JP2010510083A5 - - Google Patents
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- Publication number
- JP2010510083A5 JP2010510083A5 JP2009538474A JP2009538474A JP2010510083A5 JP 2010510083 A5 JP2010510083 A5 JP 2010510083A5 JP 2009538474 A JP2009538474 A JP 2009538474A JP 2009538474 A JP2009538474 A JP 2009538474A JP 2010510083 A5 JP2010510083 A5 JP 2010510083A5
- Authority
- JP
- Japan
- Prior art keywords
- main surface
- carrier
- workpiece
- polymer
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US86676806P | 2006-11-21 | 2006-11-21 | |
| PCT/US2007/085103 WO2008064158A2 (en) | 2006-11-21 | 2007-11-19 | Lapping carrier and method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010510083A JP2010510083A (ja) | 2010-04-02 |
| JP2010510083A5 true JP2010510083A5 (enExample) | 2011-01-06 |
Family
ID=39430535
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009538474A Pending JP2010510083A (ja) | 2006-11-21 | 2007-11-19 | ラッピングキャリア及びラッピング方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US8137157B2 (enExample) |
| EP (1) | EP2097221A4 (enExample) |
| JP (1) | JP2010510083A (enExample) |
| KR (1) | KR101494912B1 (enExample) |
| CN (1) | CN101541477B (enExample) |
| TW (1) | TWI428205B (enExample) |
| WO (1) | WO2008064158A2 (enExample) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102007049811B4 (de) * | 2007-10-17 | 2016-07-28 | Peter Wolters Gmbh | Läuferscheibe, Verfahren zur Beschichtung einer Läuferscheibe sowie Verfahren zur gleichzeitigen beidseitigen Material abtragenden Bearbeitung von Halbleiterscheiben |
| KR101271444B1 (ko) * | 2009-06-04 | 2013-06-05 | 가부시키가이샤 사무코 | 고정 연마 입자 가공 장치 및 고정 연마 입자 가공 방법, 그리고 반도체 웨이퍼 제조 방법 |
| KR101209271B1 (ko) * | 2009-08-21 | 2012-12-06 | 주식회사 엘지실트론 | 양면 연마 장치와 양면 연마 장치용 캐리어 |
| CN102267108A (zh) * | 2010-06-03 | 2011-12-07 | 中国砂轮企业股份有限公司 | 具有改质钻石磨料的研磨工具及其制造方法 |
| DE102010032501B4 (de) | 2010-07-28 | 2019-03-28 | Siltronic Ag | Verfahren und Vorrichtung zum Abrichten der Arbeitsschichten einer Doppelseiten-Schleifvorrichtung |
| DE102010042040A1 (de) | 2010-10-06 | 2012-04-12 | Siltronic Ag | Verfahren zum Schleifen einer Halbleiterscheibe |
| DE102011003008B4 (de) | 2011-01-21 | 2018-07-12 | Siltronic Ag | Führungskäfig und Verfahren zur gleichzeitig beidseitigen Material abtragenden Bearbeitung von Halbleiterscheiben |
| US20130017765A1 (en) * | 2011-07-11 | 2013-01-17 | 3M Innovative Properties Company | Lapping carrier and method of using the same |
| DE102011089570A1 (de) | 2011-12-22 | 2013-06-27 | Siltronic Ag | Führungskäfig zum beidseitigen Schleifen von mindestens einem scheibenförmigen Werkstück zwischen zwei rotierenden Arbeitsscheiben einer Schleifvorrichtung, Verfahren zur Herstellung des Führungskäfigs und Verfahren zum gleichzeitigen beidseitigen Schleifen von scheibenförmigen Werkstücken unter Verwendung des Führungskäfigs |
| US9017139B2 (en) | 2013-03-12 | 2015-04-28 | Seagate Technology Llc | Lapping carrier having hard and soft properties, and methods |
| CN104924196A (zh) * | 2014-03-20 | 2015-09-23 | 六晶金属科技(苏州)有限公司 | 一种led芯片级封装用金属基板的研磨方法 |
| US20150292090A1 (en) * | 2014-04-10 | 2015-10-15 | Shell Oil Company | Method of making a supported gas separation membrane |
| JP6838811B2 (ja) | 2014-05-02 | 2021-03-03 | スリーエム イノベイティブ プロパティズ カンパニー | 断続的構造化研磨物品並びに被加工物の研磨方法 |
| CN104385121A (zh) * | 2014-09-30 | 2015-03-04 | 无锡康柏斯机械科技有限公司 | 一种硬盘基片研磨机的研磨承载装置 |
| JP6707831B2 (ja) * | 2015-10-09 | 2020-06-10 | 株式会社Sumco | 研削装置および研削方法 |
| US10556317B2 (en) | 2016-03-03 | 2020-02-11 | P.R. Hoffman Machine Products Inc. | Polishing machine wafer holder |
| US20170252893A1 (en) * | 2016-03-03 | 2017-09-07 | P.R. Hoffman Machine Products Inc. | Polishing machine work piece holder |
| CN108020774B (zh) * | 2017-11-30 | 2020-03-20 | 上海华力微电子有限公司 | 小样品的去层方法 |
| US10792786B2 (en) | 2018-02-12 | 2020-10-06 | Seagate Technology Llc | Lapping carrier system with optimized carrier insert |
| CN113496870B (zh) * | 2020-04-03 | 2022-07-26 | 重庆超硅半导体有限公司 | 一种集成电路用硅片边缘形貌控制方法 |
| CN112435954B (zh) * | 2020-11-25 | 2024-01-26 | 西安奕斯伟材料科技股份有限公司 | 一种晶圆载体的处理方法和晶圆载体 |
| CN113146465B (zh) * | 2021-04-06 | 2023-03-21 | 安徽禾臣新材料有限公司 | 一种薄型晶片双面研磨用吸附垫及生产方法 |
Family Cites Families (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3453783A (en) | 1966-06-30 | 1969-07-08 | Texas Instruments Inc | Apparatus for holding silicon slices |
| US3691694A (en) * | 1970-11-02 | 1972-09-19 | Ibm | Wafer polishing machine |
| DE3524978A1 (de) | 1985-07-12 | 1987-01-22 | Wacker Chemitronic | Verfahren zum beidseitigen abtragenden bearbeiten von scheibenfoermigen werkstuecken, insbesondere halbleiterscheiben |
| JPH0373265A (ja) * | 1989-05-02 | 1991-03-28 | Sekisui Chem Co Ltd | 被研磨物保持用キャリヤ及びその製造方法 |
| JP2849533B2 (ja) | 1993-08-18 | 1999-01-20 | 長野電子工業株式会社 | ウェーハの研磨方法 |
| JP3379097B2 (ja) | 1995-11-27 | 2003-02-17 | 信越半導体株式会社 | 両面研磨装置及び方法 |
| US6077616A (en) * | 1997-02-10 | 2000-06-20 | Aluminum Company Of America | Laminated strip for use as reflective vehicle trim |
| US5882245A (en) | 1997-02-28 | 1999-03-16 | Advanced Ceramics Research, Inc. | Polymer carrier gears for polishing of flat objects |
| JPH1110530A (ja) | 1997-06-25 | 1999-01-19 | Shin Etsu Handotai Co Ltd | 両面研磨用キャリア |
| JPH1133895A (ja) * | 1997-07-17 | 1999-02-09 | Shin Kobe Electric Mach Co Ltd | 被研磨物保持のためのキャリア材 |
| US6030280A (en) | 1997-07-23 | 2000-02-29 | Speedfam Corporation | Apparatus for holding workpieces during lapping, honing, and polishing |
| JP2974007B1 (ja) * | 1997-10-20 | 1999-11-08 | 新神戸電機株式会社 | 被研磨物保持材及び被研磨物の製造法 |
| US6080042A (en) * | 1997-10-31 | 2000-06-27 | Virginia Semiconductor, Inc. | Flatness and throughput of single side polishing of wafers |
| CA2251056A1 (en) * | 1997-11-20 | 1999-05-20 | General Electric Company | Impact modified compositions of compatibilized polyphenylene ether-polyamide resin blends |
| JPH11254305A (ja) * | 1998-03-12 | 1999-09-21 | Shin Etsu Handotai Co Ltd | ウエーハの両面研磨方法と該研磨方法に用いるウエーハキャリア |
| JPH11267964A (ja) * | 1998-03-20 | 1999-10-05 | Speedfam Co Ltd | 平面研磨装置及びそれに用いるキャリヤ |
| US6419555B1 (en) | 1999-06-03 | 2002-07-16 | Brian D. Goers | Process and apparatus for polishing a workpiece |
| TW431434U (en) * | 1999-10-22 | 2001-04-21 | Ind Tech Res Inst | Carrier for carrying non-circular workpiece |
| DE10023002B4 (de) | 2000-05-11 | 2006-10-26 | Siltronic Ag | Satz von Läuferscheiben sowie dessen Verwendung |
| JP3439726B2 (ja) | 2000-07-10 | 2003-08-25 | 住友ベークライト株式会社 | 被研磨物保持材及びその製造方法 |
| US6454635B1 (en) | 2000-08-08 | 2002-09-24 | Memc Electronic Materials, Inc. | Method and apparatus for a wafer carrier having an insert |
| US6709981B2 (en) * | 2000-08-16 | 2004-03-23 | Memc Electronic Materials, Inc. | Method and apparatus for processing a semiconductor wafer using novel final polishing method |
| JP2002160156A (ja) * | 2000-11-27 | 2002-06-04 | Fukushichi Fukuzaki | 研磨用キャリア |
| DE10060697B4 (de) | 2000-12-07 | 2005-10-06 | Siltronic Ag | Doppelseiten-Polierverfahren mit reduzierter Kratzerrate und Vorrichtung zur Durchführung des Verfahrens |
| DE10132504C1 (de) | 2001-07-05 | 2002-10-10 | Wacker Siltronic Halbleitermat | Verfahren zur beidseitigen Material abtragenden Bearbeitung von Halbleiterscheiben und seine Verwendung |
| US7008310B2 (en) * | 2001-08-01 | 2006-03-07 | Entegris, Inc. | Wafer carrier wear indicator |
| US6673870B2 (en) * | 2002-05-13 | 2004-01-06 | The Procter & Gamble Company | Compositions of polyolefins and hyperbranched polymers with improved tensile properties |
| US20040259485A1 (en) | 2002-10-02 | 2004-12-23 | Ensinger Kunstsofftechnoligie Gbr | Retaining ring for holding semiconductor wafers in a chemical mechanical polishing apparatus |
| US20040261945A1 (en) | 2002-10-02 | 2004-12-30 | Ensinger Kunststofftechnoligie Gbr | Retaining ring for holding semiconductor wafers in a chemical mechanical polishing apparatus |
| DE10250823B4 (de) * | 2002-10-31 | 2005-02-03 | Siltronic Ag | Läuferscheibe und Verfahren zur gleichzeitig beidseitigen Bearbeitung von Werkstücken |
| US7008308B2 (en) * | 2003-05-20 | 2006-03-07 | Memc Electronic Materials, Inc. | Wafer carrier |
| US20080166952A1 (en) * | 2005-02-25 | 2008-07-10 | Shin-Etsu Handotai Co., Ltd | Carrier For Double-Side Polishing Apparatus, Double-Side Polishing Apparatus And Double-Side Polishing Method Using The Same |
-
2007
- 2007-11-19 JP JP2009538474A patent/JP2010510083A/ja active Pending
- 2007-11-19 US US12/513,705 patent/US8137157B2/en active Active
- 2007-11-19 EP EP07864595A patent/EP2097221A4/en not_active Withdrawn
- 2007-11-19 KR KR20097010304A patent/KR101494912B1/ko active Active
- 2007-11-19 WO PCT/US2007/085103 patent/WO2008064158A2/en not_active Ceased
- 2007-11-19 CN CN2007800432855A patent/CN101541477B/zh active Active
- 2007-11-20 TW TW096144003A patent/TWI428205B/zh not_active IP Right Cessation
-
2012
- 2012-02-07 US US13/367,424 patent/US8795033B2/en not_active Expired - Fee Related
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