0.000 description 1
- 208000023355 Chronic beryllium disease Diseases 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 229910000861 Mg alloy Inorganic materials 0.000 description 1
- 229910000792 Monel Inorganic materials 0.000 description 1
- 229910018054 Ni-Cu Inorganic materials 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- 229910018481 Ni—Cu Inorganic materials 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- 229910010037 TiAlN Inorganic materials 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000000779 depleting effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 230000002706 hydrostatic effect Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 231100000572 poisoning Toxicity 0.000 description 1
- 230000000607 poisoning effect Effects 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000000779 smoke Substances 0.000 description 1
- 230000008685 targeting Effects 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662310201P | 2016-03-18 | 2016-03-18 | |
| US62/310,201 | 2016-03-18 | ||
| PCT/US2017/022653 WO2017161084A1 (en) | 2016-03-18 | 2017-03-16 | Reflective optical element with high stiffness substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2019513241A JP2019513241A (ja) | 2019-05-23 |
| JP2019513241A5 true JP2019513241A5 (https=) | 2021-05-27 |
Family
ID=58455670
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018548785A Pending JP2019513241A (ja) | 2016-03-18 | 2017-03-16 | 高剛性基体を伴う反射性光学素子 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US10816702B2 (https=) |
| EP (1) | EP3430447A1 (https=) |
| JP (1) | JP2019513241A (https=) |
| KR (1) | KR102288420B1 (https=) |
| CN (1) | CN108780161A (https=) |
| CA (1) | CA3018211A1 (https=) |
| WO (1) | WO2017161084A1 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102018204376B4 (de) * | 2018-03-22 | 2022-07-07 | Infineon Technologies Ag | Siliziumcarbidvorrichtungen und Verfahren zur Herstellung derselben |
| US11226438B2 (en) * | 2018-10-03 | 2022-01-18 | Corning Incorporated | Reflective optical element |
| US11619764B2 (en) * | 2020-03-27 | 2023-04-04 | Raytheon Company | High-performance optical surface |
| US12345851B2 (en) | 2021-01-27 | 2025-07-01 | Corning Incorporated | Corrosion-resistant coatings for IR-transmitting substrates |
| CN117735991B (zh) * | 2023-12-20 | 2024-06-28 | 扬州北方三山工业陶瓷有限公司 | 一种用于反射镜的b4c复合材料及其制备方法 |
Family Cites Families (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3969131A (en) | 1972-07-24 | 1976-07-13 | Westinghouse Electric Corporation | Coated graphite members and process for producing the same |
| US4268124A (en) | 1978-06-21 | 1981-05-19 | Trw Inc. | Optical reflector having a nickel-iron alloy reflecting surface |
| DE3018785C2 (de) | 1980-05-16 | 1982-04-15 | Heraeus Quarzschmelze Gmbh, 6450 Hanau | Leichtgewichtsspiegel, insbesondere für astronomische Zwecke und Verfahren zu seiner Herstellung |
| US4376803A (en) * | 1981-08-26 | 1983-03-15 | The Aerospace Corporation | Carbon-reinforced metal-matrix composites |
| FR2552554A1 (fr) | 1983-09-23 | 1985-03-29 | Leteurtre Jean | Miroir pour faisceau lumineux, notamment laser de puissance |
| US4623228A (en) | 1984-10-25 | 1986-11-18 | United Technologies Corporation | Composite mirror substrate |
| US4659548A (en) * | 1986-02-13 | 1987-04-21 | The United States Of America As Represented By The Secretary Of The Navy | Fabrication of metal matrix composite mirror |
| JP2585300B2 (ja) * | 1987-10-06 | 1997-02-26 | キヤノン株式会社 | Ｘ線又は真空紫外線用多層膜反射鏡 |
| US4997678A (en) * | 1989-10-23 | 1991-03-05 | Cvd Incorporated | Chemical vapor deposition process to replicate the finish and figure of preshaped structures |
| US5071596A (en) | 1989-10-23 | 1991-12-10 | Cvd Incorporated | Fabrication of lightweight ceramic mirrors by means of a chemical vapor deposition process |
| JPH0774839B2 (ja) * | 1991-09-30 | 1995-08-09 | 東芝セラミックス株式会社 | Ｓｏｒ用ミラー |
| US5565052A (en) | 1992-03-05 | 1996-10-15 | Industrieanlagen-Betriebsgesellschaft Gmbh | Method for the production of a reflector |
| US5912777A (en) * | 1997-06-26 | 1999-06-15 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | High temperature solar reflector, its preparation and use |
| US6377655B1 (en) | 1998-05-08 | 2002-04-23 | Nikon Corporation | Reflective mirror for soft x-ray exposure apparatus |
| ES2161171B1 (es) | 1998-11-10 | 2003-04-01 | Bwx Technologies Inc | Un dispositivo optico reflector para lata temperatura. |
| US6206531B1 (en) * | 1999-05-25 | 2001-03-27 | Ultramet | Lightweight precision optical mirror substrate and method of making |
| US7132309B2 (en) * | 2003-04-22 | 2006-11-07 | Chien-Min Sung | Semiconductor-on-diamond devices and methods of forming |
| US6749309B1 (en) | 2001-09-27 | 2004-06-15 | Gsi Lumonics Corporation | Optical element for scanning system and method of manufacture thereof |
| US7866343B2 (en) | 2002-12-18 | 2011-01-11 | Masco Corporation Of Indiana | Faucet |
| US6921177B2 (en) * | 2003-02-24 | 2005-07-26 | Raytheon Company | High precision mirror, and a method of making it |
| US7022629B2 (en) * | 2003-08-12 | 2006-04-04 | Raytheon Company | Print through elimination in fiber reinforced matrix composite mirrors and method of construction |
| EP2316567B1 (en) | 2003-09-26 | 2018-01-24 | 3M Innovative Properties Co. | Nanoscale gold catalysts, activating agents, support media, and related methodologies useful for making such catalyst systems especially when the gold is deposited onto the support media using physical vapor deposition |
| US7688495B2 (en) | 2006-03-03 | 2010-03-30 | Gentex Corporation | Thin-film coatings, electro-optic elements and assemblies incorporating these elements |
| JP2011222958A (ja) * | 2010-03-25 | 2011-11-04 | Komatsu Ltd | ミラーおよび極端紫外光生成装置 |
| US8602576B1 (en) | 2010-07-29 | 2013-12-10 | Exelis, Inc. | Lightweight mirror blanks by deposition |
| WO2012041697A1 (en) * | 2010-09-27 | 2012-04-05 | Carl Zeiss Smt Gmbh | Mirror, projection objective comprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objective |
| US9575223B2 (en) * | 2011-05-13 | 2017-02-21 | Raytheon Company | Magnesium mirrors and methods of manufacture thereof |
| DE102011103746A1 (de) * | 2011-05-31 | 2012-12-06 | Ixys Semiconductor Gmbh | Verfahren zum Fügen von Metall-Keramik-Substraten an Metallkörpern |
| DE102012204833A1 (de) * | 2012-03-27 | 2013-02-28 | Carl Zeiss Smt Gmbh | Glatte euv-spiegel und verfahren zu ihrer herstellung |
| US9488760B2 (en) | 2013-02-28 | 2016-11-08 | Corning Incorporated | Enhanced, durable silver coating stacks for highly reflective mirrors |
| JP2015018228A (ja) * | 2013-06-10 | 2015-01-29 | 旭化成イーマテリアルズ株式会社 | ペリクル膜及びペリクル |
| GB201313824D0 (en) | 2013-08-01 | 2013-09-18 | Orbital Power Ltd | A Rotary Engine |
| US20160024648A1 (en) | 2014-07-24 | 2016-01-28 | Lauren Bolton | Process for making triple graded CVC-CVD-CVC silicon carbide products |
-
2017
- 2017-03-10 US US15/455,654 patent/US10816702B2/en active Active
- 2017-03-16 CA CA3018211A patent/CA3018211A1/en not_active Abandoned
- 2017-03-16 EP EP17714613.1A patent/EP3430447A1/en not_active Withdrawn
- 2017-03-16 CN CN201780018178.0A patent/CN108780161A/zh active Pending
- 2017-03-16 WO PCT/US2017/022653 patent/WO2017161084A1/en not_active Ceased
- 2017-03-16 KR KR1020187029488A patent/KR102288420B1/ko active Active
- 2017-03-16 JP JP2018548785A patent/JP2019513241A/ja active Pending
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