JP6084222B2 - 重質試料用の試料粘度/流量制御およびそのx線分析応用 - Google Patents
重質試料用の試料粘度/流量制御およびそのx線分析応用 Download PDFInfo
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- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
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- G—PHYSICS
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
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- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
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- G—PHYSICS
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
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- G01N2223/076—X-ray fluorescence
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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Description
本出願は、2011年8月15日に出願された米国特許仮出願第61/523,605号明細書に基づく利益を主張するものである。この仮出願は、ここに参照によりその全体が本明細書に組み込まれる。
試料T>曇り点、最高250°F
粘度 20cSt以上
濾波:100μm
LOD:0.3ppm@300s−水溶性マトリクス
LOD:0.2ppm@300s−炭化水素マトリクス
分析時間:10〜900s−ユーザによる調節が可能
例示的な範囲:0.2ppm/wt〜3,000ppm/wt
(開示されるオンライン分析器の重要な利点の1つは、有機塩素化合物および無機塩素化合物の両方を測定することが可能である点である。)
Claims (20)
- 内部で試料流がX線エンジンのX線分析焦点領域の周辺を流れる、試料分析領域を画定する試料チャンバと、
X線が前記試料分析領域へ/から進むのを可能にするための、前記チャンバの壁部中のX線透過性バリアと、
前記試料分析領域においておよび前記バリアの上において試料流の乱流を発生させるための、前記試料分析領域を部分的に阻止する阻止構造体と
を備え、
前記試料分析領域は入力試料ポートと出力試料ポートの交差部において形成され、
前記阻止構造体はその中心が前記X線分析焦点領域および/または前記試料分析領域の中心軸からずれるように配設されることを特徴とするX線分析試料処理装置。 - 前記阻止構造体は、丸形ピンを備えることを特徴とする請求項1に記載の装置。
- X線励起経路と、
X線検出経路と
を備える、前記X線エンジンを備える、X線分析システムと組み合わされ、
前記X線励起経路および/または前記X線検出経路は、前記チャンバ内に前記X線分析焦点領域を画定することを特徴とする請求項1に記載の装置。 - 前記焦点領域は、焦点であることを特徴とする請求項3に記載の装置。
- 前記焦点は、前記X線励起経路および/または前記X線検出経路中の少なくとも1つの焦点調節光学部品への/からの焦点調節されたX線によって画定されることを特徴とする請求項4に記載の装置。
- 前記少なくとも1つの焦点調節光学部品は、少なくとも1つの湾曲回折光学部品またはポリキャピラリ光学部品であることを特徴とする請求項5に記載の装置。
- 前記少なくとも1つの焦点調節光学部品は、少なくとも1つの焦点調節単色光学部品であることを特徴とする請求項5に記載の装置。
- 前記少なくとも1つの焦点調節単色光学部品は、湾曲結晶光学部品または湾曲多層光学部品であることを特徴とする請求項7に記載の装置。
- 前記X線検出経路中の少なくとも1つの焦点調節光学部品が、その入力焦点がX線焦点に位置するように、位置決めされ、前記X線励起経路中の少なくとも1つの焦点調節光学部品の出力焦点に一致することを特徴とする請求項4に記載の装置。
- 前記X線分析システムは、単色波長により可能となるXRF分析器を備えることを特徴とする請求項3に記載の装置。
- 前記分析器は、MWDXRF分析器またはME−EDXRF分析器であることを特徴とする請求項10に記載の装置。
- 前記試料流の流れを向上させるための前記試料流を加熱するための加熱素子をさらに備えることを特徴とする請求項1に記載の装置。
- 前記試料は、中に含まれる分析物の測定を必要とする石油ベース製品を含むことを特徴とする請求項1ないし12のいずれか一項に記載の装置。
- 測定される分析物が、以下のリスト、すなわちS、Cl、P、K、Ca、V、Mn、Fe、Co、Ni、Cu、Zn、Hg、As、Pb、およびSeから選択される少なくとも1つの元素であることを特徴とする請求項1ないし13のいずれか一項に記載の装置。
- 前記流は、原油であり、測定される分析物は、塩素であることを特徴とする請求項1ないし14のいずれか一項に記載の装置。
- X線励起ビームを生成するためのX線源を有するX線エンジンであって、前記X線励起ビームは、X線分析焦点領域の方向に送られる、X線エンジンと、
前記X線分析焦点領域へと試料を提供するための試料チャンバであって、前記X線分析焦点領域は、前記チャンバ内に画定された試料分析領域内に配置される、試料チャンバと、
前記焦点領域から二次X線を収集し、検出器の方向に前記二次X線を送るための、X線検出経路と、
前記X線励起ビームおよび前記二次X線が通過する前記チャンバの壁部上のX線透過性バリアと、
前記試料分析領域を部分的に阻止することにより、前記試料分析領域内におよび前記バリアの上に試料流の乱流を発生させる、阻止構造体と
を備え、
前記試料分析領域は入力試料ポートと出力試料ポートの交差部において形成され、
前記阻止構造体はその中心が前記X線分析焦点領域および/または前記試料分析領域の中心軸からずれるように配設されることを特徴とするX線分析システム。 - 分析器は、単色波長により可能となるXRF分析器を備えることを特徴とする請求項16に記載のシステム。
- 前記システムは、MWDXRF分析器またはME−EDXRF分析器であることを特徴とする請求項17に記載のシステム。
- 測定される分析物が、以下のリスト、すなわちS、Cl、P、K、Ca、V、Mn、Fe、Co、Ni、Cu、Zn、Hg、As、Pb、およびSeから選択される少なくとも1つの元素であることを特徴とする請求項16〜18のいずれか一項に記載のシステム。
- 前記流は、原油であり、測定される分析物は、塩素であることを特徴とする請求項16〜18のいずれか一項に記載のシステム。
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US201161523605P | 2011-08-15 | 2011-08-15 | |
US61/523,605 | 2011-08-15 | ||
PCT/US2012/050708 WO2013025682A2 (en) | 2011-08-15 | 2012-08-14 | Sample viscosity and flow control for heavy samples, and x-ray analysis applications thereof |
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JP2014527635A JP2014527635A (ja) | 2014-10-16 |
JP6084222B2 true JP6084222B2 (ja) | 2017-02-22 |
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US (2) | US9057685B2 (ja) |
EP (1) | EP2745101B1 (ja) |
JP (1) | JP6084222B2 (ja) |
CN (1) | CN103733054B (ja) |
WO (1) | WO2013025682A2 (ja) |
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CN103733054B (zh) * | 2011-08-15 | 2017-09-05 | X射线光学系统公司 | 用于重质试样的试样粘度和流量控制及其x‑射线分析应用 |
WO2014151305A1 (en) * | 2013-03-15 | 2014-09-25 | X-Ray Optical Systems, Inc. | Non-homogeneous sample handling apparatus and x-ray analyzer applications thereof |
JP6081260B2 (ja) * | 2013-03-28 | 2017-02-15 | 株式会社日立ハイテクサイエンス | 蛍光x線分析装置 |
CN103278519B (zh) * | 2013-05-16 | 2015-09-30 | 北京乾达源科技有限公司 | 一种在线含硫分析装置 |
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JP6677420B2 (ja) * | 2016-04-01 | 2020-04-08 | キヤノン電子管デバイス株式会社 | X線管装置 |
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US9435757B2 (en) | 2016-09-06 |
WO2013025682A3 (en) | 2013-05-02 |
WO2013025682A2 (en) | 2013-02-21 |
JP2014527635A (ja) | 2014-10-16 |
US20160033428A1 (en) | 2016-02-04 |
EP2745101A2 (en) | 2014-06-25 |
US20130044858A1 (en) | 2013-02-21 |
CN103733054B (zh) | 2017-09-05 |
US9057685B2 (en) | 2015-06-16 |
CN103733054A (zh) | 2014-04-16 |
EP2745101B1 (en) | 2019-11-06 |
EP2745101A4 (en) | 2015-04-01 |
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