JP5315251B2 - それぞれの結晶方位を持つ多層を有するｘ線集束光学系及びこの光学系を形成する方法 - Google Patents

それぞれの結晶方位を持つ多層を有するｘ線集束光学系及びこの光学系を形成する方法 Download PDF

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JP5315251B2
JP5315251B2 JP2009537384A JP2009537384A JP5315251B2 JP 5315251 B2 JP5315251 B2 JP 5315251B2 JP 2009537384 A JP2009537384 A JP 2009537384A JP 2009537384 A JP2009537384 A JP 2009537384A JP 5315251 B2 JP5315251 B2 JP 5315251B2
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optical system
curved
layers
diffractive
rays
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JP2010510494A (ja
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ズゥウー チェン
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エックス−レイ オプティカル システムズ インコーポレーテッド
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    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/062—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements the element being a crystal
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Lenses (AREA)
JP2009537384A 2006-11-16 2007-11-16 それぞれの結晶方位を持つ多層を有するｘ線集束光学系及びこの光学系を形成する方法 Expired - Fee Related JP5315251B2 (ja)

Applications Claiming Priority (3)

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US86613406P 2006-11-16 2006-11-16
US60/866,134 2006-11-16
PCT/US2007/084938 WO2008061221A2 (en) 2006-11-16 2007-11-16 X-ray focusing optic having multiple layers with respective crystal orientations

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JP2010510494A JP2010510494A (ja) 2010-04-02
JP2010510494A5 JP2010510494A5 (https=) 2013-06-13
JP5315251B2 true JP5315251B2 (ja) 2013-10-16

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JP2009537384A Expired - Fee Related JP5315251B2 (ja) 2006-11-16 2007-11-16 それぞれの結晶方位を持つ多層を有するｘ線集束光学系及びこの光学系を形成する方法

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US (1) US7738629B2 (https=)
EP (1) EP2097907B1 (https=)
JP (1) JP5315251B2 (https=)
CN (1) CN101558454B (https=)
WO (1) WO2008061221A2 (https=)

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JP6084222B2 (ja) 2011-08-15 2017-02-22 エックス−レイ オプティカル システムズ インコーポレーテッド 重質試料用の試料粘度／流量制御およびそのｘ線分析応用
CN103946693B (zh) 2011-10-06 2017-05-03 X射线光学系统公司 可移除式x‑射线分析仪用的可移动型运输及屏蔽装置
EP3168606A1 (en) 2011-10-26 2017-05-17 X-Ray Optical Systems, Inc. X-ray monochromator and support
US20150117599A1 (en) * 2013-10-31 2015-04-30 Sigray, Inc. X-ray interferometric imaging system
EP2843362A4 (en) * 2012-04-25 2015-12-02 Nippon Steel & Sumitomo Metal Corp METHOD AND DEVICE FOR DETERMINING THE FE-ZN ALLOYING PHASE THICKNESS OF A HOTZIN-COATED STEEL PLATE
JP5928363B2 (ja) * 2013-02-01 2016-06-01 信越半導体株式会社 シリコン単結晶ウエーハの評価方法
US9883793B2 (en) 2013-08-23 2018-02-06 The Schepens Eye Research Institute, Inc. Spatial modeling of visual fields
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
MX356909B (es) 2013-10-25 2018-06-20 Nippon Steel & Sumitomo Metal Corp Dispositivo de determinación de adhesión de platinado en línea para lámina de acero galvanizada y línea de producción de lámina de acero galvanizada.
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
JP6069609B2 (ja) * 2015-03-26 2017-02-01 株式会社リガク 二重湾曲ｘ線集光素子およびその構成体、二重湾曲ｘ線分光素子およびその構成体の製造方法
US10020087B1 (en) * 2015-04-21 2018-07-10 Michael Kozhukh Highly reflective crystalline mosaic neutron monochromator
US10677744B1 (en) * 2016-06-03 2020-06-09 U.S. Department Of Energy Multi-cone x-ray imaging Bragg crystal spectrometer
US10845491B2 (en) 2018-06-04 2020-11-24 Sigray, Inc. Energy-resolving x-ray detection system
KR102718046B1 (ko) * 2018-07-04 2024-10-17 가부시키가이샤 리가쿠 형광 x선 분석 장치
GB2591630B (en) 2018-07-26 2023-05-24 Sigray Inc High brightness x-ray reflection source
US10656105B2 (en) 2018-08-06 2020-05-19 Sigray, Inc. Talbot-lau x-ray source and interferometric system
US10962491B2 (en) 2018-09-04 2021-03-30 Sigray, Inc. System and method for x-ray fluorescence with filtering
DE112019004478T5 (de) 2018-09-07 2021-07-08 Sigray, Inc. System und verfahren zur röntgenanalyse mit wählbarer tiefe
US11217357B2 (en) 2020-02-10 2022-01-04 Sigray, Inc. X-ray mirror optics with multiple hyperboloidal/hyperbolic surface profiles
US12247934B2 (en) 2022-07-29 2025-03-11 X-Ray Optical Systems, Inc. Polarized, energy dispersive x-ray fluorescence system and method

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US4675889A (en) * 1985-07-08 1987-06-23 Ovonic Synthetic Materials Company, Inc. Multiple wavelength X-ray dispersive devices and method of making the devices
US5127028A (en) * 1990-08-01 1992-06-30 Wittry David B Diffractord with doubly curved surface steps
JP2968993B2 (ja) * 1990-11-29 1999-11-02 株式会社リコー Ｘ線分光器
JP2968995B2 (ja) 1990-11-30 1999-11-02 株式会社リコー 多波長分光素子
US5164975A (en) * 1991-06-13 1992-11-17 The United States Of America As Represented By The United States Department Of Energy Multiple wavelength X-ray monochromators
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JPH10502741A (ja) * 1995-04-26 1998-03-10 フィリップス エレクトロニクス ネムローゼ フェンノートシャップ Ｘ線分析装置用のｘ線光学素子の製造方法
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EP1634065A2 (en) * 2003-06-02 2006-03-15 X-Ray Optical Systems, Inc. Method and apparatus for implementing xanes analysis

Also Published As

Publication number Publication date
CN101558454B (zh) 2013-11-06
EP2097907A2 (en) 2009-09-09
JP2010510494A (ja) 2010-04-02
CN101558454A (zh) 2009-10-14
EP2097907B1 (en) 2013-07-03
US20080117511A1 (en) 2008-05-22
US7738629B2 (en) 2010-06-15
WO2008061221A3 (en) 2008-10-09
WO2008061221A2 (en) 2008-05-22

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